公开(公告)号：US07321118B2

公开(公告)日：2008-01-22

申请号：US11147102

申请日：2005-06-07

Applicant: Billy W. Ward

Inventor： Billy W. Ward

IPC: H01J37/30

CPC classification number: H01J37/28 ,  G01N23/04 ,  G01N23/225 ,  H01J37/08 ,  H01J2237/08 ,  H01J2237/0807 ,  H01J2237/2802

Abstract: Scanning Transmission Ion Microscope. The microscope includes a bright helium ion source to generate an ion beam and a focusing electrostatic optical column to focus the ion beam. A translation stage supports a sample to receive the focused ion beam and a detector responds to ions transmitted through the sample to generate a signal from which properties of the sample may be displayed.

Abstract translation: 扫描透射离子显微镜。 显微镜包括用于产生离子束的明氦离子源和用于聚焦离子束的聚焦静电光学柱。 平移台支持采样以接收聚焦的离子束，并且检测器对通过样品传输的离子进行响应以产生可以显示样品的特性的信号。

公开(公告)号：US20070221843A1

公开(公告)日：2007-09-27

申请号：US11599879

申请日：2006-11-15

Applicant: Billy Ward ,  John Notte ,  Louis Farkas ,  Randall Percival ,  Raymond Hill

Inventor： Billy Ward ,  John Notte ,  Louis Farkas ,  Randall Percival ,  Raymond Hill

IPC: G01N23/00 ,  H01J27/02

CPC classification number: H01J37/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/252 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/2566 ,  H01J2237/2623 ,  H01J2237/2812 ,  H01J2237/30438 ,  H01J2237/3174 ,  H01J2237/31755

Abstract: Ion sources, systems and methods are disclosed.

Abstract translation: 公开了离子源，系统和方法。

公开(公告)号：US20070215802A1

公开(公告)日：2007-09-20

申请号：US11385215

申请日：2006-03-20

Applicant: Billy W. Ward ,  Louis S. Farkas ,  John A. Notte ,  Randall G. Percival

Inventor： Billy W. Ward ,  Louis S. Farkas ,  John A. Notte ,  Randall G. Percival

IPC: H01J37/26 ,  G01N23/225

CPC classification number: H01J37/28 ,  H01J37/08 ,  H01J37/244 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/24455 ,  H01J2237/2505

Abstract: In one aspect the invention provides a gas field ion microscope that includes an ion source in connection with an optical column, such that an ion beam generated at the ion source travels through the optical column and impinges on a sample. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the invention provides methods for using the ion microscope to analyze samples and enhancing the performance of a gas field ion source.

Abstract translation: 一方面，本发明提供了一种气体离子显微镜，其包括与光学柱结合的离子源，使得在离子源处产生的离子束穿过光学柱并撞击样品。 离子源包括具有与包含少量原子的尖端逐渐变细的宽度的发射体。 在其他方面，本发明提供了使用离子显微镜分析样品并提高气体离子源的性能的方法。

公开(公告)号：US20070210251A1

公开(公告)日：2007-09-13

申请号：US11600874

申请日：2006-11-15

Applicant: Billy Ward ,  John Notte ,  Louis Farkas ,  Randall Percival ,  Raymond Hill

Inventor： Billy Ward ,  John Notte ,  Louis Farkas ,  Randall Percival ,  Raymond Hill

IPC: G01N23/00

CPC classification number: H01J37/08 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/2255 ,  H01J27/26 ,  H01J37/20 ,  H01J37/252 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/2566 ,  H01J2237/2623 ,  H01J2237/2812 ,  H01J2237/30438 ,  H01J2237/3174 ,  H01J2237/31755

Abstract: Ion sources, systems and methods are disclosed.

公开(公告)号：US20070194251A1

公开(公告)日：2007-08-23

申请号：US11600361

申请日：2006-11-15

Applicant: Billy Ward ,  John Notte ,  Louis Farkas ,  Randall Percival ,  Raymond Hill ,  Klaus Edinger ,  Lars Markwort ,  Dirk Aderhold ,  Ulrich Mantz

Inventor： Billy Ward ,  John Notte ,  Louis Farkas ,  Randall Percival ,  Raymond Hill ,  Klaus Edinger ,  Lars Markwort ,  Dirk Aderhold ,  Ulrich Mantz

IPC: H01J37/08

CPC classification number: H01J37/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J27/26 ,  H01J37/20 ,  H01J37/252 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/2566 ,  H01J2237/2623 ,  H01J2237/2812 ,  H01J2237/30438 ,  H01J2237/3174 ,  H01J2237/31755

Abstract: Ion sources, systems and methods are disclosed.

公开(公告)号：US4919780A

公开(公告)日：1990-04-24

申请号：US333386

申请日：1989-04-03

Applicant: Hans-Werner Fink ,  Roger Morin ,  Heinz Schmid ,  Werner Stocker

Inventor： Hans-Werner Fink ,  Roger Morin ,  Heinz Schmid ,  Werner Stocker

IPC: H01J37/141 ,  B23K17/00 ,  H01J9/02 ,  H01J9/14 ,  H01J37/06 ,  H01J37/08 ,  H01J37/12 ,  H01J37/244 ,  H01J37/305 ,  H01J37/31

CPC classification number: H01J37/12 ,  B23K17/00 ,  H01J37/31 ,  H01J9/02 ,  H01J2237/0807 ,  Y10S977/856 ,  Y10S977/857 ,  Y10S977/888 ,  Y10S977/89

Abstract: A method for fabricating exactly aligned apertures for use in electron and ion microscopy involves the placing of a very sharply pointed tip (1) in front of a set of extremely thin, precisely spaced metal foils (3,5) in an atmosphere of heavy gas atoms. The application of an elevated voltage at the tip (1) will result in a sputtering operation to commence and erode the metal foils (3,5) at a location underneath the facing tip (1). The sputtering operation is continued until the first ions are detected to emerge on the far side of the lens structure (2).

公开(公告)号：US4831308A

公开(公告)日：1989-05-16

申请号：US101131

申请日：1987-09-25

Applicant: Morikazu Konishi ,  Masaaki Takizawa

Inventor： Morikazu Konishi ,  Masaaki Takizawa

IPC: H01J27/08 ,  H01J27/20 ,  H01J27/26 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J27/20 ,  H01J2237/0807

Abstract: An ion beam apparatus with an ion gun in which a gas to be ionized is supplied to the periphery of an emitter and a high voltage is applied between the emitter and an extractor so that the gas introduced to the vicinity of the emitter tip is ionized to generate an ion beam. The structure of the ion gun is formed so as to achieve a high ion current density of the ion beam as well as to prevent short-circuiting that may otherwise be caused by atmospheric electric discharge between the emitter and the extractor.

Abstract translation: 具有离子枪的离子束装置，其中将被离子化的气体供给到发射体的周围，并且在发射极和提取器之间施加高电压，使得引入到发射极尖端附近的气体被电离至 产生离子束。 形成离子枪的结构，以实现离子束的高离子电流密度，并且防止否则可能由发射体和提取器之间的大气放电引起的短路。

公开(公告)号：US4457803A

公开(公告)日：1984-07-03

申请号：US447762

申请日：1982-12-08

Applicant: Tadahiro Takigawa

Inventor： Tadahiro Takigawa

IPC: H01J37/302 ,  H01J37/305 ,  H01L21/027 ,  H01L21/263 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/306 ,  B44C1/22 ,  C03C15/00 ,  C23F1/02

CPC classification number: H01J37/302 ,  H01J37/3056 ,  H01L21/2633 ,  H01J2237/0807 ,  H01J2237/31749 ,  Y10S438/961

Abstract: A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the desired etching depth of the specimen is preset as a function of a location. The ion dose of the focused ion beam, the acceleration voltage, or the etching time may be varied in accordance with the preset data.

Abstract translation: 提出了一种使用聚焦离子束的处理方法，其使用聚焦离子束辐射装置。 当用聚焦离子束照射试样以进行蚀刻时，根据位置预先设定试样的期望的蚀刻深度。 聚焦离子束的离子剂量，加速电压或蚀刻时间可以根据预设数据而变化。

公开(公告)号：US3504175A

公开(公告)日：1970-03-31

申请号：US3504175D

申请日：1966-09-19

Applicant: RESEARCH CORP

Inventor： MUELLER ERWIN W

IPC: H01J37/04 ,  H01J37/08 ,  H01J37/27 ,  H01J37/26

CPC classification number: H01J37/08 ,  H01J37/04 ,  H01J37/27 ,  H01J2237/0807 ,  H01J2237/2812

公开(公告)号：US20170352517A1

公开(公告)日：2017-12-07

申请号：US15514735

申请日：2015-09-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroyasu SHICHI ,  Shinichi MATSUBARA ,  Yoshimi KAWANAMI ,  Hiroyuki MUTO

IPC: H01J27/26 ,  H01J37/08 ,  H01J37/18 ,  H01J37/28

CPC classification number: H01J27/26 ,  H01J37/08 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/006 ,  H01J2237/0807

Abstract: In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply means for supplying a gas to the emitter tip. The gas supply means includes a mixed gas chamber that is filled with a hydrogen gas and a gas for diluting the hydrogen gas below an explosive lower limit.