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公开(公告)号：US20240379324A1
公开(公告)日：2024-11-14
申请号：US18658470
申请日：2024-05-08
Applicant: FEI Company
IPC: H01J37/244 , H01J37/05
Abstract: A method for confirming an ionization edge within a measured EELS spectrum involves providing a measured EELS spectrum containing an ionization edge and a numerical model that outputs simulated EELS spectra with the location of an ionization edge as an input parameter. The numerical model is fitted to the measured EELS spectrum, and a fitted location of the ionization edge is provided. A statistical test is used to confirm the ionization edge as a true ionization edge if it passes a statistical threshold value. The method can be used in a variety of applications, including materials science, chemistry, and physics, to improve the accuracy of EELS spectrum analysis.
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公开(公告)号：US20240369505A1
公开(公告)日：2024-11-07
申请号：US18774491
申请日：2024-07-16
Applicant: FEI Company
Inventor： Garrett Budnik
IPC: G01N23/2258
Abstract: Methods and systems for spectroscopic analysis of focused ion beam induced optical emission include accessing a spectrum acquired from a sample responsive to irradiating the sample with an ion beam and identifying the spectral peaks of the spectrum. The emission type of the spectral peak is determined based on a spectral resolution of a light collection system for collecting the spectrum. The emission types include elemental emission, molecular emission, and bandgap emission.
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23.发明授权公开(公告)号：US12136532B2
公开(公告)日：2024-11-05
申请号：US17964411
申请日：2022-10-12
Applicant: FEI Company
Inventor： Pavel Potocek , Remco Schoenmakers , Maurice Peemen , Bert Henning Freitag
IPC: H01J37/28 , G01N23/20091 , G01N23/203 , G01N23/2254 , H01J37/147 , H01J37/244 , H01J37/26 , H01J37/302
Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.
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公开(公告)号：US12106933B2
公开(公告)日：2024-10-01
申请号：US17694549
申请日：2022-03-14
Applicant: FEI Company
Inventor： Jan Stopka , Bohuslav Sed'a
IPC: H01J37/28 , H01J37/10 , H01J37/153
CPC classification number: H01J37/28 , H01J37/10 , H01J37/153 , H01J2237/0453 , H01J2237/1532
Abstract: An example multi-beam scanning electron microscope (MB-SEM) for correcting both astigmatism and linear distortion at least includes an electron source coupled to provide an electron beam, an aperture plate comprising an array of apertures, the aperture plate arranged to form an array of electron beamlets from the electron beam, and an electron column including a plurality of lenses and first and second stigmators, the electron column coupled to direct the array of electron beamlets toward a sample, wherein the first and second stigmators are arranged and excited to correct both astigmatism and linear distortion.
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公开(公告)号：US12085523B2
公开(公告)日：2024-09-10
申请号：US18516645
申请日：2023-11-21
Applicant: FEI Company
Inventor： Pavel Potocek
IPC: G01N23/2251 , H01J37/26 , H01J37/28
CPC classification number: G01N23/2251 , H01J37/265 , H01J37/28 , G01N2223/401 , G01N2223/408 , G01N2223/418
Abstract: A method comprises: using a Scanning Electron Microscope (SEM) to acquire an image of a specimen; identifying one or more objects of interest within the SEM image; generating a scan mask indicating a first set of one or more regions corresponding to the identified one or more objects of interest; and based on the scan mask, providing instructions to the SEM to acquire one or more Electron Backscatter Diffraction (EBSD) images from the first set of one or more regions of the specimen, wherein the method is performed by at least one device including a hardware processor.
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Patent Agency Ranking
公开(公告)号：US20240280522A1
公开(公告)日：2024-08-22
申请号：US18171541
申请日：2023-02-20
Applicant: FEI COMPANY
Inventor： Hans Vanrompay , Maurice Peemen
IPC: G01N23/2252 , G06N3/0455
CPC classification number: G01N23/2252 , G06N3/0455
Abstract: Disclosed herein are scientific instrument support systems, as well as related methods, apparatus, computing devices, and computer-readable media. Some embodiments provide a scientific instrument including detectors supporting one or more spectroscopic modalities and an imaging modality and further including an electronic controller configured to process streams of measurements received from the detectors. The electronic controller operates to generate a base image of the sample based on the measurements corresponding to the imaging modality and further operates to generate an anomaly map of the sample based on the base image and further based on differences between measured and autoencoder-reconstructed spectra corresponding to different pixels of the base image. In at least some instances, the anomaly map can beneficially be used in a quality-control procedure to identify, within seconds, specific problem spots in the sample for more-detailed inspection and/or analyses.
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公开(公告)号：US20240266142A1
公开(公告)日：2024-08-08
申请号：US18617227
申请日：2024-03-26
Applicant: FEI Company
Inventor： Christopher THOMPSON , Dustin ELLIS , Adam STOKES , Ronald KELLEY , Cedric BOUCHET-MARQUIS
IPC: H01J37/305 , H01J37/20 , H01J37/244 , H01J37/28
CPC classification number: H01J37/3056 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/2007 , H01J2237/208 , H01J2237/31745 , H01J2237/31749
Abstract: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.
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公开(公告)号：US12057286B2
公开(公告)日：2024-08-06
申请号：US18084430
申请日：2022-12-19
Applicant: FEI Company
Inventor： Edwin Verschueren , Paul Tacx
CPC classification number: H01J37/023 , H01J37/28 , H01J2237/20221 , H01J2237/20264 , H01J2237/20278 , H01J2237/2802
Abstract: A method of producing a compensation signal to compensate for misalignment of a drive unit clamp element can include applying a clamp element drive signal to a drive unit clamp element to engage a mover element, determining a first displacement of the mover element, and determining a first compensation signal based at least in part on the first displacement. The method can further comprise applying the first compensation signal to the drive unit shear elements and the clamp element drive signal to the drive unit clamp element and determining a second displacement of the mover element. If the second displacement is less than a preselected threshold, the first compensation signal can be combined with an initial shear element drive signal to produce a modified shear element drive signal. If the second displacement is greater than the preselected threshold, a second compensation signal can be determined.
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公开(公告)号：US20240194466A1
公开(公告)日：2024-06-13
申请号：US18076813
申请日：2022-12-07
Applicant: FEI Company
Inventor： Peter Christiaan TIEMEIJER , Alexander HENSTRA
CPC classification number: H01J49/0036 , H01J49/44
Abstract: Methods and systems for automatically tuning an EELS spectrometer according to the present disclosure include obtaining an initial measurement of an EELS spectrum, generating an simulated EELS spectrum fit to the initial measurement of the EELS spectrum, and estimating one or more values of one or more aberration parameters based on the simulated EELS spectrum. Then, using the value(s) of the aberration parameter(s) to tune the optical elements of the EELS spectrometer to remove and/or reduce aberrations in the EELS system.
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公开(公告)号：US20240167935A1
公开(公告)日：2024-05-23
申请号：US18515557
申请日：2023-11-21
Applicant: FEI COMPANY
Inventor： Chien-Sheng LIAO
IPC: G01N15/14
CPC classification number: G01N15/1436 , G01N15/1404 , G01N2015/0065
Abstract: A flow cell for use with a spectrometer is described. The flow cell includes a waveguide having a hollow core. An inlet is fluidly coupled at a first end of the hollow core, and an outlet is fluidly coupled at a second end of the hollow core. A window at the inlet is optically coupled to the waveguide at the second end, and a mirror at the outlet is optically coupled to the waveguide at the second end. The flow cell also includes a first conduit configured to couple a fluid to the inlet, and a second conduit configured to couple the fluid to the outlet. Methods and systems using the flow cell are described. For example, methods and systems for monitoring a bioreactor.
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