公开(公告)号：US06835683B2

公开(公告)日：2004-12-28

申请号：US10311233

申请日：2002-12-17

Applicant: Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

Inventor： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

IPC: C03C306

CPC classification number: C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

Abstract translation: 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

公开(公告)号：US20030195107A1

公开(公告)日：2003-10-16

申请号：US10317068

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C010/16 ,  C03C003/112

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cmnull1 (I2250) to the scattering peak intensity of 800 cmnull1 (I800), i.e. I2250/I800, of at most 1null10null4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2null10null3 cmnull1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在含有氟的紫外线区域至真空紫外线区域的范围内的光照射而使用，该散射峰强度比例为2250cm <上标> -1 >（I <下标> 2250 ）到800 cm <上标> -1>（I <下标> 800 ）的散射峰强度，即I <下标> 2250 / I 在激光拉曼光谱中，最多为1×10 <上标> -4>的<下标> 800 ，其吸光系数为245nm，最多为2×10 <上标> -3> cm -1>。

公开(公告)号：US06518210B1

公开(公告)日：2003-02-11

申请号：US09593441

申请日：2000-06-14

Applicant: Hiroki Jinbo ,  Norio Komine ,  Hiroyuki Hiraiwa

Inventor： Hiroki Jinbo ,  Norio Komine ,  Hiroyuki Hiraiwa

IPC: C03C306

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/44 ,  C03C2203/52 ,  G03F7/70241 ,  Y02P40/57

Abstract: A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

Abstract translation: 石英玻璃的结构测定温度为1200K以下，OH基浓度为1,000ppm以上。 石英玻璃与波长400nm以下的光一起用于光刻。

公开(公告)号：US06376401B1

公开(公告)日：2002-04-23

申请号：US09387773

申请日：1999-09-01

Applicant: Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

Inventor： Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

IPC: C03B2000

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2203/44

Abstract: A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C. or less and a transmittance of 157 nm ultraviolet rays through a 10 mm optical path of 60% or more, and optically a OH group content of 1 to 70 ppm, a Cl content less than 1 ppm, a total content of impurity metals of 50 ppb or less, a content of each individual impurity metal less than 10 ppb, and an ultraviolet ray-transmittance at 172 to 200 nm of 40% or more even after the glass is exposed to an irradiation of ultraviolet rays at 160 to 300 nm for one hour.

Abstract translation: 对于真空紫外线具有高透射率的合成二氧化硅玻璃，例如波长为157nm的F2准分子激光束，高均匀性和高耐久性并且可用于紫外线透明光学玻璃材料由高纯度 硅化合物，例如四氯化硅，通过在不足够高的温度下热处理积聚的多孔二氧化硅材料，以在惰性气体气氛中将多孔二氧化硅材料转化为透明的石英玻璃足以使OH基团冷凝的时间 并且从玻璃中除去，并且基本上不含OH基团中的杂质含量，最高和最低虚构温度之间的差别为50℃或更低，通过10mm光路的157nm紫外线的透射率为60％或 更多地，光学地含有1至70ppm的OH基含量，小于1ppm的Cl含量，50ppb以下的杂质金属的总含量， 即使玻璃暴露于160〜300nm的紫外线照射1小时，每一种杂质金属小于10ppb，而在172〜200nm的紫外线透射率为40％以上。

公开(公告)号：US6143676A

公开(公告)日：2000-11-07

申请号：US214894

申请日：1999-01-14

Applicant: Norio Ohashi ,  Michiyo Kuriyama ,  Shigeru Yamagata ,  Shigemasa Sunada

Inventor： Norio Ohashi ,  Michiyo Kuriyama ,  Shigeru Yamagata ,  Shigemasa Sunada

IPC: C03B19/14 ,  C03B23/047 ,  C03B32/00 ,  C03C3/06 ,  C03B9/10 ,  G02B1/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B23/047 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/52

Abstract: An object of the present invention is to provide a synthetic silica glass optical material which exhibits excellent transmittance as well as durability for high output power vacuum ultraviolet rays, being emitted from, for example, ArF excimer lasers and Xe.sub.2 excimer lamps, and to provide a method for producing the same. A synthetic silica glass optical material for high output power vacuum ultraviolet rays made from ultra high purity synthetic silica glass for use in the wavelength region of from 165 to 195 nm, containing OH groups at a concentration of from 5 to 300 wtppm with a fluctuation width in OH group concentration (.DELTA.OH/cm) of 10 wtppm or less, containing hydrogen molecules at a concentration of from 1.times.10.sup.17 to 1.times.10.sup.19 molecule/cm.sup.3 with a fluctuation width in hydrogen molecule concentration (.DELTA.H.sub.2 /cm) of 1.times.10.sup.17 molecule/cm.sup.3 or lower, and containing chlorine at a concentration of 50 wtppm or lower. Also claimed is a method for producing the same.

Abstract translation: PCT No.PCT / EP98 / 02965 Sec。 371日期1999年1月14日第 102（e）日期1999年1月14日PCT提交1998年5月20日PCT公布。 第WO98 / 52879号公报 日期：1998年11月26日本发明的目的是提供一种合成石英玻璃光学材料，其表现出优异的透射率以及从例如ArF准分子激光器和Xe2准分子灯发射的高输出功率真空紫外线的耐久性 并提供其制造方法。 一种用于高浓度合成石英玻璃的高输出功率真空紫外线的合成二氧化硅玻璃光学材料，用于波长范围为165至195nm的OH基，其浓度为5至300重量ppm，具有波动宽度 OH分子浓度（DELTA OH / cm）为10重量ppm以下，含有浓度为1×10 17〜1×10 19分子/ cm 3的氢分子，氢分子浓度的波动宽度（DELTA H2 / cm）为1×10 17分子/ cm 3， 较低，含有浓度为50重量ppm以下的氯。 还要求保护其的方法。

公开(公告)号：US20190062193A1

公开(公告)日：2019-02-28

申请号：US16061929

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Matthias OTTER ,  Walter LEHMANN ,  Michael HÜNERMANN ,  Nils Christian NIELSEN ,  Nigel Robert WHIPPEY ,  Boris GROMANN ,  Abdoul-Gafar KPEBANE ,  Matthias SÖHN

IPC: C03B20/00 ,  C03B17/04 ,  C03B37/012 ,  C03B37/027 ,  C03C3/06 ,  C03C1/02

CPC classification number: C03B20/00 ,  C03B17/04 ,  C03B19/106 ,  C03B19/1095 ,  C03B37/01211 ,  C03B37/027 ,  C03B2201/04 ,  C03C1/022 ,  C03C1/026 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/54 ,  C03C2203/10 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/50

Abstract: The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has at least a first and a further chamber connected to one another via a passage, wherein the temperature in the first chamber is lower than the temperature in the further chambers. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

公开(公告)号：US20180251397A1

公开(公告)日：2018-09-06

申请号：US15886982

申请日：2018-02-02

Applicant: OFS Fitel, LLC

Inventor： Man F. Yan ,  Peter I. Borel ,  Tommy Geisler ,  Rasmus V.S Jensen ,  Ole A. Levring ,  Jorgen Ostgaard Olsen ,  David W. Peckham ,  Dennis J. Trevor ,  Patrick W. Wisk ,  Benyuan Zhu

IPC: C03C13/04 ,  G02B6/036 ,  C03B37/012 ,  C03B37/027 ,  C03C4/10 ,  C03C3/06

CPC classification number: C03C13/046 ,  C03B37/01208 ,  C03B37/01853 ,  C03B37/027 ,  C03B2201/07 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/50 ,  C03B2203/223 ,  C03B2203/23 ,  C03C3/06 ,  C03C4/10 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/28 ,  C03C2201/50 ,  G02B6/03627 ,  G02B6/0365 ,  Y02P40/57

Abstract: An optical fiber has a core region that is doped with one or more viscosity-reducing dopants in respective amounts that are configured, such that, in a Raman spectrum with a frequency shift of approximately 600 cm−1, the fiber has a nanoscale structure having an integrated D2 line defect intensity of less than 0.025. Alternatively, the core region is doped with one or more viscosity-reducing dopants in respective amounts that are configured such that the fiber has a residual axial compressive stress with a stress magnitude of more than 20 MPa and a stress radial extent between 2 and 7 times the core radius.According to another aspect of the invention a majority of the optical propagation through the fiber is supported by an identified group of fiber regions comprising the core region and one or more adjacent cladding regions. The fiber regions are doped with one or more viscosity-reducing dopants in respective amounts and radial positions that are configured to achieve viscosity matching among the fiber regions in the identified group.

公开(公告)号：US20180057391A1

公开(公告)日：2018-03-01

申请号：US15797061

申请日：2017-10-30

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo KÜHN

IPC: C03C3/06 ,  G02B1/00 ,  C03B32/02 ,  G02B1/02 ,  C03B32/00 ,  C03B19/14 ,  C03C4/04

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.

公开(公告)号：US09878943B2

公开(公告)日：2018-01-30

申请号：US15471344

申请日：2017-03-28

Applicant: Corning Incorporated

Inventor： Dana Craig Bookbinder ,  Robert Brett Desorcie ,  Hazel Benton Matthews, III ,  Pushkar Tandon

IPC: G02B6/036 ,  C03C25/66 ,  C03C25/10

CPC classification number: C03C25/66 ,  C03B37/01205 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/027 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2203/23 ,  C03B2203/24 ,  C03C3/06 ,  C03C13/045 ,  C03C25/1061 ,  C03C25/1068 ,  C03C2201/11 ,  C03C2201/22 ,  C03C2201/31 ,  C03C2203/54 ,  G02B6/02 ,  G02B6/021 ,  G02B6/03627 ,  G02B6/0365 ,  Y02P40/57

Abstract: The present disclosure is directed to a method of making an optical fiber with improved bend performance, the optical fiber having a core and at least one cladding layer, and a chlorine content in the in the last layer of the at least one cladding layer that is greater than 500 ppm by weight. The fiber is prepared using a mixture of a carrier gas, a gaseous chlorine source material and a gaseous reducing agent during the sintering of the last or outermost layer of the at least one cladding layer. The inclusion of the reducing gas into a mixture of the carrier gas and gaseous chlorine material reduces oxygen-rich defects that results in at least a 20% reduction in TTP during hydrogen aging testing.

公开(公告)号：US09817184B2

公开(公告)日：2017-11-14

申请号：US15290105

申请日：2016-10-11

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Yoshiaki Tamura ,  Tetsuya Haruna ,  Masaaki Hirano ,  Hirotaka Sakuma

IPC: G02B6/02 ,  G02B6/036 ,  C03C13/04

CPC classification number: G02B6/03694 ,  C03C13/045 ,  C03C13/046 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/50 ,  C03C2201/54 ,  C03C2213/00 ,  G02B6/03611

Abstract: An optical fiber having a reduced attenuation includes a silica glass core and a silica glass cladding. The silica glass core has substantially no germanium and includes a first core and a second core. The second core encloses the first core, the refractive index of the second core is larger than the refractive index of the first core, and the average value of halogen concentration of the second core is 5000 ppm or more. The silica glass cladding surrounds the second core and contains substantially no germanium. The refractive index of the cladding is smaller than the refractive index of the first core.