Laser ablation analysis system
    232.
    发明授权
    Laser ablation analysis system 有权
    激光消融分析系统

    公开(公告)号:US09383260B1

    公开(公告)日:2016-07-05

    申请号:US13492923

    申请日:2012-06-10

    Abstract: Systems, methods, compositions, and apparatus for laser induced ablation spectroscopy are disclosed. A sample site position sensor, stage position motors operable to move the stage in three independent spatial coordinate directions, and a stage position control circuit can move an analysis sample site to selected coordinate positions for laser ablation. Light emitted from a plasma plume produced with laser ablation can be gathered into a lightguide fiber bundle that is subdivided into branches. One branch can convey a first portion of the light to a broadband spectrometer operable to analyze a relatively wide spectral segment, and a different branch can convey a second portion of the light to a high dispersion spectrometer operable to measure minor concentrations and/or trace elements. Emissions from a plasma plume can be simultaneously analyzed in various ways using a plurality of spectrometers having distinct and/or complementary capabilities.

    Abstract translation: 公开了用于激光诱导消融光谱的系统,方法,组合物和装置。 样本位置传感器,可操作以在三个独立的空间坐标方向上移动平台的平台位置传感器和平台位置控制电路可以将分析样本位置移动到用于激光消融的选定的坐标位置。 从激光烧蚀产生的等离子体羽流发出的光可以聚集成光纤纤维束,细分为分支。 一个分支可以将光的第一部分传送到可操作以分析相对宽的光谱段的宽带光谱仪,并且不同的分支可以将第二部分的光传送到高分散光谱仪,其可操作以测量较小的浓度和/或微量元素 。 可以使用具有不同和/或互补能力的多个光谱仪以各种方式同时分析来自等离子体羽流的排放。

    Handheld LIBS spectrometer
    233.
    发明授权
    Handheld LIBS spectrometer 有权
    手持式LIBS光谱仪

    公开(公告)号:US09360367B2

    公开(公告)日:2016-06-07

    申请号:US14179670

    申请日:2014-02-13

    Applicant: SciAps, Inc.

    Abstract: A handheld LIBS spectrometer includes an optics stage movably mounted to a housing and including a laser focusing lens and a detection lens. One or more motors advance and retract the optics stage, move the optics stage left and right, and/or move the optics stage up and down. A laser source in the housing is oriented to direct a laser beam to the laser focusing lens. A spectrometer subsystem in the housing is configured to receive electromagnetic radiation from the detection lens and to provide an output. A controller subsystem is responsive to the output of the spectrometer subsystem and is configured to control the laser source and motors. In this way, auto-calibration, auto-clean, and auto-focus, and/or moving spot functionality is possible.

    Abstract translation: 手持式LIBS光谱仪包括可移动地安装到壳体并包括激光聚焦透镜和检测透镜的光学台。 一个或多个电机推进和缩回光学平台,左右移动光学台,和/或上下移动光学平台。 壳体中的激光源被定向成将激光束引导到激光聚焦透镜。 外壳中的光谱仪子系统被配置为从检测透镜接收电磁辐射并提供输出。 控制器子系统响应于光谱仪子系统的输出,并被配置为控制激光源和电动机。 这样就可以进行自动校准,自动清理和自动对焦,和/或移动点功能。

    Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus
    234.
    发明授权
    Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus 有权
    等离子体处理装置的数据分析方法,等离子体处理方法和等离子体处理装置

    公开(公告)号:US09324588B2

    公开(公告)日:2016-04-26

    申请号:US14625855

    申请日:2015-02-19

    Abstract: A stable etching process is realized at an earlier stage by specifying the combination of wavelength and time interval, which exhibits a minimum prediction error of etching processing result within a short period. For this, the combination of wavelength and time interval is generated from wavelength band of plasma emission generated upon etching of the specimen, the prediction error upon prediction of etching process result is calculated with respect to each combination of wavelength and time interval, the wavelength combination is specified based on the calculated prediction error, the prediction error is further calculated by changing the time interval with respect to the specified wavelength combination, and the combination of wavelength and time interval, which exhibits the minimum value of calculated prediction error is selected as the wavelength and the time interval used for predicting the etching processing process.

    Abstract translation: 通过指定波长和时间间隔的组合,在较早的阶段实现了稳定的蚀刻工艺,其在短时间段内呈现蚀刻处理结果的最小预测误差。 为此,波长和时间间隔的组合是从样品蚀刻时产生的等离子体发射的波长带产生的,对于波长和时间间隔的每个组合,波长组合计算蚀刻处理结果预测的预测误差 基于所计算的预测误差来指定预测误差,通过改变相对于指定波长组合的时间间隔来进一步计算预测误差,并且将表现出计算出的预测误差的最小值的波长和时间间隔的组合选择为 波长和用于预测蚀刻处理过程的时间间隔。

    Optical emission system including dichroic beam combiner
    235.
    发明授权
    Optical emission system including dichroic beam combiner 有权
    光发射系统包括二向色光束组合器

    公开(公告)号:US09279722B2

    公开(公告)日:2016-03-08

    申请号:US13460308

    申请日:2012-04-30

    Abstract: An optical emission spectrometer system includes a light source and a dichroic beam combiner. The light source emits first light in a first direction and second light in a second direction different from the first direction. The dichroic beam combiner receives the first light via a first light path and the second light via a second light path, reflects a portion the first light into an entrance aperture of a light detection and measurement apparatus, and transmits a portion of the second light into the entrance aperture, enabling analysis and measurement of both first and second light characteristics simultaneously. The portion of the first light reflected into the entrance aperture predominately has wavelengths in a first range of wavelengths and the portion of the second light transmitted into the entrance aperture predominately has wavelengths in a second range of wavelengths, different from the first range of wavelengths.

    Abstract translation: 光发射光谱仪系统包括光源和二向色光束组合器。 光源沿第一方向发射第一光,而在与第一方向不同的第二方向上发射第二光。 二向色光束组合器经由第一光路接收第一光,经由第二光路接收第二光,将第一光的一部分反射到光检测和测量装置的入射孔中,并将第二光的一部分透射 入口孔径,同时能够分析和测量第一和第二光特性。 反射到入口孔中的第一光的部分主要具有波长在第一波长范围内的波长,并且透射入入口的第二光的部分主要具有不同于第一波长范围的第二波长范围的波长。

    METHOD FOR ESTIMATING THE SPECTRAL RESPONSE OF AN INFRARED PHOTODETECTOR
    236.
    发明申请
    METHOD FOR ESTIMATING THE SPECTRAL RESPONSE OF AN INFRARED PHOTODETECTOR 审中-公开
    用于估计红外光电转换器的光谱响应的方法

    公开(公告)号:US20150330837A1

    公开(公告)日:2015-11-19

    申请号:US14704114

    申请日:2015-05-05

    CPC classification number: G01J3/443 G01J5/62 G01J2003/2866

    Abstract: A method (1) is described for the estimation of the spectral response of an infrared photodetector (32) that starts with response measurements of the infrared photodetector (32) obtained by varying the temperature of the black body (31) and is such as to estimate the spectral response by solving a numerical matrix problem. The method (1) is fully automatable and presents a cost reduction compared to the known methods because it does not require the use of a monochromator or a circular filter.

    Abstract translation: 描述了用于估计红外光电检测器(32)的光谱响应的方法(1),其以通过改变黑体(31)的温度获得的红外光电检测器(32)的响应测量开始,并且等于 通过求解数值矩阵问题来估计光谱响应。 方法(1)是完全可自动化的,并且与已知方法相比降低了成本,因为它不需要使用单色器或圆形滤光器。

    AUTOMATED MULTIPLE LOCATION SAMPLING ANALYSIS SYSTEM
    237.
    发明申请
    AUTOMATED MULTIPLE LOCATION SAMPLING ANALYSIS SYSTEM 审中-公开
    自动多位置采样分析系统

    公开(公告)号:US20150316413A1

    公开(公告)日:2015-11-05

    申请号:US14795954

    申请日:2015-07-10

    Applicant: SciAps, Inc.

    Inventor: David Day

    Abstract: An analysis system (e.g., LIBS) includes a laser source generating a laser beam, a movable optic configured to move said laser beam to multiple locations on a sample, and a spectrometer responsive to photons emitted by the sample at those locations and having an output. A controller is responsive to a trigger signal and is configured in a moving spot cycle to adjust the moveable optic, activate the laser source sequentially generating photons at multiple locations on the sample, and process the spectrometer output at each location.

    Abstract translation: 分析系统(例如,LIBS)包括产生激光束的激光源,配置成将所述激光束移动到样品上的多个位置的可移动光学器件,以及响应于在那些位置的样品发射的光子的光谱仪,并具有输出 。 控制器响应于触发信号并且被配置成移动点周期以调整可移动光学元件,激活激光源在样本上的多个位置顺序地生成光子,并且处理每个位置处的光谱仪输出。

    DEVICE FOR TAKING SPECTROSCOPIC MEASUREMENTS OF LASER-INDUCED PLASMA
    238.
    发明申请
    DEVICE FOR TAKING SPECTROSCOPIC MEASUREMENTS OF LASER-INDUCED PLASMA 有权
    采用激光诱导等离子体光谱测量的装置

    公开(公告)号:US20150226673A1

    公开(公告)日:2015-08-13

    申请号:US14428444

    申请日:2013-09-25

    CPC classification number: G01N21/718 G01J3/0218 G01J3/443 G01N2201/0853

    Abstract: An installation for spectroscopic measurement includes a focusing system (2) for focusing a laser beam (3) on a sample (4) for analysis and a system (17) for collecting and spectroscopically analyzing light rays emitted by the plasma (15), this system (17) including, in particular, an optical fiber (18) for collecting light. The installation also includes a motor-driven system (23) for moving the optical fiber (18), an optical imaging system (25) for imaging the plasma in the form of an image, and a processor and control unit (24). The unit (24) is capable of analyzing the image formed by the optical imaging system in order to select a zone of interest and controlling the motor-driven system (23) in order to place the optical fiber in a position enabling it to collect light coming from the selected zone of interest in the plasma.

    Abstract translation: 用于光谱测量的装置包括用于将激光束(3)聚焦在用于分析的样品(4)上的聚焦系统(2)和用于收集和光谱分析由等离子体(15)发射的光线的系统(17),该系统 系统(17)特别包括用于收集光的光纤(18)。 该装置还包括用于移动光纤(18)的电机驱动系统(23),用于以图像形式对等离子体成像的光学成像系统(25),以及处理器和控制单元(24)。 单元(24)能够分析由光学成像系统形成的图像,以便选择感兴趣的区域并控制电机驱动系统(23),以便将光纤放置在能够收集光线的位置 来自所选择的等离子体区域。

    Analysis method, analysis device, and etching processing system
    239.
    发明授权
    Analysis method, analysis device, and etching processing system 有权
    分析方法,分析装置和蚀刻处理系统

    公开(公告)号:US09091595B2

    公开(公告)日:2015-07-28

    申请号:US13945285

    申请日:2013-07-18

    Abstract: Among the multiple OES data wavelengths, an analysis device identifies the wavelength of light emissions from a substance contained in the plasma from among multiple light emission wavelengths within the chamber by way of the steps of: measuring the light emission within the chamber during etching processing of the semiconductor wafer; finding the time-based fluctuation due to changes over time on each wavelength in the measured intensity of the light emissions in the chamber; comparing the time-based fluctuations in the wavelength of the light emitted from the pre-specified substance; and by using the comparison results, identifying the wavelength of the light emitted from the substance caused by light emission within the chamber.

    Abstract translation: 在多个OES数据波长中,分析装置通过以下步骤来识别来自腔室内的多个发光波长的等离子体中包含的物质的光发射的波长:在蚀刻处理期间测量腔室内的光发射 半导体晶片; 发现由于室内光发射强度的每个波长随时间的变化引起的时间波动; 比较从预先指定的物质发射的光的波长的基于时间的波动; 并且通过使用比较结果,识别由室内的发光引起的从物质发射的光的波长。

    LASER-ABLATION-BASED MATERIAL ANALYSIS SYSTEM WITH A POWER/ENERGY DETECTOR
    240.
    发明申请
    LASER-ABLATION-BASED MATERIAL ANALYSIS SYSTEM WITH A POWER/ENERGY DETECTOR 有权
    具有功率/能量检测器的基于激光雷达的材料分析系统

    公开(公告)号:US20150190884A1

    公开(公告)日:2015-07-09

    申请号:US14588824

    申请日:2015-01-02

    Abstract: A laser ablation system and methods are disclosed for performing material analysis. The laser ablation system includes a sample chamber which holds and encloses a sample material to be ablated; a laser source that produces a laser beam which is directed into the sample chamber to a surface of the sample material to cause laser ablation; a laser measuring device which is physically attached to the sample chamber to measure a power/energy value of the laser beam; and a material analyzing module that is coupled to the sample chamber to receive the ablated material from laser ablation of the sample material.

    Abstract translation: 公开了用于进行材料分析的激光烧蚀系统和方法。 激光烧蚀系统包括:样品室,其保持并包围待烧蚀的样品材料; 产生激光束的激光源,其被引导到样品室中到样品材料的表面以引起激光烧蚀; 激光测量装置,物理地附接到样品室以测量激光束的功率/能量值; 以及材料分析模块,其耦合到所述样品室以从所述样品材料的激光烧蚀接收所述烧蚀材料。

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