Abstract:
PROBLEM TO BE SOLVED: To provide an ability to test and 'burn in' device chips that require ultra high pitch I/O pads. SOLUTION: A system for testing a collection of the device chips by temporarily attaching them to a carrier having a plurality of receptacles with microdendritic features; the receptacles matching with and pushed in contact with a matching set of contact pads on the device chips; the carrier additionally having test pads connected to the receptacles through interconnect wiring. The system allows connecting the chips together and testing the collection as a whole by probing the test pads on the carrier. Burn-in of the collection of chips can also be performed on the temporary carrier, which is reusable. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a system making an interconnection with a quite high density by connecting device chips and a chip carrier by using a microjoint interconnect structure. SOLUTION: In the system, a pair of device chips is mounted on a microjoint interconnect chip carrier by using a microjoint interconnect structure. The microjoint interconnect chip carrier comprises a multilayer substrate having a plurality of receptacles on its surface. A pair of microjoint interconnect pads corresponding to the receptacles is provided on the device chips. Interconnecting wiring enabling an interconnection between the device chips is provided between the receptacles. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a method for making a mold with a protective layer. SOLUTION: The method for making the mold with the protective layer includes making a mold base plate having at least one substantially flat surface, accumulating a mold protective material layer on at least one substantially flat surface, and etching a plurality of cavities on at least one substantially flat surface through the mold protective layer. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
A system for interconnecting a set of device chips by means of an array of microjoints disposed on an interconnect carrier is taught. The carrier is provided with a dense array of microjoint receptacles with an adhesion layer , barrier layer and a noble metal layer; the device wafers are fabricated with an array of microjoining pads comprising an adhesion layer, barrier layer an d a fusible solder layer with pads being located at matching locations in reference to the barrier receptacles; said device chips are joined to said carrier through the microjoint arrays resulting in interconnections capable of very high input/output density and inter-chip wiring density.
Abstract:
A system for interconnecting a set of device chips by means of an array of microjoints disposed on an interconnect carrier is taught. The carrier is provided with a dense array of microjoint receptacles with an adhesion layer, barrier layer and a noble metal layer; the device wafers are fabricated with an array of microjoining pads including an adhesion layer, barrier layer and a fusible solder layer with pads being located at matching locations in reference to the barrier receptacles; the device chips are joined to the carrier through the microjoint arrays resulting in interconnections capable of very high input/output density and inter-chip wiring density.
Abstract:
A system for interconnecting a set of device chips by means of an array of microjoints disposed on an interconnect carrier is taught. The carrier is provided with a dense array of microjoint receptacles with an adhesion layer, barrier layer and a noble metal layer; the device wafers are fabricated with an array of microjoining pads including an adhesion layer, barrier layer and a fusible solder layer with pads being located at matching locations in reference to the barrier receptacles; the device chips are joined to the carrier through the microjoint arrays resulting in interconnections capable of very high input/output density and inter-chip wiring density.
Abstract:
A system for interconnecting a set of device chips by means of an array of microjoints disposed on an interconnect carrier is taught. The carrier is provided with a dense array of microjoint receptacles with an adhesion layer, barrier layer and a noble metal layer; the device wafers are fabricated with an array of microjoining pads comprising an adhesion layer, barrier layer and a fusible solder layer with pads being located at matching locations in reference to the barrier receptacles; said device chips are joined to said carrier through the microjoint arrays resulting in interconnections capable of very high input/output density and inter-chip wiring density.