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11.发明申请LITHOGRAPHIC APPARATUS COMPRISING AN ACTUATOR, AND METHOD FOR PROTECTING SUCH ACTUATOR 有权包括执行器的平面设备和用于保护执行器的方法公开(公告)号：US20150070678A1
公开(公告)日：2015-03-12
申请号：US14395454
申请日：2013-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria Cadee , Sander Christiaan Broers , Sven Antoin Johan Hol , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Bastiaan Lambertus Wilhelmus Marinus Van De Ven
IPC: G03F7/20
CPC classification number: G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
Abstract translation: 光刻设备包括一个系统。 该系统包括第一部分，第二部分和能量吸收元件。 第二部分被配置为相对于第一部分移动。 该系统在系统的操作模式期间具有位于第一部分和第二部分之间的间隙。 当第一部分和第二部分在系统的故障模式下彼此碰撞时，能量吸收元件用于在第一部分和第二部分之间吸收能量。 能量吸收元件在间隙之外。
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公开(公告)号：US12032296B2
公开(公告)日：2024-07-09
申请号：US17776369
申请日：2020-10-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Yang-Shan Huang , Nicolaas Ten Kate
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/709
Abstract: A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.
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公开(公告)号：US11092902B2
公开(公告)日：2021-08-17
申请号：US16624609
申请日：2018-05-17
Applicant: ASML Netherlands B.V.
Inventor： Johannes Franciscus Martinus D'Achard Van Enschut , Tamara Druzhinina , Nitish Kumar , Sarathi Roy , Yang-Shan Huang , Arie Jeffrey Den Boef , Han-Kwang Nienhuys , Pieter-Jan Van Zwol , Sander Bas Roobol
Abstract: Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
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Patent Agency Ranking
公开(公告)号：US09389518B2
公开(公告)日：2016-07-12
申请号：US13686854
申请日：2012-11-27
Applicant: ASML Netherlands B.V.
Inventor： Antonius Franciscus Johannes De Groot , Raymond Wilhelmus Louis Lafarre , Yang-Shan Huang , Sander Christiaan Broers , Peter Laurentius Maria Ros
CPC classification number: G03F7/70758 , G03B27/58 , G03F7/70775
Abstract: A movable stage system is configured to support an object. The stage system comprises an object table configured to support the object and an object table support defining an object table support surface configured to support the object table. The object table support comprises at least one first actuator to drive the object table support in a first driving direction substantially parallel to the object table support surface. In a projection on a plane parallel to the object table support surface the at least one actuator is spaced with respect to the object table in a direction perpendicular to the first driving direction such that the risk on slip between the object table support and the object table supported thereon is decreased.
Abstract translation: 可移动台系统被配置为支撑物体。 舞台系统包括被配置为支撑对象的对象表和定义被配置为支持对象表的对象表支持表面的对象表支持。 物体台支撑件包括至少一个第一致动器，以在基本上平行于物体台支撑表面的第一驱动方向上驱动物体台支撑件。 在与物体台支撑表面平行的平面上的突起中，至少一个致动器在垂直于第一驱动方向的方向上相对于物体台间隔开，使得物体台支撑件和物体台之间的滑动风险 支撑在其上。
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公开(公告)号：US11961698B2
公开(公告)日：2024-04-16
申请号：US17344446
申请日：2021-06-10
Applicant: ASML Netherlands B.V.
Inventor： Christiaan Otten , Peter-Paul Crans , Marc Smits , Laura Del Tin , Christan Teunissen , Yang-Shan Huang , Stijn Wilem Herman Karel Steenbrink , Xuerang Hu , Qingpo Xi , Xinan Luo , Xuedong Liu
IPC: H01J37/15 , H01J37/02 , H01J37/14 , H01J37/147 , H01J37/18 , H01J37/244 , H01J37/28 , H01J37/20 , H01J37/317
CPC classification number: H01J37/15 , H01J37/023 , H01J37/14 , H01J37/1477 , H01J37/18 , H01J37/244 , H01J37/28 , H01J37/20 , H01J37/3177 , H01J2237/2006 , H01J2237/20214 , H01J2237/2817
Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.
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公开(公告)号：US20200117097A1
公开(公告)日：2020-04-16
申请号：US16716568
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US10571814B2
公开(公告)日：2020-02-25
申请号：US16318191
申请日：2017-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US09811005B2
公开(公告)日：2017-11-07
申请号：US15003768
申请日：2016-01-21
Applicant: ASML Netherlands B.V.
Inventor： Yang-Shan Huang , Theodorus Petrus Maria Cadee
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70725 , G03F7/70758
Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.
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