Abstract:
A conductive metal wiring pattern 1 is printed and wired on a flexible insulation film 2, and has connection terminals 1a whose surfaces are treated into a solderable state by plating or the like. An overriding flexible insulation film 3 is formed such that it covers a portion excluding the connection terminals 1a. The connection terminals 1a are easily formed by printing, bonding and cutting out portions of the insulation film 2 between the connection terminals by a press to separate the connection terminal.
Abstract:
The present invention permits solder joints to be made directly to via and through holes without the solder being wicked into the vias or through holes, by filling plated through holes with an epoxy or cyanate fill composition. When cured and overplated, the fill composition provides support for the solder joint and provides a flat solderable surface for the inter-connection. In certain embodiments, the cured fill compositions, offer a further advantage of being conductive. The invention also relates to several novel methods for filling through holes with such fill compositions, and to resistors located in through holes and vias.
Abstract:
Methods of constructing a wire interconnect structure on a substrate are described. The methods broadly comprise the steps of depositing a spacer layer on a surface of the substrate, depositing a mask layer on the spacer layer, and removing a first portion of the mask layer overlying a desired area on the substrate surface to expose the spacer layer underlying the first portion of the mask layer. The methods further comprise the step of etching the structure such that a first portion of the spacer layer overlaying the desired area is removed and such that a portion of the desired area is exposed, and the step of depositing a first conductive material on the exposed portion of the desired area such that a conductive post is formed on the substrate surface and mounted to the desired area. Some of the disclosed methods comprise additional steps for forming an interconnect structure on the opposite surface of the substrate and providing an electrical interconnect means between the two interconnect structures. Additionally, some of the disclosed methods comprise steps for forming fillets around the conductive post at the substrate surface.
Abstract:
An electronic part is produced by forming two metallic wiring films of different materials on a main substrate, where a first metallic wiring film is formed on the main substrate, a protective film is formed in desired regions on the main substrate and the first metallic wiring film, and a second metallic wiring film is formed on the first metallic wiring film. The thus produced electronic part has an insulating protective film between the first and second metallic wiring films. By the presence of the protective film the surface of the first metallic wiring film is protected from etching, corrosion or deterioration by an agent for patterning the second metallic wiring film.
Abstract:
A conductor member for an electric circuit includes a conductive plastic mold in which carbon fibers or graphite fibers are dispersedly contained, and a metallic layer at least partially plated on the surface of said conductive plastic mold. The conductor member is provided on the surface of an insulating substrate to provide an electric circuit body. Thus, the conductor member for an electric circuit and the electric circuit body can be easily formed in a three-dimensional circuit because of its simple fabrication and excellent processing. Further, the film of metal plating can be made at a high speed and is hard to break because of the intimate contact of the plated metal.
Abstract:
A method for interconnecting a multilayer metal network of an electronic circuit board is provided. In the method, the electronic circuit board is made up of a plurality of superimposed metal layers having an insulating layer disposed therebetween, wherein the material of the insulating layer is substantially inert to a catalytic activation bath and to chemical deposition of metal. A via hole is formed in the board having a first metal layer thereof as its bottom and traversing a second metal layer and using electroless deposition, metal is deposited in the via by growing the metal from the metal layers only.
Abstract:
The present invention provides an improved circuit board for mounting integrated circuit chips and a technique for manufacturing the circuit board. The board permits direct chip attachment to the circuit board by providing the necessary geometry for the footprint pattern of the chip connections without the necessity of multi-level packaging using chip carriers. The circuit board includes a substrate with plated through holes, and a film of photoresist dielectric material disposed on the substrate. The dielectric material is photo patterned to form vias which are then filled with conductive material. Electrical connection pads are formed on the exposed surface of the film of dielectric material in the pattern of the chip footprint to be mounted thereon. The vias and plated through holes are arranged in groups and patterns which provide some direct connection between the pads and plated through holes, some pads wired to vias on the exposed surface of the film of dielectric material and some vias wired to plated through holes on the surface of the substrate.
Abstract:
A multi-layer wiring board where a plurality of wiring boards are laminated. The wiring board comprises a flexible insulating layer having a through hole and a wiring pattern formed on the flexible insulating layer. The wiring pattern is composed at least of two conductive layers. The first conductive layer formed on the insulating layer is made of a non-metallic conductor and the first wiring pattern is formed by a laser beam. The second conductive layer is an electroplated layer formed on the first wiring pattern. The first and second conductive layers have different reflectance for a beam. The wiring board is manufactured by integrally laminating a plastic conductive supporting plate wound in a roll shape and an insulating film similarly wound in a roll shape; forming a through hole in a predetermined position of the insulating film; forming the first conductive layer on the laminated body provided with the through hole; forming the first wiring pattern by a laser beam; and forming the electroplated layer on the first wiring pattern.
Abstract:
On a semiconductor integrated circuit die, a semipermanent electrical connection is effected by the use of wirebond techniques, in which the parameters of the wirebond are controlled, so that less bonding force retains the leadwires to the bondpads than the attachment strength of the bondpads to the die. The wirebond techniques include attaching leadwires to bondpads on the die, using ultrasonic wedge bonding. The strength of the bond between the leadwires is significantly less than the attachment strength of the bondpads, preferably by a ratio which ensures that the bondpads are not lifted from the die when the leadwires are removed by breaking the bond between the leadwires and the bondpads. Subsequent to testing and burnin, the bond between the leadwires and the bondpads is severed. The die are then removed from the package body and the bondpads may then be attached by conventional means. The technique is useful in providing known good die.
Abstract:
In order to provide pretested bare semiconductor integrated circuit die, a temporary mechanical connection is effected by the use of a soluble material. A semipermanent electrical connection is effected, in which the parameters of the connection are controlled, so that the die remains functional subsequent to burnin and test. Subsequent to testing and burnin, the die are removed from the package body. The technique is useful in providing known good die.