公开(公告)号：US20070085029A1

公开(公告)日：2007-04-19

申请号：US11241232

申请日：2005-09-30

Applicant: Bruce Baxter ,  Benyamin Buller

Inventor： Bruce Baxter ,  Benyamin Buller

IPC: G21G5/00

CPC classification number: H01J37/165 ,  H01J37/24 ,  H01J2237/0203 ,  H01J2237/0266 ,  H01J2237/28

Abstract: Systems, methods, and apparatus for reducing EMI in charged particle beam systems are provided. By placing noise sensitive electronic modules used in charged particles systems in a shielded equipment cell, and routing DC only signals to power the modules, EMI within the housing may be significantly reduced.

Abstract translation: 提供了用于减少带电粒子束系统中的EMI的系统，方法和装置。 通过将带电粒子系统中使用的噪声敏感电子模块放置在屏蔽设备单元中，并且仅路由直流信号以为模块供电，外壳内的EMI可能会显着降低。

公开(公告)号：US5342471A

公开(公告)日：1994-08-30

申请号：US870827

申请日：1992-04-20

Applicant: Kazuo Fukasawa ,  Masachika Suetsugu

Inventor： Kazuo Fukasawa ,  Masachika Suetsugu

IPC: H01L21/205 ,  C23C14/56 ,  C23C16/44 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  B44C1/22

CPC classification number: H01J37/32522 ,  C23C14/564 ,  C23C16/4401 ,  H01J2237/0266 ,  H01J2237/2001 ,  Y10S156/914

Abstract: A plasma processing apparatus having a pair of electrodes which are installed alternately in parallel in a chamber and in which an object to be processed is placed at one electrode thereof, radiofrequency applying device for applying radiofrequency power between the pair of electrodes, cooling device for cooling the object, drying-gas introducing tube for supplying a drying gas into the chamber, and dropwise-condensation preventing member installed at a portion of the chamber so as to be in contact with the outer atmosphere. The apparatus can prevent dropwise condensation at the time of cooling and at the same time prevent the occurrence of radiofrequency leakage.

Abstract translation: 一种等离子体处理装置，其具有一对电极，其在室中交替平行安装，并且其中待处理物体放置在其一个电极处，用于在所述一对电极之间施加射频电力的射频施加装置，用于冷却的冷却装置 该物体，用于将干燥气体供应到室中的干燥气体导入管，以及安装在室的一部分以与外部大气接触的防滴落构件。 该装置可以防止冷却时的滴流冷凝，同时防止发生射频泄漏。

公开(公告)号：US12068136B2

公开(公告)日：2024-08-20

申请号：US17191383

申请日：2021-03-03

Applicant: KOKUSAI ELECTRIC CORPORATION

Inventor： Tsuyoshi Takeda

IPC: H01J37/32 ,  H01L21/02

CPC classification number: H01J37/32449 ,  H01J37/32183 ,  H01J37/32669 ,  H01L21/02315 ,  H01J2237/0266

Abstract: There is provided a technique that includes: a process chamber in which a substrate is processed; a gas supply system configured to supply a processing gas into the process chamber; a first plasma generator installed to be wound around an outer periphery of the process chamber and configured to generate plasma from the processing gas in the process chamber; and a second plasma generator installed at an upper portion of the process chamber to protrude toward an inside of the process chamber and configured to generate plasma from the processing gas in the process chamber.

公开(公告)号：US20190164729A1

公开(公告)日：2019-05-30

申请号：US15828258

申请日：2017-11-30

Applicant: Lam Research Corporation

Inventor： Hema Swaroop Mopidevi ,  John Pease ,  Thomas W. Anderson ,  Neil M.P. Benjamin

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683 ,  H02J50/12

CPC classification number: H01J37/32651 ,  H01J37/32082 ,  H01J37/32174 ,  H01J2237/0266 ,  H01L21/67103 ,  H01L21/6833 ,  H02J50/12

Abstract: RF isolation for power circuitry includes one or more ferrite cages surrounding a pair of coils, one coil connected to power input, and the other coil connected to a load such as a heater. The ferrite cage provides universal isolation for the coils, avoiding the necessity of specially tuned filters or more complicated coil arrangements. A pair of dielectric discs support respective coils. In one aspect, the ferrite cage is constituted by ferrite pieces which fan out from a central portion of the dielectric discs and are connected at an outer periphery of the dielectric discs, and at the central portion of the dielectric discs. In one aspect, the fanned-out ferrite pieces comprises either manganese-zinc or magnesium-zinc ferrites, and the ferrite pieces connecting the fanned-out ferrite pieces comprise nickel-zinc ferrites.

公开(公告)号：US09961753B2

公开(公告)日：2018-05-01

申请号：US15633525

申请日：2017-06-26

Applicant: Moxtek, Inc.

Inventor： Vincent Floyd Jones ,  Daniel N. Paas

IPC: H05G1/06 ,  H05G1/04 ,  G21F1/10 ,  G21F5/02 ,  H01J35/02 ,  H01J37/16 ,  G01N23/223 ,  A61B6/00 ,  H01J5/04 ,  H01J9/36

CPC classification number: H05G1/06 ,  A61B6/107 ,  A61B6/4405 ,  A61B6/4429 ,  A61B6/485 ,  A61B2560/0406 ,  A61B2560/0425 ,  A61B2560/0431 ,  A61B2560/0462 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/301 ,  G21F1/106 ,  G21F5/015 ,  G21F5/02 ,  G21F5/04 ,  G21F5/06 ,  H01J5/04 ,  H01J5/50 ,  H01J9/36 ,  H01J35/025 ,  H01J35/16 ,  H01J37/165 ,  H01J2235/16 ,  H01J2235/163 ,  H01J2235/165 ,  H01J2235/166 ,  H01J2237/0266 ,  H01J2237/16 ,  H05G1/04

Abstract: A portable XRF analyzer includes a hand shield and a handle. In one embodiment, the XRF analyzer further comprises a power component spaced-apart from an engine component. The handle and the hand shield extend in parallel between the engine component and the power component, attaching the engine component to the power component. In another embodiment, the XRF analyzer further comprises two housing portions, each integrally formed in a single, monolithic body formed together at the same time. The two housing portions are joined together to form an XRF analyzer housing. In another embodiment, the hand shield is shorter than the handle.

公开(公告)号：US20170372878A1

公开(公告)日：2017-12-28

申请号：US15677260

申请日：2017-08-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Masahito TOGAMI ,  Tatehito USUI ,  Kosa HIROTA ,  Satomi INOUE ,  Shigeru NAKAMOTO

IPC: H01J37/32

CPC classification number: H01J37/32972 ,  H01J37/32458 ,  H01J37/32908 ,  H01J37/32963 ,  H01J37/3299 ,  H01J2237/0266 ,  H01J2237/2445 ,  H01J2237/3341

Abstract: A plasma processing apparatus includes: a detector configured to detect a change in an intensity of light emission from plasma formed inside a processing chamber; and a unit configured to adjust conditions for forming the plasma or processing a wafer arranged inside the processing chamber using an output from the detector, wherein the detector detects a signal of the intensity of light emission at plural time instants before an arbitrary time instant during processing, and wherein the adjusting unit removes the component of a temporal change of a long cycle of the intensity of light emission from this detected signal and detects the component of a short temporal change of the intensity of light emission, and adjusts the conditions for forming the plasma or processing a wafer arranged inside the processing chamber based on the short temporal change of the detected intensity of light emission.

公开(公告)号：US20170299529A1

公开(公告)日：2017-10-19

申请号：US15633525

申请日：2017-06-26

Applicant: Moxtek, Inc.

Inventor： Vincent Floyd Jones ,  Daniel N. Paas

IPC: G01N23/223

CPC classification number: H05G1/06 ,  A61B6/107 ,  A61B6/4405 ,  A61B6/4429 ,  A61B6/485 ,  A61B2560/0406 ,  A61B2560/0425 ,  A61B2560/0431 ,  A61B2560/0462 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/301 ,  G21F1/106 ,  G21F5/015 ,  G21F5/02 ,  G21F5/04 ,  G21F5/06 ,  H01J5/04 ,  H01J5/50 ,  H01J9/36 ,  H01J35/025 ,  H01J35/16 ,  H01J37/165 ,  H01J2235/16 ,  H01J2235/163 ,  H01J2235/165 ,  H01J2235/166 ,  H01J2237/0266 ,  H01J2237/16 ,  H05G1/04

Abstract: A portable XRF analyzer includes a hand shield and a handle. In one embodiment, the XRF analyzer further comprises a power component spaced-apart from an engine component. The handle and the hand shield extend in parallel between the engine component and the power component, attaching the engine component to the power component. In another embodiment, the XRF analyzer further comprises two housing portions, each integrally formed in a single, monolithic body formed together at the same time. The two housing portions are joined together to form an XRF analyzer housing. In another embodiment, the hand shield is shorter than the handle.

公开(公告)号：US09775574B2

公开(公告)日：2017-10-03

申请号：US14615134

申请日：2015-02-05

Applicant: Moxtek, Inc.

Inventor： Vincent Floyd Jones ,  Daniel N. Paas

IPC: H01J35/16 ,  H01J37/16 ,  H05G1/04 ,  H05G1/02 ,  G01N23/223 ,  G21F5/02 ,  G21F5/04 ,  G21F5/06 ,  A61B6/00 ,  A61B6/10 ,  G21F1/10 ,  H05G1/06 ,  G21F5/015 ,  H01J5/50 ,  H01J5/04 ,  H01J9/36 ,  H01J35/02

CPC classification number: H05G1/06 ,  A61B6/107 ,  A61B6/4405 ,  A61B6/4429 ,  A61B6/485 ,  A61B2560/0406 ,  A61B2560/0425 ,  A61B2560/0431 ,  A61B2560/0462 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/301 ,  G21F1/106 ,  G21F5/015 ,  G21F5/02 ,  G21F5/04 ,  G21F5/06 ,  H01J5/04 ,  H01J5/50 ,  H01J9/36 ,  H01J35/025 ,  H01J35/16 ,  H01J37/165 ,  H01J2235/16 ,  H01J2235/163 ,  H01J2235/165 ,  H01J2235/166 ,  H01J2237/0266 ,  H01J2237/16 ,  H05G1/04

Abstract: A portable XRF analyzer includes a hand shield to substantially block x-rays from impinging on a hand of a user. The portable XRF analyzer includes a heat sink over an x-ray source and a heat sink over an x-ray detector. The heat sinks are separated from each other by a thermally insulative material.

公开(公告)号：US09767997B2

公开(公告)日：2017-09-19

申请号：US14333502

申请日：2014-07-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Masahito Togami ,  Tatehito Usui ,  Kosa Hirota ,  Satomi Inoue ,  Shigeru Nakamoto

IPC: C23F1/00 ,  H01L21/306 ,  H01J37/32

CPC classification number: H01J37/32972 ,  H01J37/32458 ,  H01J37/32908 ,  H01J37/32963 ,  H01J37/3299 ,  H01J2237/0266 ,  H01J2237/2445 ,  H01J2237/3341

Abstract: A plasma processing apparatus includes: a detector configured to detect a change in an intensity of light emission from plasma formed inside a processing chamber; and a unit configured to adjust conditions for forming the plasma or processing a wafer arranged inside the processing chamber using an output from the detector, wherein the detector detects a signal of the intensity of light emission at plural time instants before an arbitrary time instant during processing, and wherein the adjusting unit removes the component of a temporal change of a long cycle of the intensity of light emission from this detected signal and detects the component of a short temporal change of the intensity of light emission, and adjusts the conditions for forming the plasma or processing a wafer arranged inside the processing chamber based on the short temporal change of the detected intensity of light emission.

公开(公告)号：US09312093B1

公开(公告)日：2016-04-12

申请号：US14321921

申请日：2014-07-02

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Joerg Fober ,  Edgar Fichter ,  Kai Schubert ,  Dirk Preikszas ,  Christian Hendrich ,  Momme Mommsen ,  Michael Schnell ,  Lorenz Lechner

IPC: H01J37/26 ,  H01J37/147

CPC classification number: H01J37/1471 ,  H01J37/24 ,  H01J37/26 ,  H01J2237/0266 ,  H01J2237/032 ,  H01J2237/1504 ,  H01J2237/153

Abstract: A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.

Abstract translation: 粒子束装置包括用于产生具有带电粒子的粒子束的束发生器和具有第一电极和第二电极的电极单元，其中第一电极与第二电极相互作用，特别是用于引导，成形，对准或校正 粒子束。 此外，粒子束装置包括使用电连接与第一电极和第二电极中的至少一个连接的低通滤波器。 另外，粒子束装置包括具有用于粒子束通过的开口的安装单元，其中至少一个低通滤波器，第一电极和第二电极布置在安装单元处。 电极单元可以包括多于两个电极，例如多达16个电极。