-
171.发明申请公开(公告)号：US20210272784A1
公开(公告)日：2021-09-02
申请号：US17282381
申请日：2019-11-01
Inventor： Yoshiyuki TERAMOTO , Akihiro WAKISAKA
Abstract: Provided is an inductively coupled plasma spectrometric system for measuring an emission state of plasma into which a measurement target sample is fed, the inductively coupled plasma spectrometric system including: a spectrometer configured to resolve light emitted in a measurement region set in the plasma into a plurality of wavelength components; a detection device configured to detect a spatial distribution of the resolved light; and a measuring device configured to measure the detected spatial distribution at every measurement unit time, the measurement unit time being at least shorter than time required for the sample to pass through the measurement region.
-
公开(公告)号：US20210270744A1
公开(公告)日：2021-09-02
申请号：US17259937
申请日：2019-07-31
Inventor： Rui Miguel DA COSTA MARTINS , Pedro Alberto DASILVA JORGE , Eduardo Alexander PEREIRA SILVA , José Miguel SOARES DE ALMEIDA , Alfredo Manuel DE OLIVEIRA MARTINS
Abstract: The present invention is enclosed in the area of machine learning, in particular machine learning for the analysis of High or Super-resolution spectroscopic data, which typically comprises analysis of highly complex samples/mixtures of substances and/or data with low resolution, for instance Laser-Induced Breakdown Spectroscopy (LIBS). It is an object of the present invention a method of computational self-learning for characterization of one or more constituents in a sample, from electromagnetic spectral information of such sample, which changes the paradigm associated with prior art methods, by using only sub-optical spectral information, i.e., obtaining the resolution of the spectral information and thereby be able to extract spectral lines—thus determining a spectral line position—from such spectral information, hence avoiding all the uncertainty associated with pixel based methods. It is also an object of the present invention a computational apparatus configured to implement such method.
-
公开(公告)号：US11079333B2
公开(公告)日：2021-08-03
申请号：US16828274
申请日：2020-03-24
Applicant: SciAps, Inc.
Inventor： David R. Day
Abstract: A spectrometer system and method including a laser source for directing a laser beam to a sample producing plasma radiation on the sample. At least one fiber of a fiber bundle is connected to an illumination source for directing light to the sample. A spectrometer subsystem receives plasma radiation from the sample via the detection fiber bundle. A camera receives light from the illumination source reflected off the sample for detecting the presence of the sample.
-
公开(公告)号：US20210175055A1
公开(公告)日：2021-06-10
申请号：US17113031
申请日：2020-12-05
Applicant: TOKYO ELECTRON LIMITED
Inventor： Atsushi SAWACHI , Ichiro SONE , Takuya NISHIJIMA , Suguru SATO
Abstract: A measuring device for a vacuum processing apparatus including a processing chamber having a first gate for loading and unloading a substrate and a second gate different from the first gate is provided. The measuring device includes a case having art opening that is sized to correspond to the second gate of the processing chamber and is airtightly attachable to the second gate, a decompressing mechanism configured to reduce a pressure in the case, and a measuring mechanism accommodated in the case and configured to measure a state in the processing chamber through the opening in a state where the pressure in the case is reduced by the decompressing mechanism.
-
公开(公告)号：US11013414B2
公开(公告)日：2021-05-25
申请号：US15504057
申请日：2016-05-10
Applicant: SYNAPTIVE MEDICAL INC.
Inventor： Ze Shan Yao , Piotr Kuchnio , Michael Frank Gunter Wood , Tammy Kee-Wai Lee , Yanhui Bai , Michael Peter Bulk , Christopher Thomas Jamieson
IPC: A61B5/00 , A61B34/20 , A61B5/026 , G01J3/443 , A61B90/00 , A61B5/06 , G01J3/28 , G01J3/10 , G01J3/02 , A61B90/20 , A61B90/30 , A61B17/34
Abstract: A multispectral synchronized imaging system is provided. A multispectral light source of the system includes: blue, green and red LEDs, and one or more non-visible light sources, each being independently addressable and configured to emit, in a sequence: at least visible white light, and non-visible light in one or more given non-visible frequency ranges. The system further includes a camera and an optical filter arranged to filter light received at the camera, by: transmitting visible light from the LEDs; filter out non-visible light from the non-visible light sources; and otherwise transmit excited light emitted by a tissue sample excited by non-visible light. Images acquired by the camera are output to a display device. A control unit synchronizes acquisition of respective images at the camera for each of blue light, green light, visible white light, and excited light received at the camera, as reflected by the tissue sample.
-
Patent Agency Ranking
176.发明授权公开(公告)号：US10975470B2
公开(公告)日：2021-04-13
申请号：US16242852
申请日：2019-01-08
Applicant: ASM IP Holding B.V.
Inventor： John Shugrue , Carl White
IPC: C23C16/455 , C23C16/52 , C23C16/505 , G01N21/73 , G01N21/68 , G01J3/443 , H01L21/67 , H01L21/02 , H05H1/46 , H01J37/32 , G01N21/15
Abstract: An apparatus and method are disclosed for monitoring and/or detecting concentrations of a chemical precursor in a reaction chamber. The apparatus and method have an advantage of operating in a high temperature environment. An optical emissions spectrometer (OES) is coupled to a gas source, such as a solid source vessel, in order to monitor or detect an output of the chemical precursor to the reaction chamber. Alternatively, a small sample of precursor can be periodically monitored flowing into the OES and into a vacuum pump, thus bypassing the reaction chamber.
-
公开(公告)号：US10971413B2
公开(公告)日：2021-04-06
申请号：US15947994
申请日：2018-04-09
Applicant: Tokyo Electron Limited
Inventor： Taro Ikeda , Yuki Osada
IPC: H01L21/66 , G01J3/443 , C23C16/455 , H01J37/32 , H01L21/02 , H01L21/3065 , C23C16/52 , C23C16/511
Abstract: Provided is a plasma processing apparatus including a microwave radiating mechanism configured to radiate microwaves output from a microwave output unit into a processing container. The microwave radiating mechanism includes: an antenna configured to radiate the microwaves; a dielectric member configured to transmit the microwaves radiated from the antenna, and form an electric field for generating surface wave plasma by the microwaves; a sensor provided in the microwave radiating mechanism or adjacent to the microwave radiating mechanism, and configured to monitor electron temperature of the generated plasma; and a controller configured to determine a plasma ignition state based on the electron temperature of the plasma monitored by the sensor.
-
公开(公告)号：US10900907B2
公开(公告)日：2021-01-26
申请号：US15897684
申请日：2018-02-15
Applicant: Radom Corporation
Inventor： Ashok Menon , Velibor Pikelja , Jovan Jevtic
Abstract: A portable, modular plasma source allows the production of an emission spectrometer by combination with a common portable fiber optic spectrograph by channeling emitted light through a fiber optic coupling communicating light from the plasma source to the portable fiber optic spectrograph.
-
179.发明授权公开(公告)号：US10892147B2
公开(公告)日：2021-01-12
申请号：US15865171
申请日：2018-01-08
Applicant: Applied Materials, Inc.
Inventor： Sairaju Tallavarjula , Kailash Pradhan , Huy Q. Nguyen , Jian Li
Abstract: Methods for matching semiconductor processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a process in a reference chamber and a process in an aged chamber. Using a calibrated light source, an optical path equivalent to an optical path in a reference chamber and an optical path in an aged chamber can be compared by determining a correction factor. The correction factor is applied to adjust a measured intensity of plasma radiation through the optical path in the aged chamber. Comparing a measured intensity of plasma radiation in the reference chamber and the adjusted measured intensity in the aged chamber provide an indication of changed chamber conditions. A magnitude of change between the two intensities can be used to adjust the process parameters to yield a processed substrate from the aged chamber which matches that of the reference chamber.
-
公开(公告)号：US10801888B2
公开(公告)日：2020-10-13
申请号：US16681323
申请日：2019-11-12
Inventor： Esa Räikkönen
Abstract: In accordance with an example embodiment of the invention, a detector assembly for an analyzer device for analysis of elemental composition of a sample using optical emission spectroscopy is provided. The detector assembly comprises an exciter for generating an excitation focused at a target position to invoke an optical emission from a surface of the sample at the target position; and a light collection arrangement for transferring the optical emission to a spectrometer. The light collection arrangement comprises a concave spherical mirror, an optical receiver arranged in an image point in the principal axis of the concave spherical mirror and a folding mirror including at least one aperture. The exciter is arranged with respect to the light collection arrangement such that the excitation is transferred towards the target position through said at least one aperture, and the folding mirror is arranged between the concave spherical mirror and the optical receiver such that the folding mirror folds the principal axis of the concave spherical mirror towards the target position and such that said at least one aperture is aligned with the principal axis of the concave spherical mirror to allow transferring optical emission reflected from the concave spherical mirror therethrough towards the optical receiver.
-
-
-
-
-
-
-
-
-
Search Results
772
records
(took 0.031 seconds)
