公开(公告)号：US07981824B2

公开(公告)日：2011-07-19

申请号：US11597087

申请日：2005-05-11

Applicant: Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

Inventor： Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00 ,  C03B23/00 ,  C03B7/14

CPC classification number: C03B19/1469 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

Abstract: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (

Abstract translation: 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料，该坯料由掺杂有钛和/或氟的高纯石英玻璃组成，其特征在于极高的均匀性 。 均匀性涉及以下特征：a）相对于TiO 2含量的平均值，TiO 2分布的局部方差（<0.05％TiO 2，相对于（5μm）的体积元素平均）引起的微不均匀性） ，b）主要功能方向（<5ppb / K）的热膨胀系数＆Dgr;α的绝对最大不均匀性，c）不大于石英玻璃坯料的可用表面的热膨胀系数的径向变化 超过0.4ppb /（K.cm）; d）具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射（SDB） 和e）根据（b）在光学表面上平均的＆Dgr;α的具体进展。 所述石英玻璃坯料只能通过将含有硅，钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料，其中使用几个成形步骤 并均质化。

公开(公告)号：US20110120190A1

公开(公告)日：2011-05-26

申请号：US13023262

申请日：2011-02-08

Applicant: Tatsuhiro Sato

Inventor： Tatsuhiro Sato

IPC: C03B20/00 ,  C03B19/01

CPC classification number: C03C1/00 ,  C03B19/063 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/36 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/36

Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.

Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英粉，或是玻璃状SiO 2粉末的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。

公开(公告)号：US20100323873A1

公开(公告)日：2010-12-23

申请号：US12870156

申请日：2010-08-27

Applicant: Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/04

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ΔT, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.

Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其在高EUV能量光照射时的线性热膨胀系数基本为零，这适合作为EUVL用曝光工具的光学部件。 本发明涉及卤素含量为100ppm以上的含TiO 2的二氧化硅玻璃， 假想温度为1100℃或更低; 20〜100℃范围内的平均线性热膨胀系数为30ppb /℃以下; 5℃以上的线性热膨胀系数为0±5ppb /℃的温度宽度＆amp; T; T; 以及线性热膨胀系数为0ppb /℃的温度在30〜150℃的范围内。

公开(公告)号：US20100234205A1

公开(公告)日：2010-09-16

申请号：US12659595

申请日：2010-03-15

Applicant: Yoshiaki Ikuta ,  Yasutomi Iwahashi ,  Kenji Okamura

Inventor： Yoshiaki Ikuta ,  Yasutomi Iwahashi ,  Kenji Okamura

IPC: C03C3/04

CPC classification number: B29C33/38 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42 ,  G03F7/0002

Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.

Abstract translation: 本发明的目的是提供一种含TiO 2的石英玻璃基板，其用作纳米压印光刻用的模具基底时，可以形成尺寸变化在±10％以内的凹凸图案。 本发明涉及一种含TiO 2的石英玻璃基板，其中15至35℃范围内的热膨胀系数在±200ppb /℃以内。 TiO 2浓度为4〜9重量％。 并且在要形成转印图案的一侧的基板表面中的TiO 2浓度分布在±1重量％以内。

公开(公告)号：US20090148627A1

公开(公告)日：2009-06-11

申请号：US12370693

申请日：2009-02-13

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Ulrich Wilhelm Heinz Neukirch

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Ulrich Wilhelm Heinz Neukirch

IPC: B05D1/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/22 ,  C03C2201/23

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制造掺杂OD的合成二氧化硅玻璃，包含这种玻璃的光学构件以及包括这种光学构件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。

公开(公告)号：US20080053150A1

公开(公告)日：2008-03-06

申请号：US11891984

申请日：2007-08-14

Applicant: Lisa Anne Moore ,  Charlene Marie Smith

Inventor： Lisa Anne Moore ,  Charlene Marie Smith

IPC: C03B19/00 ,  C03C3/04

CPC classification number: C03B19/1461 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/061 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/40 ,  C03C2201/50 ,  Y02P40/57

Abstract: An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiments of the present invention has low polarization-induced birefringence, low LIWFD and low induced absorption at 193 nm.

Abstract translation: F掺杂石英玻璃，制造玻璃的方法，包括玻璃的光学构件和包括这种光学构件的光学系统。 玻璃材料包含0.1-5000ppm重量的氟。 根据本发明的某些实施方案的玻璃材料在193nm处具有低偏振诱发双折射，低LIWFD和低诱导吸收。

公开(公告)号：US20080032213A1

公开(公告)日：2008-02-07

申请号：US11836304

申请日：2007-08-09

Applicant: Shinya KIKUGAWA ,  Akira Takada ,  Satoru Takaki ,  Yosuke Sato ,  Yasuhiko Akao

Inventor： Shinya KIKUGAWA ,  Akira Takada ,  Satoru Takaki ,  Yosuke Sato ,  Yasuhiko Akao

IPC: G03F1/00

CPC classification number: C03C3/06 ,  C03C17/09 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2217/26 ,  C03C2218/154 ,  G03F1/60

Abstract: The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the mask blank has a birefringence, as measured at a wavelength of 193 nm, of 1 nm or less per substrate thickness. According to the present invention, mask blanks suitable for use in the immersion exposure technique and the polarized illumination technique are provided.

Abstract translation: 本发明提供一种掩模板，其包括由合成石英玻璃制成的基板和层叠在基板的表面上的遮光膜，并且用于使用200nm或更短的曝光光波长的半导体器件制造技术 其中掩模坯料在193nm波长下测得的每个基片厚度为1nm或更小的双折射。 根据本发明，提供适用于浸渍曝光技术和偏振照明技术的掩模坯料。

公开(公告)号：US20070042893A1

公开(公告)日：2007-02-22

申请号：US11589875

申请日：2006-10-31

Applicant: Akio Koike ,  Yasutomi Iwahashi ,  Yasuyuki Takimoto ,  Shinya Kikugawa

Inventor： Akio Koike ,  Yasutomi Iwahashi ,  Yasuyuki Takimoto ,  Shinya Kikugawa

IPC: C03C3/06 ,  C03B19/00 ,  C03B23/00 ,  C03B32/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

Abstract: It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.

Abstract translation: 提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。 含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti 3 +浓度为70质量ppm以下，其特征在于，假想温度为1200℃以下，0〜100℃的热膨胀系数为0±150ppb /℃。 并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。 一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。

公开(公告)号：US20060183622A1

公开(公告)日：2006-08-17

申请号：US10548237

申请日：2004-03-03

Applicant: Hiroyuki Nishimura ,  Akira Fujinoki

Inventor： Hiroyuki Nishimura ,  Akira Fujinoki

IPC: C03C3/06 ,  C03B37/07 ,  C03B37/075 ,  C03B37/018

CPC classification number: C03B32/00 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  Y02P40/57

Abstract: The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

Abstract translation: 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

公开(公告)号：US06990836B2

公开(公告)日：2006-01-31

申请号：US09789744

申请日：2001-02-22

Applicant: Shigeru Maida ,  Motoyuki Yamada ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Koji Matsuo

Inventor： Shigeru Maida ,  Motoyuki Yamada ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Koji Matsuo

IPC: C03B20/00

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2203/40 ,  C03C2203/46 ,  C03C2203/54 ,  Y02P40/57

Abstract: Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.

Abstract translation: 合成石英玻璃是通过将来自燃烧器的二氧化硅形成原料气体，氢气，氧气和氟化合物气体从反应区域供给到反应区域而进行的，在反应区域中对二氧化硅形成原料气体进行火焰水解而形成微粒子 的含氟二氧化硅，将二氧化硅微粒沉积在反应区中的可旋转基板上，以产生含氟多孔二氧化硅基质，并在含氟化合物气体的气氛中对多孔二氧化硅基质进行玻璃化。 该方法使得能够低成本地制造与迄今为止已经实现的在真空紫外区域中对于光的透射率更高且更均匀的合成石英玻璃。