公开(公告)号：DE68919290T2

公开(公告)日：1995-05-24

申请号：DE68919290

申请日：1989-07-03

Applicant: IBM

Inventor： BARD STEVEN LYNDZ ,  FEGER CLAUDIUS ,  GLENNING JOHN JOSEPH ,  HOUGHAM GARETH GEOFFREY ,  MOLIS STEVEN EARLE ,  PAWLOWSKI WALTER PAUL ,  RITSKO JOHN JAMES ,  SLOTA PETER ,  SNYDER RANDY WILLIAM

IPC: G03F7/26 ,  C08J7/12 ,  G03F7/40 ,  H01L21/306 ,  H01L21/311 ,  H05K1/03 ,  H05K3/00 ,  H05K3/10 ,  H01L21/31 ,  H01L21/768

公开(公告)号：BR8906690A

公开(公告)日：1990-09-11

申请号：BR8906690

申请日：1989-12-22

Applicant: IBM

Inventor： VIEHBECK ALFRED ,  BUCHWALTER STEPHEN LESLIE ,  DONSON WILLIAM ARTHUR ,  GLENNING JOHN JOSEPH ,  GOLDBERG MARTIN JOSEPH ,  GREBE KURT RUDOLPH ,  KOVAC CAROLINE ANN ,  MATTHEW LINDA CROLYN ,  PAWLOWSKI WALTER PAUL ,  SCHADT MARK JEFREY ,  SCHEUERMANN MICHAEL ROY ,  TISDALE STEPHEN LEO

IPC: C23C18/20 ,  C08J5/12 ,  C08J7/00 ,  C23C18/16 ,  C23C18/28 ,  H05K3/38 ,  C08F8/42 ,  C08J7/06

公开(公告)号：DE68925596D1

公开(公告)日：1996-03-21

申请号：DE68925596

申请日：1989-04-25

Applicant: IBM

Inventor： FEILCHENFELD NATALIE BARBARA ,  FUERNISS STEPHEN JOSEPH ,  GLENNING JOHN JOSEPH ,  PAWLOWSKI WALTER PAUL ,  PHELAN GIANA MARRONE ,  RICKERL PAUL GEORGE

IPC: H05K3/06 ,  G03F7/038 ,  G03F7/16 ,  G03F7/32 ,  H01L21/768 ,  H01L23/522 ,  H05K1/03 ,  H05K3/46

Abstract: A polyimide pattern is formed on a substrate by providing a layer of photosensitive polyimide precursor containing the polyimide precursor and a compound having a photosensitive group on the substrate and prebaking the layer. The layer is then exposed imagewise to actinic radiation through a photomask to form an exposed image pattern of the polyimide precursor in the layer. The unexposed areas of the layer are removed using a liquid developer and the exposed image pattern is cured by heating. In one aspect of the present invention, the prebaking step employs a judicious selection of times and temperatures to eliminate the problem of formation of a white residue that occurs from using prior art prebake procedures. In another aspect of the present invention, a particular liquid developer composition is employed to facilitate the formation of sloped vias in the polyimide. In another aspect of the present invention, a particular range of exposure wavelength(s) is employed to obtain smooth walled vias.

公开(公告)号：DE68919290D1

公开(公告)日：1994-12-15

申请号：DE68919290

申请日：1989-07-03

Applicant: IBM

Inventor： BARD STEVEN LYNDZ ,  FEGER CLAUDIUS ,  GLENNING JOHN JOSEPH ,  HOUGHAM GARETH GEOFFREY ,  MOLIS STEVEN EARLE ,  PAWLOWSKI WALTER PAUL ,  RITSKO JOHN JAMES ,  SLOTA PETER ,  SNYDER RANDY WILLIAM

IPC: G03F7/26 ,  C08J7/12 ,  G03F7/40 ,  H01L21/306 ,  H01L21/311 ,  H05K1/03 ,  H05K3/00 ,  H05K3/10 ,  H01L21/31 ,  H01L21/90