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公开(公告)号：US06223755B1
公开(公告)日：2001-05-01
申请号：US09065195
申请日：1998-04-23
IPC: B08B704
CPC classification number: G01J3/443 , G01J3/28 , G01J2003/2866 , Y10S438/905
Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
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122.发明授权公开(公告)号：US06222187B1
公开(公告)日：2001-04-24
申请号：US09109619
申请日：1998-07-02
Applicant: Kandiah Shivanandan
Inventor： Kandiah Shivanandan
IPC: G01J318
CPC classification number: G02B21/365 , G01J3/02 , G01J3/0286 , G01J3/36 , G01J3/443 , G01J5/061 , G01J2003/1828 , G02B21/00
Abstract: A multiwavelength imaging and spectroscopic photoemission microscope system (100) which simultaneously provides images in a broad range of the electromagnetic spectrum, such as between 200 nm-1000 nm (optical or visible light) and 1000 nm-500 nm (infrared light). The multiwavelength imaging and spectroscopic photoemission microscope system comprises a microscope (102), a spectrometer (106), a beam splitter (108), a first spectrum focal plane array (110) including an appropriate photodiode (114A), a second spectrum focal plane array (120) including an appropriate photodiode (114B), and a cryogenic vessel (160) to maintain relevant portions of the system at a very low temperature. The invention may be used in failure analysis of integrated circuits and in semiconductor and low temperature physics.
Abstract translation: 多波长成像和光谱发光显微镜系统（100），其同时提供宽范围的电磁光谱（例如200nm-1000nm（光学或可见光））和1000nm-500nm（红外光）之间的图像。 多波长成像和光谱发射显微镜系统包括显微镜（102），光谱仪（106），分束器（108），包括适当光电二极管（114A）的第一光谱焦平面阵列（110），第二光谱焦平面 阵列（120）包括适当的光电二极管（114B）和低温容器（160），以将系统的相关部分维持在非常低的温度。 本发明可用于集成电路和半导体和低温物理学的故障分析。
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公开(公告)号：US6090302A
公开(公告)日：2000-07-18
申请号：US65006
申请日：1998-04-23
CPC classification number: G01J3/443 , G01J3/28 , G01J2003/2866
Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
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124.发明授权Spectroscopic system with a single converter and method for removing overlap in time of detected emissions 失效具有单个转换器的光谱系统和用于消除检测到的排放时间的重叠的方法
公开(公告)号：US5828452A
公开(公告)日：1998-10-27
申请号：US777903
申请日：1996-12-31
Applicant: Gregory Gillispie , Jimmie A. Burt
Inventor： Gregory Gillispie , Jimmie A. Burt
Abstract: A spectroscopic system that processes spatially dispersed electromagnetic emissions at a number of wavelengths from a test material. The spectroscopic system includes a converter that generates an electrical signal that is proportional to the intensity of electromagnetic radiation received by the converter. An optical delay circuit is coupled to an input of the converter. The optical delay circuit selectively delays application to the converter of electromagnetic emissions from the test material for at least one wavelength of electromagnetic emissions. A data processing circuit is coupled to an output of the converter. The data processing circuit records the value of the electrical signal from the converter over time so as to measure, contemporaneously, the intensity of electromagnetic emissions at each wavelength as a function of time.
Abstract translation: 一种从测试材料处理多个波长的空间分散的电磁辐射的光谱系统。 分光系统包括产生与转换器接收的电磁辐射强度成比例的电信号的转换器。 光延迟电路耦合到转换器的输入端。 光延迟电路选择性延迟对于至少一个电磁辐射波长的来自测试材料的电磁辐射的转换器的应用。 数据处理电路耦合到转换器的输出。 数据处理电路随时间记录来自转换器的电信号的值，以同时测量作为时间的函数的每个波长处的电磁辐射的强度。
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125.发明授权
公开(公告)号：US5686988A
公开(公告)日：1997-11-11
申请号：US668509
申请日：1996-07-02
Applicant: W. Ray Garrett
Inventor： W. Ray Garrett
Abstract: A method and apparatus for measuring partial pressures of gaseous components within a mixture. The apparatus comprises generally at least one tunable laser source, a beam splitter, mirrors, optical filter, an optical spectrometer, and a data recorder. Measured in the forward direction along the path of the laser, the intensity of the emission spectra of the gaseous component, at wavelengths characteristic of the gas component being measured, are suppressed. Measured in the backward direction, the peak intensities characteristic of a given gaseous component will be wavelength shifted. These effects on peak intensity wavelengths are linearly dependent on the partial pressure of the compound being measured, but independent of the partial pressures of other gases which are present within the sample. The method and apparatus allow for efficient measurement of gaseous components.
Abstract translation: 用于测量混合物中气态组分的分压的方法和装置。 该装置通常包括至少一个可调激光源，分束器，反射镜，滤光器，光谱仪和数据记录器。 沿着激光的路径沿正向测量，被测量的气体成分的波长特性的气体成分的发射光谱的强度被抑制。 在向后的方向上测量，给定气体成分的峰值强度特性将波长偏移。 这些对峰强度波长的影响线性地取决于待测化合物的分压，而与样品中存在的其它气体的分压无关。 该方法和装置允许有效测量气体组分。
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Patent Agency Ranking
公开(公告)号：US5141314A
公开(公告)日：1992-08-25
申请号：US662924
申请日：1991-03-01
Applicant: Richard J. Belmore , John A. Bernier
Inventor： Richard J. Belmore , John A. Bernier
Abstract: A spectroanalytical system with radiation dispersing apparatus having structure for dispersing radiation into a spectrum for concurrent application to a plurality of exit ports; a plurality of radiation sensor channel circuits, each circuit being optically coupled to a corresponding exit port for monitoring radiation at that exit port; sample excitation apparatus for exciting sample material to be analyzed to spectroemissive levels for generating a beam of radiation for dispersion by the dispersion structure; and controller structure for triggering the excitation apparatus to excite the sample material and for generating a gating interval by the channel circuitry for accumulating radiation data during an interval that commences subsequent to application of maximum energy to the sample by the excitation apparatus.
Abstract translation: 一种具有辐射分散装置的分光系统，其具有用于将辐射分散到用于同时应用于多个出口的光谱中的结构; 多个辐射传感器通道电路，每个电路光耦合到相应的出口，用于监测该出口处的辐射; 用于激发要分析的样品材料的分光发射级别的样品激发装置，用于产生用于由分散结构分散的辐射束; 以及控制器结构，用于触发激励装置激发样品材料并通过通道电路产生选通间隔，用于在由激励装置向样品施加最大能量之后开始的间隔期间累积辐射数据。
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127.发明授权Method and apparatus for optically coupling an element analysis system and a laser to liquid metal in a melting vessel 失效将元件分析系统和激光器与熔融容器中的液态金属光学耦合的方法和装置
公开(公告)号：US4995723A
公开(公告)日：1991-02-26
申请号：US414387
申请日：1989-09-29
Applicant: Christoph Carlhoff , Claus-Jurgen Lorenzen , Klaus-Peter Nick
Inventor： Christoph Carlhoff , Claus-Jurgen Lorenzen , Klaus-Peter Nick
CPC classification number: G01J3/443 , G01J3/02 , G01J3/0208 , G01J3/0218 , G01J3/0237 , G01N21/718 , G01N2021/695
Abstract: A method of analyzing elements of a metal melt contained in a melting vessel comprises the following steps: introducing an inert gas at a temperature in excess of 300.degree. C. laterally into a tube passing through a lateral wall of the melting vessel and opening thereinto; generating a laser beam; passing the laser beam through an adjustable first lens system; reflecting the laser beam by a mirror into the tube; guiding the laser beam through a quartz window which closes the tube; generating a plasma in the tube by focusing the laser beam by the adjustable first lens system onto the surface of the metal melt in the tube; guiding the light generated by the plasma through the quartz window to an adjustable second lens system; coupling the light by the adjustable second lens system with an optical waveguide; and introducing the light by the optical waveguide into a spectrometer.
Abstract translation: 分析熔融容器中包含的金属熔体的元素的方法包括以下步骤：将温度超过300℃的惰性气体横向导入通过熔融容器的侧壁并打开的管中; 产生激光束; 使激光束通过可调节的第一透镜系统; 通过反射镜将激光束反射到管中; 引导激光束穿过关闭管的石英窗; 通过将可调节的第一透镜系统的激光束聚焦在管中的金属熔体的表面上来在管中产生等离子体; 将由等离子体产生的光通过石英窗引导到可调节的第二透镜系统; 通过可调节的第二透镜系统将光耦合到光波导; 并通过光波导将光引入光谱仪中。
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公开(公告)号：US4973159A
公开(公告)日：1990-11-27
申请号：US289042
申请日：1988-12-23
Applicant: Kenichi Sohma , Shigeru Azuhata , Kiyoshi Narato , Tooru Inada , Hironobu Kobayashi , Norio Arashi , Hiroshi Miyadera
Inventor： Kenichi Sohma , Shigeru Azuhata , Kiyoshi Narato , Tooru Inada , Hironobu Kobayashi , Norio Arashi , Hiroshi Miyadera
CPC classification number: G01J3/2823 , G01J3/443 , G01N21/75 , G01J2003/2826 , G01J2003/283 , G01J3/1809 , G01N2021/6406 , G01N2021/725 , G01N21/72 , G01N21/76
Abstract: A spectroscope apparatus includes a device for separating light from an object to be measured into spectral components, a device for mixing spectral components which exists in a desired wavelength range, and a device for forming an image of the to-be-measured body of mixed light. The image obtained is very useful for observing the state of a combustion flame, the progress a photochemical reaction, the progress of a biochemical reaction, tissue in a cell, and the state of a flame for analyzing a solution which contains a metal ion by flame spectrophotometry. The apparatus provides accurate analytical information and makes possible precise control operations.
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129.发明授权
公开(公告)号：US4164373A
公开(公告)日：1979-08-14
申请号：US868952
申请日：1978-01-12
Applicant: Jack J. Schuss , Larry C. Johnson
Inventor： Jack J. Schuss , Larry C. Johnson
CPC classification number: G01J3/443 , G01J3/02 , G01J3/0218 , G01J3/2889
Abstract: This invention provides different length glass fibers for providing a broad range of optical time delays for short incident chromatic light pulses for the selective spatial and frequency analysis of the light with a single light detector. To this end, the frequencies of the incident light are orientated and matched with the different length fibers by dispersing the separate frequencies in space according to the respective fiber locations and lengths at the input terminal of the glass fibers. This makes the different length fibers useful in the field of plasma physics. To this end the short light pulses can be scattered by a plasma and then passed through the fibers for analyzing and diagnosing the plasma while it varies rapidly with time.
Abstract translation: 本发明提供不同长度的玻璃纤维，用于通过单个光检测器为光的选择性空间和频率分析提供用于短入射彩色光脉冲的宽范围的光学时间延迟。 为此，入射光的频率通过根据玻璃纤维的输入端上的各个纤维位置和长度将分开的频率分散在空间中而定向并与不同长度的纤维匹配。 这使得不同长度的纤维在等离子体物理领域中有用。 为此，短光脉冲可以通过等离子体散射，然后通过纤维，用于分析和诊断等离子体，同时随时间快速变化。
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130.发明授权公开(公告)号：US12072291B2
公开(公告)日：2024-08-27
申请号：US17292985
申请日：2019-11-14
Inventor： Volker Sturm
CPC classification number: G01N21/718 , G01J3/443 , G01N21/15 , G01N21/33 , G01N2021/151 , G01N2021/335
Abstract: A device may be provided for element analysis of materials by means of optical emission spectroscopy, particularly by means of laser-induced plasma spectroscopy, said device having: means for exciting a plasma from a partial quantity of a test sample made of the material to be analyzed; means for detecting and for spectral analysis of optical radiation emitted from the plasma; beam guidance means for guiding at least a part of the optical radiation emitted from the plasma to the means for detecting and spectral analysis; and means for flushing at least one partial region of the device with an inert gas, wherein the beam guidance means are at least one capillary tube, which additionally serves to guide the inert gas. A method may be provided for element analysis of materials by means of optical emission spectroscopy using the device.
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