CIRCUIT BOARD AND MANUFACTURING METHOD THEREOF
    164.
    发明申请
    CIRCUIT BOARD AND MANUFACTURING METHOD THEREOF 有权
    电路板及其制造方法

    公开(公告)号:US20170013710A1

    公开(公告)日:2017-01-12

    申请号:US14849614

    申请日:2015-09-10

    Abstract: A circuit board includes a substrate, a patterned copper layer, a phosphorous-containing electroless plating palladium layer, an electroless plating palladium layer and an immersion plating gold layer. The patterned copper layer is disposed on the substrate. The phosphorous-containing electroless plating palladium layer is disposed on the patterned copper layer, wherein in the phosphorous-containing electroless plating palladium layer, a weight percentage of phosphorous is in a range from 4% to 6%, and a weight percentage of palladium is in a range from 94% to 96%. The electroless plating palladium layer is disposed on the phosphorous-containing electroless plating palladium layer, wherein in the electroless plating palladium layer, a weight percentage of palladium is 99% or more. The immersion plating gold layer is disposed on the electroless plating palladium layer.

    Abstract translation: 电路板包括基板,图案化铜层,含磷化学镀钯层,无电镀钯层和浸镀金层。 图案化铜层设置在基板上。 含磷化学镀钯层设置在图案化的铜层上,其中,在含磷化学镀钯层中,磷的重量百分比为4〜6%,钯的重量百分比为 在94%至96%的范围内。 无电镀钯层配置在含磷化学镀钯层上,其中,在化学镀钯层中,钯的重量百分比为99%以上。 浸镀金层设置在化学镀钯层上。

    Sputtering target for forming protective film and laminated wiring film
    165.
    发明授权
    Sputtering target for forming protective film and laminated wiring film 有权
    用于形成保护膜和层压布线膜的溅射靶

    公开(公告)号:US09543128B2

    公开(公告)日:2017-01-10

    申请号:US14090203

    申请日:2013-11-26

    Abstract: A sputtering target for forming protective film according to the invention is used to form protective film on one surface or both surfaces of a Cu wiring film, and includes 8.0 to 11.0% by mass of Al, 3.0 to 5.0% by mass of Fe, 0.5 to 2.0% by mass of Ni and 0.5 to 2.0% by mass of Mn with a remainder of Cu and inevitable impurities. In addition, a laminated wiring film includes a Cu wiring film and protective film formed on one surface or both surfaces of the Cu wiring film, and the protective film is formed by using the above sputtering target.

    Abstract translation: 根据本发明的用于形成保护膜的溅射靶用于在Cu布线膜的一个表面或两个表面上形成保护膜,并且包括8.0至11.0质量%的Al,3.0至5.0质量%的Fe,0.5 至2.0质量%的Ni和0.5〜2.0质量%的Mn,余量为Cu和不可避免的杂质。 此外,层叠布线膜包括Cu布线膜和形成在Cu布线膜的一个表面或两个表面上的保护膜,并且通过使用上述溅射靶形成保护膜。

    PRINTED CIRCUIT BOARD AND METHOD FOR MANUFACTURING SAME
    167.
    发明申请
    PRINTED CIRCUIT BOARD AND METHOD FOR MANUFACTURING SAME 有权
    印刷电路板及其制造方法

    公开(公告)号:US20160353582A1

    公开(公告)日:2016-12-01

    申请号:US14848517

    申请日:2015-09-09

    Inventor: WEI-SHUO SU

    Abstract: The present disclosure relates to a method for manufacturing a printed circuit board. The method includes the steps as follows. First, a substrate including a base layer and a copper foil layer on a surface of the base layer is provided. Second, a conductive layer is formed on portions of the copper foil layer. Third, portions of the copper foil layer exposed from the conductive layer are removed by an etching process, and the conductive layer is thinner by the etching process. The reserved portions of the copper foil layer and the conductive layer forms a conductive pattern to obtain a printed circuit board without plating wires. A printed circuit board without plating wires made by the above method is also provided.

    Abstract translation: 本公开涉及印刷电路板的制造方法。 该方法包括以下步骤。 首先,提供在基底层的表面上具有基底层和铜箔层的基板。 其次,在铜箔层的部分上形成导电层。 第三,通过蚀刻工艺去除从导电层露出的铜箔层的部分,并且通过蚀刻工艺使导电层更薄。 铜箔层和导电层的保留部分形成导电图案以获得没有电镀线的印刷电路板。 还提供了一种不用上述方法制成的电镀线的印刷电路板。

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