公开(公告)号：US09719138B2

公开(公告)日：2017-08-01

申请号：US14949313

申请日：2015-11-23

Applicant: Pacific Biosciences of California, Inc.

Inventor： Cheng Frank Zhong ,  Paul Lundquist ,  Mathieu Foquet ,  Jonas Korlach ,  Hovig Bayandorian

IPC: C12Q1/68 ,  G01N21/64 ,  G01N21/77 ,  G01N33/543

CPC classification number: C12Q1/6874 ,  C12Q1/68 ,  C12Q1/6825 ,  G01N21/6428 ,  G01N21/648 ,  G01N21/7703 ,  G01N33/54373 ,  G01N2021/6463 ,  G01N2201/06113 ,  G01N2201/0638 ,  G01N2201/08

Abstract: This invention provides substrates for use in various applications, including single-molecule analytical reactions. Methods for propagating optical energy within a substrate are provided. Devices comprising waveguide substrates and dielectric omnidirectional reflectors are provided. Waveguide substrates with improved uniformity of optical energy intensity across one or more waveguides and enhanced waveguide illumination efficiency within an analytic detection region of the arrays are provided.

公开(公告)号：US20170191944A1

公开(公告)日：2017-07-06

申请号：US15387610

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yevgeniy Konstantinovich SHMAREV ,  Stanislav SMIRNOV ,  Chien-Hung TSENG ,  Armand Eugene Albert KOOLEN

IPC: G01N21/88 ,  G01N21/95 ,  G03F7/20 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/0638 ,  G03F7/70625 ,  G03F7/70641

Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.

公开(公告)号：US09671337B2

公开(公告)日：2017-06-06

申请号：US15243269

申请日：2016-08-22

Applicant: ASML Holding N.V.

Inventor： Lev Ryzhikov

IPC: G03B27/54 ,  G01N21/47 ,  G03F7/20 ,  G02B13/14 ,  G01N21/95 ,  G01N21/88 ,  G02B21/02 ,  G02B9/64 ,  G02B13/16 ,  G02B13/18 ,  G02B27/00

CPC classification number: G01N21/474 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2201/0638 ,  G02B9/64 ,  G02B13/143 ,  G02B13/16 ,  G02B13/18 ,  G02B21/02 ,  G02B27/0025 ,  G03F7/70 ,  G03F7/70058

Abstract: An objective lens system having a high numerical aperture, a large working distance, and low optical aberrations over a wide spectral band of wavelengths is disclosed. The objective lens system includes a first lens group, a second lens group, and a third lens group. The first lens group includes first and second positive meniscus lenses that are positioned at a distance from each other along an optical axis of the objective lens system. The distance may be dependent on a focal length of the objective lens system. The second lens group includes first and second meniscus lenses and a bi-convex lens. The third lens group includes a bi-concave lens and a doublet lens.

公开(公告)号：US09625389B2

公开(公告)日：2017-04-18

申请号：US15036241

申请日：2014-09-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Manabu Shiozawa ,  Koichi Watanabe ,  Masataka Shirai ,  Kentaro Osawa

IPC: G01J3/44 ,  G01N21/65

CPC classification number: G01N21/65 ,  G01N2021/653 ,  G01N2201/06113 ,  G01N2201/0638

Abstract: To measure a surface state, reflective CARS is suitable in terms of the signal intensity. However, with the reflective CARS, it has been difficult to identify the surface position because the shape information is not acquired. Thus, a reflective CARS microscope is combined with a high-resolution phase sensor. The surface position is identified with the phase sensor, and reflected CARS generated from the surface is detected, so that composition analysis is performed.

公开(公告)号：US09620547B2

公开(公告)日：2017-04-11

申请号：US15201028

申请日：2016-07-01

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Jingjing Zhang ,  John Fielden

IPC: H01L27/146 ,  G01N21/95 ,  G01N21/88 ,  H01L27/148 ,  H01L31/107 ,  H01L31/028 ,  H01L31/18

CPC classification number: H01L27/14632 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2201/061 ,  G01N2201/0638 ,  G01N2201/12 ,  H01L27/14609 ,  H01L27/1461 ,  H01L27/14612 ,  H01L27/1462 ,  H01L27/1464 ,  H01L27/14643 ,  H01L27/14645 ,  H01L27/14647 ,  H01L27/14681 ,  H01L27/14685 ,  H01L27/14687 ,  H01L27/14689 ,  H01L27/14698 ,  H01L27/14825 ,  H01L27/14831 ,  H01L27/14856 ,  H01L31/028 ,  H01L31/107 ,  H01L31/1804

Abstract: A high sensitivity image sensor comprises an epitaxial layer of silicon that is intrinsic or lightly p doped (such as a doping level less than about 1013 cm−3). CMOS or CCD circuits are fabricated on the front-side of the epitaxial layer. Epitaxial p and n type layers are grown on the backside of the epitaxial layer. A pure boron layer is deposited on the n-type epitaxial layer. Some boron is driven a few nm into the n-type epitaxial layer from the backside during the boron deposition process. An anti-reflection coating may be applied to the pure boron layer. During operation of the sensor a negative bias voltage of several tens to a few hundred volts is applied to the boron layer to accelerate photo-electrons away from the backside surface and create additional electrons by an avalanche effect. Grounded p-wells protect active circuits as needed from the reversed biased epitaxial layer.

公开(公告)号：US20170030824A1

公开(公告)日：2017-02-02

申请号：US15231146

申请日：2016-08-08

Applicant: SONY CORPORATION

Inventor： TAICHI TAKEUCHI ,  SHINGO IMANISHI

IPC: G01N15/14 ,  G01N21/21 ,  G01N21/64 ,  G01N21/53

CPC classification number: G01N15/1436 ,  G01N15/1429 ,  G01N15/1434 ,  G01N15/1459 ,  G01N21/21 ,  G01N21/47 ,  G01N21/49 ,  G01N21/53 ,  G01N21/645 ,  G01N2015/0065 ,  G01N2015/1006 ,  G01N2021/6478 ,  G01N2201/06113 ,  G01N2201/0638 ,  G01N2201/0683

Abstract: A microparticle measuring apparatus for highly accurately detecting the position of a microparticle flowing through a flow channel includes a light irradiation unit for irradiating a microparticle flowing through a flow channel with light, and a scattered light detection unit for detecting scattered light from the microparticle, including an objective lens for collecting light from the microparticle, a light splitting element for dividing the scattered light from the light collected by the objective lens, into first and second scattered light, a first scattered light detector for receiving an S-polarized light component, and an astigmatic element disposed between the light splitting element and the first scattered light detector, and making the first scattered light astigmatic. A relationship between a length L from a rear principal point of the objective lens to a front principal point of the astigmatic element, and a focal length f of the astigmatic element satisfies the following formula I. 1.5f≦L≦2.5f  (I)

Abstract translation: 用于高精度地检测流过流路的微粒的位置的微粒测量装置包括：用于照射流过流路的微粒的光照射单元，以及用于检测来自微粒的散射光的散射光检测单元，包括 用于收集来自微粒的光的物镜，将从物镜收集的光中散射的光分成第一和第二散射光的分光元件，用于接收S偏振光分量的第一散射光检测器，以及 设置在所述分光元件和所述第一散射光检测器之间的散光元件，以及使所述第一散射光散光。 从物镜的后方主点到散光元件的前主点的长度L与散光元件的焦距f之间的关系满足以下公式I. 1.5 ¢‰¤L‰2.5 ¢f

公开(公告)号：US09541498B1

公开(公告)日：2017-01-10

申请号：US14831913

申请日：2015-08-21

Applicant: UT-Battelle, LLC

Inventor： William P. Partridge, Jr. ,  Gurneesh Singh Jatana ,  Ji-Hyung Yoo ,  James E. Parks, II

IPC: G01N21/3504

CPC classification number: G01N21/3504 ,  G01N21/8507 ,  G01N33/004 ,  G01N2021/8521 ,  G01N2201/06113 ,  G01N2201/0638 ,  Y02A50/244

Abstract: A diagnostic system for measuring temperature, pressure, CO2 concentration and H2O concentration in a fluid stream is described. The system may include one or more probes that sample the fluid stream spatially, temporally and over ranges of pressure and temperature. Laser light sources are directed down pitch optical cables, through a lens and to a mirror, where the light sources are reflected back, through the lens to catch optical cables. The light travels through the catch optical cables to detectors, which provide electrical signals to a processer. The processer utilizes the signals to calculate CO2 concentration based on the temperatures derived from H2O vapor concentration. A probe for sampling CO2 and H2O vapor concentrations is also disclosed. Various mechanical features interact together to ensure the pitch and catch optical cables are properly aligned with the lens during assembly and use.

Abstract translation: 描述了用于测量流体流中的温度，压力，CO 2浓度和H 2 O浓度的诊断系统。 该系统可以包括一个或多个在空间上，时间上和在压力和温度范围上对流体流进行采样的探针。 激光光源通过透镜通过透镜和反射镜被引导到俯仰的光缆上，其中光源被反射回透镜以捕获光缆。 光线通过捕获光缆传输到检测器，检测器向处理器提供电信号。 加工者利用这些信号根据从H 2 O蒸气浓度得到的温度计算CO2浓度。 还公开了用于对CO 2和H 2 O蒸气浓度进行取样的探针。 各种机械特征相互作用，以确保在组装和使用期间，光缆与镜头正确对准。

公开(公告)号：US20160377553A1

公开(公告)日：2016-12-29

申请号：US15181691

申请日：2016-06-14

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Tsuneo TERASAWA ,  Hiroshi FUKUDA ,  Takahiro KISHITA ,  Daisuke IWAI ,  Atsushi YOKOHATA

IPC: G01N21/95 ,  G03F1/36 ,  G01B11/24

CPC classification number: G03F1/36 ,  G01B11/24 ,  G01N21/9501 ,  G01N2201/0638 ,  G03F1/84

Abstract: A method of inspecting a defect present at a surface portion of a photomask blank having at least one thin film formed on a substrate by use of the inspecting optical system. The method includes setting the distance between the defect and an objective lens of an inspecting optical system to a defocus distance, applying inspection light to the defect through the objective lens, collecting reflected light from the region irradiated with the inspection light, through the objective lens, as a magnified image, identifying a light intensity variation portion of the magnified image, and determining the rugged shape of the defect on the basis of a variation in light intensity of the light intensity variation portion of the magnified image.

Abstract translation: 通过使用检查光学系统检查存在于具有形成在基板上的至少一个薄膜的光掩模坯料的表面部分处的缺陷的方法。 该方法包括将检查光学系统的缺陷与物镜之间的距离设定为散焦距离，通过物镜对检测光施加检查光，通过物镜收集来自被检查光照射的区域的反射光 作为放大图像，识别放大图像的光强变化部分，并且基于放大图像的光强度变化部分的光强度的变化来确定缺陷的粗糙形状。

公开(公告)号：US09523646B2

公开(公告)日：2016-12-20

申请号：US15158413

申请日：2016-05-18

Applicant: KLA-Tencor Corporation

Inventor： Grace H. Chen ,  Rudolf Brunner ,  Lisheng Gao ,  Robert M. Danen ,  Lu Chen

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/0638 ,  G01N2201/068 ,  G01N2201/12

Abstract: In an optical inspection tool, an illumination aperture is opened at each of a plurality of aperture positions of an illumination pupil area one at a time across the illumination pupil area. For each aperture opening position, an incident beam is directed towards the illumination pupil area so as to selectively pass a corresponding ray bundle of the illumination beam at a corresponding set of one or more incident angles towards the sample and an output beam, which is emitted from the sample in response to the corresponding ray bundle of the incident beam impinging on the sample at the corresponding set of one or more incident angles, is detected. A defect detection characteristic for each aperture position is determined based on the output beam detected for each aperture position. An optimum aperture configuration is determined based on the determined defect detection characteristic for each aperture position.

公开(公告)号：US20160327433A1

公开(公告)日：2016-11-10

申请号：US15110981

申请日：2014-09-08

Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC

Inventor： Mordehai MARGALIT

IPC: G01J3/42 ,  G01J3/10 ,  G01J3/02 ,  G01N21/27

CPC classification number: G01J3/42 ,  G01J3/0224 ,  G01J3/0256 ,  G01J3/0264 ,  G01J3/10 ,  G01N21/27 ,  G01N2201/0612 ,  G01N2201/062 ,  G01N2201/0636 ,  G01N2201/0638 ,  G01N2201/0683

Abstract: Technologies are generally described for fabrication of a multi-component device, and employment thereof. The device may include a substrate, and a multitude of light sources and one or more photo detectors positioned on a surface of the substrate. The light sources may be configured to illuminate at least a portion of an object with light, and the photo detectors may be configured to detect reflected light from the object in response to the illumination. In some examples, the reflected light may be analyzed to determine a spectral profile of the object. The device may further include a structure applied to the substrate adjacent to the photo detectors, where the structure may be configured to reduce direct light transmission from the light sources to the photo detectors. The structure may include a deposited material, a protrusion, and/or a recession on the surface of the substrate, for example.

Abstract translation: 技术通常被描述为用于制造多组件装置，以及其使用。 该装置可以包括基板和多个光源以及位于基板的表面上的一个或多个光电检测器。 光源可以被配置为用光照亮物体的至少一部分，并且光电检测器可以被配置为响应于照明来检测来自物体的反射光。 在一些示例中，可以分析反射光以确定对象的光谱轮廓。 该装置还可以包括施加到与光电检测器相邻的衬底的结构，其中该结构可被配置为减少从光源到光电检测器的直接光透射。 该结构可以包括例如在基底表面上的沉积材料，突起和/或凹陷。