公开(公告)号：US09933301B2

公开(公告)日：2018-04-03

申请号：US14960131

申请日：2015-12-04

Applicant: STMicroelectronics S.R.L.

Inventor： Massimo Cataldo Mazzillo ,  Antonella Sciuto ,  Paolo Badalà

IPC: G01J1/42 ,  H01L27/146 ,  H01L31/101 ,  H01L31/108

CPC classification number: G01J1/429 ,  H01L27/14621 ,  H01L27/14683 ,  H01L31/1013 ,  H01L31/108

Abstract: An integrated electronic device for detecting the composition of ultraviolet radiation includes a cathode region formed by a semiconductor material with a first type of conductivity. A first anode region and a second anode region are laterally staggered with respect to one another and are set in contact with the cathode region. The cathode region and the first anode region form a first sensor. The cathode region and the second anode region form a second sensor. In a spectral range formed by the UVA band and by the UVB band, the first and second sensors have, respectively, a first spectral responsivity and a second spectral responsivity different from one another.

公开(公告)号：US09928727B2

公开(公告)日：2018-03-27

申请号：US15220112

申请日：2016-07-26

Applicant: Carrier Corporation

Inventor： Peter R. Harris ,  Marcin Piech

IPC: G08B29/00 ,  G08B29/14 ,  G01J1/42 ,  G08B17/12

CPC classification number: G08B29/145 ,  G01J1/4228 ,  G01J1/429 ,  G08B17/12

Abstract: A flame detector includes a UV sensor sensitive to solar UV radiation and a secondary sensor sensitive to non-UV radiation. A controller is operatively connected to the UV sensor and the secondary sensor to: signal an alarm in response to receiving input from the UV sensor indicative of a strong UV source and input from the secondary sensor indicative of a weak non-UV radiation source; and suppress an alarm in response to receiving a signal from the UV sensor indicative of a strong UV source and a signal from the secondary sensor indicative of a strong non-UV radiation source.

公开(公告)号：US20180081278A1

公开(公告)日：2018-03-22

申请号：US15789702

申请日：2017-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Olav Waldemar Vladimir FRIJNS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Rilpho Ludovicus DONKER ,  Han-Kwang NIENHUYS ,  Borgert KRUIZINGA ,  Wouter Joep ENGELEN ,  Otger Jan LUITEN ,  Johannes Antonius Gerardus AKKERMANS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Vladimir LITVINENKO

IPC: G03F7/20 ,  G01J1/04

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：US20180052045A1

公开(公告)日：2018-02-22

申请号：US15782692

申请日：2017-10-12

Applicant: KLA-Tencor Corporation

Inventor： Mei Sun ,  Earl Jensen ,  Kevin O'Brien

IPC: G01J1/42 ,  G01J5/08 ,  G01J5/04 ,  G01J1/02 ,  G01J1/04 ,  H01L21/67 ,  G01J1/58 ,  G01J5/10

CPC classification number: G01J1/429 ,  G01J1/0204 ,  G01J1/0271 ,  G01J1/0407 ,  G01J1/58 ,  G01J5/04 ,  G01J5/0818 ,  G01J5/10 ,  G01K11/20 ,  H01L21/67248 ,  H01L21/67253 ,  H01L22/10

Abstract: A measurement wafer device for measuring radiation intensity and temperature includes a wafer assembly including one or more cavities. The measurement wafer device further includes a detector assembly. The detector assembly includes one or more light sensors. The detector assembly is further configured to perform a direct or indirect measurement of the intensity of ultraviolet light incident on a surface of the wafer assembly.

公开(公告)号：US09868651B2

公开(公告)日：2018-01-16

申请号：US14983267

申请日：2015-12-29

Applicant: PotaVida, Inc.

Inventor： Charles Bruce Matlack ,  Tyler Blake Davis ,  Jacqueline Callihan Linnes

IPC: C02F1/32 ,  C02F1/00 ,  G01J1/42 ,  C02F1/02 ,  G01J1/02

CPC classification number: A61F2/2412 ,  A61F2/2409 ,  A61F2/2418 ,  A61F2250/0059 ,  A61F2250/0063 ,  C02F1/008 ,  C02F1/02 ,  C02F1/325 ,  C02F2201/009 ,  C02F2201/3228 ,  C02F2209/02 ,  C02F2209/11 ,  C02F2209/44 ,  C02F2303/04 ,  G01J1/0271 ,  G01J1/429 ,  Y02A20/212

Abstract: A system for solar disinfection of fluid. One most preferred version of the system includes: (a) A UVTC, made of a polyethylene laminate film with an approximately rectangular plan, providing: a. A first compartment. b. A second compartment for holding fluid, with a port to fill and dispense. (b) A Disinfection Monitor Module (“DMM”) located in the first compartment which: a. Includes at least one sensor to measure radiation intensity. b. Provides at least one user interface: c. Contains a wireless communication interface. d. Operates according to a process that ensures sufficient cumulative exposure of the contained fluid to solar UV to achieve adequate solar disinfection. Alternative embodiments may also include sensors to detect additional characteristics, such as transmittance, turbidity, “combined transmittance,” and/or temperature.

公开(公告)号：US09823572B2

公开(公告)日：2017-11-21

申请号：US14900110

申请日：2014-06-17

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Olav Waldemar Vladimir Frijns ,  Gosse Charles De Vries ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Pieter Willem Herman De Jager ,  Rilpho Ludovicus Donker ,  Han-Kwang Nienhuys ,  Borgert Kruizinga ,  Wouter Joep Engelen ,  Otger Jan Luiten ,  Johannes Antonius Gerardus Akkermans ,  Leonardus Adrianus Gerardus Grimminck ,  Vladimir Litvinenko

IPC: G03B27/42 ,  G03B27/58 ,  G03F7/20 ,  H01S3/09 ,  G01J1/04 ,  G02B1/06 ,  G02B5/20 ,  G21K1/10 ,  G02B26/02 ,  G01J1/26 ,  G01J1/42 ,  H05H7/04 ,  H01S3/00

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

公开(公告)号：US09689742B2

公开(公告)日：2017-06-27

申请号：US14829964

申请日：2015-08-19

Applicant: FUJIFILM Corporation

Inventor： Masahiro Hatta

IPC: G01J1/50 ,  G01J1/04 ,  G01J1/42

CPC classification number: G01J1/50 ,  G01J1/0407 ,  G01J1/429 ,  G01N21/78

Abstract: Provided an ultraviolet-sensing sheet that facilitates measurement of ultraviolet irradiance over a wide area, that is suitable in ultraviolet irradiance in a range from 1 to 1,000 mJ/cm2, a method for manufacturing such an ultraviolet-sensing sheet, and a method for sensing ultraviolet. The ultraviolet-sensing sheet has a change in reflection density ΔD1 of 0.2 or more over a range of cumulative illuminance 1 mJ/cm2 or more and less than 10 mJ/cm2,a change in reflection density ΔD2 of 0.2 or more over a range of cumulative illuminance 10 mJ/cm2 or more and less than 100 mJ/cm2, and a change in reflection density ΔD3 of 0.2 or more over a range of cumulative illuminance 100 mJ/cm2 or more and 1,000 mJ/cm2 or less,as measured at a wavelength of 365 nm when the ultraviolet-sensing sheet is irradiated with a high-pressure mercury lamp.

公开(公告)号：US20170176248A1

公开(公告)日：2017-06-22

申请号：US15300025

申请日：2014-03-31

Applicant: TOHOKU UNIVERSITY

Inventor： Shigetoshi SUGAWA ,  Rihito KURODA

IPC: G01J1/42 ,  H01L27/144 ,  H01L31/09 ,  G01J1/16

CPC classification number: G01J1/429 ,  G01J1/1626 ,  H01L27/142 ,  H01L27/1443 ,  H01L31/09 ,  Y02E10/50

Abstract: Provided is a solid-state light-receiving device for ultraviolet light, which is capable of measuring an irradiation amount of UV-rays, which are harmful to a human body, accurately and appropriately with a simple structure, and of being formed easily and integrally with sensors of peripheral circuits, and which is small, lightweight, low cost, and suitable for mobile or wearable applications. The solid-state light-receiving device for ultraviolet light includes a first photodiode, a second photodiode, and a differential circuit to which signals based on outputs of those photodiodes are input. The solid-state light-receiving device for ultraviolet light also includes semiconductor layer regions, which are formed in and on the above-mentioned photodiodes, and each of which includes a highest concentration position of semiconductor impurities.

公开(公告)号：US09662062B2

公开(公告)日：2017-05-30

申请号：US14478104

申请日：2014-09-05

Applicant: International Business Machines Corporation

Inventor： Brian C. De Guia ,  Sandy Y. McDonald ,  Duy Q. Nguyen ,  Esperanza D. Rodriguez ,  Gary D. Williams

IPC: G06K9/46 ,  A61B5/00 ,  G01J1/42 ,  G06K9/62 ,  G01J1/02

CPC classification number: A61B5/441 ,  A61B5/0077 ,  G01J1/0219 ,  G01J1/4228 ,  G01J1/429 ,  G01J2001/4266 ,  G06K9/4661 ,  G06K9/6267

Abstract: A tool for recommending proper sun block use. The tool receives, by one or more computer processors, a first image of a user captured by a camera, and a second image of a user captured by a camera, wherein the first image is an ultraviolet image, and the second image is a digital color image. The tool determines, by one or more computer processors, areas of ultraviolet radiation vulnerability for the user captured in the first and second image. The tool determines, by one or more computer processors, a level of ultraviolet radiation vulnerability for the determined areas. The tool determines, by one or more computer processors, a recommendation for proper sun block use based, at least in part, on the level of ultraviolet radiation vulnerability.

公开(公告)号：US20170131144A1

公开(公告)日：2017-05-11

申请号：US15412526

申请日：2017-01-23

Applicant: FUJIFILM Corporation

Inventor： Masahiro HATTA ,  Takayuki MATSUMOTO ,  Hiroki SASAKI

IPC: G01J1/50 ,  C09K9/02 ,  G01J1/04

CPC classification number: G01J1/50 ,  C09K9/02 ,  G01J1/0407 ,  G01J1/429

Abstract: Provided are an ultraviolet-sensing sheet, an ultraviolet-sensing set, and an ultraviolet-sensing method, in which color gradation properties which are suitable for detecting an ultraviolet dose are obtained and in which the coloring of an ultraviolet-sensing layer caused by the effect of light other than ultraviolet light is prevented.An ultraviolet-sensing sheet 1 includes: a filter layer 10 that selectively allows transmission of light having a specific wavelength; and an ultraviolet-sensing layer 20 that includes a capsule including a color-forming dye and a photooxidant. It is preferable that the filter layer 10 has a maximum value of the transmittance in a wavelength range of 300 nm or longer and shorter than 380 nm.