Abstract:
In addition to the three electrodes of a unipotential lens following a plasma chamber, an ion source for ion beam lithography or ion beam semiconductor or the like has a fourth electrode which is at the same potential as the second electrode and at a potential lower than the potential of the first and third electrodes The result is improved resolution.
Abstract:
An ion source of the side extraction type which includes auxiliary electrodes surrounding the cathode at the ends of the anode, and insulators surrounding the auxiliary electrodes and electrically isolating them from the anode. The auxiliary electrodes essentially define the ends of the discharge chamber, leaving the anode confined to the cylindrical surface surrounding the filament. Each insulator is made up of an inner insulator and an outer insulator with an annular space defined between them. The inner and outer insulators are each in the form of a cylinder with a radially extending flange formed at one end, and interfit with the anode and with each other such that cylindrical spaces are defined between the outer flange portion and the anode and between the inner and outer flange portions. These and other features contribute to improve the electrical isolation between the auxiliary electrode and the anode, prolong source life, and improve beam purity.
Abstract:
A source for generating singly and/or multiply charged ions composed essentially of a glow cathode, an intermediate electrode and an anode electrode having a common axis of symmetry and bordering a gas discharge chamber and each presenting a passage opening coaxial with the axis of symmetry, and a system producing a magnetic field having an axial component along the axis of symmetry, with the anode electrode opening being at a location where the magnitude of the axial component of the magnetic field is substantially equal to its maximum value.
Abstract:
An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder, a gas tube, a gas volume control valve, and a stop valve.
Abstract:
Longitudinally extending, foraminous cartridge means having a cylindrical side wall forming one flat, circular, tip end surface and an opposite end; an open-ended cavity, and uniformly spaced orifices for venting the cavity through the side wall in the annulus of a plasma ring for uniformly ejecting cesium for coating the flat, circular, surface. To this end, the cavity is filled with a cesium containing substance and attached to a heater in a hollow-discharge duoplasmatron. By coating the flat circular surface with a uniform monolayer of cesium and locating it in an electrical potential well at the end of a hollow-discharge, ion duoplasmatron source of an annular hydrogen plasma ring, the negative hydrogen production from the duoplasmatron is increased. The negative hydrogen is produced on the flat surface of the cartridge and extracted by the electrical potential well along a trajectory coaxial with the axis of the plasma ring.
Abstract:
A pulse voltage generating circuit incorporated in an ion source device of the type so as to supply a pulse voltage to an intermediate electrode of the device thereby to allow discharge to occur in said device with high efficiency.
Abstract:
An ion source device of the Duoplasmatron type has a current reduction resistor in the filament circuit thereof for reducing the filament current during steady state operation thereof, and a relay adapted to normally short-circuit both terminals of the current reduction resistor, which relay is energized by a current flowing through an intermediate electrode circuit so as to open both of these terminals of the resistor thereby making it possible to reduce the steady state filament current.