公开(公告)号：US20050173651A1

公开(公告)日：2005-08-11

申请号：US10969786

申请日：2004-10-21

Applicant: Richard Goldberg ,  Adrian Murrell

Inventor： Richard Goldberg ,  Adrian Murrell

IPC: G21K1/00 ,  G21K5/04 ,  H01J27/02 ,  H01J27/04 ,  H01J27/08 ,  H01J37/08 ,  H01J37/317 ,  H05H3/02 ,  H01J7/24 ,  C25B9/00

CPC classification number: H01J37/3171 ,  H01J27/08 ,  H01J37/08 ,  H01J2237/082

Abstract: The present invention relates to ion sources comprising a cathode and a counter-cathode that are suitable for ion implanters. The present invention provides an ion source comprising a vacuum chamber; an arc chamber operable to generate and contain a plasma; a cathode operable to emit electrons into the arc chamber along an electron path; a counter-cathode disposed in the electron path; respective separate electrical connections from each of the cathode and the counter-cathode including respective vacuum feedthroughs to outside the vacuum chamber; and a voltage potential adjuster located outside the vacuum chamber that is connected at least to the counter-cathode via the vacuum feed-through and is operable to alter the potential of the counter-cathode relative to the cathode.

Abstract translation: 本发明涉及包括适于离子注入机的阴极和对阴极的离子源。 本发明提供了一种包括真空室的离子源; 可操作以产生和容纳等离子体的电弧室; 阴极，其可操作以沿着电子路径向电弧室发射电子; 设置在电子路径中的反向阴极; 从阴极和对阴极的每一个分别的电连接包括相应的真空馈通到真空室外部; 以及位于真空室外部的电压电位调节器，其经由真空馈通至少连接到反向阴极，并且可操作地改变对阴极相对于阴极的电位。

公开(公告)号：US06797964B2

公开(公告)日：2004-09-28

申请号：US09773664

申请日：2001-02-02

Applicant: Takatoshi Yamashita

Inventor： Takatoshi Yamashita

IPC: H01J3708

CPC classification number: H01J27/08

Abstract: This ion source is set up to satisfy a relation L

Abstract translation: 该离子源被设定为满足在等离子体生成容器2和灯丝8之间施加的电弧电压为VA [V]的关系，等离子体生成容器2内的磁场19的磁通密度为B [T] 并且距几乎位于灯丝8的尖端中心处的最频繁的电子发射点9到等离子体生成容器2的壁面的最短距离为L [m]。

公开(公告)号：US20030038246A1

公开(公告)日：2003-02-27

申请号：US10115466

申请日：2002-04-03

Inventor： Jaime M. Reyes ,  Charles Prillaman

IPC: H01J027/08

CPC classification number: H01J27/04 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01J2237/31701 ,  H01L21/26506 ,  H01L21/2658

Abstract: The invention provides methods and apparatus for generating helium ions. The methods involve providing a mixture of helium gas with a second gas in an ion source. The second gas has a lower ionization potential and larger molecules than that of helium. The helium gas is ionized by generating an arc discharge within the ion source. The presence of the second gas enhances the ionization of the helium gas. The increased helium ionization enables formation of helium ion beams having a high beam currents suitable for implantation.

Abstract translation: 本发明提供了用于产生氦离子的方法和装置。 该方法包括在离子源中提供氦气与第二气体的混合物。 第二气体具有比氦气更低的电离电位和更大的分子。 通过在离子源内产生电弧放电来使氦气离子化。 第二气体的存在增强了氦气的电离。 增加的氦离子化能够形成具有适合于植入的高束流的氦离子束。

公开(公告)号：US20030030010A1

公开(公告)日：2003-02-13

申请号：US09924004

申请日：2001-08-07

Inventor： Alexander S. Perel ,  Bo H. Vanderberg

IPC: H01J027/00

CPC classification number: H01J27/08

Abstract: An ion source for an ion implanter is provided, comprising: (i) a sublimator (52) having a cavity (66) for receiving a source material (68) to be sublimated and for sublimating the source material; (ii) a gas injector (104) for injecting gas into the cavity (66); (iii) an ionization chamber (58) for ionizing the sublimated source material, the ionization chamber located remotely from the sublimator; and (iv) a feed tube (62) for connecting the sublimator (52) to the ionization chamber (58). The gas injected into the cavity may be either helium or hydrogen, and is designed to improve the heat transferability between walls (64) of the sublimator (52) and the source material (68).

Abstract translation: 提供了一种用于离子注入机的离子源，包括：（i）升华器（52），具有用于接收待升华的源材料和升华源材料的空腔（66） （ii）用于将气体注入到空腔（66）中的气体注入器（104）; （iii）电离室（58），用于使升华的源材料离子化，远离升华器的离子化室; 和（iv）用于将升华器（52）连接到电离室（58）的进料管（62）。 注入空腔中的气体可以是氦气或氢气，并且被设计成改善升华器（52）的壁（64）和源材料（68）之间的热传递性。

公开(公告)号：US20020185607A1

公开(公告)日：2002-12-12

申请号：US10114805

申请日：2002-04-03

Inventor： Jaime M. Reyes

IPC: H01J027/08

CPC classification number: H01J27/04 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01J2237/31701 ,  H01L21/26506 ,  H01L21/2658

Abstract: Ion source filaments, as well as methods and apparatus associated with the same are provided. The source filaments have a design that includes a relatively small surface area from which electrons are emitted (i.e., active portion) as compared to certain conventional source filaments. Suitable designs include filaments that have a V-shape or U-shape active portion, rather than a coiled active portion as in certain conventional source filaments. The source filaments of the present invention can increase the efficiency of ion generation and, in particular, the generation of multiply charged ionic species. The increased ion generation efficiency may enable formation of ion beams having relatively high beam currents suitable for implantation.

Abstract translation: 提供了离子源丝，以及与其相关的方法和装置。 源极丝具有包括与某些常规源丝相比发射电子的相对小的表面积（即，活性部分）的设计。 合适的设计包括具有V形或U形活性部分的长丝，而不是像某些常规的源长丝中的卷绕的活性部分。 本发明的源丝可以提高离子产生的效率，特别是产生多电荷离子物质。 增加的离子产生效率可以使得能够形成具有适合于植入的较高束流的离子束。

公开(公告)号：US20020100876A1

公开(公告)日：2002-08-01

申请号：US10083564

申请日：2002-02-27

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Atsushi Murakoshi ,  Kyoichi Suguro ,  Katsuya Okumura

IPC: H01J027/00

CPC classification number: H01J27/08 ,  H01J27/02 ,  H01J2237/08 ,  H01J2237/31701

Abstract: According to the ion generation method, ion source material composed of an element of desired ions to be generated and I is heated so that vapor of the compound is generated, and the ions are generated by discharging the vapor. The iodide has no corrosiveness, and can be stably ionized. Further, it hardly reacts with oxygen or water and is safe.

Abstract translation: 根据离子产生方法，由要产生的所需离子的元素组成的离子源材料被加热，使得产生化合物的蒸汽，并且通过排出蒸气产生离子。 碘化物没有腐蚀性，可以稳定地电离。 此外，它几乎不与氧气或水反应并且是安全的。

公开(公告)号：US06346770B1

公开(公告)日：2002-02-12

申请号：US09533008

申请日：2000-03-22

Applicant: Karl H. Schoenbach ,  Wojciech W. Byszewski ,  Frank E. Peterkin ,  Amin N. Dharamsi

Inventor： Karl H. Schoenbach ,  Wojciech W. Byszewski ,  Frank E. Peterkin ,  Amin N. Dharamsi

IPC: H01J6106

CPC classification number: H01J3/025 ,  H01J1/025 ,  H01J3/04 ,  H01J17/04 ,  H01J17/06 ,  H01J27/08 ,  H01J61/067 ,  H01J61/09 ,  H01J61/12 ,  H01J61/305 ,  H01J61/66 ,  H01J61/72 ,  H01J61/78 ,  H01S3/03 ,  H01S3/0382 ,  H01S3/0385 ,  H01S3/2383

Abstract: A discharge device for operation in a gas at a prescribed pressure includes a cathode having a plurality of micro hollows therein, and an anode spaced from the cathode. Each of the micro hollows has dimensions selected to produce a micro hollow discharge at the prescribed pressure. Preferably, each of the micro hollows has a cross-sectional dimension that is on the order of the mean free path of electrons in the gas. Electrical energy is coupled to the cathode and the anode at a voltage and current for producing micro hollow discharges in each of the micro hollows in the cathode. The discharge device may include a discharge chamber for maintaining the prescribed pressure. A dielectric layer may be disposed on the cathode when the spacing between the cathode and the anode is greater than about the mean free path of electrons in the gas. Applications of the discharge device include fluorescent lamps, excimer lamps, flat fluorescent light sources, miniature gas lasers, electron sources and ion sources.

Abstract translation: 用于在规定压力下操作气体的放电装置包括其中具有多个微型空腔的​​阴极和与阴极间隔开的阳极。 每个微型空腔具有选定的尺寸以在规定的压力下产生微细的中空排出。 优选地，每个微型空腔的​​横截面尺寸都是气体中电子的平均自由程的数量级。 电能以负极和电流耦合到阴极和阳极，用于在阴极中的每个微型空腔中产生微空心放电。 排出装置可以包括用于维持规定压力的排出室。 当阴极和阳极之间的间隔大于气体中电子的平均自由程时，电介质层可以设置在阴极上。 放电装置的应用包括荧光灯，准分子灯，平面荧光光源，微型气体激光器，电子源和离子源。

公开(公告)号：US20010042836A1

公开(公告)日：2001-11-22

申请号：US09825901

申请日：2001-04-04

Inventor： Joseph C. Olson ,  Daniel Distaso ,  Anthony Renau

IPC: H01J027/00

CPC classification number: H01J27/022 ,  H01J27/08

Abstract: An indirectly heated cathode ion source includes an extraction current sensor for sensing ion current extracted from the arc chamber and an ion source controller for controlling the filament power supply, the bias power supply and/or the arc power supply. The ion source controller may compare the sensed extraction current with a reference extraction current and determine an error value based on the difference between the sensed extraction current and the reference extraction current. The power supplies of the indirectly heated cathode ion source are controlled to minimize the error value, thus maintaining a substantially constant extraction current. The ion source controller utilizes a control algorithm, for example a closed feedback loop, to control the power supplies in response to the error value. In a first control algorithm, the bias current IB supplied by the bias power supply is varied so as to control the extraction current IE. Further according to the first control algorithm, the filament current IF and the arc voltage VA are maintained constant. According to a second control algorithm, the filament current IF is varied so as to control the extraction current IE. Further according to the second control algorithm, the bias current IB and the arc voltage VA are maintained constant.

Abstract translation: 间接加热的阴极离子源包括用于感测从电弧室提取的离子电流的提取电流传感器和用于控制灯丝电源，偏置电源和/或电弧电源的离子源控制器。 离子源控制器可以将感测的提取电流与参考提取电流进行比较，并且基于感测的提取电流与参考提取电流之间的差来确定误差值。 控制间接加热的阴极离子源的电源以使误差值最小化，从而保持基本上恒定的提取电流。 离子源控制器利用控制算法，例如闭合反馈环路，以响应误差值来控制电源。 在第一控制算法中，改变由偏置电源提供的偏置电流IB，以便控制提取电流IE。 此外，根据第一控制算法，灯丝电流IF和电弧电压VA保持恒定。 根据第二控制算法，改变灯丝电流IF，以控制提取电流IE。 此外，根据第二控制算法，偏置电流IB和电弧电压VA保持恒定。

公开(公告)号：US06288403B1

公开(公告)日：2001-09-11

申请号：US09416159

申请日：1999-10-11

Applicant: Thomas N. Horsky ,  Alexander S. Perel ,  William K. Loizides

Inventor： Thomas N. Horsky ,  Alexander S. Perel ,  William K. Loizides

IPC: H01J2700

CPC classification number: H01J27/08

Abstract: An ion source (50) for an ion implanter is provided, comprising a remotely located vaporizer (51) and an ionizer (53) connected to the vaporizer by a feed tube (62). The vaporizer comprises a sublimator (52) for receiving a solid source material such as decaborane and sublimating (vaporizing) the decaborane. A heating mechanism is provided for heating the sublimator, and the feed tube connecting the sublimator to the ionizer, to maintain a suitable temperature for the vaporized decaborane. The ionizer (53) comprises a body (96) having an inlet (119) for receiving the vaporized decaborane; an ionization chamber (108) in which the vaporized decaborane may be ionized by an energy-emitting element (110) to create a plasma; and an exit aperture (126) for extracting an ion beam comprised of the plasma. A cooling mechanism (100, 104) is provided for lowering the temperature of walls (128) of the ionization chamber (108) (e.g., to below 350° C.) during ionization of the vaporized decaborane to prevent dissociation of vaporized decaborane molecules into atomic boron ions. In addition, the energy-emitting element is operated at a sufficiently low power level to minimize plasma density within the ionization chamber (108) to prevent additional dissociation of the vaporized decaborane molecules by the plasma itself.

Abstract translation: 提供了一种用于离子注入机的离子源（50），其包括位于远处的蒸发器（51）和通过进料管（62）连接到蒸发器的离子发生器（53）。 蒸发器包括用于接收诸如十硼烷的固体源材料和升华（蒸发）十硼烷的升华器（52）。 提供加热机构用于加热升华器和将升华器连接到离子发生器的进料管，以保持蒸发的十硼烷的合适温度。 电离器（53）包括具有用于接收蒸发的十硼烷的入口（119）的主体（96） 电离室（108），其中蒸发的十硼烷可以被能量发射元件（110）电离以产生等离子体; 以及用于提取由等离子体组成的离子束的出射孔（126）。 提供冷却机构（100,104），用于在蒸发的十硼烷的电离期间降低电离室（108）的壁（128）的温度（例如，低于350℃），以防止汽化的十硼烷分子分解成 原子硼离子 此外，能量发射元件以足够低的功率水平操作以最小化电离室（108）内的等离子体密度，以防止蒸发的十硼烷分子由等离子体本身的附加解离。

公开(公告)号：US6107634A

公开(公告)日：2000-08-22

申请号：US070685

申请日：1998-04-30

Applicant: Thomas N. Horsky

Inventor： Thomas N. Horsky

IPC: H01L21/265 ,  B82B1/00 ,  H01J27/08 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01L21/2658 ,  H01J27/08

Abstract: An ion source (50) for an ion implanter is provided, comprising: (i) a sublimator (52) having a cavity (66) for receiving a source material (68) to be sublimated and for sublimating the source material; (ii) an ionization chamber (58) for ionizing the sublimated source material, the ionization chamber located remotely from the sublimator; (iii) a feed tube (62) for connecting the sublimator (52) to the ionization chamber (58); and (iv) a heating medium (70) for heating at least a portion of the sublimator (52) and the feed tube (62). A control mechanism is provided for controlling the temperature of the heating medium (70). The control mechanism comprises a heating element (80) for heating the heating medium (70), a pump (55) for circulating the heating medium, at least one thermocouple (92) for providing temperature feedback from the heating medium (70), and a controller (56) responsive to the temperature feedback to output a first control signal (94) to the heating element.

Abstract translation: 提供了一种用于离子注入机的离子源（50），包括：（i）升华器（52），其具有用于接收待升华的源材料和升华源材料的空腔（66） （ii）用于使升华的源材料离子化的离子化室（58），远离升华器的离子化室; （iii）用于将升华器（52）连接到电离室（58）的进料管（62）; 和（iv）用于加热升华器（52）和进料管（62）的至少一部分的加热介质（70）。 提供一种用于控制加热介质（70）的温度的控制机构。 控制机构包括用于加热加热介质（70）的加热元件（80），用于循环加热介质的泵（55），用于提供来自加热介质（70）的温度反馈的至少一个热电偶（92） 响应于温度反馈的控制器（56）向加热元件输出第一控制信号（94）。