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    Electron beam focusing system for electron microscope
    21.
    发明授权
    Electron beam focusing system for electron microscope 失效
    电子束聚焦系统

    公开(公告)号：US4626689A

    公开(公告)日：1986-12-02

    申请号：US743014

    申请日：1985-06-10

    Applicant: Takeshi Tomita ,  Yu Ishibashi

    Inventor： Takeshi Tomita ,  Yu Ishibashi

    IPC: H01J37/141 ,  G01Q30/02 ,  H01J37/04 ,  H01J37/10 ,  H01J37/26 ,  H01J37/295 ,  H01J29/46

    CPC classification number: H01J37/295 ,  H01J37/04

    Abstract: When a transmission-type electron microscope is used to make an observation of a diffraction image produced by a focused electron beam, it is desired that the divergence angle of the electron beam be varied at will while maintaining the spot diameter of the beam on a specimen constant. The present invention provides three stages of focusing lenses and a means for controlling these lenses in interrelated manner in a space between an objective lens and an electron gun in which the specimen is placed. The three stages of lenses are designed to be controlled independently. When an operation is performed to increase the divergence angle of the electron beam, the excitations of the first and second stages of focusing lenses are reduced while the excitation of the third stage of focusing lens is increased, thus maintaining the spot diameter of the beam on the specimen constant.

    Abstract translation: 当透射型电子显微镜用于观察由聚焦电子束产生的衍射图像时，期望电子束的发散角随意地变化，同时将光束的光斑直径保持在样品上 不变。 本发明提供了聚焦透镜的三个阶段和用于在物镜和放置样本的电子枪之间的空间中相互关联地控制这些透镜的装置。 镜片的三个阶段被设计为独立控制。 当执行增加电子束发散角的操作时，聚焦透镜的第一和第二阶段的激发减小，同时聚焦透镜的第三阶段的激发增加，从而保持光束的光斑直径 样本常数。

    Ion scattering spectrometer utilizing charge exchange processes
    22.
    发明授权
    Ion scattering spectrometer utilizing charge exchange processes 失效
    离子散射光谱仪利用电荷交换过程

    公开(公告)号：US3920989A

    公开(公告)日：1975-11-18

    申请号：US50771374

    申请日：1974-09-20

    Applicant: MINNESOTA MINING & MFG

    Inventor： ERICKSON ROBERT L ,  SMITH DAVID P

    IPC: G01N23/227 ,  G01N23/20 ,  G01N23/203 ,  G01N23/225 ,  H01J37/00 ,  H01J37/252 ,  H01J37/295 ,  H01J49/02 ,  H01J49/14 ,  H01J49/28 ,  H01J49/44 ,  H01J49/48

    CPC classification number: H01J37/295 ,  G01N23/20 ,  G01N23/203 ,  G01N23/225 ,  H01J49/022 ,  H01J49/142 ,  H01J49/282 ,  H01J49/48

    Abstract: An ion scattering spectroscopic method and apparatus wherein an oscillatory variation in the yield of ions scattered from solid surfaces provides information indicative of electron exchange processes associated with particular electronic states in the atom, which states vary with the electronic environment surrounding the atoms. The apparatus includes means for directing a beam of ions having a known mass and a known charge state toward a solid target surface such that an ion impinges thereon and scatters therefrom. During the impingement, the energy of the incident ions is varied over a range of predetermined primary ion kinetic energies. Ions having a given primary kinetic energy prior to impingement lose a given fraction of that energy upon elastic scattering from an atom of given atomic mass on the target surface. Accordingly, ions scattered from atoms of a single atomic mass are continuously detected by synchronously ''''tracking'''' the acceptance energy of an analyzer with the variation in the kinetic energy of the incident ions. A signal indicative of the yield of ions scattered from atoms having a single atomic mass is thus produced and when plotted as a function of incident primary ion kinetic energy, forms a spectrum wherein particular electronic states may be discerned.

    Abstract translation: 离子散射光谱方法和装置，其中从固体表面散射的离子的产率的振荡变化提供指示与原子中的特定电子状态相关的电子交换过程的信息，该状态随着原子周围的电子环境而变化。 该装置包括用于将具有已知质量和已知电荷状态的离子束引导朝向固体靶表面的装置，使得离子在其上撞击并从其散射。 在冲击期间，入射离子的能量在预定的一次离子动能的范围内变化。 在冲击之前具有给定的初级动能的离子在来自目标表面上的给定原子质量的原子的弹性散射上失去该能量的给定分数。 因此，通过与入射离子的动能的变化同步地“跟踪”分析仪的接收能量来连续检测从原子质量原子散射的离子。 因此产生了表示从具有单一原子质量的原子散射的离子的产率的信号，并且当作为入射的一次离子动能的函数被绘制时，形成可以识别特定电子状态的光谱。

    DEVICES AND SYSTEMS FOR SPATIAL SUBTRACTION OF ELECTRON BACKSCATTER DIFFRACTION PATTERNS
    29.
    发明公开
    DEVICES AND SYSTEMS FOR SPATIAL SUBTRACTION OF ELECTRON BACKSCATTER DIFFRACTION PATTERNS 审中-公开

    公开(公告)号：US20240186105A1

    公开(公告)日：2024-06-06

    申请号：US18526286

    申请日：2023-12-01

    Applicant: Katholieke Universiteit Leuven

    Inventor： Etienne Brodu

    IPC: H01J37/22 ,  H01J37/295

    CPC classification number: H01J37/222 ,  H01J37/295 ,  H01J2237/153

    Abstract: A set of methods of processing a set of Kikuchi diffraction patterns acquired for a series of incident positions of an electron beam on a sample material are described. One such method involves the steps of identifying a first pattern in the set containing a matrix signal and suspected of additionally containing a secondary phase signal; identifying a second pattern close to the first pattern which contains a matrix signal without containing a secondary phase signal; modifying the contrast and intensity of either the first pattern or the second pattern, the modification depending on a relative property of the first and second patterns, resulting in a modified first or second pattern; and obtaining a secondary phase signal pattern by either i) if the first pattern was modified, subtracting the original second pattern from the modified first pattern; or ii) if the second pattern was modified, subtracting the modified second pattern from the original first pattern.

    METHOD AND SYSTEM FOR GENERATING A DIFFRACTION IMAGE
    30.
    发明公开
    METHOD AND SYSTEM FOR GENERATING A DIFFRACTION IMAGE 审中-公开

    公开(公告)号：US20230298853A1

    公开(公告)日：2023-09-21

    申请号：US18321442

    申请日：2023-05-22

    Applicant: FEI Company

    Inventor： Bart BUIJSSE ,  Bart Jozef JANSSEN

    IPC: H01J37/26 ,  H01J37/295

    CPC classification number: H01J37/265 ,  H01J37/295 ,  H01J2237/04

    Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.

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