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    Depositing method and a surface modifying method for nano-particles in a gas stream
    111.
    发明授权
    Depositing method and a surface modifying method for nano-particles in a gas stream 有权
    在气流中的纳米颗粒的沉积方法和表面改性方法

    公开(公告)号：US06562417B2

    公开(公告)日：2003-05-13

    申请号：US10180054

    申请日：2002-06-27

    Applicant: Nobuyasu Suzuki ,  Toshiharu Makino ,  Yuka Yamada ,  Takehito Yoshida

    Inventor： Nobuyasu Suzuki ,  Toshiharu Makino ,  Yuka Yamada ,  Takehito Yoshida

    IPC: B05D306

    CPC classification number: C23C14/5813 ,  B05D1/12 ,  B05D3/061 ,  C23C4/12 ,  C23C14/5846

    Abstract: A method of depositing nano-particles in a gas stream for efficiently depositing nano-particles by irradiating an electron beam on charged nano-particles in the stream of a first gas species containing the nano-particles, as well as a method of modifying the surface of the nano-particles in a gas stream by mixing them with the first gas species in a gas mixing chamber thereby activating the second gas species, intended for providing a method of depositing nano-particles and a method of modifying the surface thereof in a gas stream, capable of efficiently depositing the nano-particles in a charged state in a gas stream and modifying the surface of the nano-particles which are extremely sensitive to defects and impurities caused by large exposure ratio of surface atoms in a gas stream at a good controllability.

    Abstract translation: 一种通过在含有纳米颗粒的第一气体物流中的电荷束照射电子束以有效地沉积纳米颗粒的气流中沉积纳米颗粒的方法，以及改变表面的方法 通过将其与气体混合室中的第一气体物质混合，从而激活第二气体物质，旨在提供沉积纳米颗粒的方法和在气体中改性其表面的方法，将气体流中的纳米颗粒 流，能够在气流中有效地将纳米颗粒沉积为带电状态，并且改变对由良好的气流中的表面原子的大的暴露比导致的缺陷和杂质极度敏感的纳米颗粒的表面 可控性。

    Surface treatment method and material treated by the method
    113.
    发明申请
    Surface treatment method and material treated by the method 失效
    表面处理方法和材料处理方法

    公开(公告)号：US20020187279A1

    公开(公告)日：2002-12-12

    申请号：US10128501

    申请日：2002-04-24

    Inventor： Jun Koide

    IPC: B05D003/06

    CPC classification number: C08J7/12 ,  B05D3/061 ,  B05D2201/02

    Abstract: In a surface treatment method of treating the surface of a material to be treated, by irradiating with light the material to be treated and a mediating material in contact with each other, the mediating material itself causes substantially no interaction upon irradiation with light. The surface of the material to be treated is treated by provision of a chemical reaction field, in which a substituent of the material to be treated and an atom of atomic group of the mediating material is induced by excitation, by irradiating with light by using the logical product of the contact interface between the material to be treated and the mediating material and the light irradiation region, thereby causing and progressing bonded state transition.

    Abstract translation: 在处理待处理材料的表面的表面处理方法中，通过用光照射待处理材料和彼此接触的介质材料，介质材料本身在照射光时基本上不引起相互作用。 待处理材料的表面通过提供化学反应场来处理，其中待处理材料的取代基和介质材料的原子团的原子被激发诱导，通过使用 要处理的材料与介质材料和光照射区域之间的接触界面的逻辑积，从而引起和进行粘结状态转变。

    Deposition systems and processes for transport polymerization and chemical vapor deposition
    114.
    发明授权
    Deposition systems and processes for transport polymerization and chemical vapor deposition 失效
    用于运输聚合和化学气相沉积的沉积系统和方法

    公开(公告)号：US6086679A

    公开(公告)日：2000-07-11

    申请号：US958352

    申请日：1997-10-24

    Applicant: Chung J. Lee ,  Hui Wang ,  Giovanni Antonio Foggiato

    Inventor： Chung J. Lee ,  Hui Wang ,  Giovanni Antonio Foggiato

    IPC: C23C16/448 ,  B05D3/06 ,  B05D7/24 ,  C23C16/26 ,  C23C16/40 ,  C23C16/44 ,  C23C16/507 ,  H01L21/31 ,  H01L21/312 ,  C23C16/00

    CPC classification number: B05D1/60 ,  C23C16/26 ,  C23C16/401 ,  C23C16/4412 ,  C23C16/507 ,  H01L21/312 ,  B05D3/061

    Abstract: The described deposition systems are designed to accommodate new precursors and chemical processes used for transport polymerization and chemical vapor deposition. The systems consist primarily of a reactor, a liquid injector or gas mass flow controller, a cracker and a deposition chamber under sub-atmospheres pressure. The cracker utilizes one or more types of energy, including heat, photons, and plasmas. This invention is especially useful for preparing F-PPX (fluorinated poly(para-xylylenes) and other fluorinated polymer thin films for intermetal dielectric (IMD) and interlevel dielectric (ILD) applications in the manufacture of integrated circuits with features

    Abstract translation: 所描述的沉积系统被设计成适应用于运输聚合和化学气相沉积的新的前体和化学方法。 该系统主要由反应器，液体喷射器或气体质量流量控制器，裂化器和在亚压力下的沉积室组成。 裂解器利用一种或多种类型的能量，包括热，光子和等离子体。 本发明特别可用于制备具有<0.25μm特征的集成电路的制备中的金属间电介质（IMD）和层间电介质（ILD）应用的F-PPX（氟化聚（对 - 二甲苯））和其它氟化聚合物薄膜 尺寸。

    Method for formation of coating film
    115.
    发明授权
    Method for formation of coating film 失效
    涂膜形成方法

    公开(公告)号：US5932297A

    公开(公告)日：1999-08-03

    申请号：US875727

    申请日：1997-08-04

    Applicant: Tadayoshi Tatsuno ,  Toru Hayase

    Inventor： Tadayoshi Tatsuno ,  Toru Hayase

    IPC: B05D1/02 ,  B05D3/02 ,  B05D3/06

    CPC classification number: B05D3/0209 ,  B05D1/02 ,  B05D3/06 ,  B05D3/061 ,  B05D3/068

    Abstract: The present invention provides a method for forming a coating film, which comprises ejecting a curable coating composition from a spray gun, spray-coating the ejected composition while applying thereto an active energy beam, and heat-curing the resulting coating film, wherein the curable coating composition contains an epoxy group-containing resin (A) and a photo-induced cationic polymerization initiator (B).

    Abstract translation: PCT No.PCT / JP96 / 03521 Sec。 371日期：1997年8月4日 102（e）日期1997年8月4日PCT 1996年12月2日PCT公布。 出版物WO97 / 20642 日期：1997年6月12日本发明提供了一种形成涂膜的方法，其包括从喷枪喷射可固化涂料组合物，将喷射的组合物喷涂到其上施加活性能量束，并将所得涂层 膜，其中可固化涂料组合物含有含环氧基的树脂（A）和光诱导的阳离子聚合引发剂（B）。

    Light curing apparatus for a continuous linear product
    116.
    发明授权
    Light curing apparatus for a continuous linear product 失效
    用于连续线性产品的光固化设备

    公开(公告)号：US5115761A

    公开(公告)日：1992-05-26

    申请号：US594346

    申请日：1990-10-09

    Applicant: Randy Hood

    Inventor： Randy Hood

    IPC: B05C9/14 ,  B05D3/06 ,  B29C35/08 ,  B29C35/10 ,  C03C17/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00

    CPC classification number: C03C17/00 ,  B05C9/14 ,  B05D3/061 ,  B29C35/10 ,  C03C25/12 ,  F26B13/002 ,  F26B3/283 ,  B29C2035/0827 ,  Y10S118/22

    Abstract: An apparatus for light curing of an adhesive resin coating on a continuous string-like linear product is shown. It consists of an elongated chamber having a light reflective inner side wall and removable end caps. The product coated with the adhesive resin is passed through the chamber through transverse slots formed in the end caps. The ultraviolet curing light is injected into the chamber by a light guide inserted through the peripheral side wall. Nitrogen gas may be also passed through the chamber to enhance the curing process of the resin.

    Abstract translation: 示出了在连续的线状线性产品上的粘合树脂涂层的光固化装置。 它由细长的室组成，其具有光反射内侧壁和可移除的端盖。 涂有粘合剂树脂的产品通过形成在端盖中的横向槽穿过室。 紫外线固化光通过插入通过周边侧壁的导光体注入到腔室中。 氮气也可以通过室以增强树脂的固化过程。

    Apparatus for the preparation of a functional deposited film by means of photochemical vapor deposition process
    117.
    发明授权
    Apparatus for the preparation of a functional deposited film by means of photochemical vapor deposition process 失效
    用于通过光化学气相沉积工艺制备功能沉积膜的装置

    公开(公告)号：US5112647A

    公开(公告)日：1992-05-12

    申请号：US481690

    申请日：1990-02-20

    Applicant: Akiharu Takabayashi

    Inventor： Akiharu Takabayashi

    IPC: C23C16/24 ,  B05D3/06 ,  B05D7/24 ,  C09D4/00 ,  C23C16/30 ,  C23C16/48 ,  G03F7/20 ,  H01L21/205 ,  H01L21/263

    CPC classification number: B05D1/60 ,  C09D4/00 ,  C23C16/482 ,  C23C16/483 ,  G03F7/2041 ,  B05D2518/10 ,  B05D3/06 ,  B05D3/061

    Abstract: An improvement in the photochemical vapor deposition apparatus for the preparation of a functional deposited film on a substrate by exciting and decomposing, or polymerizing a raw material as by way of a photochemical reaction, which comprises a reaction chamber with a raw material gas introducing means and an exhaust means, a radiant light transmissive window and a means to supply a light energy through the light transmissive window to the raw material gas introduced into the reaction space of the reaction chamber. The improvement comprises providing the above apparatus with a means to irradiate an infrared energy ray containing a wavelength having a vibrational absorption power for the raw material gas molecule concurrently with the irradiation of light energy.The improved photochemical vapor deposition apparatus enables one to stably and repeatedly prepare a desired functional deposited film of high quality and having a wealth of practically applicable characeristics at an improved film deposition rate without foreign matter resulting from the raw material gas being deposited on the inner face of the light transmissive window.

    Abstract translation: 用于通过激发和分解或通过光化学反应聚合原料的基板上的功能沉积膜的制备的光化学气相沉积装置的改进，其包括具有原料气体引入装置的反应室和 排气装置，辐射光透射窗和通过透光窗口将光能提供给引入反应室的反应空间的原料气体的装置。 改进之处在于提供上述装置，与光能的照射同时照射含有原料气体分子的具有振动吸收能力的波长的红外能量射线的装置。 改进的光化学气相沉积装置使得能够以改善的膜沉积速率稳定且重复地制备所需的高质量的功能性沉积膜，并且具有丰富的实际应用特性，而不会由于原料气体沉积在内表面而产生异物 的透光窗口。

    Method for providing adhesion to a metal surface
    118.
    发明授权
    Method for providing adhesion to a metal surface 失效
    提供对金属表面的附着力的方法

    公开(公告)号：US5089063A

    公开(公告)日：1992-02-18

    申请号：US461922

    申请日：1990-01-08

    Applicant: Larry A. Harrah ,  Ronald E. Allred ,  Kennard V. Wilson, Jr.

    Inventor： Larry A. Harrah ,  Ronald E. Allred ,  Kennard V. Wilson, Jr.

    IPC: B05D3/02 ,  B05D3/04 ,  B05D3/06 ,  B05D3/10 ,  C09J5/02 ,  C23C26/00

    CPC classification number: B05D3/044 ,  B05D3/10 ,  C09J5/02 ,  C23C26/00 ,  B05D2202/00 ,  B05D3/0254 ,  B05D3/061 ,  C09J2400/166

    Abstract: A process for treating metal surfaces to obtain improved susceptibility to bonding with adhesive compositions is disclosed. A metal surface is oxidized with a halogen to form a monolayer of halide ions on the surface. The halide ions are then exchanged with azide ions to form an azide monolayer on the metal surface. Upon contact of the treated surface with an adhesive composition, the azide layer may be thermally or photochemically decomposed to form active nitrene species, which react to bond the adhesive composition to the metal surface.

    Abstract translation: 公开了一种用于处理金属表面以获得改善的粘合剂组合物敏感性的方法。 金属表面被卤素氧化以在表面上形成单层的卤离子。 然后将卤离子与叠氮化物离子交换以在金属表面上形成叠氮化物单层。 当处理过的表面与粘合剂组合物接触时，叠氮化物层可以被热或光化学分解形成活性的腈类物质，它们将粘合剂组合物与金属表面反应。

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