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    复合射束装置
    1.
    发明公开
    复合射束装置 有权

    公开(公告)号：CN107818904A

    公开(公告)日：2018-03-20

    申请号：CN201710789226.8

    申请日：2017-09-05

    Applicant: 日本株式会社日立高新技术科学

    Inventor： 麻畑达也

    IPC: H01J37/28 ,  H01J37/26 ,  G01N1/28

    CPC classification number: H01J37/026 ,  H01J37/141 ,  H01J37/292 ,  H01J37/3056 ,  H01J2237/1405 ,  H05H3/00 ,  H01J37/28 ,  G01N1/28 ,  H01J37/261

    Abstract: 提供复合射束装置，其在利用集束离子束对试样进行截面加工之后利用其他射束对截面进行精加工时，能够抑制来自电子束镜筒的电场或磁场的泄漏所造成的影响或充电所造成的影响的。复合射束装置(100)具有：电子束镜筒(10)，其用于对试样(200)照射电子束(10A)；集束离子束镜筒(20)，其用于对试样照射集束离子束(20A)而形成截面；以及中性粒子束镜筒(30)，其加速电压设定得比集束离子束镜筒低，用于对试样照射中性粒子束(30A)而对截面进行精加工，电子束镜筒、集束离子束镜筒以及中性粒子束镜筒配置为各自的各照射束在照射点P上交叉。

    COMPOSITE BEAM APPARATUS
    7.
    发明公开
    COMPOSITE BEAM APPARATUS 审中-公开
    复合光束装置

    公开(公告)号：EP3293752A1

    公开(公告)日：2018-03-14

    申请号：EP17190734.8

    申请日：2017-09-13

    Applicant: Hitachi High-Tech Science Corporation

    Inventor： ASAHATA, Tatsuya

    IPC: H01J37/305

    CPC classification number: H01J37/026 ,  H01J37/141 ,  H01J37/292 ,  H01J37/3056 ,  H01J2237/1405 ,  H05H3/00

    Abstract: Disclosed is a composite beam apparatus capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam. The Composite beam apparatus includes: an electron beam column irradiating an electron beam onto a sample; a focused ion beam column irradiating a focused ion beam onto the sample to form a cross section; a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column, and irradiating a neutral particle beam onto the sample to perform finish processing of the cross section, wherein the electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point.

    Abstract translation: 本发明公开了一种复合光束装置，其能够在用聚焦离子束对样品进行截面处理时，抑制电荷累积或电子束柱的电场或磁场泄漏，然后与另一个 光束。 该复合光束设备包括：将电子束照射到样品上的电子束柱; 将聚焦离子束照射到样品上以形成横截面的聚焦离子束柱; 加速电压被设定为低于聚焦离子束柱的中性粒子束柱，并且将中性粒子束照射到样品上以执行截面的精加工，其中电子束柱，聚焦离子束柱， 和中性粒子束柱被布置成使得柱的束在照射点彼此交叉。

    APPARATUS FOR PREPARING A SAMPLE FOR MICROSCOPY
    10.
    发明申请
    APPARATUS FOR PREPARING A SAMPLE FOR MICROSCOPY 审中-公开
    用于制备显微镜样品的装置

    公开(公告)号：WO2016014332A1

    公开(公告)日：2016-01-28

    申请号：PCT/US2015/040728

    申请日：2015-07-16

    Applicant: E.A. FISCHIONE INSTRUMENTS, INC.

    Inventor： FISCHIONE, Paul, E. ,  BOCCABELLA, Michael, F.

    IPC: G01N1/32 ,  H01J37/26

    CPC classification number: H01J37/3056 ,  H01J37/20 ,  H01J37/28 ,  H01J37/292 ,  H01J37/304 ,  H01J2237/30466 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: An apparatus for preparing a sample for microscopy is provided that has a milling device that removes material from a sample in order to thin the sample. An electron beam that is directed onto the sample is present along with a detector that detects when the electron beam has reached a preselected threshold transmitted through or immediately adjacent the sample. Once the detector detects the electron beam has reached this threshold, the milling device terminates the milling process.

    Abstract translation: 提供了一种用于制备用于显微镜的样品的装置，其具有从样品中除去材料的研磨装置以使样品变薄。 引导到样品上的电子束与检测器一起存在，该检测器检测电子束何时达到通过或紧邻样品透射的预选阈值。 一旦检测器检测到电子束达到该阈值，铣削装置终止铣削过程。

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