公开(公告)号：EP1470583A4

公开(公告)日：2005-08-03

申请号：EP02789958

申请日：2002-11-26

Applicant: IBM

Inventor： POGGE BERNHARD H ,  YU ROY ,  PRASAD CHANDRIKA ,  NARAYAN CHANDRASEKHAR

IPC: H01L23/12 ,  H01L21/68 ,  H01L21/768 ,  H01L23/48 ,  H01L23/485 ,  H01L23/525 ,  H01L25/065 ,  H01L25/07 ,  H01L25/18

CPC classification number: H01L24/10 ,  H01L21/6835 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L23/525 ,  H01L24/13 ,  H01L24/81 ,  H01L25/0652 ,  H01L2224/03002 ,  H01L2224/0401 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05184 ,  H01L2224/0557 ,  H01L2224/05572 ,  H01L2224/05644 ,  H01L2224/06181 ,  H01L2224/13 ,  H01L2224/13099 ,  H01L2224/16145 ,  H01L2224/17181 ,  H01L2224/81005 ,  H01L2224/94 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01057 ,  H01L2924/01061 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/10329 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/15787 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/013

Abstract: A process is described for semiconductor device integration at chip level or wafer level, in which vertical connections are formed through a substrate (1). A metallized feature (2) is formed in the top surface of a substrate, and a handling plate (35) is attached to the substrate. The substrate is then thinned at the bottom surface thereof to expose the bottom of the feature, to form a conducting through-via (20). The substrate may comprise a chip (44) having a device (30), e.g. a PE chip. The plate may be a wafer (65) attached to the substrate using a vertical stud/via interconnection. The substrate and plate may each have devices (30,60) fabricated therein, so that the process provides vertical wafer-level integration of the devices.

公开(公告)号：EP0806727A3

公开(公告)日：1998-05-20

申请号：EP97302760

申请日：1997-04-22

Applicant: IBM

Inventor： ALT PAUL MATTHEW ,  CHALCO PEDRO A ,  FURMAN BRUCE KENNETH ,  HORTON RAYMOND ROBERT ,  NARAYAN CHANDRASEKHAR ,  OWENS BENAL LEE JR ,  WARREN KEVIN WILSON ,  WRIGHT STEVEN LORENZ

IPC: G02F1/1343 ,  G02F1/13 ,  G02F1/1362 ,  G06F11/20 ,  G09F9/30 ,  G09G3/20 ,  G09G3/36 ,  G11C29/00

CPC classification number: G02F1/1309 ,  G02F2001/136272 ,  G09G3/3611 ,  G09G3/3685 ,  G09G2300/0426 ,  G09G2310/0297 ,  G09G2330/08 ,  G11C29/76 ,  Y10S345/904

Abstract: A matrix addressed display system designed so as to enable data line (22) repair by electronic mechanisms which is efficient and low in cost and thus increases yield. Such active data line (22) repair utilizes additional data driver (36) outputs, a defect map memory (48) in the TFT/LCD module and modification of the data stream to the data drivers (36) by additional circuits (42) between the display and the display adapter. A bus configuration on the display substrate is utilized which combines repair flexibility, low parasitic capacitance, and the ability to easily make the necessary interconnections. The number of interconnections is kept to a minimum, the connections are reliable, and the connections may be made with conventional wire bond or laser bond technology, or disk bond technology.

公开(公告)号：WO0163648A3

公开(公告)日：2002-04-18

申请号：PCT/US0105373

申请日：2001-02-20

Applicant: INFINEON TECHNOLOGIES CORP ,  IBM

Inventor： NARAYAN CHANDRASEKHAR ,  BRINTZINGER AXEL ,  EINSPRUCH FRED L ,  HAFFNER HENNING ,  THOMAS ALAN C

IPC: H01L23/525 ,  G03F1/14

CPC classification number: H01L23/5258 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of making a photolithography mask for use in creating an electrical fuse on a semiconductor structure comprises initially determining a pattern for a desired electrical fuse, with the pattern including a fuse portion of substantially constant width except for a localized narrowed region of the fuse portion at which the electrical fuse is designed to blow. The method then includes providing a photolithography mask substrate and creating on the photolithography mask substrate a fuse mask element adapted to absorb transmission of an energy beam. The fuse mask element has a first mask portion of substantially constant width corresponding to the desired electrical fuse pattern portion of substantially constant width, and a second mask portion corresponding to the localized narrowed region of the fuse portion. The second mask portion comprises either an additional mask element spaced from the first mask portion, a narrowed width portion, or a gap in the first mask portion. The second mask portion is of a configuration sufficient to create a latent image of the electrical fuse pattern, including the localized narrowed region of the fuse portion at which the electrical fuse is designed to blow, upon passing the energy beam through the photolithography mask and onto a resist layer. Preferably, the fuse portion of substantially constant width on the determined fuse pattern has a design width less than about 0.25 mu m, and wherein the localized narrowed region of the fuse portion has a design width less than the design width of the fuse portion.

Abstract translation: 制造用于在半导体结构上形成电熔丝的光刻掩模的方法包括：首先确定用于期望的电熔丝的图案，其中该图案包括除了熔丝部分的局部变窄的区域之外基本恒定宽度的熔丝部分 在此电熔丝被设计为吹塑。 该方法然后包括提供光刻掩模衬底并且在光刻掩模衬底上产生适于吸收能量束的透射的熔丝掩模元件。 熔丝掩模元件具有基本恒定宽度的第一掩模部分和与熔丝部分的局部缩窄区域对应的第二掩模部分，第一掩模部分对应于基本恒定宽度的期望电熔丝图案部分。 第二掩模部分包括与第一掩模部分隔开的另外的掩模元件，变窄的宽度部分或第一掩模部分中的间隙。 第二掩模部分具有足以产生电熔丝图案的潜像的配置，该电图案包括保险丝部分的局部变窄的区域，在电熔丝被设计成在该区域处被吹过，在通过能量束通过光刻掩模并且到 抗蚀剂层。 优选地，在所确定的熔丝图案上具有基本恒定宽度的熔丝部分具有小于约0.25μm的设计宽度，并且其中熔丝部分的局部变窄区域具有小于熔丝部分的设计宽度的设计宽度。

公开(公告)号：WO0199148A3

公开(公告)日：2002-08-29

申请号：PCT/US0119240

申请日：2001-06-14

Applicant: INFINEON TECHNOLOGIES CORP ,  IBM

Inventor： IYER SUNDAR K ,  BRINTZINGER AXEL ,  SMEYS PETER ,  NARAYAN CHANDRASEKHAR ,  IYER SUBRAMANIAN

IPC: H01L23/525 ,  H01L27/102

CPC classification number: H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A fuse for semiconductor devices, in accordance with the present invention, includes a cathode (104) including a first dopant type, and an anode (102) including a second dopant type where the second dopant type is opposite the first dopant type. A fuse link (106) connects the cathode and the anode and includes the second dopant type. The fuse link and the cathode form a junction (111) therebetween, and the junction is configured to be reverse biased relative to a cathode potential and an anode potential. A conductive layer (103) is formed across the junction such that current flowing at the junction is diverted into the conductive layer to enhance material migration to program the fuse.

Abstract translation: 根据本发明的用于半导体器件的熔断器包括包括第一掺杂剂型的阴极（104）和包括第二掺杂剂类型的阳极（102），其中第二掺杂剂类型与第一掺杂剂类型相反。 熔丝连接（106）连接阴极和阳极并且包括第二掺杂剂类型。 熔丝链和阴极在其间形成结（111），并且该结被配置为相对于阴极电位和阳极电位被反向偏置。 在结上形成导电层（103），使得在结处流动的电流被转移到导电层中以增强材料迁移以对熔丝进行编程。

公开(公告)号：WO0163648A9

公开(公告)日：2002-10-24

申请号：PCT/US0105373

申请日：2001-02-20

Applicant: INFINEON TECHNOLOGIES CORP ,  IBM

Inventor： NARAYAN CHANDRASEKHAR ,  BRINTZINGER AXEL ,  EINSPRUCH FRED L ,  HAFFNER HENNING ,  THOMAS ALAN C

IPC: H01L23/525 ,  G03F1/14

CPC classification number: H01L23/5258 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of making a photolithography mask for use in creating an electrical fuse on a semiconductor structure comprises initially determining a pattern for a desired electrical fuse, with the pattern including a fuse portion of substantially constant width except for a localized narrowed region of the fuse portion at which the electrical fuse is designed to blow. The method then includes providing a photolithography mask substrate and creating on the photolithography mask substrate a fuse mask element adapted to absorb transmission of an energy beam. The fuse mask element has a first mask portion of substantially constant width corresponding to the desired electrical fuse pattern portion of substantially constant width, and a second mask portion corresponding to the localized narrowed region of the fuse portion. The second mask portion comprises either an additional mask element spaced from the first mask portion, a narrowed width portion, or a gap in the first mask portion. The second mask portion is of a configuration sufficient to create a latent image of the electrical fuse pattern, including the localized narrowed region of the fuse portion at which the electrical fuse is designed to blow, upon passing the energy beam through the photolithography mask and onto a resist layer. Preferably, the fuse portion of substantially constant width on the determined fuse pattern has a design width less than about 0.25 mu m, and wherein the localized narrowed region of the fuse portion has a design width less than the design width of the fuse portion.

Abstract translation: 制造用于在半导体结构上形成电熔丝的光刻掩模的方法包括：首先确定所需电熔丝的图案，其中所述图案包括基本恒定宽度的熔丝部分，除了熔丝部分的局部变窄区域 电熔丝被设计在其上。 该方法然后包括提供光刻掩模基板，并在光刻掩模基板上产生适于吸收能量束透射的熔丝屏蔽元件。 熔丝掩模元件具有对应于基本恒定宽度的期望电熔丝图案部分的基本恒定宽度的第一掩模部分和对应于熔丝部分的局部变窄区域的第二掩模部分。 第二掩模部分包括与第一掩模部分间隔开的附加掩模元件，第一掩模部分中的窄宽度部分或间隙。 第二掩模部分具有足以产生电熔丝图案的潜像的构造，包括将电熔丝设计成熔断部分的熔断部分的局部变窄区域，以使能量束通过光刻掩模并进入 抗蚀剂层。 优选地，确定的熔丝图案上的基本上恒定的宽度的熔丝部分具有小于约0.25μm的设计宽度，并且其中熔丝部分的局部变窄区域具有小于熔丝部分的设计宽度的设计宽度。

公开(公告)号：JP2004193605A

公开(公告)日：2004-07-08

申请号：JP2003405153

申请日：2003-12-03

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： DALTON TIMOTHY J ,  DAS SANJIT K ,  ENGEL BRETT H ,  HERBST BRIAN W ,  HICHRI HABIB ,  KASTENMEIER BERND E ,  MALONE KELLY ,  MARINO JEFFREY R ,  MARTIN ARTHUR ,  MCGAHAY VINCENT J ,  MELVILLE IAN D ,  NARAYAN CHANDRASEKHAR ,  PETRARCA KEVIN S ,  VOLANT RICHARD P

IPC: H01L21/768 ,  H01L23/522 ,  H01L23/532

CPC classification number: H01L21/76808 ,  H01L21/76801 ,  H01L21/76831 ,  H01L23/5226 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To provide a structure and a method for reducing thermal mechanical stress in stack and via. SOLUTION: An interconnection structure for a semiconductor device comprises an organic low-k (low specific dielectric constant) dielectric layer formed on a lower metallization. The via to be formed here is in this low-k dielectric layer, and combines a lower metallization line formed on the lower metallization level and an upper metallization line formed on an upper metallization level. This via is surrounded by structure collar selected from material with CTE that can protect the via from shearing force generated after the thermal expansion of the low-k dielectric layer. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004006772A

公开(公告)日：2004-01-08

申请号：JP2003093635

申请日：2003-03-31

Applicant: IBM ,  SIEMENS AG

Inventor： NARAYAN CHANDRASEKHAR ,  BRINTZINGER AXEL ,  KIEWRA EDWARD ,  RADENS CARL

IPC: B23K26/00 ,  B23K26/38 ,  B23K101/38 ,  H01H69/02 ,  H01H85/00 ,  H01L21/3205 ,  H01L21/82 ,  H01L21/8242 ,  H01L23/52 ,  H01L23/525 ,  H01L27/04 ,  H01L27/108

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing an integrated circuit having an improved fuse structure part and laser fuse links. SOLUTION: The fuse structure part in an integrated circuit chip comprises an insulated semiconductor substrate, a fuse bank 410 which is constituted of a plurality of the parallel fuse links 402, 404 and 404 on the same plane and which are integrated with the insulated semiconductor substrate and voids 410 and 412 which scatter between pairs of fuse links and which extend across the plane delimited by the fuse links on the same plane. The voids 410 and 412 surrounding a spot 420 to be hit by a laser beam during a fusing operation function as crack stops for preventing damage against an adjacent circuit element or the other existing fuse link. Thus, a denser pitch between fuses can be obtained by suitably forming and positioning the voids. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2000058655A

公开(公告)日：2000-02-25

申请号：JP17440199

申请日：1999-06-21

Applicant: IBM

Inventor： ARNDT KENNETH C ,  GAMBINO JEFFREY P ,  MANDELMAN JACK A ,  NARAYAN CHANDRASEKHAR ,  SCHNABEL RAINER F ,  SCHUTZ RONALD J ,  TOEBBEN DIRK

IPC: H01L21/82 ,  H01L21/768 ,  H01L23/525

Abstract: PROBLEM TO BE SOLVED: To improve the control of thickness of an insulator layer on a fuse structure, by a method wherein a dielectric structure is positioned on a conduction level, and electric connection is performed at a selected position of the conduction level through the dielectric structure. SOLUTION: On a semiconductor substrate 10 an electric conduction level 1 is formed by using conductive material selected out of aluminum, copper, aluminum copper alloy, and doped polysilicon having metal type conductivity. A dielectric etching stop material layer 2 is stuck on the upper surface of the electric conduction level 1. Electric connection is performed to a selected position of the electric conduction level 1 through the dielectric etching stop material layer 2, and a conductive fuse 21 is constituted. As a result control of the thickness of an insulator layer on the fuse structure containing a self-aligned isolation cap can be improved.

公开(公告)号：JP2000353750A

公开(公告)日：2000-12-19

申请号：JP2000144824

申请日：2000-05-17

Applicant: IBM ,  INFINEON TECHNOLOGIES CORP

Inventor： BRINTZINGER AXEL ,  KIRIHATA TOSHIAKI ,  NARAYAN CHANDRASEKHAR

IPC: H01L21/82 ,  H01H85/00 ,  H01L23/525 ,  H01H85/044

Abstract: PROBLEM TO BE SOLVED: To array a larger number of fuses densely by electrically connecting at least two fuses that contain a fusing part arrayed in a first level of a multi- layer semiconductor device, respectively. SOLUTION: Each fuse 13 contains a part 15 that is actually fused. The part 15 to be fused is arrayed in a first metal level M1. Like the other part of the fuse 13, the part 15 that is actually fused is made typically of a electrically conductive material, especially aluminum. A termination of each part 15 to be fused is connected to a connector bias 17 that connects that fuse 13 with a connector 19. A gate contact 23 is vertical to a direction of the fuse 13. The gate contact 23 can be connected to a ground that is common to all of existing fuse circuits. Therefore, fuse density is doubled without narrowing the fuse pitch.

公开(公告)号：JP2000323578A

公开(公告)日：2000-11-24

申请号：JP37247499

申请日：1999-12-28

Applicant: IBM ,  SIEMENS AG

Inventor： NARAYAN CHANDRASEKHAR ,  BRINTZINGER AXEL ,  KIEWRA EDWARD ,  RADENS CARL

IPC: B23K26/00 ,  B23K26/38 ,  B23K101/38 ,  H01H69/02 ,  H01H85/00 ,  H01L21/3205 ,  H01L21/82 ,  H01L21/8242 ,  H01L23/52 ,  H01L23/525 ,  H01L27/04 ,  H01L27/108 ,  H01H85/046

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing an integrated circuit which has a improved fuse structure and a laser fuse link. SOLUTION: A fuse structure within an integrated circuit chi is described which includes an insulated semiconductor substrate, a fuse band 4 consisting of a plurality of parallel fuse links 402, 404, and 406 on the same plane and united with the insulated semiconductor substrate, and voids 410 and 412 scattered among fuse links each in a pair and extending beyond the plane demarcated by the fuse links on the same plane. The voids 410 and 412, surrounding the spot 420 which should be hit with a laser beam during the operation of fuse fusion function as crack stopper for preventing damages to the adjacent circuit element or other existing fuse link. Closer pitch between fuses can be obtained by forming and positioning the voids properly.