公开(公告)号：US09082590B2

公开(公告)日：2015-07-14

申请号：US13966614

申请日：2013-08-14

Applicant: APPLIED MATERIALS, INC.

Inventor： James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Jason A. Kenney ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J7/24 ,  H05B31/26 ,  H01J37/32 ,  H05H1/46 ,  C23C16/505

CPC classification number: H01J37/3211 ,  C23C16/505 ,  H01J37/32119 ,  H01J37/32183 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

Abstract translation: 等离子体反应器具有架空多线圈感应等离子体源，其具有对称和径向RF馈送以及围绕对称和径向RF馈送的圆柱形RF屏蔽。 径向RF馈送对称地馈送到等离子体源。

公开(公告)号：US20140020835A1

公开(公告)日：2014-01-23

申请号：US13666224

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Andrew Nguyen ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Shahid Rauf ,  James D. Carducci ,  Douglas A. Buchberger, JR. ,  Ankur Agrawal ,  Jason A. Kenney ,  Leonid Dorf ,  Ajit Balakrishna ,  Richard Fovell

IPC: C23F1/08 ,  C23C14/28

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workplace support. A grid may be included for masking spatial effects of the struts from the processing region.

Abstract translation: 等离子体反应器具有具有对称RF进料的顶置多线圈感应等离子体源和具有穿过排气区域的多个支柱的对称室排气，从而提供对受限制的工作场所支撑件的通路。 可以包括用于屏蔽来自处理区域的支柱的空间效应的网格。

公开(公告)号：US11049760B2

公开(公告)日：2021-06-29

申请号：US15436936

申请日：2017-02-20

Applicant: Applied Materials, Inc.

Inventor： Olivier Joubert ,  Jason A. Kenney ,  Sunil Srinivasan ,  James Rogers ,  Rajinder Dhindsa ,  Vedapuram S. Achutharaman ,  Olivier Luere

IPC: H01L21/687 ,  H01J37/32 ,  H01L21/683

Abstract: The implementations described herein generally relate to a process kit suitable for use in a semiconductor process chamber, which reduces edge effects and widens the processing window with a single edge ring as compared to conventional process kits. The process kit generally includes an edge ring disposed adjacent to and surrounding a perimeter of a semiconductor substrate in a plasma chamber. A dimension of a gap between the substrate and the edge ring is less than about 1000 μm, and a height difference between the substrate and the edge ring is less than about (+/−) 300 μm. The resistivity of the ring is less than about 50 Ohm-cm.

公开(公告)号：US10249470B2

公开(公告)日：2019-04-02

申请号：US13897585

申请日：2013-05-20

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason A. Kenney ,  James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: C23C16/00 ,  H01L21/306 ,  H01J37/04 ,  H01J37/32 ,  H05H1/46

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and symmetrical RF shielding around the symmetric RF feeds.

公开(公告)号：US20180218873A1

公开(公告)日：2018-08-02

申请号：US15936154

申请日：2018-03-26

Applicant: Applied Materials, Inc.

Inventor： Jason A. Kenney ,  James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/04 ,  H05H1/46 ,  H01J37/32

CPC classification number: H01J37/04 ,  H01J37/321 ,  H01J37/3211 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor includes a window assembly, inner, middle and outer coil antennas adjacent the window assembly, inner, middle and outer current distributors respectively coupled to the inner, middle and outer coil antennas, a ceiling plate overlying the window assembly, first, second and third RF power terminals, and first, second and third axial RF power feeds connected between respective ones of the first, second and third RF power terminals and respective ones of the inner, middle and outer current distributors. The third axial RF power feed includes an outer RF power distribution cylinder surrounding the first and second RF axial power feeds. Plural spaced-apart reactance elements are electrically connected to the outer RF power distribution cylinder.

公开(公告)号：US20180138014A1

公开(公告)日：2018-05-17

申请号：US15867559

申请日：2018-01-10

Applicant: Applied Materials, Inc.

Inventor： James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Jason A. Kenney ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/32 ,  H05H1/46 ,  C23C16/505

Abstract: A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

公开(公告)号：US09896769B2

公开(公告)日：2018-02-20

申请号：US13666280

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Andrew Nguyen ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Shahid Rauf ,  James D. Carducci ,  Douglas A. Buchberger, Jr. ,  Ankur Agarwal ,  Jason A. Kenney ,  Leonid Dorf ,  Ajit Balakrishna ,  Richard Fovell

IPC: C23C16/00 ,  H01L21/306 ,  C23F1/08 ,  C23C14/28 ,  H05H1/46 ,  B01J12/00 ,  H01J37/32

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.

公开(公告)号：US20170350017A1

公开(公告)日：2017-12-07

申请号：US15685568

申请日：2017-08-24

Applicant: Applied Materials, Inc.

Inventor： Andrew Nguyen ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Shahid Rauf ,  James D. Carducci ,  Douglas A. Buchberger, JR. ,  Ankur Agarwal ,  Jason A. Kenney ,  Leonid Dorf ,  Ajit Balakrishna ,  Richard Fovell

IPC: C23F1/08 ,  C23C14/28 ,  B01J12/00 ,  H05H1/46 ,  H01J37/32

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workpiece support. A grid may be included for masking spatial effects of the struts from the processing region.

公开(公告)号：US20140021861A1

公开(公告)日：2014-01-23

申请号：US13966614

申请日：2013-08-14

Applicant: APPLIED MATERIALS, INC.

Inventor： James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Jason A. Kenney ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  C23C16/505 ,  H01J37/32119 ,  H01J37/32183 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

Abstract translation: 等离子体反应器具有架空多线圈感应等离子体源，其具有对称和径向RF馈送以及围绕对称和径向RF馈送的圆柱形RF屏蔽。 径向RF馈送对称地馈送到等离子体源。

公开(公告)号：US20140020838A1

公开(公告)日：2014-01-23

申请号：US13897585

申请日：2013-05-20

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason A. Kenney ,  James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/04

CPC classification number: H01J37/04 ,  H01J37/321 ,  H01J37/3211 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and symmetrical RF shielding around the symmetric RF feeds.

Abstract translation: 等离子体反应器具有架空多线圈感应等离子体源，对称RF馈电和围绕对称RF馈送的对称RF屏蔽。