Abstract:
The present invention relates to a method of implanting carbon nanotube (CNT), which is especially being adopted for forming CNTs in carbon nanotube field emitting displays (CNT-FEDs). The method comprises steps of: transferring a medium by an electromagnetic wave generating means for forming a media layer of adhesive and conductive ability; and exposing a CNT material to the electromagnetic wave generating means for implanting CNTs in a plurality of gate apertures by the light pressure of the electromagnetic wave generating means. By the aforesaid method, the problems troubling conventional CNT formation methods, such as the density of CNT formed thereby is not sufficient, the adhesion of the substrate used thereby is low, and the CNT formation requires to be performed under a high temperature ambient, etc., can be solved.
Abstract:
A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic “modules” which can be easily manipulated and shaped to fit standard mounts in various devices.
Abstract:
An apparatus for forming a film of solution of carbon nanotubes includes a retaining member, an array of spray nozzles, and a supply tube. The spray nozzles are mounted on the retaining member. The spray nozzles being in communication with the supply tube. The apparatus can deposit a film of solution of carbon nanotubes having high thickness uniformity.
Abstract:
A surface treatment method for material with surface microstructure includes the steps of subjecting the material surface to a dry-type free-radical oxidation treatment, and using a supercritical fluid to purge the surface of the material with surface microstructure, so as to remove oxidized and bond-broken small molecules from the material surface. The surface microstructure may include nanoholes or high-aspect-ratio microstructures. Small molecules or moistures in the nanoholes or the high-aspect-ratio microstructures are carried by the supercritical fluid away from the material with surface microstructure.
Abstract:
A field emission type backlight device can include upper and lower substrates facing each other with a gap between them, an anode electrode on a lower side of the upper substrate, a fluorescent layer on a lower side of the anode electrode, a lower gate electrode on an upper side of the lower substrate, an insulating layer on an upper side of the lower gate electrode, a cathode electrode on an upper side of the insulating layer, and a gate electrode that is provided on an upper side of the insulating layer and electrically connected to the lower gate electrode.
Abstract:
A method of manufacturing an electron-emitting source includes first to third steps. In the first step, a cathode structure made of a metal containing any one of ion, nickel, cobalt, and chromium is heated to a first temperature in a reaction furnace to which a carbon source gas has been introduced, to form a plurality of first carbon nanotubes on the cathode structure by chemical vapor deposition. In the second step, the metal serving as a material of the cathode structure is deposited on at least either one of the cathode structure and the plurality of first carbon nanotubes, to form a catalyst metal layer. In the third step, the cathode structure including the catalyst metal layer is heated to a second temperature higher than the first temperature in the reaction furnace to which the carbon source gas has been introduced, to form a plurality of second carbon nanotubes which are thinner than the first carbon nanotubes on the catalyst metal layer by chemical vapor deposition. An electron-emitting source is also disclosed.
Abstract:
Multi-pixel electron microbeam irradiator systems and methods are provided with particular applicability for selectively irradiating predetermined cells or cell locations. A multi-pixel electron microbeam irradiator system can include a plurality of individually addressable electron field emitters sealed in a vacuum. The multi-pixel electron microbeam irradiator system can include an anode comprising one or more electron permeable portions corresponding to the plurality of electron field emitters. Further, the multi-pixel electron microbeam irradiator system can include a controller operable to individually control electron extraction from each of the electron field emitters for selectively irradiating predetermined locations such as cells or cell locations.
Abstract:
In removing a protection film, damage to an emitter material (carbon nanotubes) is decreased. A process for manufacturing an electron emitting device includes a first step of forming an emitter layer 10 containing carbon nanotubes 11 as a fibrous emitter material on a cathode electrode 5, a second step of forming an insulating layer 6 and a gate electrode 7 on the emitter layer 10 through a protection film 22, a third step of forming gate holes 8 in the insulating layer 6 and the gate electrode 7 above the emitter layer 10, and a fourth step of removing the protection film 22, which was exposed by forming the gate holes 8, with a weak acid etchant.
Abstract:
An exemplary method for fabricating a carbon nanotube-based field emission device is provided. A substrate is provided. A catalyst layer is formed on the substrate. A carbon nanotube array is grown from the catalyst layer. The carbon nanotube array includes a root portion and an opposite top portion respectively being in contact with and away from the catalyst layer. A cathode base with an adhesive layer formed thereon is provided. The top portion of the carbon nanotube array is immersed into the adhesive layer. The adhesive layer is solidified to embed the immersed top portion into the solidified adhesive layer. The root portion of the carbon nanotube array is exposed.