公开(公告)号：US09524852B2

公开(公告)日：2016-12-20

申请号：US14437046

申请日：2014-12-05

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Hui Tian

IPC: H01L21/66 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3005 ,  H01J37/3171 ,  H01J2237/2445 ,  H01J2237/31703 ,  H01J2237/31705 ,  H01J2237/31711

Abstract: A method for monitoring ion implantation, comprising: a), providing a control piece and forming a mask layer; b), performing ion implantation process to implant a predetermined dose of impurity ions into the control piece, an area on the control piece uncovered by the mask layer being an impurity implantation area and an area on the control piece covered by the mask layer being an impurity non-implantation area; c), peeling off the mask layer from the control piece; d), performing oxidation treatment on the control piece; and e), respectively measuring thicknesses of the oxide layers on the impurity implantation area and the impurity non-implantation area of the control piece, and monitoring the impurity dose of the ion implantation on the basis of a ratio of the thickness of the oxide layer in the impurity implantation area to the thickness of the oxide layer in the impurity non-implantation area. By this method, it is possible to accurately monitor whether or not the dose of the implanted ions meets the predetermined requirement, and it is possible to effectively avoid the defects of incorrect monitor result caused by the variation of the intrinsic resistance of the semiconductor, improve the accuracy of the monitoring, and thus improve the performance and yield rate of the device.

Abstract translation: 一种用于监测离子注入的方法，包括：a）提供控制件并形成掩模层; b），执行离子注入工艺以将预定剂量的杂质离子注入到控制件中，由掩模层未覆盖的作为杂质注入区域的控制片上的区域和由掩模层覆盖的控制片上的区域是 杂质非植入区; c）从掩模层剥离掩模层; d）对控制件执行氧化处理; 和e），分别测量所述杂质注入区域上的氧化物层的厚度和所述控制件的杂质非注入区域，并且基于所述氧化物层的厚度的比率来监测所述离子注入的杂质剂量 在杂质注入区域中的杂质非注入区域中的氧化物层的厚度。 通过该方法，可以准确地监视注入离子的剂量是否满足规定的要求，能够有效地避免半导体固有电阻的变化引起的监视结果不正确的缺陷，提高 监控的准确性，从而提高设备的性能和产出率。

公开(公告)号：US20160322193A1

公开(公告)日：2016-11-03

申请号：US15109726

申请日：2014-12-08

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Masami MAKUUCHI ,  Takahiro JINGU

IPC: H01J37/244 ,  H01J37/28 ,  G01N21/94 ,  G01N21/95

CPC classification number: H01J37/244 ,  A61B5/0059 ,  A61B5/0075 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  H01J37/28 ,  H01J49/00 ,  H01J2237/2443 ,  H01J2237/2444 ,  H01J2237/2445 ,  H01J2237/24495

Abstract: A detection circuit for accurately detecting a very small foreign material and an inspection/measurement device using the same are provided. The inspection/measurement device includes: an irradiation section that irradiates a laser beam to a surface of a specimen; and a detection section that detects scattered light from the surface of the specimen and generates a detection signal. The detection section includes: a photon counting sensor that outputs M output signals from photo-detecting elements of N pixels (N and N are natural numbers, and M

Abstract translation: 提供了一种用于精确检测非常小的异物的检测电路和使用其的检查/测量装置。 检查/测量装置包括：照射部，其将激光束照射到试样的表面; 以及检测部，其检测来自所述检体的表面的散射光，并生成检测信号。 检测部分包括：光子计数传感器，其从N个像素的光检测元件输出M个输出信号（N和N是自然数，M

公开(公告)号：US09466460B2

公开(公告)日：2016-10-11

申请号：US14891494

申请日：2014-03-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Taku Sakazume ,  Sukehiro Ito

IPC: H01J37/26 ,  G01N23/04 ,  H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/22 ,  G01N23/046 ,  G01N2223/3307 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2802

Abstract: An electron microscope has a large depth of focus in comparison with an optical microscope. Thus, information is superimposed on one image in the direction of depth. Therefore, it is necessary to accurately specify the three-dimensional position and density of a structure in a specimen so as to observe the three-dimensional structure of the interior of the specimen by using the electron microscope. Furthermore, a specimen that is observed with the optical microscope on a slide glass is not put into a TEM device of the related art. Thus, performing three-dimensional internal structure observation with the electron microscope on a location that is observed with the optical microscope requires very cumbersome preparation of the specimen. By controlling a vector parameter that defines the interrelationship between a primary charged particle beam and the specimen and by irradiation with the primary charged particle beam with a plurality of different vector parameters, images of transmitted charged particles of the specimen that correspond to each of the vector parameters are obtained. Irradiation with the primary charged particle beam is performed on the specimen that is arranged either directly or through a predetermined member on a detector which detects charged particles transmitted through or scattered by the interior of the specimen.

Abstract translation: 与光学显微镜相比，电子显微镜具有较大的聚焦深度。 因此，信息在深度方向上叠加在一个图像上。 因此，必须准确地确定试样中的结构的三维位置和密度，以便通过电子显微镜观察试样内部的三维结构。 此外，用幻灯片玻璃上的光学显微镜观察的样品没有放入现有技术的TEM器件中。 因此，在用光学显微镜观察的位置上用电子显微镜进行三维内部结构观察需要非常繁琐的样品制备。 通过控制限定初级带电粒子束和样本之间的相互关系的矢量参数以及通过用多个不同矢量参数照射初级带电粒子束的样本的透射带电粒子对应于每个矢量的图像 获得参数。 对于直接或通过检测器上的预定部件布置的试样进行照射，该检测器检测通过样本内部传播或散射的带电粒子。

公开(公告)号：US20160163503A1

公开(公告)日：2016-06-09

申请号：US14583403

申请日：2014-12-26

Applicant: Industrial Technology Research Institute

Inventor： Fu-Rong CHEN ,  Tsu-Wei HUANG ,  Chin-Liang HSU

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/244 ,  G01N23/2252 ,  H01J37/28 ,  H01J2237/226 ,  H01J2237/2445 ,  H01J2237/24495 ,  H01J2237/24585 ,  H01J2237/2555

Abstract: An electron microscope includes a stage, a charged particle beam generator, a plurality of elemental spectrum detectors and a reader. The stage is configured for carrying a sample. The charged particle beam generator is configured for generating a charged particle beam to bombard the sample. The elemental spectrum detectors is configured for detecting X ray emitted from the sample being bombarded by the charged particle beam and outputting a plurality of corresponding spectrum detecting signals. The reader is configured for calibrating a plurality of counting signals generated by the spectrum detecting signals and summing the calibrated counting signals to obtain an elemental spectrum of the sample. The collection time of elemental spectrum of the above-mentioned electron microscope can be shortened. A reader and an acquiring elemental spectrum method applied to the above-mentioned electron microscope are also disclosed.

Abstract translation: 电子显微镜包括载物台，带电粒子束发生器，多个元素光谱检测器和读取器。 舞台被配置为携带样本。 带电粒子束发生器被配置为产生带电粒子束以轰击样品。 元素频谱检测器被配置用于检测由带电粒子束轰击的样品发射的X射线，并输出多个对应的频谱检测信号。 读取器被配置为校准由频谱检测信号产生的多个计数信号，并对校准的计数信号求和以获得样本的基本频谱。 可以缩短上述电子显微镜的元素的收集时间。 还公开了一种应用于上述电子显微镜的阅读器和获取元素光谱方法。

公开(公告)号：US09355815B2

公开(公告)日：2016-05-31

申请号：US14423081

申请日：2013-08-09

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shin Imamura ,  Takashi Ohshima ,  Yoichi Ose ,  Kenichi Hirane

IPC: H01J37/00 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/28 ,  H01J2237/2801

Abstract: An electron microscope is provided with a scintillator (7) and a light guide (8). The scintillator (7) has an index of refraction greater than the index of refraction of the light guide (8), and an end surface (72) joined to the light guide (8) is formed from a curved surface with a convex shape on the outside. The scintillator (7) is formed by a Y—Al—O based ceramic sintered body represented by the compositional formula (Ln1-xCex)3M5O12 (wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).

Abstract translation: 电子显微镜设有闪烁体（7）和光导（8）。 闪烁体（7）的折射率大于导光体（8）的折射率，与导光体（8）接合的端面（72）由凸形的曲面形成 外。 闪烁体（7）由组成式（Ln1-xCex）3M5O12表示的Y-Al-O系陶瓷烧结体形成（其中Ln表示选自Y，Gd，La和 Lu和M表示Al和Ga中的任一个或两者）。

公开(公告)号：US09322711B2

公开(公告)日：2016-04-26

申请号：US14407768

申请日：2013-06-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Fujio Onishi ,  Hiroshi Touda ,  Tetsuji Osawa ,  Yuki Sugawara

IPC: H01J37/24 ,  G01J1/44 ,  G01J1/42 ,  H01J37/244 ,  G01N23/225 ,  H03F3/08 ,  G01N21/64

CPC classification number: G01J1/44 ,  G01J1/42 ,  G01N21/64 ,  G01N23/2251 ,  H01J37/244 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/24495 ,  H03F3/08 ,  H03F2201/3215

Abstract: A light signal detecting circuit, a light amount detecting device, and a charged-particle-beam device capable of discriminating the signal component of a small amount of light from the signal component of noise due to dark current. A data-processing-unit detects pulses from digital voltage signal corresponding to an amount of light obtained by an amplifier and an A-D converter, calculates a crest value as the maximum voltage value of each pulse, and stores the occurrence frequency of each calculated crest value in a frequency occurrence storage area. A data analysis unit compares a previously-determined frequency lower limit with the occurrence frequency of each crest value in ascending order of the crest values and sets a pulse determination threshold to the first crest value whose occurrence frequency is equal to or smaller than the frequency lower limit. The threshold processing unit thus outputs the digital signal higher than the pulse determination threshold.

Abstract translation: 光信号检测电路，光量检测装置和带电粒子束装置，其能够鉴别由暗电流引起的噪声的信号分量的少量光的信号分量。 数据处理单元检测与由放大器和AD转换器获得的光量相对应的数字电压信号的脉冲，计算峰值作为每个脉冲的最大电压值，并存储每个计算的峰值的出现频率 在频率发生存储区域中。 数据分析单元将先前确定的频率下限与峰值的升序的出现频率进行比较，并将脉冲判定阈值设定为出现频率等于或小于频率下降的第一波峰值 限制。 因此，阈值处理单元输出高于脉冲判定阈值的数字信号。

公开(公告)号：US20150362446A1

公开(公告)日：2015-12-17

申请号：US14716984

申请日：2015-05-20

Applicant: JEOL Ltd.

Inventor： Naoki Kato ,  Masaru Takakura ,  Norihisa Mori ,  Shinya Fujita ,  Shigeru Honda

IPC: G01N23/225 ,  H01J37/244 ,  H01J37/06

CPC classification number: G01N23/2252 ,  H01J37/244 ,  H01J2237/2445 ,  H01J2237/2448

Abstract: A phase analyzer includes a principal component analysis section that performs principal component analysis on elemental map data that represents an intensity or concentration distribution corresponding to each element to calculate a principal component score corresponding to each unit area of the elemental map data, a scatter diagram generation section that plots the calculated principal component score to generate a scatter diagram of the principal component score, a peak position detection section that detects a peak position from the scatter diagram, a clustering section that calculates a distance between each point and each peak position within the scatter diagram, and classifies each point within the scatter diagram into a plurality of groups based on the distance, and a phase map generation section that generates a phase map based on classification results of the clustering section.

Abstract translation: 相位分析器包括：主成分分析部，其对表示与各元素对应的强度或浓度分布的元素图数据进行主成分分析，计算与基本图数据的各单位面积对应的主成分分数;散点图生成 绘制计算出的主成分分数以生成主分量分数的散点图，峰值位置检测部分，其根据散点图检测峰值位置;聚类部分，其计算每个点与每个峰值位置之间的距离; 散点图，并且根据距离将散点图内的每个点分类成多个组;以及相位图生成部，其基于聚类部的分类结果生成相位图。

公开(公告)号：US20150214002A1

公开(公告)日：2015-07-30

申请号：US14423081

申请日：2013-08-09

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shin Imamura ,  Takashi Ohshima ,  Yoichi Ose ,  Kenichi Hirane

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/28 ,  H01J2237/2801

Abstract: An electron microscope is provided with a scintillator (7) and a light guide (8). The scintillator (7) has an index of refraction greater than the index of refraction of the light guide (8), and an end surface (72) joined to the light guide (8) is formed from a curved surface with a convex shape on the outside. The scintillator (7) is formed by a Y—Al—O based ceramic sintered body represented by the compositional formula (Ln1-xCex)3M5O12 (wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).

Abstract translation: 电子显微镜设有闪烁体（7）和光导（8）。 闪烁体（7）具有大于导光体（8）的折射率的折射率，与导光体（8）接合的端面（72）由凸形的曲面形成 外。 闪烁体（7）由组成式（Ln1-xCex）3M5O12表示的Y-Al-O系陶瓷烧结体形成（其中Ln表示选自Y，Gd，La和 Lu和M表示Al和Ga中的任一个或两者）。

公开(公告)号：US09076632B2

公开(公告)日：2015-07-07

申请号：US14378098

申请日：2013-02-12

Applicant: EL-MUT TECHNOLOGIES LTD.

Inventor： Silviu Reinhorn ,  Eli Cheifetz ,  Amit Weingarten

IPC: H01J37/26 ,  G01T1/20 ,  H01J37/28 ,  H01J37/244 ,  G01N23/04

CPC classification number: H01J37/28 ,  G01N23/04 ,  H01J37/244 ,  H01J2237/221 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/2446 ,  H01J2237/26 ,  H01J2237/2802 ,  H01J2237/2806

Abstract: A STEM system is disclosed wherein an imaging system is used to image the electron scatter pattern plane of the HAADF detector onto a two-dimensional array detector. A data acquisition system stores and processes the data from the two-dimensional array detector. For each illumination pixel of the STEM, one frame of data is generated and stored Each frame includes data of all scattered angles and can be analyzed in real time or in off-line at any time after the scan. A method is disclosed for detecting electrons emitted from a sample by detecting electrons scattered from the sample and generating plurality of corresponding signals, each signal indicative of scattering angle of a scattered electron; generating a plurality of signal groups, each signal group being a collection of signals of a user selected scattering angle.

Abstract translation: 公开了一种STEM系统，其中使用成像系统将HAADF检测器的电子散射图形平面成像到二维阵列检测器上。 数据采集​​系统存储和处理来自二维阵列检测器的数据。 对于STEM的每个照明像素，生成和存储一帧数据每帧包括所有散射角的数据，并且可以在扫描之后的任何时间实时或离线分析。 公开了一种通过检测从样品散射的电子并产生多个对应信号来检测从样品发射的电子的方法，每个信号指示散射电子的散射角; 产生多个信号组，每个信号组是用户选择的散射角的信号的集合。

公开(公告)号：US09030675B2

公开(公告)日：2015-05-12

申请号：US13295159

申请日：2011-11-14

Applicant: Jan Andries Meijer

Inventor： Jan Andries Meijer

IPC: G01B11/14 ,  H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/224 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/2445 ,  H01J2237/2446 ,  H01J2237/24578 ,  H01J2237/30433

Abstract: The invention relates to a method for determining a distance between charged particle beamlets in a multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a converter element for converting charged particle energy into light and a light sensitive detector provided with a two-dimensional pattern of beamlet blocking and non-blocking regions. The method comprises scanning a first beamlet over the pattern, receiving light generated by the converter element, and converting the received light into a first signal. Then the two-dimensional pattern and the first beamlet are moved relatively with respect to each other over a predetermined distance. Subsequently, the method comprises scanning a second beamlet over the pattern, receiving light generated by the converter element, and converting the received light into a second signal. Finally, the distance between the first beamlet and second beamlet is determined based on the first signal, the second signal and the predetermined distance.

Abstract translation: 本发明涉及一种用于确定多子束曝光装置中的带电粒子束之间的距离的方法。 该装置设置有传感器，其包括用于将带电粒子能量转换成光的转换器元件和具有子束阻挡和非阻挡区域的二维图案的光敏检测器。 该方法包括在图案上扫描第一子束，接收由转换器元件产生的光，并将接收的光转换成第一信号。 然后，二维图案和第一子束相对于彼此相对移动预定距离。 随后，该方法包括在图案上扫描第二子束，接收由转换器元件产生的光，并将接收的光转换成第二信号。 最后，基于第一信号，第二信号和预定距离来确定第一子束和第二子束之间的距离。