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    Determining an analyte by multiple measurements through a cuvette
    221.
    发明申请
    Determining an analyte by multiple measurements through a cuvette 审中-公开

    公开(公告)号：US20050185176A1

    公开(公告)日：2005-08-25

    申请号：US10784505

    申请日：2004-02-23

    Applicant: Donald Moran ,  Michael LaCourt ,  Davis Freeman ,  Merrit Jacobs

    Inventor： Donald Moran ,  Michael LaCourt ,  Davis Freeman ,  Merrit Jacobs

    IPC: G01J3/00 ,  G01N21/31 ,  G01N21/64

    CPC classification number: G01N21/31 ,  G01N21/64 ,  G01N2021/157 ,  G01N2021/6493

    Abstract: A method for measuring the presence or concentration of an analyte in a sample by spectrophotometry: providing an open top cuvette having a sample with an analyte to be measured; providing a light source and a detector for detecting emitted light; taking at least two measurements that includes: (i) directing at least two beams of light from the light source to different locations on the cuvette; (ii) passing the at least two beams through the cuvette at their respective locations and through the sample to be measured; and (iii) measuring at least two respective emitted light beams with the detector; and comparing the at least two emitted light beams to determine if: all the emitted light beams should be disregarded; one or more of the emitted light beams should be disregarded; or the sample absorbances should be averaged. In a preferred embodiment, the method includes taking at least three measurements. In another preferred embodiment, the spectrophotometry is absorption spectrophotometry, and the method is performed on a diagnostic analyzer.

    Processing system for remote chemical identification
    223.
    发明申请
    Processing system for remote chemical identification 审中-公开
    远程化学鉴定处理系统

    公开(公告)号：US20050154539A1

    公开(公告)日：2005-07-14

    申请号：US11076636

    申请日：2005-03-10

    Applicant: Matthew Butler ,  Grant Plummer

    Inventor： Matthew Butler ,  Grant Plummer

    IPC: G01J3/00 ,  G01J3/28 ,  G01J3/453 ,  G01N21/35 ,  G01N21/00

    CPC classification number: G01J3/453 ,  G01J3/0264 ,  G01J3/28 ,  G01N21/3518 ,  G01N2021/1793 ,  G01N2201/1211 ,  G01N2201/129

    Abstract: A fourth embodiment of the present invention is a method of generating a temperature compensated absorbance spectrum. The method includes the steps of: a. providing a sample spectrum and an estimated temperature of a backdrop object; b. from a set of known temperature spectra related to a known background temperature, selecting at least two known temperature spectra representing a background temperature above and below the estimated temperature; c. comparing the sample spectrum to the known temperature spectra in order to determine a sample background spectrum; and d. calculating an absorbance spectrum from the sample spectrum and the background spectrum.

    Abstract translation: 本发明的第四实施例是产生温度补偿吸收光谱的方法。 该方法包括以下步骤：a。 提供样本谱和背景物体的估计温度; b。 从与已知背景温度相关的一组已知温度谱中，选择表示背景温度高于和低于估计温度的至少两个已知温度光谱; C。 将样品光谱与已知的温度光谱进行比较，以确定样品背景光谱; 和d。 从样品光谱和背景光谱计算吸收光谱。

    Dosimetry probe
    225.
    发明授权
    Dosimetry probe 失效
    剂量探针

    公开(公告)号：US6138046A

    公开(公告)日：2000-10-24

    申请号：US295246

    申请日：1999-04-20

    Applicant: Brian Dalton

    Inventor： Brian Dalton

    IPC: A61B17/00 ,  A61N5/06 ,  G01J1/04 ,  G01J1/42 ,  G02B6/00 ,  G02B6/24 ,  G02B6/26 ,  A61B6/00 ,  G01J3/00 ,  G02B6/02 ,  A61B17/36 ,  A61N21/00

    CPC classification number: A61N5/062 ,  A61N5/0601 ,  G01J1/04 ,  G01J1/0425 ,  G01J1/4228 ,  G02B6/241 ,  G02B6/262 ,  A61B2017/00057 ,  G02B6/0001

    Abstract: A dosimetry probe for monitoring light irradiation dosages and for providing irradiance measurements to monitor the application of light during a phototherapy procedure. The dosimetry probe includes a light delivery optical fiber operable to transmit optical radiation to target tissue and a plurality of dosimetry optical fibers substantially coextensive with the light delivery optical fiber, the distal ends of each of the dosimetry optical fibers arranged at a different axial distance from the light delivery optical fiber to provide irradiance measurements at a number of different axial distances. The dosimetry probe may include a safety feedback optical fiber to monitor the intensity of the treatment light independent of the influence of the optical properties of the target tissue. The dosimetry probe may also include a source dosimetry optical fiber for carrying a modulated dosimetry light signal, which can be selectively detected by means of frequency lock-in technology.

    Abstract translation: 用于监测光照射剂量并用于提供辐照度测量以在光疗过程中监测光的应用的剂量测定探针。 剂量测量探针包括可用于将光学辐射传输到靶组织的光输送光纤和与光输送光纤基本上共同延伸的多个剂量学光纤，每个剂量测量光纤的远端以不同的轴向距离 光输送光纤在多个不同的轴向距离处提供辐照度测量。 剂量测量探针可以包括安全反馈光纤，以独立于靶组织的光学性质的影响来监测治疗光的强度。 剂量测定探针还可以包括用于携带调制剂量测定光信号的源剂量学光纤，其可以通过频率锁定技术选择性地检测。

    Method and apparatus for monitoring plasma processing operations
    226.
    发明授权
    Method and apparatus for monitoring plasma processing operations 失效

    公开(公告)号：US6132577A

    公开(公告)日：2000-10-17

    申请号：US65362

    申请日：1998-04-23

    Applicant: Michael Lane Smith, Jr. ,  Joel O'Don Stevenson ,  Pamela Peardon Denise Ward

    Inventor： Michael Lane Smith, Jr. ,  Joel O'Don Stevenson ,  Pamela Peardon Denise Ward

    IPC: G01J3/00 ,  G01J3/28 ,  G01J3/443 ,  C23C14/34

    CPC classification number: G01J3/443 ,  G01J3/28 ,  G01J2003/2866

    Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

    Hyperspectral imaging spectrometer spectral calibration
    227.
    发明授权
    Hyperspectral imaging spectrometer spectral calibration 有权
    高光谱成像光谱仪光谱校准

    公开(公告)号：US6111640A

    公开(公告)日：2000-08-29

    申请号：US344728

    申请日：1999-06-25

    Applicant: Theodore R. Hedman ,  Peter J. Jarecke ,  Lushalan B. Liao

    Inventor： Theodore R. Hedman ,  Peter J. Jarecke ,  Lushalan B. Liao

    IPC: G01J3/28 ,  G01J3/00 ,  G01N21/93

    CPC classification number: G01J3/2823 ,  G01J2003/2866

    Abstract: A method of calibrating a hyperspectral imaging spectrometer. A PTFE panel (26) having substantially 100% reflectance across a spectrum of interest is mechanically inserted into the spectrometer's field-of-view. The panel (26) is illuminated by a lamp (22, 24), such as a quartz Tungsten Halogen lamp, so that reflected radiation from the panel (26) floods the spectrometer's FOV. The image generated by the spectrometer is electronically stored. Next, the reflectance panel (26) is removed and replaced with a PTFE panel (40) that is doped with a rare earth element, such as holmium oxide, dysprosium oxide, erbium oxide or other dopants. The dopant serves the purpose of producing many distinct absorption features in the reflected spectra whose wavelengths spacings and absorption line widths are precisely known. The image obtained form the doped PTFE panel (40) is then electronically stored. The image obtained from the doped PTFE panel (40) is divided by the image obtained from the reflectance PTFE panel (26) on a pixel-by-pixel basis to obtain a measurement of the absorption spectra of the dopant. The measured spectra is compared to the known spectra as a function of spatial position across the focal plane of the spectrometer to obtain the spectral calibration. A center wavelength is then assigned to each pixel in the FPA based on the calibration.

    Abstract translation: 一种校准高光谱成像光谱仪的方法。 将具有基本上100％的感兴趣的光谱反射率的PTFE面板（26）机械地插入到光谱仪的视场中。 面板（26）由诸如石英钨卤素灯的灯（22,24）照射，使得来自面板（26）的反射辐射使光谱仪的FOV泛光。 由光谱仪产生的图像是电子存储的。 接下来，去除反射面板（26），并用掺杂有稀土元素（例如氧化钬，氧化镝，氧化铒或其它掺杂剂）的PTFE面板（40）代替。 掺杂剂用于在反射光谱中产生许多不同的吸收特征，其波长间隔和吸收线宽度是精确已知的。 然后电子存储从掺杂的PTFE面板（40）获得的图像。 从掺杂PTFE面板（40）获得的图像被逐个像素地从反射聚四氟乙烯面板（26）获得的图像除以获得掺杂剂的吸收光谱的测量。 将测量的光谱与已知光谱作为跨越光谱仪焦平面的空间位置的函数进行比较，以获得光谱校准。 然后根据校准将中心波长分配给FPA中的每个像素。

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