Abstract:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
Abstract:
A method of optically detecting a change in intensity of an emission peak in a plasma process, such as a plasma etching process, by reflecting an emission spectrum of radiation from the plasma reaction off of a pair of rugate filters. The reflected emission spectrum has increased in-band reflections and decreased out-of-band reflections which provides reduced noise and an easier-to-detect emission peak. The method can be used for end-point detection in a plasma etching process such as etching of SiO.sub.2.
Abstract:
An optical system for a multidetector array spectrophotometer which includes multiple light sources for emitting light of selected wavelength ranges and means for selectively transmitting the selected wavelength ranges of light to respective slits of a multi-slit spectrogrpah for multiple wavelength range detection. The spectrograph has two or more slits which direct the selected wavelength ranges of the light spectra to fall upon a dispersive and focusing system which collects light from each slit, disperses the light by wavelength and refocuses the light at the positions of a single set of detectors.
Abstract:
A method and apparatus for the qualitative and quantitative spectroscopic investigation of elements present in a liquid sample using the laser spark. A series of temporally closely spaced spark pairs is induced in the liquid sample utilizing pulsed electromagnetic radiation from a pair of lasers. The light pulses are not significantly absorbed by the sample so that the sparks occur inside of the liquid. The emitted light from the breakdown events is spectrally and temporally resolved, and the time period between the two laser pulses in each spark pair is adjusted to maximize the signal-to-noise ratio of the emitted signals. In comparison with the single pulse technique, a substantial reduction in the limits of detectability for many elements has been demonstrated. Narrowing of spectral features results in improved discrimination against interfering species.
Abstract:
A method and apparatus for standardizing spectral line intensities in a spectral monochromator separate an input beam into a sample spectral line characteristic of a sample element, a reference spectral line, a standard spectral line and a background spectral band. At a first point in time an intensity I.sub.A of the sample line, a first intensity I.sub.R1 of the reference line and a first intensity I.sub.B1 of the background band are measured. At a second point in time an intensity I.sub.S of the standard line, a second intensity I.sub.R2 of the reference line and a second intensity I.sub.B2 of the background band are measured. An intensity ratio IR defined by the formula ##EQU1## is computed wherein the intensity ratio IR represents a standardized intensity of the sample line compensated for source fluctuations.
Abstract:
An analysis system for directly analyzing solid samples by atomic emission spectroscopy wherein the system includes an atomic spectral lamp (1) of the type which enables a solid sample to be analyzed to be demountably located as a cathode of the lamp (1), means (2) for producing a primary electric discharge by cathodic sputtering from the sample via connection (8) and a secondary boosted discharge for analytical emission via connection (9), spectral wave length analysis device (4) being arranged to receive and determine the intensity of spectral lines emitted by the lamp (1), and control means (3) for controlling the system, the current level of the sample cathode and the operation of the spectral wave length analysis device (4) being controlled on the basis of output from the photomultiplier tube (7) such that the intensity of the spectral lines is maximized and the relationship between spectral line intensity and concentration of the corresponding element in the sample is maintained in a region which is substantially linear.
Abstract:
An optical partial pressure gas analyzer employs an electron beam to excite the outer electrons of gas atoms or molecules, and one or more photomultiplier tubes or other similar detectors to detect wavelengths of photons characteristic of the decay of the outer electrons of one or more species of gas molecules. The photomultiplier tubes have a viewing direction substantially at right angles to the electron beam. A Faraday trap or similar device is employed to avoid secondary electron generation. Thin-film interference filters are favorably employed to pass a specific characteristic wavelength of the desired species, and to reject other wavelengths. An electromechanical filter changer permits each photomultiplier tube to analyze two or more gasses alternately.
Abstract:
An apparatus for measuring anisotropy of light emitted from the sample, in which photodetectors are each disposed by either side of the sample and TACs are connected to the abovesaid apparatus each correspondingly to one photodetector so that a vertical polarized component and a horizontal one of light emitted from the sample can be measured at the same time for enabling analysis operation in a short period of time and measurement in high precision.
Abstract:
A system for calculating, analyzing and presenting a chemical analysis of a specimen is comprised of a spectrometer, a converter-control, a computer, programmers, a keyboard, and a display. The format of the presented data the calculation of the specimen data and the analysis of the calculated data are specified by a combination of interrogating signals from the programmers and responsive signals from the keyboard.