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公开(公告)号：US20250140538A1
公开(公告)日：2025-05-01
申请号：US18495458
申请日：2023-10-26
Applicant: Applied Materials, Inc.
Inventor： Devi Raghavee Veerappan , Ajit Balakrishna
Abstract: A method for estimating pressure values within a processing chamber is provided. The method can include receiving a measurement of a pressure at a terminal end of an exit flow path from a processing chamber, and processing the measurement of the pressure using a model including conductance values for a plurality of segments of the exit flow path to estimate one or more pressure values within the processing chamber.
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公开(公告)号：US11894220B2
公开(公告)日：2024-02-06
申请号：US16591139
申请日：2019-10-02
Applicant: APPLIED MATERIALS, INC.
Inventor： Michael Nichols , Tina Dhekial-Phukan , Venkata Ravishankar Kasibhotla , Ajit Balakrishna , Sanggyum Kim
CPC classification number: H01J37/3299 , H01J37/32183 , H01J37/32449 , H01J37/32816 , H01J37/32926 , H01L21/67248 , H01L21/67253 , H01J2237/3321 , H01J2237/3341
Abstract: Methods and systems for processing substrates are provided. The system can include: a processing chamber configured to process a substrate based on a recipe; a plurality of sub-systems in operable communication with the processing chamber for controlling corresponding parameters associated with processing the substrate; and a controller in operable communication with the processing chamber and each of the plurality of sub-systems and configured to control each of the plurality of sub-systems and the processing chamber using information included in the recipe and feedback provided by at least one of the plurality of sub-systems. The controller is configured to compare information included in the recipe and feedback provided by at least one of the plurality of sub-systems with stored empirical information relating to the recipe and each of the plurality of sub-systems, and adjust at least one of the corresponding parameters associated with processing the substrate based on a determined comparison.
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公开(公告)号：US11049699B2
公开(公告)日：2021-06-29
申请号：US16516419
申请日：2019-07-19
Applicant: Applied Materials, Inc.
Inventor： Tejas Ulavi , Amit Kumar Bansal , Nitin Pathak , Ajit Balakrishna
IPC: H01J37/32 , C23C16/455 , H01L21/02
Abstract: Embodiments of the present disclosure relate to apparatus for improving quality of films deposited on a substrate by a CVD process. More specifically, a branched gas feed assembly uniformly distributes a process gas entering an annular plenum. Each conduit of a first plurality of conduits having substantially equal flow conductance is in fluid communication with one or more conduits of a second plurality of conduits having substantially equal flow conductance. Each conduit of the second plurality of conduits terminates at one of a plurality of outlets. Each outlet of the plurality of outlets is in fluid communication with one or more inlet ports of a plurality of inlet ports formed in the annular plenum. Each inlet port of the plurality of inlet ports is spaced equidistant about a central axis of the annular plenum.
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公开(公告)号：US20230042432A1
公开(公告)日：2023-02-09
申请号：US17892441
申请日：2022-08-22
Applicant: Applied Materials, Inc.
Inventor： Tao Zhang , Upendra V. Ummethala , Ajit Balakrishna
IPC: G01R31/3177 , G01D21/02 , G01F1/86 , G05B13/02 , G01F1/84
Abstract: A non-transitory computer-readable storage medium stores instructions, which when executed by a processing device of a diagnostic server, cause the processing device to perform certain operations. The operations include receiving, from a processing chamber, (i) measurement values of a combined signal that is based on an injection of an alternating signal wave onto a first output signal of a controller of the processing chamber, and (ii) measurement values of a second output signal of the controller that incorporates feedback from the processing chamber. The operations further include generating, based on the measurement values of the combined signal and the measurement values of the second output signal of the controller, a baseline bode fingerprint pertaining to a state associated with the processing chamber. The operations further include storing, in computer storage, the baseline bode fingerprint to be used in performing diagnostics of the processing chamber.
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公开(公告)号：US20210311114A1
公开(公告)日：2021-10-07
申请号：US16838834
申请日：2020-04-02
Applicant: Applied Materials, Inc.
Inventor： Tao Zhang , Upendra V. Ummethala , Ajit Balakrishna
IPC: G01R31/3177 , G05B13/02 , G01F1/86 , G01D21/02
Abstract: A non-transitory computer-readable storage medium stores instructions, which when executed by a processing device of a diagnostic server, cause the processing device to perform certain operations. The operations include receiving, from a processing chamber, (i) measurement values of a combined signal that is based on an injection of an alternating signal wave onto a first output signal of a controller of the processing chamber, and (ii) measurement values of a second output signal of the controller that incorporates feedback from the processing chamber. The operations further include generating, based on the measurement values of the combined signal and the measurement values of the second output signal of the controller, a baseline bode fingerprint pertaining to a state associated with the processing chamber. The operations further include storing, in computer storage, the baseline bode fingerprint to be used in performing diagnostics of the processing chamber.
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Patent Agency Ranking
公开(公告)号：US10770269B2
公开(公告)日：2020-09-08
申请号：US15677929
申请日：2017-08-15
Applicant: Applied Materials, Inc.
Inventor： Andrew Nguyen , Bradley Howard , Shahid Rauf , Ajit Balakrishna , Tom K. Choi , Kenneth S. Collins , Anand Kumar , Michael D. Willwerth , Yogananda Sarode Vishwanath
Abstract: Embodiments of the present disclosure generally provide various apparatus and methods for reducing particles in a semiconductor processing chamber. One embodiment of present disclosure provides a vacuum screen assembly disposed over a vacuum port to prevent particles generated by the vacuum pump from entering substrate processing regions. Another embodiment of the present disclosure provides a perforated chamber liner around a processing region of the substrate. Another embodiment of the present disclosure provides a gas distributing chamber liner for distributing a cleaning gas around the substrate support under the substrate supporting surface.
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公开(公告)号：US09909213B2
公开(公告)日：2018-03-06
申请号：US14452228
申请日：2014-08-05
Applicant: Applied Materials, Inc.
Inventor： Sergio Fukuda Shoji , Hamid Noorbakhsh , Jong Mun Kim , Jason Della Rosa , Ajit Balakrishna
IPC: C23C16/44 , C23C16/455 , F15D1/02 , H01J37/32
CPC classification number: C23C16/45591 , C23C16/4412 , F15D1/025 , H01J37/32633 , H01J37/32834
Abstract: Embodiments of the present invention provide apparatus and methods for reducing non-uniformity and/or skews during substrate processing. One embodiment of the present invention provides a flow equalizer assembly for disposing between a vacuum port and a processing volume in a processing chamber. The flow equalizing assembly includes a first plate having at least one first opening, and a second plate having two or more second openings. The first and second plates define a flow redistributing volume therebetween, and the at least one first opening and the two or more second openings are staggered.
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公开(公告)号：US09761416B2
公开(公告)日：2017-09-12
申请号：US14200077
申请日：2014-03-07
Applicant: Applied Materials, Inc.
Inventor： Andrew Nguyen , Bradley Howard , Shahid Rauf , Ajit Balakrishna , Tom K. Cho , Kenneth S. Collins , Anand Kumar , Michael D. Willwerth , Yogananda Sarode Vishwanath
CPC classification number: H01J37/32495 , B01D45/08 , B29C66/71 , B32B1/02 , H01J37/32449 , H01J37/32477 , H01J37/32871 , Y10T428/13
Abstract: Embodiments of the present disclosure generally provide various apparatus and methods for reducing particles in a semiconductor processing chamber. One embodiment of present disclosure provides a vacuum screen assembly disposed over a vacuum port to prevent particles generated by the vacuum pump from entering substrate processing regions. Another embodiment of the present disclosure provides a perforated chamber liner around a processing region of the substrate. Another embodiment of the present disclosure provides a gas distributing chamber liner for distributing a cleaning gas around the substrate support under the substrate supporting surface.
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公开(公告)号：US09745663B2
公开(公告)日：2017-08-29
申请号：US13666224
申请日：2012-11-01
Applicant: APPLIED MATERIALS, INC.
Inventor： Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Shahid Rauf , James D. Carducci , Douglas A. Buchberger, Jr. , Ankur Agarwal , Jason A. Kenney , Leonid Dorf , Ajit Balakrishna , Richard Fovell
CPC classification number: C23F1/08 , B01J12/002 , C23C14/28 , H01J37/321 , H01J37/3211 , H01J37/32733 , H01J37/32834 , H05H1/46
Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workpiece support. A grid may be included for masking spatial effects of the struts from the processing region.
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10.发明申请公开(公告)号：US20140020835A1
公开(公告)日：2014-01-23
申请号：US13666224
申请日：2012-11-01
Applicant: APPLIED MATERIALS, INC.
Inventor： Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Shahid Rauf , James D. Carducci , Douglas A. Buchberger, JR. , Ankur Agrawal , Jason A. Kenney , Leonid Dorf , Ajit Balakrishna , Richard Fovell
CPC classification number: C23F1/08 , B01J12/002 , C23C14/28 , H01J37/321 , H01J37/3211 , H01J37/32733 , H01J37/32834 , H05H1/46
Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workplace support. A grid may be included for masking spatial effects of the struts from the processing region.
Abstract translation: 等离子体反应器具有具有对称RF进料的顶置多线圈感应等离子体源和具有穿过排气区域的多个支柱的对称室排气，从而提供对受限制的工作场所支撑件的通路。 可以包括用于屏蔽来自处理区域的支柱的空间效应的网格。
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