公开(公告)号：US07141809B2

公开(公告)日：2006-11-28

申请号：US11099062

申请日：2005-04-05

Applicant: John W. Vanderpot ,  John D. Pollock ,  Donald W. Berrian

Inventor： John W. Vanderpot ,  John D. Pollock ,  Donald W. Berrian

IPC: B65H1/00

CPC classification number: H01J37/20 ,  H01J37/3171 ,  H01J2237/0216 ,  H01J2237/20228 ,  H01J2237/20292 ,  H01J2237/31703 ,  H01L21/67069 ,  H01L21/67259 ,  H01L21/68764 ,  H01L21/68792

Abstract: A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operably coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied between the rotor and stator rotates the rotor about the first axis and translates the workpiece through the ion beam along a first scan path. A position of the workpiece is sensed and the electromagnetic force between the rotor and stator is controlled in order to reverse the direction of motion of the workpiece along the first scan path, and wherein the control is based, at least in part, on the sensed position of the workpiece. The stator further rotates about the first axis in reaction to the rotation of the rotor, particularly in the reversal of direction of motion of the workpiece, thus acting as a reaction mass to the rotation of one or more of the rotor, scan arm, and workpiece.

Abstract translation: 提供了一种用于通过离子束在扫描臂上往复运送工件的方法，其中扫描臂可操作地耦合到包括转子和定子的电动机，该转子和定子可以围绕第一轴线单独旋转。 施加在转子和定子之间的电磁力围绕第一轴线旋转转子，并使工件沿第一扫描路径平移离子束。 感测工件的位置，并且控制转子和定子之间的电磁力以便沿着第一扫描路径反转工件的运动方向，并且其中控制至少部分地基于感测的 工件位置。 定子进一步围绕第一轴线转动，以反应转子的旋转，特别是在反转工件的运动方向上，从而作为与转子，扫描臂和转子中的一个或多个的旋转反应的质量 工件。

公开(公告)号：US20060255290A1

公开(公告)日：2006-11-16

申请号：US11125317

申请日：2005-05-10

Applicant: Santokh Bhadare ,  Ian Barkshire ,  Daniel Turner

Inventor： Santokh Bhadare ,  Ian Barkshire ,  Daniel Turner

IPC: H01J37/244

CPC classification number: H01J37/02 ,  H01J2237/0216 ,  H01J2237/2001 ,  H01J2237/2817

Abstract: A sample inspection apparatus comprises a sample support; a detection system for detecting radiation emitted by or transmitted through a sample on the sample support in response to radiation incident on the sample; and a cooling system for cooling at least one of the sample support and detection system. The cooling system includes at least one oscillating, mechanical component which oscillates at a frequency different from the at least one of the support and detection system.

公开(公告)号：US20060076492A1

公开(公告)日：2006-04-13

申请号：US11245428

申请日：2005-10-07

Applicant: Yoshifumi Taniguchi ,  Hisafumi Otsuka

Inventor： Yoshifumi Taniguchi ,  Hisafumi Otsuka

IPC: G21K7/00

CPC classification number: H01J37/26 ,  H01J37/224 ,  H01J37/265 ,  H01J2237/0216 ,  H01J2237/2025 ,  H01J2237/20292

Abstract: Drift generated at the time of photographing a TEM image is corrected simultaneously with photographing, so that a TEM image free form influence of drift is photographed. While the TEM image is recorded, drift in the place out of the view field subjected to recording is measured from moment to moment by another TV camera or a position sensitive detector. Drift is corrected by the movement of the specimen due to a specimen holder or by the movement of the image due to an image shift coil.

Abstract translation: 在拍摄TEM图像时产生的漂移与拍摄同时被校正，从而拍摄TEM图像自由形成的漂移影响。 在记录TEM图像的同时，通过另一台电视摄像机或位置敏感探测器随时测量被记录的视场外的位置的漂移。 漂移由于样品夹持器的移动或由于图像移动线圈的图像的运动而被校正。

公开(公告)号：US20060060791A1

公开(公告)日：2006-03-23

申请号：US10937137

申请日：2004-09-08

Applicant: Andrew Hazelton

Inventor： Andrew Hazelton

IPC: G21K5/10

CPC classification number: H01J37/02 ,  G03F7/709 ,  H01J2237/0216

Abstract: Embodiments of the present invention are directed to apparatus and methods of attenuating vibration, particularly for modern stepper machines and other types of vibration sensitive equipment. The attenuation system exhibits good vibration attenuation in the axial or support direction, and exhibits low or substantially zero lateral stiffness to prevent transmission of any vibrations between any of various portions of the machine. In one embodiment, an apparatus for attenuating transmission of lateral vibration between a first mass and a second mass comprises a vibration attenuation device including at least one bellows oriented along a support axis. The at least one bellows is connected between the first mass and the second mass and has an interior volume pressurized with a fluid to an internal fluid pressure which is greater than a zero-stiffness pressure such that the vibration attenuation device exhibits a negative lateral stiffness. A positive stiffness device is coupled between the first mass and the second mass. The positive stiffness device has a positive lateral stiffness which may be substantially equal to or greater than the negative lateral stiffness in magnitude.

Abstract translation: 本发明的实施例涉及衰减振动的装置和方法，特别是用于现代步进机和其它类型的振动敏感设备。 衰减系统在轴向或支撑方向上表现出良好的振动衰减，并且表现出低或基本上零的侧向刚度，以防止在机器的各个部分中的任何一个之间的任何振动的传播。 在一个实施例中，一种用于衰减第一质量块和第二质量块之间横向振动传播的装置包括一个振动衰减装置，其包括至少一个沿支撑轴定向的波纹管。 所述至少一个波纹管连接在所述第一质量块和所述第二质量块之间，并且具有用流体加压至大于零刚度压力的内部流体压力的内部体积，使得所述振动衰减装置呈现负的横向刚度。 正刚度装置联接在第一质量块和第二质量块之间。 正刚度装置具有正横向刚度，该横向刚度可以在大小上基本上等于或大于负横向刚度。

公开(公告)号：US20050205809A1

公开(公告)日：2005-09-22

申请号：US11074645

申请日：2005-03-09

Applicant: Shinji Uchida

Inventor： Shinji Uchida

IPC: G03F7/20 ,  H01J37/02 ,  H01J37/16 ,  H01J37/20 ,  H01J37/317 ,  H01L21/027 ,  H01L21/68 ,  H01J37/304

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/023 ,  H01J2237/0216 ,  H01J2237/0245

Abstract: An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4A arranged in the sample chamber 3 for holding and moving the wafer 10; and first mounting 5A for elastically supporting the column 1 with respect to the sample chamber 3.

Abstract translation: 一种电子束曝光装置，包括：用于将电子束照射到用作样品的晶片10的列1; 样品室3，其具有真空泵40作为用于将内部单元控制到真空气氛的真空耗尽单元; 设置在样品室3中用于保持和移动晶片10的阶段4A; 并且首先安装5A用于相对于样品室3弹性地支撑柱1。

公开(公告)号：US06855929B2

公开(公告)日：2005-02-15

申请号：US09985324

申请日：2001-11-02

Applicant: Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: G01N23/225 ,  G01Q30/02 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  G01N23/00 ,  G21K7/00

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到在检查室中保持真空的检查室23-1中; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US20040263819A1

公开(公告)日：2004-12-30

申请号：US10875166

申请日：2004-06-25

Applicant: Sumitomo Heavy Industries, Ltd.

Inventor： Naoki Yasumitsu ,  Eiichi Hiraoka ,  Yoshiyuki Tomita

IPC: G03B027/54 ,  A47C027/08

CPC classification number: H01L21/67126 ,  G03F7/70808 ,  G03F7/70841 ,  H01J37/16 ,  H01J37/20 ,  H01J2237/0216

Abstract: An airtight processing apparatus comprises a chamber having a side wall and a bottom wall airtightly fixed to the side wall, and a bed supported inside the chamber by the side wall with a gap from the bottom wall.

公开(公告)号：US06308557B1

公开(公告)日：2001-10-30

申请号：US09209057

申请日：1998-12-09

Applicant: Peter Heiland

Inventor： Peter Heiland

IPC: G01D328

CPC classification number: G01Q10/06 ,  G01Q30/18 ,  G01Q70/04 ,  H01J2237/0216 ,  Y10S977/851

Abstract: A device which scans in a raster mode, in particular to a raster microscope, provides a rapid and inexpensive compensation of the disturbing effects of mechanical vibrations on the scanning process. The device includes a sensor for sensing mechanical vibrations and driving a filter whose output, together with the output of the device for the production of a z-signal, is connected to an adder, the output of which drives the device for changing the distance between the specimen and the sensor.

Abstract translation: 以光栅模式扫描的装置，特别是光栅显微镜，可以快速而廉价地补偿机械振动对扫描过程的干扰作用。 该装置包括用于感测机械振动和驱动滤波器的传感器，其输出与用于产生z信号的装置的输出连接到加法器，加法器的输出驱动装置，以改变 样品和传感器。

公开(公告)号：US6043490A

公开(公告)日：2000-03-28

申请号：US12757

申请日：1998-01-23

Applicant: Katsuhiko Sakai

Inventor： Katsuhiko Sakai

IPC: H01J37/20 ,  H01J37/02 ,  H01J37/147 ,  G06K9/40 ,  H01J37/28

CPC classification number: H01J37/02 ,  H01J2237/0216

Abstract: Mechanical vibration detecting sensors and a sound wave sensor are provided in a column, and mechanical vibration detecting sensors, a sound wave sensor and electromagnetic wave detecting antennas are provided in a sample stage side. Outputs of the sensors and the antennas are processed by signal processing circuits and correction signals generated by these signal processing circuits are added to X-direction and Y-direction scanning signals from signal generating circuits.

Abstract translation: 在列中设置机械振动检测传感器和声波传感器，在样本台侧设置机械振动检测传感器，声波传感器和电磁波检测天线。 传感器和天线的输出由信号处理电路处理，由这些信号处理电路生成的校正信号被加到来自信号发生电路的X方向和Y方向的扫描信号上。

公开(公告)号：US5508518A

公开(公告)日：1996-04-16

申请号：US434100

申请日：1995-05-03

Applicant: Rodney A. Kendall

Inventor： Rodney A. Kendall

IPC: F16F15/02 ,  G03F7/20 ,  H01J37/30 ,  G21G5/00

CPC classification number: G03F7/70691 ,  F16F15/02 ,  G03F7/70833 ,  G03F7/709 ,  H01J37/3002 ,  H01J2237/0216 ,  H01J2237/3175

Abstract: The optical components of an imaging or exposure tool are isolated from vibrations emanating from components such as vacuum pumps, stage drives, and substrate translating and handling components, by connecting all sources of vibrations to the frame, and suspending the optical components from the frame using isolating and damping components. Connections to portions of the optical components are made using high vacuum, heavily damped, bellows type connectors, or the like.

Abstract translation: 成像或曝光工具的光学部件与从诸如真空泵，平台驱动器和基板平移和处理部件的部件发出的振动隔​​离，通过将所有的振动源连接到框架上，并且使用 隔离和阻尼部件。 使用高真空，重度阻尼，波纹管式连接器等来连接到光学部件的部分。