公开(公告)号：US20040023513A1

公开(公告)日：2004-02-05

申请号：US10333406

申请日：2003-06-13

Inventor： Shintaro Aoyama ,  Hiroshi Shinriki ,  Masanobu Igeta

IPC: H01L021/336 ,  B05C005/00 ,  C23C016/00 ,  B05C009/08

CPC classification number: H01L21/02238 ,  C23C16/452 ,  C23C16/45589 ,  C23C16/482 ,  H01J37/32009 ,  H01J37/32321 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/02332 ,  H01L21/0234 ,  H01L21/3143 ,  H01L21/31604 ,  H01L21/67017

Abstract: A radical source is movably provided in a processing vessel holding a substrate, and the location or driving energy of the radical source is set such that the film formed on the substrate has a uniform thickness. Further, a radical source is provided at a first side of the substrate and a radical flow is formed such that the radical flow flows from the first side of the substrate surface to the other side. By optimizing the condition of the radical flow, the film formed on the substrate has a uniform thickness.

Abstract translation: 自由基源可移动地设置在保持基板的处理容器中，并且自由基源的位置或驱动能量被设定为使得形成在基板上的膜具有均匀的厚度。 此外，在基板的第一侧设置自由基源，并且形成自由基流，使得自由基流从基板表面的第一侧流动到另一侧。 通过优化自由基流的条件，形成在基板上的膜具有均匀的厚度。

公开(公告)号：US20040079281A1

公开(公告)日：2004-04-29

申请号：US10298115

申请日：2003-01-10

Applicant: NEOCERA, INC.

Inventor： Hans M. Christen

IPC: C23C014/00 ,  B05C005/00 ,  B05B005/025 ,  B05C009/08 ,  C23C016/00

CPC classification number: C23C14/28

Abstract: There is provided a deposition system (1) for yielding substantially uniform deposition of an evaporant material onto a substrate. The deposition system (1) comprises: a source (10) for generating a coherent energy beam; a substantially planar target (60) containing the evaporant material and disposed in spaced relation to the substrate; a focusing element (30) optically coupled to the source for focusing the coherent energy beam onto the target (60); and, an actuator (40) coupled to the focusing element (30) for reversibly translating the focusing element (30) along a scanning path directed substantially parallel to a target plane defined by the target (60). The focused coherent energy beam defines an impingement spot (14) on the target (60). The impingement spot (14) is displaced responsive to the translation of the focusing element (30) along the scanning path. The focus of the coherent energy beam on the target (60) thus remains substantially preserved.

Abstract translation: 提供了一种沉积系统（1），用于将蒸发剂材料基本均匀地沉积到基底上。 沉积系统（1）包括：用于产生相干能量束的源（10）; 包含所述蒸发材料并以与所述基板隔开的关系设置的基本平坦的靶（60）; 光学耦合到所述源的聚焦元件（30），用于将所述相干能量束聚焦到所述目标（60）上; 以及耦合到所述聚焦元件（30）的致动器（40），用于沿着基本上平行于由所述目标（60）限定的目标平面指向的扫描路径可逆地平移所述聚焦元件（30）。 聚焦的相干能量束限定靶（60）上的冲击点（14）。 响应于沿着扫描路径的聚焦元件（30）的平移，冲击点（14）移位。 目标（60）上的相干能量束的焦点因此保持基本保持。

公开(公告)号：US20040033318A1

公开(公告)日：2004-02-19

申请号：US10376253

申请日：2003-03-03

Applicant: SEIKO EPSON CORPORATION ,  YOUTEC CO., LTD.

Inventor： Takeshi Kijima ,  Eiji Natori ,  Mitsuhiro Suzuki

IPC: C08F002/46 ,  C08J007/00 ,  C08F002/48 ,  G21H001/00 ,  B05D003/00 ,  C08J007/18 ,  G21H005/00 ,  B06B001/00 ,  B01J019/08 ,  B01J019/10 ,  B05C005/00 ,  B05B007/00 ,  B05C015/00 ,  B05B005/025 ,  B05C009/08

CPC classification number: C23C18/1216 ,  B01J3/008 ,  B01J19/0013 ,  B01J19/123 ,  B01J19/125 ,  B01J19/1887 ,  B01J2219/00058 ,  B05D1/025 ,  B05D2401/90 ,  C23C18/12 ,  C23C18/1283 ,  C23C18/1287 ,  C23C18/14 ,  Y02P20/544

Abstract: To provide an apparatus and method for forming a thin-film using raw material fluid containing a film ingredient and supercritical fluid or liquid. An apparatus according to the present invention is used for forming a thin-film using raw material fluid containing alcohol, supercritical fluid or liquid carbon dioxide, and a condensation polymer containing an element of a target metal oxide compound. This apparatus includes a substrate holder 2 for retaining a substrate 3, a film-forming chamber 1 for housing the substrate holder, a feeding means for feeding the raw material fluid to the substrate surface, and a lamp heater 4 for heating the substrate 3 retained to the substrate holder 2. Thereby, the thin-film can be formed using the raw material fluid containing a film ingredient and the supercritical fluid or liquid.

Abstract translation: 提供使用含有膜成分和超临界流体或液体的原料流体形成薄膜的装置和方法。 根据本发明的装置用于使用含有醇，超临界流体或液体二氧化碳的原料流体和含有目标金属氧化物化合物元素的缩聚物形成薄膜。 该装置包括用于保持基板3的基板保持件2，用于容纳基板保持件的成膜室1，用于将原料流体供给到基板表面的进给装置和用于加热保持的基板3的灯加热器4 由此，可以使用含有膜成分和超临界流体或液体的原料液形成薄膜。

公开(公告)号：US20010014224A1

公开(公告)日：2001-08-16

申请号：US09816233

申请日：2001-03-26

Inventor： Keizo Hasebe ,  Shuuichi Nishikido ,  Nobuo Konishi ,  Takayuki Toshima ,  Kazutoshi Yoshioka

IPC: G03D005/00 ,  G03C005/00 ,  G03D007/00 ,  G03D015/02 ,  G03D015/06 ,  B05C005/02 ,  B05C009/08 ,  B05C011/08 ,  C23C016/458

CPC classification number: G03F7/162 ,  B05C11/08

Abstract: A solvent of a resist solution is dropped from a solvent supply nozzle onto the surface of a semiconductor wafer held by a spin chuck. The semiconductor wafer is rotated by the spin chuck to spread the resist solution over the entire surface of the semiconductor wafer W. Simultaneously, the resist solution is dropped from a resist solution supply nozzle onto the semiconductor wafer and spread following the solvent. During the processing, the processing space is isolated from the outer atmosphere by closing a lid of a processing vessel and a sprayed solvent is supplied into the processing space. The processing space is thus filled with the mist of solvent. In the processing space supplied with the solvent, evaporation of the solvent from the resist solution is suppressed. A film of the resist solution is formed with a uniform film thickness to the edge of the semiconductor wafer W.

公开(公告)号：US20040058089A1

公开(公告)日：2004-03-25

申请号：US10437276

申请日：2003-05-12

Applicant: Sport Court, Inc.

Inventor： Cheryl Forster ,  Jason D. Carling

IPC: B05D003/02 ,  B05D001/36 ,  B05C015/00 ,  B05C005/00 ,  B05C009/08

CPC classification number: C08J7/123 ,  B05D1/28 ,  B05D3/0218 ,  B05D3/067 ,  B05D3/142 ,  B05D3/144 ,  B05D7/02 ,  B05D7/546 ,  B05D2252/04 ,  B05D2503/00 ,  C08J7/047 ,  C08J2323/00 ,  C08J2323/02 ,  C08J2475/00 ,  C09D175/16 ,  E04F15/02194 ,  E04F15/105 ,  E04F2201/0138 ,  E04F2201/0153

Abstract: A system for applying a polyurethane coating to a polyolefin floor tile, comprising a conveyor for moving the floor tile past a plurality of treatment devices, including a solvent applicator, a heater, a plasma generator, an applicator, and an ultraviolet light system. The solvent applicator enables the polymer surface to be more responsive to the processes applied by the heater and plasma generator, increasing the energy of the top surface of the floor tile in preparation for the applicator to apply a liquid polyurethane to the top surface while in the energized state. The ultraviolet light system then exposes the polyurethane to ultraviolet light to at least partially cure it.

Abstract translation: 一种用于将聚氨酯涂层施加到聚烯烃地砖上的系统，包括用于使地板砖通过多个处理装置的输送机，包括溶剂施加器，加热器，等离子体发生器，施加器和紫外光系统。 溶剂涂布器使得聚合物表面能够更好地响应于由加热器和等离子体发生器施加的过程，从而增加了地砖的上表面的能量，以准备施加器以将液体聚氨酯施加到顶表面，同时在 通电状态。 然后，紫外光系统将聚氨酯暴露于紫外光以至少部分地固化。

公开(公告)号：US20040052963A1

公开(公告)日：2004-03-18

申请号：US10242331

申请日：2002-09-13

Inventor： Igor Ivanov ,  Jonathan (Weiguo) Zhang ,  Arthur Kolics

IPC: B05D001/18 ,  B05C005/00 ,  B05C009/08

CPC classification number: H01L21/67109 ,  C23C18/1619 ,  C23C18/1676 ,  C23C18/1678 ,  C23C18/168 ,  C23C18/1682

Abstract: The method for electroless deposition of a coating material, which may be a metal, semiconductor, or dielectric, that is carried out at a relatively low temperature of the working solution compensated by an increased temperature on the substrate which is controlled by a heater built into the substrate chuck. A decrease in the temperature of the working solution prevents thermal decomposition of the solution and reduces formation of gas bubbles, normally generated at increased temperatures. Accumulation of bubbles on the surface of the substrate is further prevented due to upwardly-facing orientation of the treated surface of the substrate. The substrate holder is equipped with a substrate heater and a substrate cooler, that can be used alternatingly for quick heating or cooling of the substrate surface.

Abstract translation: 用于无电沉积涂覆材料的方法，其可以是金属，半导体或电介质，其在工作溶液的相对低的温度下进行，所述工作溶液由基板上升高的温度补偿，所述温度由内置的 基板卡盘。 工作溶液的温度降低可防止溶液的热分解，并减少通常在升高的温度下产生的气泡的形成。 由于衬底的处理表面的向上取向，进一步防止了衬底表面积聚的气泡。 衬底保持器配备有基板加热器和基板冷却器，其可以交替地用于快速加热或冷却基板表面。

公开(公告)号：US20040050327A1

公开(公告)日：2004-03-18

申请号：US10621464

申请日：2003-07-18

Applicant: Tokyo Electron Limited

Inventor： Wayne L. Johnson ,  Steven T. Fink ,  Jeff Browning ,  Jovan Jevtic

IPC: C23C014/00 ,  B05C009/08 ,  C23C016/00

CPC classification number: H01L21/67069 ,  H01J37/32082 ,  H01J37/32174

Abstract: A chuck assembly for supporting a workpiece within a plasma reactor chamber having sidewalls surrounding an interior region capable of supporting a plasma. The assembly includes a chuck base and at least one support arm extending outwardly from the chuck base perimeter to the chamber sidewalls. The chuck assembly includes a workpiece support member which is supported by one or more vertical translation members arranged between and operatively connected to the chuck base and the workpiece support member.

Abstract translation: 一种用于在等离子体反应器室内支撑工件的卡盘组件，其具有围绕能够支撑等离子体的内部区域的侧壁。 组件包括卡盘基座和从卡盘基部周边向外延伸到腔室侧壁的至少一个支撑臂。 卡盘组件包括工件支撑构件，该工件支撑构件由布置在卡盘底座和工件支撑构件之间并且可操作地连接到卡盘底座和工件支撑构件之间的一个或多个垂直平移构件支撑。

公开(公告)号：US20020011205A1

公开(公告)日：2002-01-31

申请号：US09818513

申请日：2001-03-28

Inventor： Shunpei Yamazaki ,  Toru Takayama ,  Takeshi Fukunaga

IPC: B05C005/00 ,  B05C009/08

CPC classification number: C23C14/564 ,  C23C14/04 ,  C23C14/12 ,  C23C14/243 ,  C23C14/54

Abstract: A cleaning method of removing a vapor-deposition material adhering to equipments without exposure to the atmosphere is provided. A vapor-deposition material adhering to equipments (components of a film-forming apparatus) such as a substrate holder, a vapor-deposition mask, a mask holder, or an adhesion preventing shield provided in a film-forming chamber are subjected to heat treatment. Because of this, the adhering vapor-deposition material is re-sublimated, and removed by exhaust through a vacuum pump. By including such a cleaning method in the steps of manufacturing an electro-optical device, the manufacturing steps are shortened, and an electro-optical device with high reliability can be realized.

Abstract translation: 提供了一种清除附着在不暴露于大气中的设备的气相沉积材料的方法。 将附着在设置在成膜室上的设备（成膜装置的部件）如基板保持器，蒸镀掩模，掩模保持器或防粘附屏蔽物的气相沉积材料进行热处理 。 因此，附着的气相沉积材料被重新升华，并通过真空泵通过排气除去。 通过在制造电光装置的步骤中包括这种清洁方法，缩短了制造步骤，并且可以实现具有高可靠性的电光装置。

公开(公告)号：US20010007704A1

公开(公告)日：2001-07-12

申请号：US09756799

申请日：2001-01-10

Inventor： Yumiko Anzai ,  Motoyasu Terao ,  Tetsuya Nishida ,  Mokoto Miyamoto

IPC: B05C005/00 ,  B32B003/02 ,  B05C013/00 ,  B05C009/08 ,  B05B007/14

CPC classification number: B32B27/36 ,  B29C59/16 ,  B29C2035/0827 ,  B29K2069/00 ,  B29L2017/003 ,  B29L2017/005 ,  B32B27/28 ,  G11B7/2433 ,  G11B7/252 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/258 ,  G11B7/2585 ,  G11B7/26 ,  G11B2007/2571 ,  G11B2007/25713 ,  Y10T428/21

Abstract: An optical disk for recording/reproducing information have the problem of the fine irregularities on its substrate surface that causes increase of noise, under the process of forming the recording layer capable of changing physically or chemically by irradiation of laser light. The problem could deteriorate the record and reproduction characteristics and bring about a defect on a life test or on its storage ability. To solve the problem, the present invention provides the method of manufacturing an optical disk having the pits-and-lands pattern whose organic material is modified by the ultraviolet light irradiation. The transmission of the substrate is not more than 50% at one wavelength in a wavelength region from 300 to 375 nm. And, thereby the surface of an optical disk substrate is smoothed to effect the reduction of the substrate noise and the improvement of record and reproduction characteristics. Moreover, adhesiveness between the substrate and other layer formed thereon is bettered and hence the number of generated defects is reduced.

Abstract translation: 用于记录/再现信息的光盘在形成能够通过激光的照射物理或化学变化的记录层的过程中存在其基板表面上的细小不规则性导致噪声增加的问题。 这个问题可能会使记录和再现特性恶化，并在生命测试或其存储能力上产生缺陷。 为了解决这个问题，本发明提供一种具有通过紫外光照射改变有机材料的凹凸图案的光盘的制造方法。 在300〜375nm的波长范围内的一个波长的基板的透射率不超过50％。 并且，由此光盘基板的表面被平滑化以实现基板噪声的降低和记录和再现特性的提高。 此外，衬底和其上形成的其它层之间的粘附性更好，因此产生的缺陷的数量减少。

公开(公告)号：US20010005797A1

公开(公告)日：2001-06-28

申请号：US09765801

申请日：2001-01-19

Inventor： Joel W Barlow ,  Goohee Lee ,  Richard H. Crawford ,  Joseph J. Beaman ,  Harris L. Marcus ,  Richard J. Lagow

IPC: A61F002/28 ,  B05D003/06 ,  B05C009/08 ,  B05D003/00

CPC classification number: C04B35/628 ,  A61F2/28 ,  A61F2/2875 ,  A61F2/3094 ,  A61F2/30942 ,  A61F2002/30199 ,  A61F2002/30929 ,  A61F2002/30952 ,  A61F2002/30968 ,  A61F2230/0063 ,  A61F2310/00293 ,  A61L27/46 ,  B29C64/153 ,  B29C64/165 ,  B29L2031/7532 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C04B35/447 ,  C04B35/63424 ,  C04B2235/3201 ,  C04B2235/3212 ,  C04B2235/36 ,  C04B2235/5409 ,  C04B2235/5436 ,  C04B2235/6026 ,  C04B2235/608 ,  C04B2235/61 ,  C04B2235/616 ,  C04B2235/6584 ,  C04B2235/665 ,  C04B2235/77 ,  C04B2235/80 ,  C04B2235/96 ,  C04B2235/9615

Abstract: A process for making bone implants from calcium phosphate powders is disclosed. This process involves selectively fusing layers of calcium powders that have been coated or mixed with polymer binders. The calcium powder mixture may be formed into layers and the polymer fused with a laser. Complex three-dimensional geometrical shapes can be automatically replicated or modified using this approach.