公开(公告)号：US4983864A

公开(公告)日：1991-01-08

申请号：US328854

申请日：1989-03-27

Applicant: Fumio Murai ,  Shinji Okazaki

Inventor： Fumio Murai ,  Shinji Okazaki

IPC: H01L21/027 ,  H01J37/02 ,  H01J37/248

CPC classification number: H01J37/026 ,  H01J37/248

Abstract: An electron beam drawing apparatus having a grounded conductor for a screening operation in the neighborhood of a detection surface of a detector to detect a reflected electrons obtained by irradiating an electron onto a specimen and a secondary electron generated through the electron irradiation. The conductor has openings to pass therethrough the reflected electron and the secondary electron. As a result, the electric charge accumulated on an organic substance fixed onto the front surface of the detector through the electron irradiation is prevented from exerting an influence on the drawing electron beam.

Abstract translation: 一种电子束描绘装置，具有用于在检测器的检测表面附近进行筛选操作的接地导体，以检测通过将电子照射到样本上获得的反射电子和通过电子辐射产生的二次电子。 导体具有通过反射电子和二次电子的开口。 结果，防止了通过电子照射固定在检测器的前表面上的有机物上累积的电荷对绘制电子束的影响。

公开(公告)号：US4968888A

公开(公告)日：1990-11-06

申请号：US375442

申请日：1989-07-05

Applicant: Anthony D. Appelhans ,  David A. Dahl ,  James E. Delmore

Inventor： Anthony D. Appelhans ,  David A. Dahl ,  James E. Delmore

IPC: G01N23/22 ,  G01Q90/00 ,  H01J37/02 ,  H01J49/14

CPC classification number: G01N23/22 ,  H01J37/026 ,  H01J49/14 ,  G01N2223/0816 ,  G01N2223/351

Abstract: An apparatus and method for alternating voltage and for varying the rate of extraction during the extraction of secondary particles, resulting in periods when either positive ions, or negative ions and electrons are extracted at varying rates. Using voltage with alternating charge during successive periods to extract particles from materials which accumulate charge opposite that being extracted causes accumulation of surface charge of opposite sign. Charge accumulation can then be adjusted to a ratio which maintains a balance of positive and negative charge emission, thus maintaining the charge neutrality of the sample.

Abstract translation: 一种用于在二次粒子提取期间交替电压和改变提取速率的装置和方法，导致当以不同的速率提取正离子或负离子和电子的时间段。 在连续的周期内使用交替电荷的电压，从堆积与被提取的电荷相反的材料中提取颗粒会引起相反符号表面电荷的积累。 然后可以将电荷累积调节到保持正和负电荷发射平衡的比例，从而保持样品的电荷中性。

公开(公告)号：US4833330A

公开(公告)日：1989-05-23

申请号：US116039

申请日：1987-11-03

Applicant: Peter R. Swann ,  Joseph S. Jones

Inventor： Peter R. Swann ,  Joseph S. Jones

IPC: H01J37/02

CPC classification number: H01J37/02

Abstract: An improved electron microscope anticontaminator having a conduction rod enclosed within an independent vacuum system and micropositioning capability is described. The micropositioning facility allows the use of unusually small apertures in the cold anticontaminator block with a consequent improvement in efficiency of function. A self-contained contact sensor provides immediate audible warning of contact between a specimen holder and the cold anticontaminator block, permitting the removal of the usual mechanical end-stops for the specimen tilt mechanism and allowing the maximum specimen movement possible at any time. The independent vacuum system in combination with a heater positioned close to the anitcontaminator block allows the microscopist to vent the microscope column without removing the anticontaminator from the microscope. Special anticontaminator blocks incorporating multiple apertures or an X-ray collimator eliminate the need for separate microscope objective aperture or X-ray collimator mechanisms and also ease design constraints imposed by the very limited space around specimens in high resolution microscopes.

Abstract translation: 描述了一种具有封闭在独立真空系统内的导电棒和微定位能力的改进型电子显微镜抗贴片机。 微型定位设备允许在冷抗凝剂块中使用异常小的孔，从而提高功能的效率。 一个独立的接触传感器立即提供了一个样品架和冷的反贴片块之间接触的可听见的警告，允许去除样品倾斜机构的通常的机械端部挡块，并允许在任何时候最大的样品移动。 独立的真空系统与靠近防污剂块的加热器组合使得显微镜可以排出显微镜柱而不从显微镜上移除抗凝剂。 结合多个孔或X射线准直器的特殊抗肿瘤块无需分离的显微镜物镜孔径或X射线准直器机构，并且还可以缓解由高分辨率显微镜中的标本周围非常有限的空间所施加的设计约束。

公开(公告)号：US4818872A

公开(公告)日：1989-04-04

申请号：US49736

申请日：1987-05-11

Applicant: Norman W. Parker ,  William G. Turnbull ,  William P. Robinson

Inventor： Norman W. Parker ,  William G. Turnbull ,  William P. Robinson

IPC: H01J37/05 ,  G01Q10/00 ,  H01J37/02 ,  H01J37/317 ,  H01J49/06 ,  H01J49/26 ,  H01J37/26

CPC classification number: H01J37/026

Abstract: An integrated charge neutralization and imaging system is disclosed. An energy analyzer is mounted directed above a target surface consisting of a 90 degree spherical electrostatic capacitor with variable voltage on both the inner and outer electrodes. Circular apertures are mounted at the entrance and exit of the analyzer to limit the fringing electric fields and define the beam size. An electrostatic lenses is used for focusing the beam from the electron gun into the virtual object plane of the energy analyzer. It is also used to collect secondary electrons or secondary ions leaving the energy analyzer and focused them into the imaging optics. A defector is used for steering the electron beam onto the axis of the lens. This deflector is also used to steer the secondary electrons or secondary ions into the electron/ion detector, or to steer the secondary ions into the SIMS mass filter entrance aperture. An electrons gun is used for providing a beam of electrons which is aimed towards the deflector, and then on through the lens and energy analyzer, finally ending up at the target surface. An imaging system employed by the present invention may include a channel electron multiplier or a secondary ion mass spectrometer system.

Abstract translation: 公开了一种集成电荷中和和成像系统。 能量分析仪被安装在目标表面上方，该目标表面由内外电极上具有可变电压的90度球形静电电容组成。 圆形孔安装在分析仪的入口和出口处，以限制边缘电场并限定光束尺寸。 静电透镜用于将来自电子枪的光束聚焦到能量分析仪的虚拟物体平面中。 它还用于收集离开能量分析仪的二次电子或二次离子，并将它们聚焦到成像光学器件中。 叛逃者用于将电子束转向镜片的轴线。 该偏转器还用于将二次电子或二次离子引导到电子/离子检测器中，或者将二次离子引导到SIMS质量过滤器入口孔中。 电子枪用于提供瞄准偏转器的电子束，然后通过透镜和能量分析仪，最终到达目标表面。 本发明使用的成像系统可以包括通道电子倍增器或二次离子质谱仪系统。

公开(公告)号：US4783597A

公开(公告)日：1988-11-08

申请号：US924370

申请日：1986-10-29

Applicant: Hisanori Misawa ,  Hidetaro Nishimura ,  Takaya Tsujimaru ,  Shuji Kikuchi ,  Nobuyuki Abe ,  Kouichi Mori

Inventor： Hisanori Misawa ,  Hidetaro Nishimura ,  Takaya Tsujimaru ,  Shuji Kikuchi ,  Nobuyuki Abe ,  Kouichi Mori

IPC: H01L21/265 ,  H01J37/02 ,  H01J37/317

CPC classification number: H01J37/026 ,  H01J37/3171

Abstract: An ion implant apparatus which forms ions from an ion source into an ion beam to implant the ions into a target to be ion-implanted through an ion beam introduction tube. The ion implant apparatus comprises: radiation means for radiating an electron beam, the radiating means fixed on the ion beam introduction tube; and a target for being radiated by an electron beam, said target reflecting the electron beam to generate a reflectance beam, the electron beam causing a secondary electron beam to be emitted from the electron beam target, the electron beam target being formed so as to prevent the reflectance beam and the secondary electron beam from being directly radiated on the target to be ion-implanted. The apparatus can keep high energy electrons from the surface of a wafer thereby to prevent the wafer from being charged negatively, and can trap the high energy electrons in the measuring system thereby to decrease errors in measuring a number of dopant atoms.

Abstract translation: 一种离子注入装置，其从离子源形成离子到离子束中，以将离子注入到通过离子束引入管离子注入的靶中。 离子注入装置包括：用于辐射电子束的辐射装置，固定在离子束引入管上的辐射装置; 以及通过电子束照射的目标，所述目标反射电子束以产生反射光束，使得从电子束靶发射二次电子束的电子束，形成电子束靶，以防止 反射光束和二次电子束直接照射在待离子注入的靶上。 该装置可以保持来自晶片表面的高能电子，从而防止晶片被负电荷捕获，并且可以捕获测量系统中的高能电子，从而减少测量多个掺杂原子的误差。

公开(公告)号：US4731540A

公开(公告)日：1988-03-15

申请号：US844303

申请日：1986-03-26

Applicant: Guenther Schmidt

Inventor： Guenther Schmidt

IPC: C23C14/46 ,  H01J37/02 ,  H01J37/30

CPC classification number: C23C14/46 ,  H01J37/026

Abstract: An ion beam processing system for etching or sputtering includes a voltage source for applying an extraction voltage between a beam neutralizing filament and a specimen mount target for improved ion beam neutralization efficiency and reduced contamination.

Abstract translation: 用于蚀刻或溅射的离子束处理系统包括用于在光束中和丝和样品安装靶之间施加提取电压的电压源，用于改善离子束中和效率和减少的污染。

公开(公告)号：US4619030A

公开(公告)日：1986-10-28

申请号：US753336

申请日：1985-07-09

Applicant: Alan D. Marwick ,  Harry C. Sansom, deceased

Inventor： Alan D. Marwick ,  Harry C. Sansom, deceased

IPC: B01J3/00 ,  F28F27/00 ,  H01J37/02 ,  B23Q15/00

CPC classification number: F28F27/00 ,  H01J37/20 ,  H01J2237/2001 ,  Y10S165/904 ,  Y10T29/49758 ,  Y10T29/4976 ,  Y10T29/53039 ,  Y10T29/53061

Abstract: During treatment of a specimen (10) in an evacuated chamber, the temperature of the specimen is controlled by varying the radiant heat flux to and from the specimen. The specimen is supported adjacent to but spaced apart from a heat sink (14) with a blackened surface (16), and between the specimen (10) and the heat sink (14) are one or more reflective elements (20) movable so as to cover a larger or a smaller fraction of the surface of the heat sink.

Abstract translation: 在真空室中的样品（10）处理期间，通过改变来自样品的辐射热通量来控制样品的温度。 试样与具有黑化表面（16）的散热器（14）相邻但间隔开，并且在试样（10）和散热器（14）之间是一个或多个可移动的反射元件（20） 以覆盖散热器表面的较大或较小部分。

公开(公告)号：US4419203A

公开(公告)日：1983-12-06

申请号：US355067

申请日：1982-03-05

Applicant: James M. E. Harper ,  Mordehai Heiblum ,  Harold R. Kaufman

Inventor： James M. E. Harper ,  Mordehai Heiblum ,  Harold R. Kaufman

IPC: B01J19/08 ,  H01J27/02 ,  H01J27/08 ,  H01J37/02 ,  H01J37/08 ,  H01J37/305 ,  H01J37/317 ,  H01L21/203 ,  H01L21/302 ,  H01L21/31 ,  C23C15/00

CPC classification number: H01J27/08 ,  H01J37/026

Abstract: Apparatus is described for neutralizing high intensity ion beams. A technique for neutralizing a positive ion beam from internally plasma produced electrons is provided whereby electrons are added to the positive ion beam by maintaining the voltage between the cathode, anode, and accelerator grid in a predetermined relationship. Other higher energy ion beams are neutralized in another technique by directing the neutralizing beam of charged particles to intersect a sputtering beam.

Abstract translation: 描述了用于中和高强度离子束的装置。 提供了用于中和来自内部等离子体产生的电子的正离子束的技术，其中通过以预定关系维持阴极，阳极和加速器栅之间的电压，将电子加到正离子束上。 其他较高能量的离子束通过引导带电粒子的中和束与溅射束相交而在另一种技术中被中和。

公开(公告)号：US3814356A

公开(公告)日：1974-06-04

申请号：US7771870

申请日：1970-10-02

Applicant: COLEMAN J ,  MC GINNIS J ,  FAIRBANKS J ,  HOFFMAN A ,  NEWTON K ,  SCHULER J ,  MC LAUGHLIN P ,  JOHNSON G

Inventor： COLEMAN J ,  MC GINNIS J ,  FAIRBANKS J ,  HOFFMAN A ,  NEWTON K ,  SCHULER J ,  MC LAUGHLIN P ,  JOHNSON G

IPC: H01J37/02 ,  F16F7/00 ,  F16F9/346

CPC classification number: H01J37/02

Abstract: A vibration eliminating support system for a sensitive instrument. The support system includes a bearing which supports the instrument in pendulum fashion such that external vibrations and movement of the support are transformed to long period swinging motion of the instrument. This prevents relative movement of the parts of the instrument with the result that vibrations and shock have no effect on the accuracy of the instrument. The support system has particular utility for vibration isolation of a rigid column of an electron microscope which is suspended on the bearings for pivotal movement. Advantageously, the bearings are air bearings to maintain friction of the bearing surfaces at an absolute minimum.

Abstract translation: 用于敏感仪器的振动消除支持系统。 支撑系统包括以摆式方式支撑仪器的轴承，使得外部振动和支撑件的运动转变为仪器的长时间摆动运动。 这样可以防止仪器部件的相对移动，从而振动和冲击对仪器的精度无影响。 该支撑系统特别适用于悬挂在轴承上的电子显微镜的刚性柱的振动隔离用于枢转运动。 有利的是，轴承是空气轴承，以保持轴承表面的摩擦绝对最小。

公开(公告)号：US3622741A

公开(公告)日：1971-11-23

申请号：US3622741D

申请日：1970-08-05

Applicant: STEIGERWALD KARL HEINZ

Inventor： STEIGERWALD KARL-HEINZ

IPC: H01J29/84 ,  H01J37/02 ,  B23K15/00 ,  H01J37/26

CPC classification number: H01J37/02 ,  H01J29/84

Abstract: Apparatus in electron-beam-processing machines for keeping the path of the working beam free of impurities, the apparatus having a screening device associated with the working beam for catching impurities, comprising an ionization device acting in the region of the working beam path, and a deflecting device effective in the region of the said beam path to produce a deflecting field for electrically charged particles, the ionization device being so formed that it acts with an ionization probability greater than that of the working beam on atom-sized or larger particles, the deflecting device exerting a sufficient deflecting action on such electrically charged particles, which move at substantially thermal speeds as to remove these particles from the path of the working beam.