Curtain coating device
    15.
    发明授权

    公开(公告)号:US09675991B2

    公开(公告)日:2017-06-13

    申请号:US14729781

    申请日:2015-06-03

    Applicant: Heikki Vatanen

    Inventor: Heikki Vatanen

    Abstract: A curtain coating device for paper and board machines has a nozzle beam (10) with a nozzle lip (12) with an edge strip (11) for feeding the coating color curtain and edge guides (20) located along each edge of the nozzle lips (12) controlling the width of the coating color curtain. The edge guide (20) has upper and lower ends. Flow surfaces (22) extend in a substantially vertical direction parallel and next to each other. The edge guide has a lubrication feed (24), additional lubrication feeds (26) and a suction opening (27). The flow surfaces (22) are inclined toward each other forming a flow guide recess (25) which extends in a vertical direction such that the form of the flow surfaces (22) with the flow guide recess (25) is concave. A protrusion (21) extends within the recess in the direction of the flow guide recess (25).

    Robotic object coating system
    17.
    发明授权
    Robotic object coating system 有权
    机器人涂装系统

    公开(公告)号:US09568906B2

    公开(公告)日:2017-02-14

    申请号:US14030534

    申请日:2013-09-18

    Abstract: A method and apparatus for coating a group of objects may be provided. A three-dimensional model of the group of objects may be generated. Segments that represent each object in the group of objects in the three-dimensional model may be formed. Instructions for coating the group of objects may be generated based on the segments. The instructions may be configured to cause a robotic coating system to coat the group of objects.

    Abstract translation: 可以提供用于涂覆一组物体的方法和装置。 可以生成一组对象的三维模型。 可以形成表示三维模型中的对象组中的每个对象的段。 可以基于段来生成用于涂覆对象组的说明。 说明书可以被配置成使机器人涂层系统涂覆一组物体。

    METHOD FOR MANUFACTURING THIN FILM CHIP RESISTOR DEVICE
    18.
    发明申请
    METHOD FOR MANUFACTURING THIN FILM CHIP RESISTOR DEVICE 有权
    制造薄膜芯片电阻器件的方法

    公开(公告)号:US20160351307A1

    公开(公告)日:2016-12-01

    申请号:US14946155

    申请日:2015-11-19

    Inventor: WAN-PING WANG

    Abstract: A method for manufacturing a thin film chip resistor device includes the steps of: disposing a magnetic fixing member on a first surface of a substrate, and disposing a magnetic shadow mask on a second surface of the substrate opposite to the first surface, such that the magnetic shadow mask detachably and fixedly contacts the second surface of the substrate by virtue of an attractive magnetic force between the magnetic fixing member and the magnetic shadow mask; and depositing at least one resistor unit on the second surface of the substrate with the use of the magnetic shadow mask, the resistor unit including two separated first electrode elements and a resistor element that electrically interconnects the first electrode elements.

    Abstract translation: 一种制造薄膜片式电阻器件的方法包括以下步骤:在基片的第一表面上设置磁性固定件,并在与第一表面相对的基片的第二表面上设置磁性掩模,使得 磁性荫罩借助于磁性固定构件和磁性荫罩之间的有吸引力的磁力而可拆卸地固定地接触基板的第二表面; 以及使用所述磁性掩模在所述衬底的所述第二表面上沉积至少一个电阻器单元,所述电阻器单元包括两个分离的第一电极元件和电连接所述第一电极元件的电阻元件。

    WIDE PATTERN NOZZLE
    19.
    发明申请
    WIDE PATTERN NOZZLE 审中-公开
    宽图案喷嘴

    公开(公告)号:US20160236226A1

    公开(公告)日:2016-08-18

    申请号:US15137579

    申请日:2016-04-25

    Abstract: The invention relates, inter alia, to a device (10) for applying a plurality of threads (17) of a fluid, such as adhesive or lotion, to a moving web-like substrate (11), having a plurality of outlet openings (15a, 15b, 15c, 15d, 15e) for the threads of fluid (17, 17a, 17b, 17c), wherein each outlet opening is disposed between a pair of flow openings (16a, 16b, 16c, 16d, 16e), through which a flow fluid (21), in particular compressed air, flows in order to achieve thread oscillation. The special feature consists, inter alia, in that the outlet openings are disposed along a curved path (22, 22′).

    Abstract translation: 本发明尤其涉及一种用于将诸如粘合剂或洗剂之类的流体的多个螺纹(17)施加到移动的网状基底(11)上的装置(10),该基片具有多个出口 15a,15b,15c,15d,15e),其中每个出口开口设置在一对流动开口(16a,16b,16c,16d,16e)之间,通过 流体流体(21),特别是压缩空气流动,以实现螺纹振动。 其特征在于,其特征在于,出口开口沿弯曲路径(22,22')设置。

    SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
    20.
    发明申请
    SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS 有权
    基板液体处理装置,基板液体处理方法和基板处理装置

    公开(公告)号:US20160221046A1

    公开(公告)日:2016-08-04

    申请号:US15005516

    申请日:2016-01-25

    CPC classification number: B05C11/00 B08B2203/0229 H01L21/6715 H01L21/68792

    Abstract: A substrate liquid processing apparatus including: a substrate rotary-holding unit configured to rotate a substrate while holding the substrate; and a processing liquid supply unit configured to supply a processing liquid to a bottom surface of the substrate held by the substrate rotary-holding unit. The substrate rotary-holding unit includes: a base plate disposed spaced apart from the substrate below the substrate; a cover member supported by the base plate and disposed outside an outer periphery of the substrate; and a discharge port formed between the base plate and the cover member and configured to discharge an air stream occurring below the substrate. The support portion of the base plate and the cover member protrudes outwards from a top surface of the base plate to be connected to the cover member.

    Abstract translation: 一种基板液体处理装置,包括:基板旋转保持单元,被配置为在保持基板的同时旋转基板; 以及处理液体供给单元,其构造成将处理液体供给到由所述基板旋转保持单元保持的所述基板的底面。 基板旋转保持单元包括:与基板下方的基板隔开设置的基板; 盖构件,其由所述基板支撑并且设置在所述基板的外周的外侧; 以及形成在所述基板和所述盖部件之间并且被配置为排出在所述基板下方发生的空气流的排出口。 基板的支撑部分和盖构件从基板的顶表面向外突出以与盖构件连接。

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