Method of forming an electrical circuit with overlaying integration layer
    105.
    发明授权
    Method of forming an electrical circuit with overlaying integration layer 有权
    形成具有覆盖积分层的电路的方法

    公开(公告)号:US07657999B2

    公开(公告)日:2010-02-09

    申请号:US11868640

    申请日:2007-10-08

    Abstract: In a method of forming an electrical circuit assembly, a substrate is provided including a plurality of first segments that form an electrical circuit. The first segments have surfaces that rise above surfaces of other segments that form the electrical circuit. All of the segments are deposited on the substrate via one or more shadow mask vapor deposition processes in a vacuum. A photoresist caused to cover all of the segments is hardened and then abraded until surfaces of the first segments are exposed, but surfaces of the other segments are not exposed, and a surface of the abraded photoresist is at the same level as the exposed surfaces of the first segments. Second segments can be deposited on the exposed surfaces of the first segments via a shadow mask vapor deposition process in a vacuum to a level above the top surface of the abraded photoresist.

    Abstract translation: 在形成电路组件的方法中,提供了包括形成电路的多个第一段的衬底。 第一段具有在形成电路的其他段的表面上方的表面。 所有的片段通过真空中的一个或多个荫罩气相沉积工艺沉积在衬底上。 导致覆盖所有片段的光致抗蚀剂被硬化,然后磨损直到第一片段的表面露出,但是其它片段的表面不被暴露,并且磨损的光致抗蚀剂的表面处于与暴露的表面相同的水平 第一段。 第二段可以通过在真空中的荫罩气相沉积工艺在第一段的暴露表面上沉积到磨损光致抗蚀剂的顶表面上方的水平。

    FABRICATING PROCESS FOR SUBSTRATE WITH EMBEDDED PASSIVE COMPONENT
    106.
    发明申请
    FABRICATING PROCESS FOR SUBSTRATE WITH EMBEDDED PASSIVE COMPONENT 有权
    具有嵌入式被动元件的基板的制造工艺

    公开(公告)号:US20090280617A1

    公开(公告)日:2009-11-12

    申请号:US12358852

    申请日:2009-01-23

    Inventor: Shih-Lian Cheng

    Abstract: A fabricating process for a substrate with an embedded passive component is provided. The fabricating process includes the following steps. First, a substrate including a top conductive layer, a bottom conductive layer, and at least a dielectric layer is provided. The top conductive layer and the bottom conductive layer are separately disposed on a top surface and a bottom surface of the dielectric layer. Next, a plurality of plating through holes is formed in the substrate. Then, the top and the bottom conductive layers are patterned to form a patterned top conductive layer and a patterned bottom conductive layer separately, and the dielectric layer is exposed in part. The patterned top conductive layer and the patterned bottom conductive layer have many traces and many trenches formed by the traces. Thereafter, the trenches are filled with a material, wherein the traces and the material are adapted for forming the passive component.

    Abstract translation: 提供了一种具有嵌入式无源元件的基板的制造工艺。 制造过程包括以下步骤。 首先,提供包括顶部导电层,底部导电层和至少介电层的基板。 顶导电层和底导电层分别设置在电介质层的顶表面和底表面上。 接下来,在基板上形成多个电镀通孔。 然后,对顶部和底部导电层进行图案化以分别形成图案化的顶部导电层和图案化的底部导电层,并且介电层部分暴露。 图案化的顶部导电层和图案化的底部导电层具有许多迹线和由迹线形成的许多沟槽。 此后,沟槽填充有材料,其中迹线和材料适于形成无源部件。

    Controlling Impedance and Thickness Variations for Multilayer Electronic Structures
    108.
    发明申请
    Controlling Impedance and Thickness Variations for Multilayer Electronic Structures 有权
    控制多层电子结构的阻抗和厚度变化

    公开(公告)号:US20090258194A1

    公开(公告)日:2009-10-15

    申请号:US12101449

    申请日:2008-04-11

    Abstract: Impedance control, and the uniformity of electrical and mechanical characteristics in electronic packaging are becoming more important as chip and bus speeds increase and manufacturing processes evolve. Current state of the art design and manufacture processes inherently introduce physical dielectric thickness variations into PCB cross sections. These thickness variations between the ground reference plane(s) and the signal layer(s) inject undesirable characteristic impedance variations and undesirable mechanical variations in thickness and surface topology. Therefore a multilayer electronic structure and a method of manufacture is presented.

    Abstract translation: 阻抗控制以及电子封装中电气和机械特性的均匀性越来越重要,因为芯片和总线速度的增加和制造过程的演变。 当前的现有技术设计和制造工艺本身将物理电介质厚度变化引入PCB横截面。 接地参考平面与信号层之间的这些厚度变化引起了不需要的特性阻抗变化和厚度和表面拓扑结构中不期望的机械变化。 因此,提出了一种多层电子结构和制造方法。

    Controlling Impedance and Thickness Variations for Multilayer Electronic Structures
    109.
    发明申请
    Controlling Impedance and Thickness Variations for Multilayer Electronic Structures 失效
    控制多层电子结构的阻抗和厚度变化

    公开(公告)号:US20090255715A1

    公开(公告)日:2009-10-15

    申请号:US12101441

    申请日:2008-04-11

    Abstract: Impedance control, and the uniformity of electrical and mechanical characteristics in electronic packaging are becoming more important as chip and bus speeds increase and manufacturing processes evolve. Current state of the art design and manufacture processes inherently introduce physical dielectric thickness variations into multilayer cross sections. These thickness variations between the ground reference plane(s) and the signal layer(s) inject undesirable characteristic impedance variations and undesirable mechanical variations in thickness and surface topology. Therefore a multilayer structure and a method of manufacture are presented.

    Abstract translation: 阻抗控制以及电子封装中电气和机械特性的均匀性越来越重要,因为芯片和总线速度的增加和制造过程的演变。 现有技术的设计和制造工艺现在将物理电介质厚度变化引入到多层横截面中。 接地参考平面与信号层之间的这些厚度变化引起了不需要的特性阻抗变化和厚度和表面拓扑结构中不期望的机械变化。 因此,提出了多层结构和制造方法。

Patent Agency Ranking