SKM ion source
    2.
    发明授权
    SKM ion source 失效
    SKM离子源

    公开(公告)号:US4891525A

    公开(公告)日:1990-01-02

    申请号:US271241

    申请日:1988-11-14

    CPC classification number: H01J37/08 H01J27/10

    Abstract: An ion source of the side extraction type which includes auxiliary electrodes surrounding the cathode at the ends of the anode, and insulators surrounding the auxiliary electrodes and electrically isolating them from the anode. The auxiliary electrodes essentially define the ends of the discharge chamber, leaving the anode confined to the cylindrical surface surrounding the filament. Each insulator is made up of an inner insulator and an outer insulator with an annular space defined between them. The inner and outer insulators are each in the form of a cylinder with a radially extending flange formed at one end, and interfit with the anode and with each other such that cylindrical spaces are defined between the outer flange portion and the anode and between the inner and outer flange portions. These and other features contribute to improve the electrical isolation between the auxiliary electrode and the anode, prolong source life, and improve beam purity.

    Abstract translation: 侧面提取型离子源包括在阳极端部包围阴极的辅助电极,以及包围辅助电极并将其与阳极电隔离的绝缘体。 辅助电极基本上限定了放电室的端部,使阳极限制在围绕灯丝的圆柱形表面上。 每个绝缘体由内绝缘体和外绝缘体组成,其间具有限定的环形空间。 内绝缘体和外绝缘体各自为圆柱形,其一端形成有径向延伸的凸缘,并且与阳极相互配合,使得圆柱形空间限定在外凸缘部分和阳极之间以及内部 和外凸缘部分。 这些和其他特征有助于改善辅助电极和阳极之间的电隔离,延长源寿命,并提高光束纯度。

    Ion generating source
    3.
    发明授权
    Ion generating source 失效
    离子发生源

    公开(公告)号:US4123686A

    公开(公告)日:1978-10-31

    申请号:US774655

    申请日:1977-03-04

    CPC classification number: H01J27/10 H01J3/04

    Abstract: A source for generating singly and/or multiply charged ions composed essentially of a glow cathode, an intermediate electrode and an anode electrode having a common axis of symmetry and bordering a gas discharge chamber and each presenting a passage opening coaxial with the axis of symmetry, and a system producing a magnetic field having an axial component along the axis of symmetry, with the anode electrode opening being at a location where the magnitude of the axial component of the magnetic field is substantially equal to its maximum value.

    Abstract translation: 用于产生单和/或多电荷离子的源,其基本上由辉光阴极,中间电极和具有公共对称轴线的接触气体放电室的阳极组成,并且每个具有与对称轴同轴的通道开口, 以及产生沿着对称轴具有轴向分量的磁场的系统,其中阳极电极开口位于磁场的轴向分量的大小基本上等于其最大值的位置。

    Cesium injection system for negative ion duoplasmatrons
    7.
    发明授权
    Cesium injection system for negative ion duoplasmatrons 失效
    铯注射系统用于负离子质子母体

    公开(公告)号:US4093858A

    公开(公告)日:1978-06-06

    申请号:US804189

    申请日:1977-06-06

    CPC classification number: H01J27/028 H01J27/10 H01J27/22

    Abstract: Longitudinally extending, foraminous cartridge means having a cylindrical side wall forming one flat, circular, tip end surface and an opposite end; an open-ended cavity, and uniformly spaced orifices for venting the cavity through the side wall in the annulus of a plasma ring for uniformly ejecting cesium for coating the flat, circular, surface. To this end, the cavity is filled with a cesium containing substance and attached to a heater in a hollow-discharge duoplasmatron. By coating the flat circular surface with a uniform monolayer of cesium and locating it in an electrical potential well at the end of a hollow-discharge, ion duoplasmatron source of an annular hydrogen plasma ring, the negative hydrogen production from the duoplasmatron is increased. The negative hydrogen is produced on the flat surface of the cartridge and extracted by the electrical potential well along a trajectory coaxial with the axis of the plasma ring.

    Abstract translation: 纵向延伸,有孔筒意味着具有形成一个平坦的,圆形的顶端表面和相对端的圆柱形侧壁; 开口腔,以及均匀间隔的孔,用于通过等离子体环的环中的侧壁排出空腔,用于均匀地喷射铯以涂覆平坦的圆形表面。 为此,空腔中填充含铯物质,并连接到中空排放二重质量管中的加热器。 通过用均匀的铯单层涂覆平坦的圆形表面,并将其定位在环形氢等离子体环的中空放电,离子二等离子体源的末端的电势井中,来自二重质量子的负氢产生增加。 在墨盒的平坦表面上产生负的氢气,并沿着与等离子体环的轴线同轴的轨迹由电位井提取。

    Ion source device having control means for reducing filament current below its starting value
    9.
    发明授权
    Ion source device having control means for reducing filament current below its starting value 失效
    具有控制装置的离子源设备,用于降低其下面的电流值

    公开(公告)号:US3699381A

    公开(公告)日:1972-10-17

    申请号:US3699381D

    申请日:1971-01-11

    Applicant: HITACHI LTD

    CPC classification number: H01J49/022 H01J27/10 H01J37/08 H01J37/242 Y10S315/05

    Abstract: An ion source device of the Duoplasmatron type has a current reduction resistor in the filament circuit thereof for reducing the filament current during steady state operation thereof, and a relay adapted to normally short-circuit both terminals of the current reduction resistor, which relay is energized by a current flowing through an intermediate electrode circuit so as to open both of these terminals of the resistor thereby making it possible to reduce the steady state filament current.

    Abstract translation: Duoplasmatron型离子源装置在其灯丝电路中具有电流减小电阻器,用于在其稳态操作期间减少灯丝电流,以及继电器,适于正常短路电流还原电阻器的两端,该继电器通电 通过流过中间电极电路的电流,以便打开电阻器的这两个端子,从而可以减小稳态灯丝电流。

Patent Agency Ranking