Abstract:
A device for controlling trapped ions includes a substrate. An electrode structure is disposed on the substrate, the electrode structure including DC electrodes and RF electrodes of an ion trap configured to trap ions in a space above the substrate. A first device terminal is disposed on the substrate, the first device terminal being connected via a first electrode connection line to a specific DC electrode. Further, a second device terminal is disposed on the substrate, the second device terminal being connected via a second electrode connection line to the specific DC electrode.
Abstract:
The present invention relates to an ion trap with a large trap capacity. A mass spectrometer comprises a first linear ion trap that performs mass selective ejection, and a second linear ion trap that accumulates and then mass selectively ejects ions ejected from the first linear ion trap. Directions of resonant excitation of ions of the first linear ion trap and of the second linear ion trap are orthogonal. Compared to conventional art, sensitivity is significantly improved.
Abstract:
An electron has an electron-emitting region, a longitudinal axis and an arrangement of apertured electron grids along the axis. A first grid has an aperture for passing electrons, which aperture is located further outwards with respect to the longitudinal axis than the emitting region. One of the other grids is provided with a shield so as to shield the edge wall of the aperture, if it is located within direct view of the electron-emitting region, from incidence of positive ions.
Abstract:
An ion trap for an electron beam generator consists of at least two electrically conductive elements which are in the form of a sector of a cylinder the elements being spaced apart from each other and together form a cylindrical form. Each element has end plates and a number of fins extending inwardly to the center of the cylindrical form. A recess in the form of a sector of a circle is located in each end plate and each fin adjacent to the center of the cylindrical form. These recesses form a central bore through which an electron beam from an electron gun travels, the electron beam and central bore being essentially of the same diameter. Each elements is attached to an outer envelope by an insulating element and a conductive lead is electrically connected to each element to maintain that element at a predetermined potential which deflects positive ions travelling along the beam path.
Abstract:
An ion guide includes a first arrangement of electrodes on a first surface, a second arrangement of electrodes on a second surface, and an ion containment space in a gap therebetween. The first arrangement includes first electrodes and second electrodes. Each first electrode includes a first main portion and a first edge portion. The first edge portion is wider than the first main portion. The second arrangement includes third electrodes and fourth electrodes. Each fourth electrode includes a fourth main portion and a fourth edge portion. The fourth edge portion is wider than the fourth main portion. The first edge portions are positioned opposite the fourth edge portions. The first electrodes and the third electrodes are configured to receive first RF voltages and the second electrodes and the fourth electrodes are configured to receive second RF voltages that are phase-shifted with respect to the first RF voltages.
Abstract:
A high-voltage power source for applying high voltage to a nozzle of an ESI ion source includes a charge release assistant section including switch circuits and other elements for forcing electric charges accumulated at output terminals to be discharged in a polarity-switching operation, whereby the positive/negative switching of the polarity of the output voltage can be quickly performed. For example, when the voltage applied to the nozzle needs to be changed from V1 to V2 (where V1 and V2 are positive, and V1>V2), a voltage control section operates a positive voltage generation section and negative voltage generation section so as to temporarily provide a negative output voltage. After a predetermined period of time, the voltage control section operates the positive voltage generation section and negative voltage generation section so as to provide voltage V2.
Abstract:
A high-voltage power source for applying high voltage to a nozzle of an ESI ion source includes a charge release assistant section (26) including switch circuits (62 and 65) and other elements for forcing electric charges accumulated at output terminals to be discharged in a polarity-switching operation, whereby the positive/negative switching of the polarity of the output voltage can be quickly performed. In the mass spectrometer according to the present invention, for example, when the voltage applied to the nozzle needs to be changed from Vi to V2 (where V1 and V2 are positive, and V1>V2), a voltage control section (20) under the command of a main controller (9) operates a positive voltage generation section (21) and negative voltage generation section (23) so as to temporarily provide a negative output voltage. After a predetermined period of time, the voltage control section operates the positive voltage generation section (21) and negative voltage generation section (23) so as to provide voltage V2. If the voltage was simply changed from V1 to V2, the voltage would decrease slowly and require considerable time for the change. The positive/negative switching of the polarity induces the discharging of the electric charges accumulated at the output terminals, and consequently, the voltage-switching operation from V1 to V2 is quickly performed.
Abstract:
A linear ion trap traps a plurality of charged particles in a charged particle trap including first and second electrode mirrors arranged along an axis at opposite ends of the particle trap, the electrode mirrors being capable, when voltage is applied thereto, of creating respective electric fields configured to reflect charged particles causing oscillation of the particles between the mirrors. The method includes: (a) introducing into the charged particle trap the plurality of charged particles, the particles having a spread in the oscillation time of the particles per oscillation; (b) applying voltage to the electrode mirrors during step (a) to induce a relatively weak self-bunching of the charged particles; and (c) after the plurality of charged particles has been introduced into the charged particle trap, waiting for a time period ΔT and then changing the voltage so as to induce a relatively stronger self-bunching among the charged particles.
Abstract:
An electron beam generator includes: an electron emitting cathode (1); an anode (3) with an anode bore (4) for the passage of an electron beam (6); a Wehnelt electrode (2) between the cathode (1) and the anode (3) for controlling the electron beam; the cathode (1); the anode (3) and the Wehnelt electrode (2) disposed within a vacuum chamber (100); and a magnetic unit (7) disposed between the cathode (1) and the anode (3) for generating a static transverse magnetic field causing the electrons to be deflected along a curved path until the electrons enter the anode (3) such that ions follow an ionic path back to strike the Wehnelt electrode (2) and are kept from striking the cathode (1) by displacement caused by the ionic path. The present invention reduces the number of ions that impact the cathode and reduces the number of ions that are formed by the ionization of residual molecules, increasing the service life of the cathode.
Abstract:
Improvement of resolution in terms of reducing minimum feature sizes and ximity effects on bulk substrates in high voltage electron beam lithography as applied to manufacture of electronic circuits from coated semiconductors involves the use of a dielectric layer interposed between an electrically semiconducting substrate and a resist layer. The dielectric layer functions to reduce the resist exposure resulting from the backscattered electrons coming from the substrate into the resist layer.