公开(公告)号：DE10006952A1

公开(公告)日：2001-08-30

申请号：DE10006952

申请日：2000-02-16

Applicant: INFINEON TECHNOLOGIES AG

Inventor： FRIEDRICH CHRISTOPH ,  GRIESINGER UWE ,  GANS FRITZ ,  ERGENZINGER KLAUS ,  MAURER WILHELM ,  PFORR RAINER ,  KNOBLOCH JUERGEN ,  WIDMANN DIETRICH ,  CZECH GUENTHER ,  FUELBER CARSEN

IPC: G03F1/00 ,  G03F7/20

Abstract: Mask set comprises a first chrome-less phase mask (1) for producing exposed and non-exposed regions on a photolaquer in a minimal structure and a second mask (2) for dividing the non-exposed regions by exposing partial regions of the regions non-exposed by the first phase mask. An Independent claim is also claimed for a process for producing structures acting as resist masks (3). Preferred Features: The second mask is a chrome-on-glass mask or a halftone mask. The exposed and non-exposed regions produced by the first mask are formed in straight lines. Both masks each have a number of individual structures.

公开(公告)号：DE10006952C2

公开(公告)日：2002-05-16

申请号：DE10006952

申请日：2000-02-16

Applicant: INFINEON TECHNOLOGIES AG

Inventor： FRIEDRICH CHRISTOPH ,  GRIESINGER UWE ,  GANS FRITZ ,  ERGENZINGER KLAUS ,  MAURER WILHELM ,  PFORR RAINER ,  KNOBLOCH JUERGEN ,  WIDMANN DIETRICH ,  CZECH GUENTHER ,  FUELBER CARSEN

IPC: G03F1/00 ,  G03F7/20

公开(公告)号：DE19937742B4

公开(公告)日：2008-04-10

申请号：DE19937742

申请日：1999-08-10

Applicant: INFINEON TECHNOLOGIES AG

Inventor： PFORR RAINER ,  GANS FRITZ

IPC: G03F1/00 ,  G03F7/20 ,  H01L21/312

Abstract: A pattern with small, densely packed structures is transferred from a structure carrier to an object. At least two partial patterns of less densely packed structure contents are produced from the densely packed structures in that those structures which are arranged close beside one another in the pattern on the structure carrier are assigned to various partial patterns if possible and separated from one another as a result. The partial patterns are then transferred to the object with a time offset and the structures are combined again as a result. This achieves a reduction in the structure density during the optical imaging process, so that the influence of disruptive structure interference on the imaging is reduced and thus denser structures can be imaged at the same wavelength.

公开(公告)号：DE10215193A1

公开(公告)日：2003-10-30

申请号：DE10215193

申请日：2002-04-05

Applicant: INFINEON TECHNOLOGIES AG

Inventor： ERBER FRANK ,  SCHOENHER BERND ,  LUTZ TAREK ,  EBI CHRISTIAN ,  RUHL GUENTHER ,  FRANKE TORSTEN ,  GANS FRITZ

IPC: G03F1/00 ,  G03F1/14 ,  G03F7/20 ,  G03F9/00 ,  H01J37/30 ,  H01J37/302 ,  H01J37/317

Abstract: The method involves providing at least one coating of particle-sensitive material, writing defined patterns (20) into a limited area (21) of the particle-sensitive material using at least one particle beam and writing a frame (22) in the particle-sensitive material around the limited area so that variations in background dose within the area are smaller than 30 per cent of the maximum background dose within the area.

公开(公告)号：DE10215193B4

公开(公告)日：2006-03-09

申请号：DE10215193

申请日：2002-04-05

Applicant: INFINEON TECHNOLOGIES AG

Inventor： ERBER FRANK ,  SCHOENHER BERND ,  LUTZ TAREK ,  EBI CHRISTIAN ,  RUHL GUENTHER ,  FRANKE TORSTEN ,  GANS FRITZ

IPC: G03F1/00 ,  G03F1/14 ,  G03F7/20 ,  G03F9/00 ,  H01J37/30 ,  H01J37/302 ,  H01J37/317

Abstract: The method involves providing at least one coating of particle-sensitive material, writing defined patterns (20) into a limited area (21) of the particle-sensitive material using at least one particle beam and writing a frame (22) in the particle-sensitive material around the limited area so that variations in background dose within the area are smaller than 30 per cent of the maximum background dose within the area.

公开(公告)号：NL1025104C2

公开(公告)日：2005-10-25

申请号：NL1025104

申请日：2003-12-22

Applicant: INFINEON TECHNOLOGIES AG

Inventor： RUHL GUENTHER ,  PRECHTL GERHARD ,  SABISCH WINFRIED ,  KERSCH ALFRED ,  NESLADEK PAVEL ,  GANS FRITZ ,  ANDERSON REX

IPC: G03F1/00 ,  H01J37/32 ,  H01L21/00 ,  H01L21/687

公开(公告)号：DE10260645B3

公开(公告)日：2004-09-16

申请号：DE10260645

申请日：2002-12-23

Applicant: INFINEON TECHNOLOGIES AG

Inventor： RUHL GUENTHER ,  PRECHTL GERHARD DR ,  SABISCH WINFRIED ,  KERSCH ALFRED ,  NESLADEK PAVEL ,  GANS FRITZ ,  ANDERSON REX

IPC: G03F1/00 ,  H01J37/32 ,  H01L21/00 ,  H01L21/687 ,  H01L21/68 ,  H01L21/306

Abstract: The frame (2) has an inner contour for holding a substrate (1), a region (3a) of an upper main surface at a defined height above the substrate in the frame and a further region (3b) at essentially the same height as the plane of the upper main surface (1a) of the substrate in the frame. The inner profile is polygonal for accommodating the substrate and the further area of the upper main surface of the frame has different widths at different points.

公开(公告)号：DE19937742A1

公开(公告)日：2001-03-15

申请号：DE19937742

申请日：1999-08-10

Applicant: INFINEON TECHNOLOGIES AG

Inventor： PFORR RAINER ,  GANS FRITZ

IPC: G03F1/00 ,  G03F7/20 ,  G03F1/14 ,  H01L21/312

Abstract: A pattern with small, densely packed structures is transferred from a structure carrier to an object. At least two partial patterns of less densely packed structure contents are produced from the densely packed structures in that those structures which are arranged close beside one another in the pattern on the structure carrier are assigned to various partial patterns if possible and separated from one another as a result. The partial patterns are then transferred to the object with a time offset and the structures are combined again as a result. This achieves a reduction in the structure density during the optical imaging process, so that the influence of disruptive structure interference on the imaging is reduced and thus denser structures can be imaged at the same wavelength.

公开(公告)号：NL1025104A1

公开(公告)日：2004-06-24

申请号：NL1025104

申请日：2003-12-22

Applicant: INFINEON TECHNOLOGIES AG

Inventor： RUHL GUENTHER ,  PRECHTL GERHARD ,  SABISCH WINFRIED ,  KERSCH ALFRED ,  NESLADEK PAVEL ,  GANS FRITZ ,  ANDERSON REX

IPC: G03F1/00 ,  H01J37/32 ,  H01L21/00 ,  H01L21/687

公开(公告)号：DE10021096A1

公开(公告)日：2001-10-31

申请号：DE10021096

申请日：2000-04-20

Applicant: INFINEON TECHNOLOGIES AG

Inventor： THIELE JOERG ,  GANS FRITZ ,  FISCHER WERNER ,  PFORR RAINER

IPC: G03F1/00

Abstract: The mask consists of an image structure (2) and a dummy structure (3) formed on a transparent carrier material (1). The dummy structure is spaced apart from all image structures (2) and has different transparency and phase rotation from the image structure. The dummy structure is preferably semitransparent. The smallest lateral dimension of the dummy structure is at least half as large as the smallest lateral dimension of the image structure. The semitransparent dummy structure may be optically homogenous.