Abstract:
PROBLEM TO BE SOLVED: To realize an optoelectronic semiconductor device suitable for high optical output power. SOLUTION: The optoelectronic semiconductor device 1 consists of semiconductor crystal material containing at least one of gallium and aluminum substance, and the optoelectronic semiconductor device includes at least one optical active region 2 with its surface, on which at least one optical surface 3 is formed, and at least one boundary layer 4 formed in a position facing an optical surface 3 in the optical active region 2 and consisting of one up to ten layers of monomolecular layers, which contains sulfur or selenium. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
The invention relates to a radiation-emitting semi-conductor element provided with a layered structure, comprising an n-doped confinement layer (14), a p-doped confinement layer (22), and an active layer (18) emitting photons, said layer being arranged between the n-doped confinement layer (14) and the p-doped confinement layer (22). According to the invention, the n-doped confinement layer (14) is doped with a first n-dopant (or two n-dopants which are different from each other) in order to produce a high active doping and a precise doping profile, and the active layer (18) is doped with exclusively one second n dopant, which is different form the first dopant, in order to improve the layer quality of the active layer (18).
Abstract:
The invention relates to a surface-emitting semiconductor laser component having a vertical emission direction, comprising a semiconductor body which has a first resonator mirror (2), a second resonator mirror (4), and an active zone (3) suited to generate radiation. The first resonator mirror (2) comprises alternating stacked first layers (2a) having a first composition and second layers (2b) having a second composition. The first layers (2a) have oxidized regions (8a). Furthermore, at least the first layers (2a) each comprise a doping agent, wherein at least one layer (21a) of the first layers (2a) has a doping agent concentration that differs from the doping agent concentration of the other first layers (2a).
Abstract:
An edge emitting semiconductor laser chip includes at least one contact strip, wherein the contact strip has a width B, an active zone, in which electromagnetic radiation is generated during the operation of the semiconductor laser chip, and at least two current barriers, arranged on different sides of the contact strip and extending along the contact strip, wherein the largest distance V between at least one of the current barriers and the contact strip is chosen in such a way that the ratio of the largest distance V to the width B is V/B>1.
Abstract:
The component has n- and p-doped confinement layers (14,22) and n active, photon emitting layer (18) between them. The n-doped confinement layer is doped with a first n-doping material to produce high active doping and/or a sharp doping profile and the active layer is doped with a second different doping material to improve the layer quality of the active layer.
Abstract:
The semiconductor body has an epitaxial semiconductor layer sequence with an active zone (1) arranged between wave guide layers (2) suitable for producing electromagnetic radiation and a p-coating layer (4). The layer (4) has two sub areas (5, 6) comprising magnesium and zinc as p-doping materials (8, 9), respectively, whose concentration changes with a distance of the active zone. The areas (5, 6) are free from zinc and magnesium, respectively. The layer (4) has another sub area, which comprises the doping materials.
Abstract:
Process for preparation of an epitaxial structural element based on a first group III/V compound semiconductor material system (SMS) with a first group V element on a substrate or buffer layer, which includes a material based on a second group III/V element SMS with a second group V element different from the first one, where prior to application of the epitaxial layer sequence, a layer sequence with different first and second group III/V compound SMS is applied.
Abstract:
The semiconductor chip has a p-doped region with a coating layer (18) and a contact layer (21). Two intermediate layers (19,20) are provided between the coating layer and the contact layer. A concentration of material component is changed in such a manner within two intermediate layers that the bandgap varies within intermediate layer within a range. An independent claim is also included for a method of manufacturing a semiconductor chip.
Abstract:
Process for preparation of an epitaxial structural element based on a first group III/V compound semiconductor material system (SMS) with a first group V element on a substrate or buffer layer, which includes a material based on a second group III/V element SMS with a second group V element different from the first one, where prior to application of the epitaxial layer sequence, a layer sequence with different first and second group III/V compound SMS is applied.
Abstract:
Es wird ein oberflächenemittierendes Halbleiterlaser-Bauelement mit einer vertikalen Emissionsrichtung angegeben, das einen Halbleiterkörper umfasst, der einen ersten Resonatorspiegel (2), einen zweiten Resonatorspiegel (4) und eine zur Strahlungserzeugung geeignete aktive Zone (3) aufweist. Der erste Resonatorspiegel (2) weist alternierend gestapelte erste Schichten (2a) einer ersten Zusammensetzung und zweite Schichten (2b) einer zweiten Zusammensetzung auf. Die ersten Schichten (2a) weisen oxidierte Bereiche (8a) auf. Ferner enthalten zumindest die ersten Schichten (2a) jeweils einen Dotierstoff, wobei mindestens eine Schicht (21a) der ersten Schichten (2a) eine von der Dotierstoffkonzentration der anderen ersten Schichten (2a) unterschiedliche Dotierstoffkonzentration aufweist.