公开(公告)号：US12125664B2

公开(公告)日：2024-10-22

申请号：US17575429

申请日：2022-01-13

Applicant: Oxford Instruments Nanotechnology Tools Limited

Inventor： David Pearson ,  Sebastien Pochon ,  Joao Ferreira

IPC: H01J37/08 ,  H01J27/02 ,  H01J37/32

CPC classification number: H01J37/08 ,  H01J27/024 ,  H01J37/32422 ,  H01J2237/083 ,  H01J2237/334

Abstract: A charged particle beam source for a surface processing apparatus is disclosed. The charged particle beam source comprises: a plasma chamber; a plasma generation unit adapted to convert an input gas within the plasma chamber into a plasma containing charged particles; and a grid assembly adjacent an opening of the plasma chamber. The grid assembly comprises one or more grids each having a plurality of apertures therethrough, the one or more grids being electrically biased in use so as to accelerate charged particles from the plasma through the grid(s) to thereby output a charged particle beam, the major axis of which is substantially perpendicular to the plane of the grid assembly. The transmissivity of the or each grid to the charged particles is defined by the relative proportion of aperture area to non-aperture area, and at least one of the grids has a transmissivity which varies across the grid along a first direction, the transmissivity being lower adjacent a first extremity of the grid than adjacent a second extremity of the grid opposite the first extremity, the first direction lying parallel to the plane of the grid assembly, such that in use the charged particle beam output by the source has a non-uniform charged particle current density profile in a plane parallel to the plane of the grid assembly which varies along the first direction, the charged particle current density being lower adjacent a first edge of the beam than adjacent a second edge of the beam opposite the first edge.

公开(公告)号：US20230369003A1

公开(公告)日：2023-11-16

申请号：US18124740

申请日：2023-03-22

Applicant: ENPULSION GmbH

Inventor： Ivanhoe VASILJEVICH

IPC: H01J27/02 ,  B64G1/40

CPC classification number: H01J27/024 ,  B64G1/405

Abstract: A liquid metal ion source, in particular an ion thruster for propulsion of a spacecraft, comprises a reservoir for the liquid metal, an emitter penetrating a front wall of the reservoir for drawing liquid metal from the reservoir and emitting ions of the liquid metal, and an extractor supported with respect to the reservoir and facing the emitter for extracting and accelerating the ions from the emitter, wherein the reservoir is provided with advancing means for creating an electromagnetic field within the liquid metal in the reservoir to exert a force on the liquid metal in a direction towards the emitter.

公开(公告)号：US20180342367A1

公开(公告)日：2018-11-29

申请号：US15727910

申请日：2017-10-09

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Jeffrey A. BURGESS

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/147 ,  H01J27/024 ,  H01J37/08 ,  H01J37/1471 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/31701

Abstract: A low profile extraction electrode assembly including an insulator having a main body, a plurality of spaced apart mounting legs extending from a first face of the main body, a plurality of spaced apart mounting legs extending from a second face of the main body opposite the first face, the plurality of spaced apart mounting legs extending from the second face offset from the plurality of spaced apart mounting legs extending from the first face in a direction orthogonal to an axis of the main body, the low profile extraction electrode assembly further comprising a ground electrode fastened to the mounting legs extending from the first face, and a suppression electrode fastened to the mounting legs extending from the second face, wherein a tracking distance between the ground electrode and the suppression electrode is greater than a focal distance between the ground electrode and the suppression electrode.

公开(公告)号：US20180254175A1

公开(公告)日：2018-09-06

申请号：US15903321

申请日：2018-02-23

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Inventor： Thomas ALAVA ,  Hadley VIDELIER ,  Frederic PROGENT ,  Laurent DURAFFOURG ,  Sebastien VIGNE

IPC: H01J49/00 ,  H01J49/14 ,  H01J49/26

CPC classification number: H01J49/0018 ,  H01J27/024 ,  H01J27/20 ,  H01J49/14 ,  H01J49/26

Abstract: A generator of an ion beam is provided, including an ionisation chamber provided with an inlet of a fluid to be ionised; a source of ionising particles configured to impact the fluid in an impact zone of the ionisation chamber so as to generate ions; and an extractor of ions generated in a direction of an outlet zone of the generator, the extractor including at least two electrodes, a first electrode referred to as input electrode laterally bordering the impact zone, and at least one second electrode referred to as intermediate electrode located in the impact zone, the at least two electrodes being configured to generate a voltage gradient in the impact zone, with the voltage gradient being configured to direct the generated ions to the outlet zone of the generator.

公开(公告)号：US09852873B2

公开(公告)日：2017-12-26

申请号：US15215829

申请日：2016-07-21

Applicant: COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIES ALTERNATIVES

Inventor： Olivier Delferriere ,  Olivier Tuske ,  Francis Harrault

IPC: H01J27/16 ,  H01J27/18 ,  H01J37/32 ,  H01J27/02

CPC classification number: H01J27/18 ,  H01J27/022 ,  H01J27/024

Abstract: An electron cyclotron resonance ion generator device includes a metal tube subjected to a first potential and pierced by a first cavity forming a plasma chamber intended to contain a plasma; a second cavity forming a waveguide configured to inject a high frequency wave into the plasma chamber, an extraction system including an upstream end connected to the plasma chamber and a downstream end configured to be connected to an ion transport line, the connecting flange being subjected to a second potential, a magnetic field generator, and a ceramic tube in contact with the metal tube, the ceramic tube surrounding the metal tube and at least a part of the extraction system.

公开(公告)号：US20160247669A1

公开(公告)日：2016-08-25

申请号：US15049366

申请日：2016-02-22

Applicant: SHIMADZU CORPORATION

Inventor： Yusuke TATEISHI ,  Kazuteru TAKAHASHI ,  Hideki SATO

IPC: H01J49/14

CPC classification number: H01J49/147 ,  H01J27/024 ,  H01J27/205 ,  H01J49/067 ,  H01J49/145

Abstract: In an ion source 3 in which a repeller electrode 32 for forming a repelling electric field that repels ions toward an ion emission port 311 is provided inside of an ionization chamber 31, ion focusing electrodes 36 and 37 are respectively arranged between an electron introduction port 312 and a filament 34 and between an electron discharge port 313 and a counter filament 35. An electric field formed by applying a predetermined voltage to each of the ion focusing electrodes 36 and 37 intrudes into the ionization chamber 31 through the electron introduction port 312 and the electron discharge port 313, and becomes a focusing electric field that pushes the ions in an ion optical axis C direction. Ions at positions off a central part of the ionization chamber 31 receive the combined force of the force of the repelling electric field and the force of the focusing electric field, and move toward the ion emission port 311 while approaching the ion optical axis C. Accordingly, the amount of ions sent out from the ion emission port increases. Further, even if a charge-up phenomenon occurs, the ion trajectories less easily change, and the stability of the sensitivity can be enhanced.

Abstract translation: 在离子源3中，在电离室31的内部设置有用于形成排斥离子的排斥电极的排斥电极32，离子聚焦电极36,37分别配置在电子引入口312 灯丝34和电子排出口313和反向灯丝35之间。通过向每个离子聚焦电极36和37施加预定电压而形成的电场通过电子引入口312侵入电离室31和 电子放电端口313，并且成为在离子光轴C方向推动离子的聚焦电场。 在离子化室31的中心部分的位置处的离子接收排斥电场的力和聚焦电场的力的组合力，并且在接近离子光轴C的同时向离子发射端口311移动。因此 从离子发射口发出的离子量增加。 此外，即使发生充电现象，离子轨迹也不容易改变，并且可以提高灵敏度的稳定性。

公开(公告)号：US09398678B2

公开(公告)日：2016-07-19

申请号：US13825913

申请日：2011-09-14

Applicant: Ane Aanesland ,  Pascal Chabert ,  Michael Irzyk ,  Stéphane Mazouffre

Inventor： Ane Aanesland ,  Pascal Chabert ,  Michael Irzyk ,  Stéphane Mazouffre

IPC: H01J7/24 ,  H05B31/26 ,  H05H1/24 ,  H01J27/02 ,  H01J27/16 ,  H05H1/54 ,  F03H1/00

CPC classification number: H05H1/24 ,  F03H1/0025 ,  H01J27/024 ,  H01J27/16 ,  H05H1/54

Abstract: The invention relates to a method and device for forming a plasma beam. According to the invention: the quality of the electroneutrality of the plasma beam (PB) is detected (in 12 and/or 13); and the alternating polarization potentials of the extraction and acceleration grid (4) are adjusted such that the plasma beam (PB) is at least approximately electrically neutral.

Abstract translation: 本发明涉及一种用于形成等离子体束的方法和装置。 根据本发明：检测等离子体束（PB）的电中性的质量（12和/或13）; 并且调整提取和加速栅格（4）的交变极化电位，使得等离子体束（PB）至少大致电中性。

公开(公告)号：US20160163495A1

公开(公告)日：2016-06-09

申请号：US14903747

申请日：2014-06-26

Applicant: PHOENIX NUCLEAR LABS LLC

Inventor： Joseph D. Sherman ,  Evan R. Sengbusch ,  Ross F. Radel ,  Arne V. Kobernik ,  Tye T. Gribb ,  Preston J. Barrows ,  Christopher M. Seyfert ,  Logan D. Campbell ,  Daniel J. Swanson ,  Eric D. Risley ,  Jin W. Lee ,  Kevin D. Meaney

IPC: H01J27/02 ,  H01J27/22 ,  H01J27/16

CPC classification number: H01J27/028 ,  H01J27/024 ,  H01J27/16 ,  H01J27/18 ,  H01J27/22 ,  H01J37/08

Abstract: A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of electrons provided between the plasma chamber and the negative ion converter. The beam formation mechanism extracts the negative ions.

Abstract translation: 负离子源包括等离子体室，微波源，负离子转换器，磁性过滤器和束形成机构。 等离子体室包含待离子化的气体。 微波源将微波传输到等离子体室以将气体电离成包括超热中性原子的原子物质。 负离子转换器将超热中性原子转化为负离子。 磁性过滤器降低了设置在等离子体室和负离子转换器之间的电子的温度。 束形成机制提取负离子。

公开(公告)号：US20160148775A1

公开(公告)日：2016-05-26

申请号：US14897232

申请日：2014-06-12

Applicant: GENERAL PLASMA, INC.

Inventor： John E. Madocks

IPC: H01J27/14

CPC classification number: H01J27/14 ,  H01J27/024 ,  H01J27/10 ,  H01J37/08

Abstract: A linear anode layer ion source is provided that includes a top pole having a linear ion emitting slit. An anode under the top pole has a slit aligned with the top pole ion emitting slit. At least one magnet creates a magnetic field that passes through the anode slit. Wherein the width of the anode slit is 3 mm or less. A process of generating an accelerated ion beam is also provided that includes flowing a gas into proximity to said anode. By energizing a power supply electron flow is induced to the anode and the gas is ionized. Accelerating the ions from the anode through the linear ion emitting slit generates an accelerated ion beam by a process superior to that using a racetrack-shaped slit.

Abstract translation: 提供线性阳极层离子源，其包括具有线性离子发射狭缝的顶极。 顶极下的阳极具有与顶极离子发射狭缝对准的狭缝。 至少一个磁体产生通过阳极狭缝的磁场。 其中阳极狭缝的宽度为3mm以下。 还提供了产生加速离子束的过程，其包括使气体流动到所述阳极附近。 通过激励电源，电子流引入阳极并且气体被电离。 通过线性离子发射狭缝加速来自阳极的离子通过比使用跑道形狭缝的方法更高的加工离子束产生加速离子束。

公开(公告)号：US09336979B2

公开(公告)日：2016-05-10

申请号：US14591843

申请日：2015-01-07

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Anto Yasaka ,  Fumio Aramaki ,  Yasuhiko Sugiyama ,  Tomokazu Kozakai ,  Osamu Matsuda

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/305 ,  H01J27/26

CPC classification number: H01J27/024 ,  H01J27/26 ,  H01J37/08 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/182

Abstract: A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. The surface of the emitter is formed of a precious metal, such as platinum, palladium, iridium, rhodium or gold. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.

Abstract translation: 聚焦离子束装置具有离子源室，其中设置有用于发射离子的发射极。 发射体的表面由贵金属形成，例如铂，钯，铱，铑或金。 气体供给单元向离子源室供给氮气，使得氮气吸附在发射体的表面。 提取电极与发射极间隔开，并向提取电极施加电压，使吸附的氮气离子化，并以离子束形式提取氮离子。 温度控制单元控制发射器的温度。