MULTICHIP MODULE FABRICATED ON A SEMICONDUCTOR OR DIELECTRIC WAFER AND METHOD FOR MANUFACTURING SAME
    3.
    发明申请
    MULTICHIP MODULE FABRICATED ON A SEMICONDUCTOR OR DIELECTRIC WAFER AND METHOD FOR MANUFACTURING SAME 审中-公开
    在半导体或电介质膜上制造的多芯片模块及其制造方法

    公开(公告)号:WO02086971A3

    公开(公告)日:2003-02-27

    申请号:PCT/US0212207

    申请日:2002-04-17

    Applicant: IBM

    Abstract: A semiconductor or dielectric wafer with conducting vias is used as a substrate in an integrated circuit packaging structure, where high density inter and intra chip contacts and wiring are positioned on the substrate face on which the integrated circuitry is mounted, and external signal and power circuitry is contacted through the opposite face. Use of a substrate such as silicon permits the use of conventional silicon processes available in the art for providing high wiring density together with matching of the thermal expansion coefficient of any silicon chips in the integrated circuits. The use of vias through the substrate allows a high density of connections leaving the silicon substrate and provides short paths for the connections of power and signals.

    Abstract translation: 具有导电通孔的半导体或介电晶片用作集成电路封装结构中的基板,其中高密度片间和芯片间接触和布线位于其上安装集成电路的基板面上,以及外部信号和电源电路 通过相对面接触。 使用诸如硅的衬底允许使用本领域可获得的常规硅工艺来提供高布线密度以及集成电路中任何硅芯片的热膨胀系数的匹配。 使用通过基板的通孔允许离开硅衬底的高密度连接并且为功率和信号的连接提供短路径。

    Multichip module fabricated on a semiconductor or dielectric wafer and process for producing thereof

    公开(公告)号:CZ20032834A3

    公开(公告)日:2004-02-18

    申请号:CZ20032834

    申请日:2002-04-17

    Applicant: IBM

    Abstract: A semiconductor or dielectric wafer with conducting vias is used as a substrate in an integrated circuit packaging structure, where high density inter and intra chip contacts and wiring are positioned on the substrate face on which the integrated circuitry is mounted, and external signal and power circuitry is contacted through the opposite face. Use of a substrate such as silicon permits the use of conventional silicon processes available in the art for providing high wiring density together with matching of the thermal expansion coefficient of any silicon chips in the integrated circuits. The use of vias through the substrate allows a high density of connections leaving the silicon substrate and provides short paths for the connections of power and signals.

    Multichip module fabricated on a semiconductor or dielectric wafer and method for manufacturing same

    公开(公告)号:AU2002256271A1

    公开(公告)日:2002-11-05

    申请号:AU2002256271

    申请日:2002-04-17

    Applicant: IBM

    Abstract: A semiconductor or dielectric wafer with conducting vias is used as a substrate in an integrated circuit packaging structure, where high density inter and intra chip contacts and wiring are positioned on the substrate face on which the integrated circuitry is mounted, and external signal and power circuitry is contacted through the opposite face. Use of a substrate such as silicon permits the use of conventional silicon processes available in the art for providing high wiring density together with matching of the thermal expansion coefficient of any silicon chips in the integrated circuits. The use of vias through the substrate allows a high density of connections leaving the silicon substrate and provides short paths for the connections of power and signals.

    SYSTEM ON A PACKAGE FABRICATED ON A SEMICONDUCTOR OR DIELECTRIC WAFER

    公开(公告)号:PL368078A1

    公开(公告)日:2005-03-21

    申请号:PL36807802

    申请日:2002-04-17

    Applicant: IBM

    Abstract: A semiconductor or dielectric wafer with conducting vias is used as a substrate in an integrated circuit packaging structure, where high density inter and intra chip contacts and wiring are positioned on the substrate face on which the integrated circuitry is mounted, and external signal and power circuitry is contacted through the opposite face. Use of a substrate such as silicon permits the use of conventional silicon processes available in the art for providing high wiring density together with matching of the thermal expansion coefficient of any silicon chips in the integrated circuits. The use of vias through the substrate allows a high density of connections leaving the silicon substrate and provides short paths for the connections of power and signals.

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