Thermal-field type electron source composed of transition metal carbide material
    11.
    发明授权
    Thermal-field type electron source composed of transition metal carbide material 有权
    由过渡金属碳化物材料组成的热场型电子源

    公开(公告)号:US09490098B1

    公开(公告)日:2016-11-08

    申请号:US14992870

    申请日:2016-01-11

    Abstract: An electron source is made from mixed-metal carbide materials of high refractory nature. Producing field-enhanced thermionic emission, i.e., thermal-field or extended Schottky emission, from these materials entails the use of a certain low work function crystallographic direction, such as, for example, (100), (210), and (310). These materials do not naturally facet because of their refractory nature. The disclosed electron source made from transition metal carbide material is especially useful when installed in a scanning electron microscope (SEM) performing advanced imaging applications that require a high brightness, high beam current source.

    Abstract translation: 电子源由具有高耐火性质的混合金属碳化物材料制成。 从这些材料产生场强增强的热离子发射,即热场或延伸的肖特基发射需要使用某种低功函数的晶体学方向,例如(100),(210)和(310) 。 这些材料由于其耐火性质而不自然而然。 所披露的由过渡金属碳化物材料制成的电子源在安装在需要高亮度,远光束电流源的先进成像应用的扫描电子显微镜(SEM)中是特别有用的。

    Method and apparatus for reducing the work function of polycrystalline metal hexaboride

    公开(公告)号:US12237137B2

    公开(公告)日:2025-02-25

    申请号:US17221170

    申请日:2021-04-02

    Abstract: Aspects include a method for treating a polycrystalline material, the method comprising: exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein: the surface comprises a plurality of crystallites each having the composition MB6, M being a metal element; the plasma comprises ions, the ions being characterized by an average ion flux selected from the range of 1.5 to 100 A/cm2 and an average ion energy that is less than a sputtering threshold energy; the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and the second average work function is less than the first average work function.

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