公开(公告)号：US08519363B2

公开(公告)日：2013-08-27

申请号：US12938856

申请日：2010-11-03

Applicant: Kohei Tanaka ,  Takashi Nogami ,  Masayoshi Hino

Inventor： Kohei Tanaka ,  Takashi Nogami ,  Masayoshi Hino

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/204 ,  H01J2237/2482 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/68742

Abstract: An ion implanter performs ion implantation by irradiating a wafer having a notch at its outer peripheral region by an ion beam. In ion implanter, a twist angle adjustment mechanism is configured to adjust a twist angle, an aligner is configured to adjust an alignment angle, a wafer transfer device is configured to transfer the wafer between the aligner and the twist angle adjustment mechanism, an image processing device is configured to detect the twist angle of the wafer on the twist angle adjustment mechanism, and a control device is configured to carry out a twist control in which the wafer is rotated by the twist angle adjustment mechanism by an angle obtained from a first difference between the detected twist angle and the alignment angle and a second difference between the alignment angle and a target twist angle given as one of ion implantation conditions.

Abstract translation: 离子注入机通过离子束在其外周区域照射具有凹口的晶片来进行离子注入。 在离子注入机中，扭转角度调节机构被配置为调节扭曲角度，对准器被配置为调整对准角度，晶片传送装置构造成在对准器和扭转角调节机构之间传送晶片，图像处理 装置被配置为检测扭转角度调节机构上的晶片的扭曲角度，并且控制装置被配置为执行扭转控制，其中晶片由扭转角调节机构旋转角度从第一差异 在检测到的扭转角和对准角之间，以及作为离子注入条件之一给出的对准角和目标扭转角之间的第二差。

公开(公告)号：US08461557B2

公开(公告)日：2013-06-11

申请号：US12997371

申请日：2008-06-13

Applicant: Richard Comunale ,  Alexander Groholski ,  John A. Notte, IV ,  Randall Percival ,  Billy W. Ward

Inventor： Richard Comunale ,  Alexander Groholski ,  John A. Notte, IV ,  Randall Percival ,  Billy W. Ward

IPC: H01J27/00 ,  A61N5/00 ,  G21G5/00

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/0216 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/2007 ,  H01J2237/204 ,  H01J2237/2482

Abstract: Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).

公开(公告)号：US20120152731A1

公开(公告)日：2012-06-21

申请号：US13406275

申请日：2012-02-27

Applicant: Jeff Blackwood ,  Stacey Stone

Inventor： Jeff Blackwood ,  Stacey Stone

IPC: G01N1/32

CPC classification number: G01N1/28 ,  G01N1/06 ,  G01N1/08 ,  G01N1/32 ,  G01N23/04 ,  H01J37/06 ,  H01J37/18 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/063 ,  H01J2237/182 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (

Abstract translation: 一种用于S / TEM样品制备和分析的改进方法和装置。 本发明的优选实施例提供用于TEM样品制备的改进方法，特别是对于小几何（<100nm厚）TEM薄片。 新颖的样品结构和铣削图案的新颖应用允许产生薄至50nm的S / TEM样品，而没有显着的弯曲或翘曲。 本发明的优选实施方案提供了部分或全部自动化TEM样品制备的方法，使TEM样品的创建和分析过程减少劳动密集度，并提高TEM分析的产量和再现性。

公开(公告)号：US08143595B2

公开(公告)日：2012-03-27

申请号：US12547195

申请日：2009-08-25

Applicant: Junichi Tatemichi ,  Masatoshi Onoda ,  Kohichi Orihira

Inventor： Junichi Tatemichi ,  Masatoshi Onoda ,  Kohichi Orihira

IPC: C23C14/50

CPC classification number: H01L21/67213 ,  H01J37/20 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204 ,  H01J2237/31701 ,  H01L21/68764 ,  H01L21/68771

Abstract: An ion implanter includes an implantation chamber into which an ion beam is introduced, a holder for holding substrates on two columns of a first column and a second column in an X-direction, and a holder driving unit having a function of setting the holder in a horizontal state and then positioning the holder in a substrate exchange position and a function of setting the holder in a standing state and then driving reciprocally and linearly the holder along the X-direction in an irradiation area of the ion beam. Also, the ion implanter includes two load lock mechanisms, and two substrate carrying units equipped with arms, which carry the substrates between the load lock mechanisms and a substrate exchange position respectively, every two arms.

Abstract translation: 离子注入机包括：入射离子束的注入室，用于将基板保持在X方向上的第一列和第二列的两列的保持器，以及具有将所述保持器设置为的功能的保持器驱动单元 水平状态，然后将保持器定位在基板更换位置中，并且具有将支架设置在立起状态，然后在离子束的照射区域沿X方向往复并直线地驱动保持器的功能。 此外，离子注入机还包括两个装载锁定机构，以及两个装有臂的基板承载单元，每个臂分别在两个载荷锁定机构和基板更换位置之间承载基板。

公开(公告)号：US20120060353A1

公开(公告)日：2012-03-15

申请号：US12881653

申请日：2010-09-14

Applicant: Jeffrey E. Krampert

Inventor： Jeffrey E. Krampert

IPC: B23Q7/00 ,  B23Q3/00

CPC classification number: H01L21/682 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/2007 ,  H01J2237/204 ,  H01J2237/31711 ,  H01L21/68 ,  Y10T29/49998

Abstract: A workpiece support having alignment features to allow the proper alignment of the shadow mask to the workpiece is provided. The alignment features include tactile sensors, so as to measure the pressure being applied to each alignment feature. Based on these pressure readings, a determination can be made as to whether the workpiece is properly aligned with the shadow mask. In some embodiments, corrective actions may be initiated if a determination is made that the workpiece is not properly aligned.

Abstract translation: 提供具有对准特征以允许荫罩与工件正确对准的工件支撑件。 对准特征包括触觉传感器，以便测量施加到每个对准特征的压力。 基于这些压力读数，可以确定工件是否与荫罩正确对准。 在一些实施例中，如果确定工件未正确对准，则可以启动校正动作。

公开(公告)号：US08110818B2

公开(公告)日：2012-02-07

申请号：US12247536

申请日：2008-10-08

Applicant: You-Jin Wang ,  Chung-Shih Pan

Inventor： You-Jin Wang ,  Chung-Shih Pan

IPC: G01N23/04 ,  H01J37/26

CPC classification number: H01L22/12 ,  H01J2237/204 ,  H01J2237/2817 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.

Abstract translation: 控制通过带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法通过将晶片样品接地并在转移和转移过程中保持电中性而防止颗粒吸收。

公开(公告)号：US08053726B2

公开(公告)日：2011-11-08

申请号：US12216233

申请日：2008-07-01

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC: H01J37/28

CPC classification number: H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

Abstract translation: 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在迷你环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US20110240881A1

公开(公告)日：2011-10-06

申请号：US13047018

申请日：2011-03-14

Applicant: Hiroya Miyazaki

Inventor： Hiroya Miyazaki

IPC: G21K5/08

CPC classification number: H01J37/20 ,  H01J2237/026 ,  H01J2237/2001 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/26 ,  H01J2237/2802

Abstract: The present disclosure significantly reduces the waiting time from inserting a specimen holder into an electron microscope until high quality data acquisition is possible. Characterizing the present disclosure, it is a specimen holder partly made of low thermal expansion material. The low thermal expansion material can be any of group 4, 5 or 6 in the periodic table of the elements.

Abstract translation: 本公开显着地减少了将样品架插入电子显微镜直到高质量数据采集成为可能的等待时间。 表征本公开，它是部分由低热膨胀材料制成的试样保持器。 低热膨胀材料可以是元素周期表中的4,5,6族中的任何一种。

公开(公告)号：US07888661B2

公开(公告)日：2011-02-15

申请号：US12030306

申请日：2008-02-13

Applicant: Ivan L. Berry, III

Inventor： Ivan L. Berry, III

IPC: H01J37/317 ,  H01L21/265

CPC classification number: H01J37/32431 ,  H01J2237/16 ,  H01J2237/184 ,  H01J2237/204 ,  H01J2237/31701

Abstract: A system and methods are provided for mitigating or removing workpiece surface contaminants or conditions. Methods of the invention provide treatment of the wafer surface to provide a known surface condition. The surface condition can then be maintained during and following implantation of the workpiece surface with a dopant.

Abstract translation: 提供了减轻或去除工件表面污染物或条件的系统和方法。 本发明的方法提供晶片表面的处理以提供已知的表面状态。 然后可以在用掺杂剂注入工件表面期间和之后维持表面状态。

公开(公告)号：US20100090107A1

公开(公告)日：2010-04-15

申请号：US12249640

申请日：2008-10-10

Applicant: You-Jin WANG ,  Hsuan-Bin HUANG ,  Chung-Shih PAN

Inventor： You-Jin WANG ,  Hsuan-Bin HUANG ,  Chung-Shih PAN

IPC: G21K5/10 ,  G01N23/00

CPC classification number: H01L21/68707 ,  H01J2237/204

Abstract: A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.

Abstract translation: 公开了一种用于带电粒子束成像的图案形成装置处理装置。 所公开的图案形成装置处理装置包括第一夹持构件和第二夹持构件。 第一夹持构件配备有多个第一定位突起，并且第二夹持构件配备有多个第二定位突起。 当图案形成装置保持一角度时，第一定位突起抵靠图案形成装置的一个边缘，并且第二定位突起抵靠图案形成装置的相对边缘。 当图案形成装置保持在另一个角度时，第一定位突起邻接图案形成装置的两个相邻边缘，并且第二定位突起抵靠图案形成装置的另外两个相邻的边缘。 因此，所公开的图案形成装置处理装置可以以不同的角度保持图案装置。