公开(公告)号：US20120061583A1

公开(公告)日：2012-03-15

申请号：US13304427

申请日：2011-11-25

Applicant: Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

Inventor： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

Abstract: The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

Abstract translation: 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。

公开(公告)号：US07675047B2

公开(公告)日：2010-03-09

申请号：US11536992

申请日：2006-09-29

Applicant: Svetlana B. Radovanov ,  Peter L. Kellerman ,  Victor M. Benveniste ,  Robert C. Lindberg ,  Kenneth H. Purser ,  Tyler B. Rockwell ,  James S. Buff ,  Anthony Renau

Inventor： Svetlana B. Radovanov ,  Peter L. Kellerman ,  Victor M. Benveniste ,  Robert C. Lindberg ,  Kenneth H. Purser ,  Tyler B. Rockwell ,  James S. Buff ,  Anthony Renau

IPC: H01J37/10 ,  H01J37/317

CPC classification number: H01J37/12 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/083 ,  H01J2237/121

Abstract: A technique for shaping a ribbon-shaped ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for shaping a ribbon-shaped ion beam. The apparatus may comprise an electrostatic lens having a substantially rectangular aperture for a ribbon-shaped ion beam to pass through, wherein a plurality of focusing elements are positioned along short edges of the aperture, and wherein each focusing element is separately biased and oriented to shape the ribbon-shaped ion beam.

Abstract translation: 公开了一种用于成形带状离子束的技术。 在一个特定的示例性实施例中，该技术可以被实现为用于成形带状离子束的装置。 该设备可以包括具有用于带状离子束通过的基本上矩形的孔的静电透镜，其中多个聚焦元件沿着孔的短边缘定位，并且其中每个聚焦元件被单独偏置并定向成形 带状离子束。

公开(公告)号：US20090261267A1

公开(公告)日：2009-10-22

申请号：US12393050

申请日：2009-02-26

Applicant: Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

Inventor： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

IPC: H01J3/14

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses. The projection lens systems are arranged at a pitch in the range of about 1 to 3 times the diameter of the plate apertures, and each projection lens system is for demagnifying and focusing one or more of the charged particle beamlets on to the target plane, each projection lens system has an effective focal length in the range of about 1 to 5 times the pitch, and demagnifies the charged particle beamlets by at least 25 times.

Abstract translation: 一种用于带电粒子多子束系统的投影透镜装置，所述投影透镜装置包括一个或多个板和一个或多个投影透镜阵列。 每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。 投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。 投影透镜系统以等于板孔直径的1至3倍的间距布置，并且每个投影透镜系统用于将一个或多个带电粒子子束放大并聚焦到目标平面上，每个 投影透镜系统具有在俯仰的约1至5倍的范围内的有效焦距，并且将带电粒子子束减小至少25倍。

公开(公告)号：US07297948B2

公开(公告)日：2007-11-20

申请号：US11295801

申请日：2005-12-06

Applicant: Gerard Benas-Sayag ,  Patrick Bouchet ,  Antoine Corbin ,  Pierre Sudraud

Inventor： Gerard Benas-Sayag ,  Patrick Bouchet ,  Antoine Corbin ,  Pierre Sudraud

IPC: G01N23/00 ,  A61N5/00

CPC classification number: H01J37/228 ,  G02B17/082 ,  H01J37/12 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/121 ,  H01J2237/2482 ,  H01J2237/31749

Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Abstract translation: 本发明涉及一种用于生产聚焦粒子束的色谱柱，包括：将包括输出电极（130）的颗粒与用于允许通过粒子束（A）的输出孔（131）聚焦的装置（100）; 用于同时聚焦包括输出孔（230）的光束（F）的光学聚焦装置（200）。 本发明的特征在于，所述输出孔（230）对于光束（F）是透明的，而所述输出电极（130）由保持在所述孔（230）中的金属插入件（130）形成，并且与中心 孔（131）形成所述输出孔。

公开(公告)号：US07235798B2

公开(公告)日：2007-06-26

申请号：US11151425

申请日：2005-06-14

Applicant: Tohru Ishitani ,  Hiroyuki Muto ,  Yuichi Madokoro

Inventor： Tohru Ishitani ,  Hiroyuki Muto ,  Yuichi Madokoro

IPC: G21K5/10

CPC classification number: H01J37/28 ,  H01J37/12 ,  H01J2237/04924 ,  H01J2237/121 ,  H01J2237/31749

Abstract: In order to implement faster high precision milling and high resolution image observation in the structure analysis and failure analysis of the MEMS and semiconductor devices, a two-lens optical system is mounted on a focused ion beam apparatus, and in the optical system the distance from an emitter apex in an ion source to an earth electrode included in a condenser lens and disposed nearest to the ion source is in the range of 5 to 14 mm.

Abstract translation: 为了在MEMS和半导体器件的结构分析和故障分析中实现更快的高精度铣削和高分辨率图像观察，将双透镜光学系统安装在聚焦离子束装置上，并且在光学系统中距离 离子源中的发射极顶点包括在聚光透镜中并且最靠近离子源设置的接地电极在5至14mm的范围内。

公开(公告)号：US20060151713A1

公开(公告)日：2006-07-13

申请号：US11323017

申请日：2005-12-30

Applicant: Pavel Adamec

Inventor： Pavel Adamec

IPC: H01J1/50

CPC classification number: H01J37/12 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/2611 ,  H01J2237/2817

Abstract: The invention provides a multiple lens assembly 1 for a charged particle beam device which comprises at least two lens sub units 2, each sub unit having an optical axis 3, wherein at least two of the optical axes of the lens sub units are inclined to each other. Further, the invention provides a charged particle beam device which comprises at least one multiple lens assembly and a method for operating a charged particle beam device.

Abstract translation: 本发明提供了一种用于带电粒子束装置的多透镜组件1，其包括至少两个透镜子单元2，每个子单元具有光轴3，其中透镜子单元的至少两个光轴倾斜于每个 其他。 此外，本发明提供一种带电粒子束装置，其包括至少一个多透镜组件和用于操作带电粒子束装置的方法。

公开(公告)号：US20050082497A1

公开(公告)日：2005-04-21

申请号：US10696782

申请日：2003-10-29

Applicant: Richard Goldberg ,  David Armour ,  Christopher Burgess ,  Adrian Murrell

Inventor： Richard Goldberg ,  David Armour ,  Christopher Burgess ,  Adrian Murrell

IPC: G21K5/10 ,  H01J37/08 ,  H01J37/12 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/12 ,  H01J2237/04756 ,  H01J2237/121 ,  H01J2237/31701

Abstract: Provided is an ion implanter having a deceleration lens assembly comprising a plurality of electrodes in which one or more of the apertures of the deceleration electrodes are shaped in a manner which can improve performance of the ion implanter. In one embodiment, an electrode aperture is generally elliptical in shape and conforms generally to the shape of the beam passing through the aperture. In another aspect, an axis segment extends 40% of the length of the aperture from the aperture center to an intermediate point at the end of the segment. The average width of the aperture measured at each point from the center to the intermediate point is substantially less than the maximum width of the aperture.

Abstract translation: 提供了具有减速透镜组件的离子注入机，该减速透镜组件包括多个电极，其中减速电极的一个或多个孔径以能够提高离子注入机的性能的方式成形。 在一个实施例中，电极孔的形状通常为椭圆形，并且通常符合通过孔的光束的形状。 在另一方面，轴线段将孔的长度的40％从孔中心延伸到段末端的中间点。 在从中心到中间点的每个点处测量的孔的平均宽度基本上小于孔的最大宽度。

公开(公告)号：US09941107B2

公开(公告)日：2018-04-10

申请号：US14441700

申请日：2013-11-08

Applicant: LECO Corporation

Inventor： Anatoly N. Verenchikov

IPC: H01J49/40 ,  H01J49/00

CPC classification number: H01J49/406 ,  H01J49/0031 ,  H01J49/405 ,  H01J2237/121

Abstract: A method and apparatus are disclosed for improving resolution and duty-cycle of a multi-reflecting TOF mass spectrometer (MR-TOF) by arranging a cylindrical analyzer having an appropriate radial deflection means, means for limiting ion divergence in the tangential direction and a pulsed source providing ion packet divergence of less than 1 mm*deg. There are disclosed embodiments for fifth-order focusing cylindrical ion minors. Separate embodiments provide parallel tandem MS-MS within a single cylindrical MR-TOF.

公开(公告)号：US20180025885A1

公开(公告)日：2018-01-25

申请号：US15548321

申请日：2016-02-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta IMAI ,  Hideo MORISHITA ,  Toshihide AGEMURA

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/08 ,  H01J37/28 ,  H01J37/06

CPC classification number: H01J37/12 ,  H01J37/06 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/08 ,  H01J2237/121 ,  H01J2237/244 ,  H01J2237/2801

Abstract: This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is placed, and an electric field correction electrode (13) which is provided around the tip of the first charged particle beam column, wherein the electric field correction electrode is an electrode that corrects the electric field distribution formed in the vicinity of the test piece, and the electric field correction electrode is positioned between the test piece and the first charged particle beam column, and on the opposite side from the second charged particle beam column with respect to the optical axis of the first charged particle beam column.

公开(公告)号：US09373481B2

公开(公告)日：2016-06-21

申请号：US14618630

申请日：2015-02-10

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Kouji Kato ,  Yoshitaka Amamo

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/317 ,  H01J37/12

CPC classification number: H01J37/3171 ,  H01J37/12 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/121 ,  H01J2237/16

Abstract: A beam collimator includes a plurality of lens units that are arranged along a reference trajectory so that a beam collimated to the reference trajectory comes out from an exit of the beam collimator. Each of the plurality of lens units forms a bow-shaped curved gap and is formed such that an angle of a beam traveling direction with respect to the reference trajectory is changed by an electric field generated in the bow-shaped curved gap. A vacant space is provided between one lens unit of the plurality of lens units and a lens unit that is adjacent to the lens unit. The vacant space is directed in a transverse direction of the collimated beam in a cross section that is perpendicular to the reference trajectory. An inner field containing the reference trajectory is connected to an outer field of the plurality of lens units through the vacant space.

Abstract translation: 光束准直仪包括沿着参考轨迹布置的多个透镜单元，使得准直到参考轨迹的光束从光束准直仪的出口出来。 多个透镜单元中的每一个形成弓形弯曲间隙，并且形成为使得相对于基准轨迹的光束移动方向的角度由弓形弯曲间隙中产生的电场改变。 在多个透镜单元的一个透镜单元和与透镜单元相邻的透镜单元之间设置有空白空间。 在垂直于参考轨迹的横截面中，空白空间被引导在准直光束的横向方向上。 包含参考轨迹的内部场通过空置空间连接到多个透镜单元的外部场。