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    Method for depositing a patterned layer of material over a substrate
    12.
    发明授权
    Method for depositing a patterned layer of material over a substrate 有权
    在衬底上沉积图案化材料层的方法

    公开(公告)号：US06458426B1

    公开(公告)日：2002-10-01

    申请号：US09717351

    申请日：2000-11-22

    Applicant: Vladimir Bulovic ,  Stephen R. Forrest

    Inventor： Vladimir Bulovic ,  Stephen R. Forrest

    IPC: B05D128

    CPC classification number: B82Y10/00 ,  B01J2219/00382 ,  B05D1/007 ,  B05D1/283 ,  B82Y30/00 ,  B82Y40/00 ,  C40B60/14 ,  G03F7/0002

    Abstract: This application relates to a method of depositing a patterned layer of material, such as organic material, over a substrate or organizing materials over a substrate. The method involves using a stamp having at least one conductive pathway and an insulating layer to transfer material from a solution to a substrate in a specified pattern. The stamp may be used multiple times to transfer a similar pattern of organic material to multiple substrates or to different portions of the same substrate. The transferred material may then be preferably used as a photolithographic mask for nano-patterning the substrate. This application also relates to a stamp that may be used in depositing a patterned layer of material onto a substrate, a method of forming such a stamp, and a method of depositing a layer of oriented molecules over a substrate.

    Abstract translation: 本申请涉及在衬底上沉积诸如有机材料的图案化层材料层或在衬底上组织材料的方法。 该方法包括使用具有至少一个导电通路的印模和绝缘层以特定的图案将材料从溶液转移到基底。 印模可以多次使用以将相似图案的有机材料转移到多个基板或相同基底的不同部分。 然后可以将转移的材料用作用于纳米图案化衬底的光刻掩模。 本申请还涉及可以用于将图案化的材料层沉积到衬底上的印模，形成这种印模的方法以及在衬底上沉积定向分子层的方法。

    Method for forming polymer brush pattern on a substrate surface
    13.
    发明授权
    Method for forming polymer brush pattern on a substrate surface 失效
    在基材表面上形成聚合物刷图案的方法

    公开(公告)号：US06413587B1

    公开(公告)日：2002-07-02

    申请号：US09261300

    申请日：1999-03-02

    Applicant: Craig Jon Hawker ,  James Lupton Hedrick ,  Nicholas Abbott

    Inventor： Craig Jon Hawker ,  James Lupton Hedrick ,  Nicholas Abbott

    IPC: B05D128

    CPC classification number: B82Y30/00 ,  B05D1/185 ,  B05D1/283 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/165 ,  Y10T428/24802 ,  Y10T428/24826 ,  Y10T428/24917 ,  Y10T428/26 ,  Y10T428/261 ,  Y10T428/268 ,  Y10T428/269

    Abstract: A method is disclosed for providing a patterned surface wherein predetermined regions of the surface are masked with a self-assembled monolayer (“SAM”) covalently bound to a brush polymer overlayer. The remainder of the substrate surface will generally be functionalized with a second self-assembled monolayer. Preferably, the method involves a microcontact printing technique, wherein a molecular moiety capable of spontaneously forming an SAM upon transfer to a surface is “stamped” onto a substrate surface, followed by growth (or covalent attachment) of a polymer on exposed functional groups within the SAM molecules. Coverage of surface regions with both an SAM and a polymer overlayer provides a number of advantages, particularly with regard to surface masking during etching and the like. The method is useful in the manufacture of microelectronic circuitry, biosensors, high-density assay plates, and the like.

    Abstract translation: 公开了一种用于提供图案化表面的方法，其中表面的预定区域被共价结合到刷式聚合物覆盖层上的自组装单层（“SAM”）掩蔽。 基底表面的其余部分通常将用第二自组装单层进行功能化。 优选地，该方法包括微接触印刷技术，其中能够在转移到表面时自发形成SAM的分子部分被“冲压”到基底表面上，随后在暴露的官能团上的聚合物的生长（或共价附着） SAM分子。 具有SAM和聚合物覆盖层的表面区域的覆盖提供了许多优点，特别是关于在蚀刻等期间的表面掩蔽。 该方法在制造微电子电路，生物传感器，高密度测定板等方面是有用的。

    Selective chemical vapor deposition of polymers
    14.
    发明授权
    Selective chemical vapor deposition of polymers 失效
    聚合物的选择性化学气相沉积

    公开(公告)号：US5869135A

    公开(公告)日：1999-02-09

    申请号：US909690

    申请日：1997-10-03

    Applicant: Kathleen M. Vaeth ,  Klavs F. Jensen

    Inventor： Kathleen M. Vaeth ,  Klavs F. Jensen

    IPC: B05D1/28 ,  B05D7/24 ,  C09K11/06 ,  C23C16/04 ,  H01L51/00 ,  H01L51/30 ,  H01L51/40 ,  H01L51/50

    CPC classification number: H01L51/5012 ,  B05D1/60 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C09K11/06 ,  C23C16/04 ,  H01L51/0002 ,  B05D1/283 ,  H01L51/0038

    Abstract: A system for selective chemical vapor deposition of polymers onto a substrate. A substrate is provided which comprises a plurality of surface regions, wherein the surface of at least one region provides a more favorable nucleation site for at least one of a polymer or polymer precursor than at least one other region. This may be an intrinsic characteristic of the substrate or may be accomplished through surface treatment of a substrate. The substrate is subjected to chemical vapor deposition of a reactive monomer, producing a polymer coating which is substantially thicker in the regions of favorable nucleation than in the regions of unfavorable nucleation.

    Abstract translation: 用于将聚合物选择性化学气相沉积到基底上的系统。 提供了包括多个表面区域的基底，其中至少一个区域的表面比至少一个其它区域为聚合物或聚合物前体中的至少一个提供更有利的成核位点。 这可以是衬底的固有特性，或者可以通过衬底的表面处理来实现。 将基底进行化学气相沉积反应性单体，产生聚合物涂层，其在有利成核区域中的厚度大于在不利成核区域内的厚度。

    Apparatus and method for stamping a surface
    15.
    发明授权
    Apparatus and method for stamping a surface 失效
    用于冲压表面的装置和方法

    公开(公告)号：US5669303A

    公开(公告)日：1997-09-23

    申请号：US610776

    申请日：1996-03-04

    Applicant: George N. Maracas ,  Lawrence N. Dworsky ,  Kathleen Tobin

    Inventor： George N. Maracas ,  Lawrence N. Dworsky ,  Kathleen Tobin

    IPC: B41K3/02 ,  B05C1/02 ,  B05D1/18 ,  B05D1/28 ,  C40B60/14 ,  G03F7/00 ,  H01L21/027 ,  B41F31/00

    CPC classification number: B82Y30/00 ,  B05C1/027 ,  B05D1/185 ,  B05D1/28 ,  B05D1/283 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  B01J2219/00382 ,  C40B60/14

    Abstract: An apparatus (100) including a support structure (104), a flexible stamp (106) having a stamping surface (110) including a predetermined pattern disposed opposite the support structure (104), a pressure controlled chamber (112) disposed above the support structure (104), and a mechanical attachment (114) affixed to the flexible stamp (106). A method is provided for stamping the surface (101) of an article (102) including the steps of i) placing the article (102) on the support structure (104) within the pressure-controlled chamber (112), ii) wetting the stamping surface (110) with a solution containing a self-assembled monolayer-forming molecular species, iii) aligning alignment patterns (118) on the flexible stamp (106) with alignment patterns (124) on the surface (101) of the article (102), iv) controllably contacting the wetted stamping surface (110) with the surface (101) of the article (102) by changing the pressure differential across the flexible stamp (106) so that contact commences at the center of the flexible stamp (106) and proceeds outwardly in a controlled manner, and v) removing the stamping surface (110) from the surface (101) of the article so that a self-assembled monolayer (134) having the predetermined pattern is formed on the surface (101) of the article (102).

    Abstract translation: 一种包括支撑结构（104）的装置（100），具有包括与所述支撑结构（104）相对设置的预定图案的冲压表面的柔性印模（106），设置在所述支撑结构（104）上方的压力控制室 结构（104）和固定到柔性印模（106）上的机械附件（114）。 提供了一种用于冲压制品（102）的表面（101）的方法，包括以下步骤：i）将制品（102）放置在压力控制室（112）内的支撑结构（104）上，ii）润湿 用包含自组装单层形成分子种类的溶液冲压表面（110），iii）将柔性印模（106）上的对准图案（118）与制品的表面（101）上的对准图案（124）对准（ 102），iv）通过改变柔性印章（106）上的压差来可控地将湿润的冲压表面（110）与制品（102）的表面（101）接触，使得在柔性印模的中心开始接触 106），并且以受控的方式向外移动，以及v）从制品的表面（101）移除冲压表面（110），使得在表面（101）上形成具有预定图案的自组装单层（134） ）的物品（102）。

    Method for patterning a substrate surface
    20.
    发明授权
    Method for patterning a substrate surface 有权
    图案化衬底表面的方法

    公开(公告)号：US08714082B2

    公开(公告)日：2014-05-06

    申请号：US10575437

    申请日：2004-10-07

    Applicant: Dirk Burdinski ,  Ruben B. A. Sharpe

    Inventor： Dirk Burdinski ,  Ruben B. A. Sharpe

    IPC: B44B11/04

    CPC classification number: B82Y30/00 ,  B05D1/283 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: An elastomeric stamp has a bulk surface from which protruding features extend. A barrier layer covers the bulk surface and the protruding features. After applying an ink solution to the elastomeric stamp and drying the elastomeric stamp, the elastomeric stamp is brought into contact with a surface of a first substrate. The surface of the first substrate has a high affinity with the ink molecules, which is utilized to effectively remove the ink molecules from the contact surfaces of the protruding features. Subsequently, the elastomeric stamp is brought into contact with the surface of a second substrate. Ink molecules are transferred from the edges of the protruding features to the surface of a second substrate, thus forming an ink pattern in the form of a self assembled monolayer on this surface.

    Abstract translation: 弹性印模具有突出特征延伸的主体表面。 阻挡层覆盖体表面和突出特征。 在将墨水溶液施加到弹性体印模上并干燥弹性体印模之后，使弹性体印模与第一基板的表面接触。 第一衬底的表面与油墨分子具有高亲和力，用于从突出特征的接触表面有效地去除油墨分子。 随后，弹性体印模与第二基板的表面接触。 油墨分子从突出特征的边缘转移到第二基底的表面，从而在该表面上形成自组装单层形式的油墨图案。

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