Abstract:
Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.
Abstract:
The invention relates to a device for crystal orientation measurement, comprising an ion source (42); means (44) for focusing ions emitted from the ion source into an ion probe; and means (18) for receiving a crystalline or multicrystalline sample (16), characterized by an imaging ion detector (12) for registering at least one ion blocking pattern (26) in digital form. The invention further relates to the use of a device according to one of the preceding claims for crystal orientation measurement. The invention further relates to a method for crystal orientation measurement, comprising the focusing of ions emitted from an ion source (42) into an ion probe; directing the ion probe onto a crystalline or multicrystalline sample (16); and registering at least one ion blocking pattern (26) in digital form with the aid of an imaging ion detector (12).
Abstract:
The invention concerns a corrector (10) for chromatic and aperture aberration correction in a scanning electron microscope or a scanning transmission electron microscope, comprising four multipole elements (1, 2, 3, 4) which are consecutively disposed in the optical path (9), the first (1) and fourth (4) of which are used to generate quadrupole fields (5, 6) and the second (2) and third (3) of which are used to generate octupole fields (11, 12) and quadrupole fields (7, 7′, 8, 8′), wherein the latter are superposed magnetic (7, 8) and electric (7′, 8′) fields, and wherein the quadrupole fields (5, 6, 7, 8) of all four multipole elements (1, 2, 3, 4) are successively rotated with respect to one another through 90°. Elimination of errors up to fifth order can be realized with a corrector (10) of this type in that the second (2) and the third (3) multipole elements are designed as twelve-pole elements, and an additional twelve-pole element (13) is inserted between the second (2) and the third (3) multipole element, and is loaded with current and/or voltage, such that an octupole field (14) is generated that is superposed by a twelve-pole field (15).
Abstract:
An apparatus for simultaneous parallel processing of a sample using light energy for optical viewing or surface processing in parallel with a charged particle beam. A charged particle beam transmits a focused ion beam or an electron beam along a path to a sample. An optical microscope transmits light along a first path to the sample, and a prism aligned along the first light path reflects light into a second light path toward the sample. A portion of the prism and reflective surface is removed for passage of the charged particle beam. A lens is aligned along the second light path and has a portion removed for passage of the charged particle beam. The removed portions of the prism and lens are aligned along the charged particle beam path to permit parallel delivery of the charged particle beam and the light to substantially the same portion of the sample.
Abstract:
A reusable sample-holding device for readily loading very small wet samples for observation of the samples by microscopic equipment, in particular in a vacuum environment. Embodiments may be used with a scanning electron microscope (SEM), a transmission electron microscope (TEM), an X-ray microscope, optical microscope, and the like. For observation of the sample, embodiments provide a thin-membrane window etched in the center of each of two silicon wafers abutting to contain the sample in a small uniform gap formed between the windows. This gap may be adjusted by employing spacers. Alternatively, the thickness of a film established by the fluid in which the sample is incorporated determines the gap without need of a spacer. To optimize resolution each window may have a thickness on the order of 50 nm and the gap may be on the order of 50 nm.
Abstract:
In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
Abstract:
Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.
Abstract:
A nanorobot module with a measurement device for the measurement of spatial surface properties with a measurement range in the centimetre range and a resolution in the nanometre range, that can be arranged in a vacuum chamber, for example the vacuum chamber of a microscope. Along with this integration of the nanorobot module into a vacuum chamber, the disclosure further relates to the automation of the module in the chamber system, in particular the connection of the controller of the nanorobot system and the chamber system by the provision of an interface between both systems. Finally, the disclosure relates to a mechatronic exchange adapter for the flexible securing of nanorobot modules within a vacuum chamber, in particular the disclosure relates to an exchange adapter, which preferably in one process electrically connects a nanorobot module and mechanically secures it so that it is guided with high precision and without play.
Abstract:
In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
Abstract:
An apparatus for holding a specimen to be viewed in a focused beam microscope, which can be an electron microscope or a focused ion beam microscope. The apparatus has a base and a specimen carriage with specimen mounting surface in a first plane and an ion beam screen or knife blade. The relative position between the ion beam screen and the specimen carriage are remotely adjustable while the apparatus is mounted in the focused beam microscope. In a further embodiment, the apparatus is transferable between an ion beam milling device and the focused beam microscope while the milling device and the microscope share a common vacuum.