Abstract:
An emission signal visualization device includes a front video camera for photographing a measured object from the front, a signal detecting sensor for detecting an emission signal generated from the measured object, a lateral video camera for photographing the signal detecting sensor from a lateral, a spectrum analyzer, and an analyzing body unit, and records and analyzes the state of the spatial distribution of signals detected by the signal detecting sensor.
Abstract:
Systems, methods, compositions, and apparatus for laser induced ablation spectroscopy are disclosed. A sample site position sensor, stage position motors operable to move the stage in three independent spatial coordinate directions, and a stage position control circuit can move an analysis sample site to selected coordinate positions for laser ablation. Light emitted from a plasma plume produced with laser ablation can be gathered into a lightguide fiber bundle that is subdivided into branches. One branch can convey a first portion of the light to a broadband spectrometer operable to analyze a relatively wide spectral segment, and a different branch can convey a second portion of the light to a high dispersion spectrometer operable to measure minor concentrations and/or trace elements. Emissions from a plasma plume can be simultaneously analyzed in various ways using a plurality of spectrometers having distinct and/or complementary capabilities.
Abstract:
A handheld LIBS spectrometer includes an optics stage movably mounted to a housing and including a laser focusing lens and a detection lens. One or more motors advance and retract the optics stage, move the optics stage left and right, and/or move the optics stage up and down. A laser source in the housing is oriented to direct a laser beam to the laser focusing lens. A spectrometer subsystem in the housing is configured to receive electromagnetic radiation from the detection lens and to provide an output. A controller subsystem is responsive to the output of the spectrometer subsystem and is configured to control the laser source and motors. In this way, auto-calibration, auto-clean, and auto-focus, and/or moving spot functionality is possible.
Abstract:
A stable etching process is realized at an earlier stage by specifying the combination of wavelength and time interval, which exhibits a minimum prediction error of etching processing result within a short period. For this, the combination of wavelength and time interval is generated from wavelength band of plasma emission generated upon etching of the specimen, the prediction error upon prediction of etching process result is calculated with respect to each combination of wavelength and time interval, the wavelength combination is specified based on the calculated prediction error, the prediction error is further calculated by changing the time interval with respect to the specified wavelength combination, and the combination of wavelength and time interval, which exhibits the minimum value of calculated prediction error is selected as the wavelength and the time interval used for predicting the etching processing process.
Abstract:
An optical emission spectrometer system includes a light source and a dichroic beam combiner. The light source emits first light in a first direction and second light in a second direction different from the first direction. The dichroic beam combiner receives the first light via a first light path and the second light via a second light path, reflects a portion the first light into an entrance aperture of a light detection and measurement apparatus, and transmits a portion of the second light into the entrance aperture, enabling analysis and measurement of both first and second light characteristics simultaneously. The portion of the first light reflected into the entrance aperture predominately has wavelengths in a first range of wavelengths and the portion of the second light transmitted into the entrance aperture predominately has wavelengths in a second range of wavelengths, different from the first range of wavelengths.
Abstract:
A method (1) is described for the estimation of the spectral response of an infrared photodetector (32) that starts with response measurements of the infrared photodetector (32) obtained by varying the temperature of the black body (31) and is such as to estimate the spectral response by solving a numerical matrix problem. The method (1) is fully automatable and presents a cost reduction compared to the known methods because it does not require the use of a monochromator or a circular filter.
Abstract:
An analysis system (e.g., LIBS) includes a laser source generating a laser beam, a movable optic configured to move said laser beam to multiple locations on a sample, and a spectrometer responsive to photons emitted by the sample at those locations and having an output. A controller is responsive to a trigger signal and is configured in a moving spot cycle to adjust the moveable optic, activate the laser source sequentially generating photons at multiple locations on the sample, and process the spectrometer output at each location.
Abstract:
An installation for spectroscopic measurement includes a focusing system (2) for focusing a laser beam (3) on a sample (4) for analysis and a system (17) for collecting and spectroscopically analyzing light rays emitted by the plasma (15), this system (17) including, in particular, an optical fiber (18) for collecting light. The installation also includes a motor-driven system (23) for moving the optical fiber (18), an optical imaging system (25) for imaging the plasma in the form of an image, and a processor and control unit (24). The unit (24) is capable of analyzing the image formed by the optical imaging system in order to select a zone of interest and controlling the motor-driven system (23) in order to place the optical fiber in a position enabling it to collect light coming from the selected zone of interest in the plasma.
Abstract:
Among the multiple OES data wavelengths, an analysis device identifies the wavelength of light emissions from a substance contained in the plasma from among multiple light emission wavelengths within the chamber by way of the steps of: measuring the light emission within the chamber during etching processing of the semiconductor wafer; finding the time-based fluctuation due to changes over time on each wavelength in the measured intensity of the light emissions in the chamber; comparing the time-based fluctuations in the wavelength of the light emitted from the pre-specified substance; and by using the comparison results, identifying the wavelength of the light emitted from the substance caused by light emission within the chamber.
Abstract:
A laser ablation system and methods are disclosed for performing material analysis. The laser ablation system includes a sample chamber which holds and encloses a sample material to be ablated; a laser source that produces a laser beam which is directed into the sample chamber to a surface of the sample material to cause laser ablation; a laser measuring device which is physically attached to the sample chamber to measure a power/energy value of the laser beam; and a material analyzing module that is coupled to the sample chamber to receive the ablated material from laser ablation of the sample material.