公开(公告)号：US20240331968A1

公开(公告)日：2024-10-03

申请号：US18742934

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Albertus Victor Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/1471 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/24578

Abstract: A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array, and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array. The charged-particle-optical lens compensates for variations in distance between the emitter and the aperture array.

公开(公告)号：US12106933B2

公开(公告)日：2024-10-01

申请号：US17694549

申请日：2022-03-14

Applicant: FEI Company

Inventor： Jan Stopka ,  Bohuslav Sed'a

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/153 ,  H01J2237/0453 ,  H01J2237/1532

Abstract: An example multi-beam scanning electron microscope (MB-SEM) for correcting both astigmatism and linear distortion at least includes an electron source coupled to provide an electron beam, an aperture plate comprising an array of apertures, the aperture plate arranged to form an array of electron beamlets from the electron beam, and an electron column including a plurality of lenses and first and second stigmators, the electron column coupled to direct the array of electron beamlets toward a sample, wherein the first and second stigmators are arranged and excited to correct both astigmatism and linear distortion.

公开(公告)号：US20240302542A1

公开(公告)日：2024-09-12

申请号：US18600229

申请日：2024-03-08

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Erik Essers ,  Dirk Preikszas

IPC: G01T1/20 ,  H01J37/10

CPC classification number: G01T1/2018 ,  G01T1/2002 ,  H01J37/10

Abstract: A particle beam microscope comprises: a particle beam source for generating a particle beam; an objective lens for focusing the particle beam in an object plane; a first scintillator for converting electrons into light; a second scintillator for generating light by way of electrons; and light detectors for detecting the generated light. The distance of second scintillator from the object plane is greater than the distance of the first scintillator from the object plane. The second scintillator has a surface which faces the object plane and through which electrons arriving from the object plane pass. The electrons are converted into light by the second scintillator. The light generated by the first scintillator and detected by a light detector is incident on the second scintillator.

公开(公告)号：US12080515B2

公开(公告)日：2024-09-03

申请号：US17718225

申请日：2022-04-11

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1474 ,  H01J2237/0492 ,  H01J2237/083 ,  H01J2237/1501 ,  H01J2237/2806

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：US11955310B2

公开(公告)日：2024-04-09

申请号：US17214719

申请日：2021-03-26

Applicant: FEI Company

Inventor： Peter Christiaan Tiemeijer

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/265 ,  H01J2237/24485 ,  H01J2237/2802 ,  H01J2237/31749

Abstract: The invention relates to a transmission charged particle microscope comprising a charged particle beam source for emitting a charged particle beam, a sample holder for holding a sample, an illuminator for directing the charged particle beam emitted from the charged particle beam source onto the sample, and a control unit for controlling operations of the transmission charged particle microscope. As defined herein, the transmission charged particle microscope is arranged for operating in at least two modes that substantially yield a first magnification whilst keeping said diffraction pattern substantially in focus. Said at least two modes comprise a first mode having first settings of a final projector lens of a projecting system; and a second mode having second settings of said final projector lens.

公开(公告)号：US11810749B2

公开(公告)日：2023-11-07

申请号：US17542773

申请日：2021-12-06

Applicant: Carl Zeiss SMT GmbH

Inventor： Eugen Foca ,  Amir Avishai ,  Thomas Korb ,  Daniel Fischer

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/265 ,  H01J37/28

Abstract: The present invention relates to a charged particle beam system comprising a deflection subsystem configured to deflect a charged particle beam in a deflection direction based on a sum of analog signals generated by separate digital to analog conversion of a first digital signal and a second digital signal. The present invention further relates to a method of configuring the charged particle beam system so that each of a plurality of regions of interest can be scanned by varying only the first digital signal while the second digital signal is held constant at a value associated with the respective region of interest. The present invention further relates to a method of recording a plurality of images of the regions of interest at the premise of reduced interference due to charge accumulation.

公开(公告)号：US11784023B2

公开(公告)日：2023-10-10

申请号：US17462455

申请日：2021-08-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira Ikegami ,  Yasushi Ebizuka ,  Nobuo Fujinaga

IPC: H01J37/10 ,  H01J37/153 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/1472 ,  H01J2237/0473 ,  H01J2237/1534

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US11657999B2

公开(公告)日：2023-05-23

申请号：US17353333

申请日：2021-06-21

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01J37/05

CPC classification number: H01J37/10 ,  H01J37/05 ,  H01J37/244 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/0453 ,  H01J2237/24465 ,  H01J2237/24485 ,  H01J2237/24507 ,  H01J2237/24564 ,  H01J2237/24585 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/2857

Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

公开(公告)号：US20180358199A1

公开(公告)日：2018-12-13

申请号：US15780064

申请日：2016-11-29

Applicant: Matsusada Precision, Inc.

Inventor： Kazuya Kumamoto ,  Sadayoshi Matsuda

IPC: H01J37/10 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/10 ,  H01J37/141 ,  H01J37/22 ,  H01J37/228 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: A charged particle beam device includes: a charged particle source configured to emit a charged particle beam; an acceleration electric power source connected to the charged particle source and configured to accelerate the charged particle beam; a second objective lens configured to focus the charged particle beam onto a sample; and a second detector. The second objective lens is positioned on the opposite side of the sample from where the charged particle beam is incident on the sample. The second detector is configured to receive at least one of: an electromagnetic wave that the sample emits upon receiving the charged particle beam, and an electromagnetic wave that the sample reflects upon receiving the charged particle beam. The second detector carries out a detection of the received electromagnetic wave(s).

公开(公告)号：US20180350555A1

公开(公告)日：2018-12-06

申请号：US15925606

申请日：2018-03-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/244 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.