Abstract:
A method for producing an optical fiber preform according to the present invention includes a collapse step of collapsing a silica-based glass tube by heating with a heat source continuously traversed in the longitudinal direction of the glass tube to form a first glass rod to be formed into a core part or part of a core part of an optical fiber, the glass tube having an inner surface doped with an alkali metal, in which the glass tube has a maximum alkali metal concentration of 500 to 20,000 atomic ppm, a maximum chlorine concentration of 0 to 1000 atomic ppm, and a maximum fluorine concentration of 0 to 10,000 atomic ppm, and in which in the collapse step, the maximum temperature of the outer surface of the glass tube is 2000° C. to 2250° C., and the traverse speed of the heat source is 30 mm/min to 100 mm/min.
Abstract:
A method for manufacturing at least one lens of synthetic quartz glass with increased H2 content for an optical system with an operating wavelength of less than 250 nm. The method involves: (1) providing at least one precursor product of synthetic quartz glass with a first H2 content, the precursor product having a circumferential border surface and two mutually opposed base surfaces, wherein at least one partial surface of at least one of the base surfaces has a curvature; (2) determining at least one target value for at least one treatment parameter for treating the precursor product in an H2-containing inert gas atmosphere; (3) treating the precursor product in the H2-containing atmosphere in accordance with the target value of the treatment parameter, thereby producing at least one precursor product of synthetic quartz glass with a second H2 content that is greater than the first H2 content; and (4) working at least part of at least one of the base surfaces of the treated precursor product, thereby producing at least one final lens shape.
Abstract:
First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
Abstract:
Methods for producing glass powders are provided. The methods include generating an aerosol stream comprising droplets that include a liquid and a glass precursor. Glass particles are formed in the aerosol stream having a small average particle size. The powders can also have a small particle size, narrow size distribution, a high density and a spherical morphology. The invention also includes devices and products formed from the glass powders.
Abstract:
A fused silica glass having a refractive index homogeneity of less or equal to about 5 ppm over an aperture area of at least about 50 cm2. The fused silica glass is also substantially free of halogens and has an adsorption edge of less than about 160 nm. The glass is dried by exposing a silica soot blank to carbon monoxide before consolidation, reducing the combined concentration of hydroxyl (i.e., OH, where H is protium (11H) and deuteroxyl (OD), where D is deuterium (12H)) of less than about 20 ppm by weight in one embodiment, less than about 5 ppm by weight in another embodiment, and less than about 1 ppm by weight in a third embodiment.
Abstract:
The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.
Abstract:
What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.
Abstract:
An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiments of the present invention has low polarization-induced birefringence, low LIWFD and low induced absorption at 193 nm.
Abstract:
Disclosed are methods for hydrogen loading silica glass and silica glass comprising loaded H2. The methods can lead to H2 gradient in the glass material. Alternatively, the method may involve the use of varying H2 partial pressure of H2 in the atmosphere. Both can result in expedited hydrogen loading process.
Abstract translation:公开了用于氢气加载石英玻璃和包含加载H 2 N 2的二氧化硅玻璃的方法。 这些方法可导致玻璃材料中的H 2 2梯度。 或者,该方法可以涉及在气氛中使用H 2 H 2 H 2 H 2分压的变化。 两者都可以产生加速氢气加载过程。
Abstract:
A method of manufacturing a glassy optical preform is disclosed that includes providing a preform having a silica soot layer and then sintering the soot layer into a glassy layer, and water is selectively added to the preform by exposing the soot layer to a gaseous water-containing atmosphere during the sintering step. The preform is controllably doped with water.