公开(公告)号：EP2541590A4

公开(公告)日：2016-01-13

申请号：EP10846621

申请日：2010-11-25

Applicant: SPP TECHNOLOGIES CO LTD

Inventor： HAYASHI YASUYUKI ,  TOMISAKA KENICHI

IPC: H01L21/3065 ,  H01J37/32

CPC classification number: H01J37/32623 ,  H01J37/321

Abstract: The present invention relates to a plasma processing device capable of positioning a protective member for covering the upper surface of a peripheral edge portion of a substrate, with high accuracy. A plasma processing device 1 has a processing chamber 11, a platen 21 on which a substrate K is placed, a gas supply device 45 supplying a processing gas, a plasma generating device 50 generating plasma from the processing gas, an RF power supply unit 55 supplying RF power to the platen 21, an annular and plate-shaped protective member 31 which is formed in an annular and plate-like shape and is configured to be capable of being placed on a peripheral portion of the platen 21 and which covers the upper surface of a peripheral edge portion of the substrate K with an inner peripheral edge portion thereof when placed on the peripheral portion of the platen 21, support members 35 supporting the protective member 31, and a lifting cylinder 30 lifting up and down the platen 21. At least three first protrusions 33 which are engaged with the peripheral portion of the platen 21 when placed on the platen 21 are formed on a pitch circle on the lower surface of the protective member 31 and the center of the pitch circle is co-axial with the central axis of the protective member 31.

公开(公告)号：JP2014142058A

公开(公告)日：2014-08-07

申请号：JP2013254137

申请日：2013-12-09

Applicant: Spp Technologies Co Ltd ,  Sppテクノロジーズ株式会社

Inventor： HAYASHI YASUYUKI ,  HINO TADAYOSHI

IPC: F16B5/02 ,  F16B43/00

Abstract: PROBLEM TO BE SOLVED: To provide a fastening structure and the like capable of improving sealability between a base material and a fastened member, and making difficult to detach a washer and facilitating handling of the washer when the fastened member is detached from the base material.SOLUTION: A fastening structure 101 according to the present invention includes: a bolt 1; a base material 2 provided with a female screw 21 engageable with a bolt 1; and a fastened member 3 provided with a through-hole 31 into which the bolt 1 can be inserted. The fastened member 3 is fastened to the base material 2 by inserting the bolt 1 into the through-hole 31 and engaging the bolt 1 with the female screw 21. A counterbore portion 32 having a circular outer edge is formed on a surface of the fastened member 3 facing the base material 2. The fastening structure further includes a flexible washer 4 into which the bolt 1 can be inserted and that is strongly fitted into the counterbore portion 32. The washer 4 is compressed in a thickness direction in a state in which the fastened member 3 is fastened to the base material 2.

Abstract translation: 要解决的问题：提供一种能够提高基材和紧固构件之间的密封性的紧固结构等，并且当紧固构件从基材脱离时，使得垫圈难以分离并便于处理垫圈。 解决方案：根据本发明的紧固结构101包括：螺栓1; 具有可与螺栓1接合的内螺纹21的基材2; 以及设置有可插入螺栓1的通孔31的紧固构件3。 紧固构件3通过将螺栓1插入通孔31并将螺栓1与阴螺纹21接合而紧固到基材2.具有圆形外边缘的沉孔部分32形成在紧固的 构件3面向基材2.紧固结构还包括柔性垫圈4，螺栓1可以插入其中并且牢固地装配到沉孔部分32中。垫圈4在厚度方向上被压缩在其中 紧固构件3固定在基材2上。

公开(公告)号：JP2014236193A

公开(公告)日：2014-12-15

申请号：JP2013119033

申请日：2013-06-05

Applicant: Sppテクノロジーズ株式会社 ,  Spp Technologies Co Ltd

Inventor： UCHIDA RYOHEI ,  HAYASHI YASUYUKI ,  HAYAMA NOBORU

IPC: H01L21/677 ,  B65G49/07 ,  H01L21/205 ,  H01L21/3065 ,  H01L21/31

Abstract: 【課題】高いスループットを得ることが可能な基板搬送装置、及びこれを用いた基板搬送方法を提供する。【解決手段】本発明に係る基板搬送装置100は、大気搬送部1と、大気搬送部1に設けられる第1の搬送手段2と、大気搬送部1に連結される気密搬送室3と、気密搬送室3に設けられる第2の搬送手段4とを備える。第1の搬送手段2は、複数の基板を収納可能な基板収納部21と、基板の位置調整を行うアライメント部22と、基板収納部21に収納された基板をアライメント部22に搬送可能であると共に、アライメント部22により位置調整された基板を気密搬送室3に搬送可能である大気搬送機構23とを具備する。第2の搬送手段4は、回動軸を挟んで両端部に位置する2つの基板保持部42を有する可動保持部41を具備する。可動保持部41は、気密搬送室3とチャンバCとの連結方向に進退動可能である。【選択図】図1

Abstract translation: 要解决的问题：提供一种能够获得高产量的基板转印装置，并提供使用该基板转印方法的基板转印方法。解决方案：基板转印装置100包括大气输送部分1，设置在第一转印装置2中的第一转印装置2， 大气输送部1，与大气输送部1连接的气密输送室3，以及设置在气密输送室3内的第二输送装置4.第一输送装置2包括能容纳多个基板的基板收容部21， 用于定位基板的对准部22和能够将容纳在基板容纳部21中的基板转印到对准部22的气氛输送机构23，并且能够将由定位部22定位的基板转印到气密 传送室3.第二传送装置4包括可移动保持部分41 g位于两端的两个基板保持部分42，同时在其间保持旋转轴。 可移动保持部41能够在气密传送室3和室C的联接方向上前进和后退。

公开(公告)号：EP2903019A4

公开(公告)日：2016-06-08

申请号：EP13842461

申请日：2013-09-25

Applicant: SPP TECHNOLOGIES CO LTD

Inventor： YAMAMOTO TAKASHI ,  OTA KAZUYA ,  SASAKURA MASAHIRO ,  HAYASHI YASUYUKI

IPC: H01L21/3065 ,  H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32623 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/32458 ,  H01J37/32568 ,  H01J37/32633 ,  H01J37/32724 ,  H01J2237/0656 ,  H01J2237/15 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/67069 ,  H05H1/46 ,  H05H2001/4667

Abstract: The present invention relates to a substrate etching device capable of improving uniformity of in-plane density of generated plasma to uniformly etch an entire substrate surface. A plasma etching device 1 includes a chamber 2 having a plasma generation space 3 and a processing space 4 set therein, a coil 30 disposed outside an upper body portion 6, a platen 40 disposed in the processing space 4 for placing a substrate K thereon, an etching gas supply mechanism 25 supplying an etching gas into the plasma generation space 3, a coil power supply mechanism 35 supplying RF power to the coil 30, and a platen power supply mechanism 45 supplying RF power to the platen 40. Further, a tapered plasma density adjusting member 20 is fixed on an inner wall of the chamber 2 between the plasma generation space 3 and the platen 40 and, in an upper portion of the chamber 2, a cylindrical core member 10 having a tapered portion formed thereon having a diameter decreasing toward a lower end surface thereof is arranged to extend downward.