公开(公告)号：US11034590B2

公开(公告)日：2021-06-15

申请号：US16090953

申请日：2017-04-04

Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY ,  UNIST(ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)

Inventor： Jun Hong Noh ,  Seong Sik Shin ,  Jang Won Seo ,  Sang Il Seok

IPC: H01L21/00 ,  C01G19/00 ,  B05D1/00 ,  B05D3/02 ,  H01G9/20 ,  H01L51/42

Abstract: The present invention relates to a method for preparing a BaSnO3 thin film, comprising the steps of: a) precipitating an amorphous precipitate by adding an alkaline aqueous solution to a mixture solution comprising a barium salt, a tin salt, hydrogen peroxide, and an organic acid; b) preparing a crystalline BaSnO3 precursor material by preheating the mixture solution containing the amorphous precipitate; c) preparing a dispersion solution by dispersing the crystalline BaSnO3 precursor material in a polar organic solvent; d) coating the dispersion solution on a substrate; and e) preparing a BaSnO3 thin film of a perovskite structure by heat treating the dispersion solution coated on the substrate.

公开(公告)号：US11033929B2

公开(公告)日：2021-06-15

申请号：US15807643

申请日：2017-11-09

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Naozumi Fujiwara

IPC: B05D1/00 ,  H01L21/67 ,  B08B3/08

Abstract: For a substrate having a diameter of 300 millimeters and a main surface on which a lot of pattern elements standing upright are formed, a processing using a processing liquid is performed on the main surface. After the processing using the processing liquid, a filler solution is applied onto the main surface. In the application process of the filler solution, pure water is supplied onto the main surface which faces upward while the substrate is in a horizontal state, and a liquid film of the pure water which covers the main surface and has a thickness not larger than 5 micrometers is formed by rotating the substrate. Then, the filler solution containing a water-soluble filler is supplied onto a center portion of the main surface while the substrate is rotated at the number of rotation not smaller than 300 times and not larger than 500 times per minute.

公开(公告)号：US11020766B2

公开(公告)日：2021-06-01

申请号：US16576195

申请日：2019-09-19

Applicant: Service Support Specialties, Inc.

Inventor： Gary Hillman ,  Joseph Deghuee

IPC: B05D1/00 ,  B05C11/08 ,  B05C11/06

Abstract: A spin coating apparatus, system, and/or method that increase the uniformity of a coating material on a substrate. The spin coating system may be specifically directed for use with polygonal shaped substrates. The spin coating system may include a process chamber within which the substrate is located, spinning on a chuck, during operation. The spin coating system may include gas injection ports that inject a gas into the process chamber so that the gas contacts the substrate along corner portions of its front surface. This injection of the gas increases pressure and prevents excessive build-up of the coating material that may otherwise occur when spin coating polygonal shaped substrates.

公开(公告)号：US20210138451A1

公开(公告)日：2021-05-13

申请号：US16623194

申请日：2018-06-15

Applicant: Wisconsin Alumni Research Foundation

Inventor： Chao Li ,  Jiaquan Yu ,  Theodorus Evan de Groot ,  David James Beebe

IPC: B01L3/00 ,  B05D1/00 ,  B05D5/08

Abstract: Systems, methods, compositions of matter, and kits for undermedia repellency are disclosed. In some cases, these involve a first volume of a first liquid presented in a second volume of a second liquid above a first location of a first surface. The first liquid, second liquid, and first location can have properties sufficient to give rise to undermedia perfect liquid repellency.

公开(公告)号：US20210134591A1

公开(公告)日：2021-05-06

申请号：US17150153

申请日：2021-01-15

Applicant: ASM IP HOLDING B.V.

Inventor： Elina Färm

IPC: H01L21/02 ,  H01L21/321 ,  B05D1/00 ,  C23C16/455 ,  H01L21/3105 ,  C23C16/04 ,  C23C16/54 ,  C23C16/46 ,  C23C16/30

Abstract: The present application discloses forming self-assembled monolayers (SAMs) by exposing the substrate at least twice to SAM precursors with intervening cooling of a substrate.

公开(公告)号：US20210129176A1

公开(公告)日：2021-05-06

申请号：US17130112

申请日：2020-12-22

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Shu-Jen Han ,  Bharat Kumar ,  George S. Tulevski

IPC: B05D1/00 ,  A61B5/00 ,  A61B5/145 ,  B05D7/00 ,  B05D3/04 ,  G01N1/00

Abstract: A method of protecting an in-vivo sensor includes forming a sensing surface on a surface of the in-vivo sensor, the sensing surface including a functionalized monolayer that will bind to an analyte of interest; and coating the sensing surface of the sensor with a bioabsorbable polymeric coating including a bioabsorbable polymer; wherein the bioabsorbable polymeric coating is configured to protect the in-vivo sensor until needed for implantation.

公开(公告)号：US10960435B2

公开(公告)日：2021-03-30

申请号：US15915392

申请日：2018-03-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Makoto Fujikawa ,  Reiji Niino ,  Hiroyuki Hashimoto ,  Tatsuya Yamaguchi ,  Syuji Nozawa

IPC: C23C16/455 ,  B05D1/00 ,  H01L21/02 ,  C23C16/44 ,  H01L21/67

Abstract: A film forming apparatus includes: a film forming gas discharge part; an exhaust port; a rotation mechanism; a heating part configured to heat the interior of a reaction container to a temperature lower than a temperature of a film forming gas discharged from the film forming gas discharge part; first gas discharge holes opened, in the film forming gas discharge part, toward a gas temperature reducing member so that the film forming gas is cooled by colliding with the gas temperature reducing member inside the reaction container before the film forming gas is supplied to substrates; and second gas discharge holes opened, in the film forming gas discharge part, in a direction differing from an opening direction of the first gas discharge holes so that the film forming gas does not collide with the gas temperature reducing member before the film forming gas is supplied to the substrates.

公开(公告)号：US20210085944A1

公开(公告)日：2021-03-25

申请号：US17070572

申请日：2020-10-14

Applicant: QuadMedicine

Inventor： Sun Young BAEK

IPC: A61M37/00 ,  A61K47/26 ,  A61K9/00 ,  A61K47/12 ,  B05D1/00 ,  B29C39/02 ,  B29C39/26 ,  B29C39/36 ,  B29C39/38 ,  B29C39/42

Abstract: Disclosed is a microneedle, the microneedle including a needle body portion formed using a water-soluble material; an active ingredient coating portion configured to coat the surface of the needle body portion, and including an active ingredient transferred to the biological tissue; and a waterproof coating portion configured to coat at least a portion of the surface of the active ingredient coating portion, and to protect the needle body portion and the active ingredient coating portion from moisture.

公开(公告)号：US10934623B2

公开(公告)日：2021-03-02

申请号：US16882100

申请日：2020-05-22

Applicant: Jiangsu Favored Nanotechnology Co., Ltd.

Inventor： Jian Zong

IPC: C23C16/50 ,  C23C16/52 ,  B05D1/00 ,  C23C16/458 ,  B05D3/14 ,  H01J37/32 ,  H01B7/28 ,  H01R13/03 ,  H01R43/00

Abstract: Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.

公开(公告)号：US10934617B2

公开(公告)日：2021-03-02

申请号：US13885616

申请日：2011-11-16

Applicant: Sven Göthe ,  Björn Atthoff ,  Karl-Gunnar Larsson

Inventor： Sven Göthe ,  Björn Atthoff ,  Karl-Gunnar Larsson

IPC: C23C16/02 ,  C23C18/16 ,  C23C18/18 ,  H05K3/38 ,  H01M4/88 ,  B05D1/00 ,  C23C18/20 ,  H01L31/04 ,  H01M8/02 ,  H05K1/02

Abstract: A method for applying a metal on a substrate comprises: a) applying a coating by treatment in a plasma, comprising a compound selected from alkanes up to 10 carbon atoms, and unsaturated monomers, and b1) producing polymers on the surface of the substrate, the polymers comprising carboxylic groups and adsorbed ions of a second metal, reducing the ions to the second metal, or alternatively b2) producing polymers on the surface, bringing the surface of the substrate in contact with a dispersion of colloidal metal particles of at least one second metal, and c) depositing the first metal on the second metal. Advantages include that materials sensitive to, for instance, low pH or solvents can be coated. Substrates including glass, SiO2 with very few or no abstractable hydrogen atoms as well as polymer materials containing halogen atoms can be coated with good adhesion.