公开(公告)号：US20250062095A1

公开(公告)日：2025-02-20

申请号：US18799382

申请日：2024-08-09

Applicant: Board of Trustees of Michigan State University

Inventor： Peng ZHANG ,  Lan JIN ,  Yang ZHOU

IPC: H01J37/063

Abstract: An electron beam emitter apparatus includes a light source and a radio frequency (“RF”) source. In another aspect, an apparatus includes direct density modulation of photo-assisted field emission from a radio frequency cold cathode. A further aspect provides a radio frequency source connected to an electron emitter or cold cathode having tapered projections, and a photon emitter such as a laser, infrared light or ultraviolet light.

公开(公告)号：US20240282546A1

公开(公告)日：2024-08-22

申请号：US18439532

申请日：2024-02-12

Applicant: Kayaku Advanced Materials, Inc.

Inventor： W. Shannan O'Shaughnessy ,  Sergio Fernandez ,  Andrew Grant ,  Lucas Black

IPC: H01J37/063 ,  C23C16/40 ,  C23C16/505 ,  H01J37/32

CPC classification number: H01J37/063 ,  C23C16/401 ,  C23C16/505 ,  H01J37/32449

Abstract: Plasma-enhanced chemical vapor deposition (PECVD) reactors and methods of fabricating polymers via PECVD processes are generally provided. In some embodiments, a PECVD reactor has one or more features that enhance the quality of the polymers that may be formed therein. Similarly, some methods are performed in a manner that enhances the quality of a polymer formed thereby.

公开(公告)号：US11721516B2

公开(公告)日：2023-08-08

申请号：US17423149

申请日：2020-01-06

Applicant: National Institute for Materials Science

Inventor： Han Zhang ,  Jie Tang ,  Daisuke Fujita ,  Yasushi Yamauchi ,  Luchang Qin

IPC: H01J37/073 ,  H01J9/12 ,  H01J37/063

CPC classification number: H01J37/073 ,  H01J9/12 ,  H01J37/063

Abstract: The purpose of the present invention is to provide an emitter capable of easily and highly efficiently emitting electrons, an electron gun using same, and an electronic device.
This emitter is provided with a cathode holder, and an acicular substance secured to the cathode holder. An end, to which the acicular substance is secured, of the cathode holder is bent at α (α(°) satisfies 5

公开(公告)号：US20230131413A1

公开(公告)日：2023-04-27

申请号：US17044850

申请日：2020-05-08

Applicant: Photo electron Soul Inc.

Inventor： Atsushi KOIZUMI ,  Hokuto IIJIMA

IPC: H01J37/073 ,  H01J37/063

Abstract: The present disclosure addresses the problem of providing an electron gun that can directly monitor an intensity of an electron beam emitted from a photocathode using only the configuration provided to the electron gun, an electron beam applicator equipped with an electron gun, and a method for controlling an electron gun.
The aforementioned problem can be solved by an electron gun comprising a light source, a photocathode that emits an electron beam in response to receiving light from the light source, an anode, an electron-beam-shielding member with which it is possible to shield part of the electron beam, and a measurement unit that measures the intensity of the electron beam emitted from the photocathode using a measurement electron beam shielded by the electron-beam-shielding member.

公开(公告)号：US20230010176A1

公开(公告)日：2023-01-12

申请号：US17368707

申请日：2021-07-06

Applicant: KLA Corporation

Inventor： Luca Grella ,  Nikolai Chubun ,  Stephen Pitts

IPC: H01J37/073 ,  H01J37/063 ,  H01J37/32

Abstract: An e-beam device includes a cold-field emission source to emit electrons and an extractor electrode to be positively biased with respect to the cold-field emission source to extract the electrons from the cold-field emission source. The extractor electrode has a first opening for the electrons. The e-beam device also includes a mirror electrode with a second opening for the electrons. The mirror electrode is configurable to be positively biased with respect to the extractor electrode during a first mode of operation and to be negatively biased with respect to the extractor electrode during a second mode of operation. The extractor electrode is disposed between the cold-field emission source and the mirror electrode. The e-beam device further includes an anode to be positively biased with respect to the extractor electrode and the cold-field emission source. The mirror electrode is disposed between the extractor electrode and the anode.

公开(公告)号：US20220301808A1

公开(公告)日：2022-09-22

申请号：US17836109

申请日：2022-06-09

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Syuta Ochi

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/063 ,  H01J37/32

Abstract: An ion generator includes an arc chamber defining a plasma generation space, and a cathode which emits thermoelectrons toward the plasma generation space. The arc chamber includes a box-shaped main body having an opening, and a slit member mounted to cover the opening and provided with a front slit. An inner surface of the main body is exposed to the plasma generation space made of a refractory metal material. The slit member includes an inner member made of graphite and an outer member made of another refractory metal material. The outer member includes an outer surface exposed to an outside of the arc chamber. The inner member includes an inner surface exposed to the plasma generation space, and an opening portion which forms the front slit extending from the inner surface of the inner member to the outer surface of the outer member.

公开(公告)号：US11380512B2

公开(公告)日：2022-07-05

申请号：US16818675

申请日：2020-03-13

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Syuta Ochi

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/063 ,  H01J37/32

Abstract: An ion generator includes: an arc chamber which defines a plasma generation space; a cathode which emits thermoelectrons toward the plasma generation space; and a repeller which faces the cathode with the plasma generation space interposed therebetween. The arc chamber includes a box-shaped main body on which a front side is open, and a slit member which is mounted to the front side of the main body and provided with a front slit for extracting ions. An inner surface of the main body which is exposed to the plasma generation space is made of a refractory metal material, and an inner surface of the slit member which is exposed to the plasma generation space is made of graphite.

公开(公告)号：US11189459B2

公开(公告)日：2021-11-30

申请号：US16886872

申请日：2020-05-29

Applicant: NuFlare Technology, Inc.

Inventor： Hideaki Hashimoto ,  Riki Ogawa

IPC: H01J37/28 ,  H01J37/065 ,  H01J37/063

Abstract: A pattern inspection apparatus according to an aspect described herein includes: a stage on which an object to be inspected is capable to be mounted, a multibeam column that irradiates the object to be inspected with multi-primary electron beams, and a multi-detector including a first detection pixel that receives irradiation of a first secondary electron beam emitted after a first beam scanning region of the object to be inspected is irradiated with a first primary electron beam of the multi-primary electron beams and a second detection pixel that receives irradiation of a second secondary electron beam emitted after a second beam scanning region adjacent to the first beam scanning region of the object to be inspected and overlapping with the first beam scanning region is irradiated with a second primary electron beam adjacent to the first primary electron beam of the multi-primary electron beams; a comparison unit that obtains a difference in beam intensity between the first primary electron beam and the second primary electron beam by comparing overlapping portions of a first frame image acquired through entering of the first secondary electron beam into the first detection pixel and a second frame image acquired through entering of the second secondary electron beam into the second detection pixel; and a sensitivity adjustor that adjusts detection sensitivity of the first detection pixel and/or the second detection pixel so as to correct the difference in beam intensity.

公开(公告)号：US11139138B2

公开(公告)日：2021-10-05

申请号：US16809611

申请日：2020-03-05

Applicant: NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

Inventor： Kazuhiko Inoue ,  Atsushi Ando ,  Munehiro Ogasawara ,  John Hartley

IPC: H01J37/06 ,  H01J37/20 ,  H01J37/24 ,  H01J37/10 ,  H01J37/063 ,  H01J37/244

Abstract: A multiple electron beam irradiation apparatus includes a forming mechanism which forms multiple primary electron beams; a plurality of electrode substrates being stacked in each of which a plurality of openings of various diameter dimensions are formed, the plurality of openings being arranged at passage positions of the multiple primary electron beams, and through each of which a corresponding one of the multiple primary electron beams passes, the plurality of electrode substrates being able to adjust an image plane conjugate position of each of the multiple primary electron beams depending on a corresponding one of the various diameter dimensions; and a stage which is capable of mounting thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode substrates.

公开(公告)号：US10529529B2

公开(公告)日：2020-01-07

申请号：US15424270

申请日：2017-02-03

Applicant: Moxtek, Inc.

Inventor： Dustin Peterson ,  Richard Zimmerman ,  Vince Jones ,  Eric Miller

IPC: H01J35/14 ,  H01J35/16 ,  H01J37/065 ,  H01J35/06 ,  H01J37/21 ,  H01J37/063 ,  H01J37/15 ,  H05G1/52

Abstract: Electron beam spot characteristics can be tuned in each x-ray tube by moving a focusing-ring along a longitudinal-axis of the x-ray tube. The focusing-ring can then be immovably fastened to the x-ray tube.An x-ray source can include an x-ray tube and a focusing-ring. The focusing-ring can at least partially encircle an electron-emitter, a cathode, an evacuated-enclosure, or combinations thereof. The focusing-ring can be located outside of a vacuum of the evacuated enclosure. The focusing-ring can adjust an electron-beam spot on a target material of the x-ray tube when moved along a longitudinal-axis extending linearly from the electron-emitter to the target material.