公开(公告)号：DE10042929A1

公开(公告)日：2002-03-21

申请号：DE10042929

申请日：2000-08-31

Applicant: INFINEON TECHNOLOGIES AG

Inventor： MAURER WILHELM ,  ZIMMERMANN RAINER ,  AHRENS MARCO ,  KNOBLOCH JUERGEN

IPC: G03F1/00

Abstract: A raw layout (10) for manufacturing a circuit structure is provided using a lithographic technique. From the layout, a pattern (56) for a phase-shift mask and a pattern for a trim mask are formed. The pattern for the phase-shift mask is corrected in a first correction step (60). The pattern for the trim mask is corrected using the corrected pattern for the phase shift mask. Independent claims are also included for: (a) a data processing apparatus for correcting patterns (b) a program for producing corrected patterns (c) an integrated circuit structure (d) a phase-shift mask (e) a trim mask

公开(公告)号：DE10006952A1

公开(公告)日：2001-08-30

申请号：DE10006952

申请日：2000-02-16

Applicant: INFINEON TECHNOLOGIES AG

Inventor： FRIEDRICH CHRISTOPH ,  GRIESINGER UWE ,  GANS FRITZ ,  ERGENZINGER KLAUS ,  MAURER WILHELM ,  PFORR RAINER ,  KNOBLOCH JUERGEN ,  WIDMANN DIETRICH ,  CZECH GUENTHER ,  FUELBER CARSEN

IPC: G03F1/00 ,  G03F7/20

Abstract: Mask set comprises a first chrome-less phase mask (1) for producing exposed and non-exposed regions on a photolaquer in a minimal structure and a second mask (2) for dividing the non-exposed regions by exposing partial regions of the regions non-exposed by the first phase mask. An Independent claim is also claimed for a process for producing structures acting as resist masks (3). Preferred Features: The second mask is a chrome-on-glass mask or a halftone mask. The exposed and non-exposed regions produced by the first mask are formed in straight lines. Both masks each have a number of individual structures.

公开(公告)号：DE10006952C2

公开(公告)日：2002-05-16

申请号：DE10006952

申请日：2000-02-16

Applicant: INFINEON TECHNOLOGIES AG

Inventor： FRIEDRICH CHRISTOPH ,  GRIESINGER UWE ,  GANS FRITZ ,  ERGENZINGER KLAUS ,  MAURER WILHELM ,  PFORR RAINER ,  KNOBLOCH JUERGEN ,  WIDMANN DIETRICH ,  CZECH GUENTHER ,  FUELBER CARSEN

IPC: G03F1/00 ,  G03F7/20