公开(公告)号：US20060043311A1

公开(公告)日：2006-03-02

申请号：US10932340

申请日：2004-09-01

Applicant: Andrew Dean

Inventor： Andrew Dean

IPC: H01J3/32 ,  H01J37/147

CPC classification number: H01J37/1475 ,  H01J37/141 ,  H01J2237/141 ,  H01J2237/152 ,  H01J2237/153

Abstract: A device for influencing an electron beam, for example a beam deflecting device in an electron beam lithography machine, comprises a beam influencing coil (13) operable to influence an electron beam (EB) in the vicinity of the device by way of a magnetic field and a heat dissipation compensating coil (14) operable to provide a heat output so compensating for any change in heat dissipation of the device due to operation of the beam influencing coil (13)—particularly variable operation to vary the field intensity or to create and remove a field—as to reduce the amount of change, preferably to maintain the net heat dissipation at a constant value. The compensating coil (13) can be controlled, for example, by measurement (19) of the heat dissipation of the device and calculating (18) current supply (16) to the coil (13) in dependence on the measured dissipation.

Abstract translation: 用于影响电子束的装置，例如电子束光刻机中的光束偏转装置，包括可影响线束（13）的光束（13），其可操作以通过磁场影响装置附近的电子束（EB） 以及散热补偿线圈（14），其可操作以提供热输出，从而补偿由于所述光束影响线圈（13）的操作而导致的所述装置的热耗散的任何变化 - 特别可变的操作以改变所述场强度或者产生和 去除一个场，以减少变化量，最好将净散热维持在恒定的值。 补偿线圈（13）可以例如通过装置的散热的测量（19）来控制，并且根据测量的耗散计算（18）到线圈（13）的电流供应（16）。

公开(公告)号：US5994703A

公开(公告)日：1999-11-30

申请号：US811774

申请日：1997-03-06

Applicant: Yoshihiro Arai

Inventor： Yoshihiro Arai

IPC: H01F5/04 ,  H01J3/32 ,  H01J37/147 ,  H05K1/00 ,  H05K1/16 ,  H01J37/14

CPC classification number: H01J37/1475 ,  H01J3/32 ,  H05K1/165 ,  H01J2229/7037 ,  H05K1/0393 ,  H05K1/16 ,  H05K2201/051

Abstract: A printed circuit for forming deflection coils used, for example, in a scanning electron microscope. The printed circuit permits some of scroll coil circuits to be connected with an external circuit with or without connecting them in series. There is also disclosed a printed circuit capable of forming deflection coils which are small in size but produce strong magnetic fields. A printed circuit according to the invention comprises a sheet on which the scroll coils and indicia are printed. When the sheet is wound into a cylinder, the scroll coils are arranged circumferentially.

Abstract translation: 用于形成偏转线圈的印刷电路，例如用扫描电子显微镜。 印刷电路允许一些涡旋线圈电路与具有或不连接它们的外部电路连接。 还公开了能够形成尺寸小但产生强磁场的偏转线圈的印刷电路。 根据本发明的印刷电路包括印刷有涡旋线圈和标记的片材。 当片材被卷绕成圆柱体时，涡旋盘管周向布置。

公开(公告)号：US5393984A

公开(公告)日：1995-02-28

申请号：US106351

申请日：1993-08-12

Applicant: Hilton F. Glavish

Inventor： Hilton F. Glavish

IPC: C23C14/48 ,  G21K1/093 ,  H01F3/02 ,  H01F7/20 ,  H01J3/32 ,  H01J29/76 ,  H01J37/04 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/317 ,  H01L21/02 ,  H01L21/265 ,  H01L27/12

CPC classification number: H01J37/147 ,  G21K1/093 ,  H01F3/02 ,  H01F7/202 ,  H01J29/76 ,  H01J3/32 ,  H01J37/1475 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/31701

Abstract: Deflection apparatus is shown for high perveance ion beams, operating at 20 Hz fundamental and substantially higher order harmonics, having a magnetic structure formed of laminations with thickness in range between 0.2 and 1 millimeter. Additionally, a compensator is shown with similar laminated structures with resonant excitation circuit, operating at 20 Hz or higher, in phase locked relationship with the frequency of the previously deflected beam. Furthermore, features are shown which have broader applicability to producing strong magnetic field in magnetic gap. Among the numerous important features shown are special laminated magnetic structures, including different sets of crosswise laminations in which the field in one lamination of one set is distributed into multiplicity of laminations of the other set of coil-form structures, field detection means and feedback control system, cooling plate attached in thermal contact with number of lamination layers. Surfaces on the entry and exit sides of the compensator magnetic structure have cooperatively selected shapes to increase the length of path exposed to the force field dependently with deflection angle to compensate for contribution to deflection angle caused by higher order components. The entry and exit surfaces of the magnetic scanner and compensator structures cooperating to produce desired eam profile and desired limit on angular deviation of ions within the beam. Also shown is an accelerator comprising a set of accelerator electrodes having slotted apertures, a suppressor electrode at the exit of the electrostatic accelerator, a post-accelerator analyzer magnet having means for adjusting the angle of incidence by laterally moving the post-accelerator analyzer magnet, and a magnet to eliminate aberration created by the post-accelerator analyzer magnet. In the case of use of a spinning substrate carrier for scanning in one dimension, the excitation wave form of the scanner relates changes in scan velocity in inverse dependence with changes in the radial distance of an implant point from the rotation axis. Also an oxygen implantation method is shown with 50 mA ion beam current, the ion beam energy above 100 KeV, and the angular velocity of a rotating carrier above 50 rpm.

公开(公告)号：US5338939A

公开(公告)日：1994-08-16

申请号：US67108

申请日：1993-05-26

Applicant: Hisayasu Nishino ,  Akio Yamada ,  Yoshihisa Oae ,  Hiroshi Yasuda

Inventor： Hisayasu Nishino ,  Akio Yamada ,  Yoshihisa Oae ,  Hiroshi Yasuda

IPC: H01J37/147 ,  H01J3/32

CPC classification number: H01J37/1472 ,  H01J2237/002 ,  H01J2237/14 ,  H01J2237/152 ,  H01J2237/3175

Abstract: A charged particle beam exposure method deflects a charged particle beam in a deflection system which includes electromagnetic deflection coils and an electromagnetic lens. The charged particle beam exposure method includes controlling the deflection system based on deflection data, and blocking heat radiation from at least the electromagnetic deflection coils by a partition so as to prevent the heat radiation from reaching the electromagnetic lens and to prevent heat conduction to the electromagnetic lens by the partition.

Abstract translation: 带电粒子束曝光方法使带电粒子束偏转在包括电磁偏转线圈和电磁透镜的偏转系统中。 带电粒子束曝光方法包括基于偏转数据控制偏转系统，并且通过隔板阻挡来自至少电磁偏转线圈的热辐射，以防止热辐射到达电磁透镜并防止对电磁体的热传导 镜头由分区。

公开(公告)号：US4725736A

公开(公告)日：1988-02-16

申请号：US895200

申请日：1986-08-11

Applicant: Albert V. Crewe

Inventor： Albert V. Crewe

IPC: H01J3/02 ,  H01J37/30 ,  H01J3/18 ,  H01J3/32

CPC classification number: H01J37/3007 ,  H01J3/027

Abstract: An ultra-compact electrostatic electron gun includes integrated beam-modifying means for use in electron beam memory systems, electron microscopes, electron lithographic devices and the like. The gun is illustrated as comprising means forming a point source of electrons and means receiving electrons from the point source for defining an electron beam. Electrostatic lens means receives the beam and forms a beam focus. An integrated magnetic field-generating means establishes a field of magnetic flux through the electrostatic lens for modifying the position, cross-sectional shape or other characteristic of the beam. The magnetic field-generating means is adapted to receive static or dynamic control signals and is characterized by comprising means positioned axially coincident with and surrounding the electrostatic lens to effectively immerse substantially the entire lens in the beam-modifying magnetic field, whereby due to the axial coincidence of the magnetic field-generating means with the lens, a characteristic of the electron beam may be modified without the magnetic field-generating adding significantly, if at all, to the axial length of the gun.

Abstract translation: 超小型静电电子枪包括用于电子束存储系统，电子显微镜，电子光刻设备等的集成光束修改装置。 枪被示出为包括形成电子点源的装置，以及从点源接收电子的装置，用于限定电子束。 静电透镜装置接收光束并形成光束聚焦。 集成磁场产生装置建立通过静电透镜的磁通场，用于改变光束的位置，横截面形状或其他特性。 磁场产生装置适于接收静态或动态控制信号，其特征在于包括与轴向重合并围绕静电透镜的装置，以有效地将整个透镜有效地浸入光束修正磁场中，由此由于轴向 磁场产生装置与透镜的一致性，可以改变电子束的特性，而不会对枪的轴向长度显着增加磁场产生。

公开(公告)号：US3826945A

公开(公告)日：1974-07-30

申请号：US33665673

申请日：1973-02-28

Applicant: INT STANDARD ELECTRIC CORP

Inventor： BEHENNA J ,  PHIPPS G

IPC: H01J21/18 ,  H01J3/32 ,  H01J29/76

CPC classification number: H01J21/18

Abstract: The output power of a magnetically focused thermionic electron tube is varied by altering the strength of the magnetic focusing field. In one embodiment, the output power of an oscillator using a magnetically focused triode may be reduced over a wide range by reducing the focusing field without any detrimental increase of intercepted beam current. The field is reduced by use of a magnetic shunt across the pole pieces of a permanent magnet used for focusing, the shunt being moved mechanically toward or away from the pole pieces. The device may also be used to control gate current in a gate controlled tube.

Abstract translation: 通过改变磁聚焦场的强度来改变磁聚焦热电子管的输出功率。 在一个实施例中，使用磁聚焦三极管的振荡器的输出功率可以通过减小聚焦场而在宽范围内减小，而不会有截获的束电流的任何有害的增加。 通过使用用于聚焦的永磁体的极片之间的磁分路来减小该场，该分流器机械地朝向或远离极片移动。 该器件还可用于控制栅极控制管中的栅极电流。

公开(公告)号：US3193717A

公开(公告)日：1965-07-06

申请号：US12394261

申请日：1961-07-03

Applicant: VARIAN ASSOCIATES

Inventor： NUNAN CRAIG S

IPC: G21K1/093 ,  H01J3/32 ,  H01J33/00

CPC classification number: H01J3/32 ,  G21K1/093 ,  H01J33/00

公开(公告)号：US20210304999A1

公开(公告)日：2021-09-30

申请号：US17208047

申请日：2021-03-22

Applicant: SUMITOMO HEAVY INDUSTRIES, LTD.

Inventor： Hiromichi Sakai

IPC: H01J3/32 ,  G21K5/02

Abstract: An irradiation control device which controls irradiation of charged particles to a target that includes a substance that generates neutrons by being irradiated with a charged particle beam, includes: a deflector that deflects the charged particles; and a controller that controls the deflector such that a plurality of peaks of heat density formed by the beam are formed between a center of an irradiation surface of the target and an end portion of the irradiation surface by moving the beam of the charged particles on the irradiation surface.

公开(公告)号：US09218936B2

公开(公告)日：2015-12-22

申请号：US13514230

申请日：2010-12-10

Applicant: Juergen Zinsstag ,  Cristian Jans

Inventor： Juergen Zinsstag ,  Cristian Jans

IPC: H01J3/32 ,  H01J37/147 ,  C23C14/30 ,  C23C14/54 ,  H01J37/305

CPC classification number: H01J37/1475 ,  C23C14/30 ,  C23C14/542 ,  H01J37/1472 ,  H01J37/3053 ,  H01J2237/1523 ,  H01J2237/3132

Abstract: A vaporizing device is provided, wherein an elongated pot having material to be vaporized is impinged upon by an electron beam, preferably via several electron guns. Each electron gun is responsible for a certain section of the pot. The electron beam is guided over the melt in a pendular manner. For this purpose, a first magnetic deflecting unit is provided, which produces a variable parallel displacement of the electron beam. In order to achieve this, two magnetic fields are provided, the magnetic field boundaries of which form a type of lens system, wherein the outlet side of the first magnetic field is convex and the inlet side of the second magnetic field is concave. In order to deflect the electron beam into the pot, a second magnetic deflecting unit is provided, the magnetic field of which can be moved synchronously with the beam displacement parallel to the pot.

Abstract translation: 提供了一种蒸发装置，其中具有待蒸发的材料的细长的罐优选通过几个电子枪被电子束撞击。 每个电子枪负责锅的某一部分。 电子束以圆柱形的方式引导到熔体上。 为此，提供了第一磁偏转单元，其产生电子束的可变的平行位移。 为了实现这一点，提供了两个磁场，其磁场边界形成一种透镜系统，其中第一磁场的出口侧是凸的，并且第二磁场的入口侧是凹的。 为了将电子束偏转到电池中，提供了第二磁偏转单元，其磁场可以与平行于电位器的光束位移同步地移动。

公开(公告)号：US08829466B2

公开(公告)日：2014-09-09

申请号：US13963000

申请日：2013-08-09

Applicant: Mitsubishi Electric Corporation

Inventor： Takaaki Iwata

IPC: A61N5/10 ,  H01J3/32 ,  H01J37/04

CPC classification number: H01J37/147 ,  A61N5/10 ,  A61N5/1043 ,  A61N5/1048 ,  A61N5/1077 ,  A61N2005/1087 ,  G06N3/02 ,  G21H5/00 ,  G21K1/093 ,  G21K5/04 ,  H01J37/04 ,  H01J2237/0473

Abstract: A scanning power source that outputs the excitation current for a scanning electromagnet and an irradiation control apparatus that controls the scanning power source; the irradiation control apparatus is provided with a scanning electromagnet command value learning generator that evaluates the result of a run-through, which is a series of irradiation operations through a command value for the excitation current outputted from the scanning power source, that updates the command value for the excitation current, when the result of the evaluation does not satisfy a predetermined condition, so as to perform the run-through, and that outputs to the scanning power source the command value for the excitation current such that its evaluation result has satisfied the predetermined condition.

Abstract translation: 输出用于扫描电磁体的激励电流的扫描电源和控制扫描电源的照射控制装置; 照射控制装置设置有扫描电磁体指令值学习生成器，其通过用于从扫描电源输出的激励电流的命令值来评估作为一系列照射操作的通过结果，该命令值更新命令 励磁电流的值，当评估结果不满足预定条件时，进行贯通，并且向扫描电源输出使其评估结果满足的激励电流的指令值 预定条件。