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31.发明申请METHOD OF PREPARING AN ULTRA SHARP TIP, APPARATUS FOR PREPARING AN ULTRA SHARP TIP, AND USE OF AN APPARATUS 审中-公开制备超快速提拉的方法，用于制备超声波提示的装置以及装置的使用公开(公告)号：US20100006447A1
公开(公告)日：2010-01-14
申请号：US12169041
申请日：2008-07-08
Applicant: Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
Inventor： Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
CPC classification number: C25D5/48 , B81C1/00111 , B82Y15/00 , C25D7/00 , H01J1/3044 , H01J9/025 , H01J27/26 , H01J37/073 , H01J37/08 , H01J2201/30411 , H01J2201/30415 , H01J2209/0226 , H01J2237/06341 , H01J2237/0807
Abstract: A method of preparing an ultra sharp tip, in particular a single atom tip, is provided, comprising providing a tip having a shank, an apex, and a coating covering the shank and the apex; locally removing the coating from the apex by field evaporation; and partially or fully restoring the coating at the apex.
Abstract translation: 提供了制备超尖尖，特别是单个原子尖端的方法，其包括提供具有柄，尖端和覆盖柄和顶点的涂层的尖端; 通过场蒸发从顶点局部去除涂层; 并且部分地或完全地恢复顶点处的涂层。
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公开(公告)号：US20090289185A1
公开(公告)日：2009-11-26
申请号：US12133298
申请日：2008-06-04
Applicant: Juergen FROSIEN , Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
Inventor： Juergen FROSIEN , Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
IPC: G01N23/00
CPC classification number: H01J37/08 , H01J27/26 , H01J37/28 , H01J2237/004 , H01J2237/061 , H01J2237/0807 , H01J2237/244 , H01J2237/24514 , H01J2237/24535 , H01J2237/24564 , H01J2237/24578 , H01J2237/2594 , H01J2237/2623 , H01J2237/2816 , H01J2237/2817
Abstract: A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission centre of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.
Abstract translation: 描述了一种聚焦离子束装置，其包括气体离子源，其具有用于分析和分类样品结构的分析器，用于根据分析仪的分析来控制和/或改变样品的结构的控制器，发射器尖端 发射极尖端具有包括第一材料和超高压头的基座尖端，所述第一材料和第一材料包括不同于所述第一材料的材料，其中所述超高压是单个原子尖端，并且所述基座尖端是单晶基底尖端。 此外，聚焦离子束装置具有探针电流控制和样品充电控制。 提供了一种操作聚焦离子束装置的方法，包括在超高压的单个发射中心和电极之间施加电压，向发射极尖端供应气体，分析和分类样品的结构，以及控制样品的结构 。
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公开(公告)号：US07601953B2
公开(公告)日：2009-10-13
申请号：US11385215
申请日：2006-03-20
Applicant: Billy W. Ward , Louis S. Farkas, III , John A. Notte, IV , Randall G. Percival
Inventor： Billy W. Ward , Louis S. Farkas, III , John A. Notte, IV , Randall G. Percival
IPC: H01J37/26
CPC classification number: H01J37/28 , H01J37/08 , H01J37/244 , H01J2237/0807 , H01J2237/1501 , H01J2237/24455 , H01J2237/2505
Abstract: In one aspect the invention provides a gas field ion microscope that includes an ion source in connection with an optical column, such that an ion beam generated at the ion source travels through the optical column and impinges on a sample. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the invention provides methods for using the ion microscope to analyze samples and enhancing the performance of a gas field ion source.
Abstract translation: 一方面，本发明提供了一种气体离子显微镜，其包括与光学柱结合的离子源，使得在离子源处产生的离子束穿过光学柱并撞击样品。 离子源包括具有与包含少量原子的尖端逐渐变细的宽度的发射体。 在其他方面，本发明提供了使用离子显微镜分析样品并提高气体离子源的性能的方法。
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公开(公告)号：US20090179161A1
公开(公告)日：2009-07-16
申请号：US12364259
申请日：2009-02-02
Applicant: BILLY W. WARD , JOHN A. NOTTE, IV , LOUIS S. FARKAS, III , RANDAL G. PERCIVAL , RAYMOND HILL , KLAUS EDINGER , LARS MARKWORT , DIRK ADERHOLD , ULRICH MANTZ
Inventor： BILLY W. WARD , JOHN A. NOTTE, IV , LOUIS S. FARKAS, III , RANDAL G. PERCIVAL , RAYMOND HILL , KLAUS EDINGER , LARS MARKWORT , DIRK ADERHOLD , ULRICH MANTZ
CPC classification number: H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/08 , H01J37/20 , H01J37/252 , H01J37/256 , H01J37/28 , H01J37/304 , H01J37/3053 , H01J37/3056 , H01J2237/08 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/31701 , H01J2237/3174 , H01J2237/3175 , H01J2237/31755
Abstract: Ion sources, systems and methods are disclosed.
Abstract translation: 公开了离子源，系统和方法。
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公开(公告)号：US07557360B2
公开(公告)日：2009-07-07
申请号：US11600861
申请日：2006-11-15
Applicant: Billy W. Ward , John A. Notte, IV , Louis S. Farkas, III , Randall G. Percival , Raymond Hill , Lars Markwort , Dirk Aderhold
Inventor： Billy W. Ward , John A. Notte, IV , Louis S. Farkas, III , Randall G. Percival , Raymond Hill , Lars Markwort , Dirk Aderhold
CPC classification number: H01J37/08 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/3174 , H01J2237/31755
Abstract: Ion sources, systems and methods are disclosed.
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Patent Agency Ranking
公开(公告)号：US20090121160A1
公开(公告)日：2009-05-14
申请号：US12253042
申请日：2008-10-16
Applicant: Dieter Winkler , Udo Weigel , Stefan Grimm
Inventor： Dieter Winkler , Udo Weigel , Stefan Grimm
IPC: G01J1/00
CPC classification number: H01J37/073 , H01J27/26 , H01J37/08 , H01J37/265 , H01J37/304 , H01J2237/06341 , H01J2237/0805 , H01J2237/0807 , H01J2237/30466 , H01J2237/30477 , H01J2237/31749
Abstract: A charged particle beam device is described. The device includes an emitter unit including an emitter tip; a voltage supply unit adapted for providing a stable voltage to generate a stable extraction field at the emitter tip; a pulsed voltage supply member adapted for providing a pulsed voltage to generate a pulsed extraction field on top of the stable extraction field; a measuring unit for measuring an emitter characteristic; and a control unit adapted for receiving a signal from the measuring unit and for control of the pulsed voltage supply member.
Abstract translation: 描述带电粒子束装置。 该装置包括发射器单元，其包括发射极尖端; 电压供应单元，适于提供稳定的电压以在发射极尖端处产生稳定的提取场; 脉冲电压供应构件，其适于提供脉冲电压以在所述稳定提取场的顶部产生脉冲提取场; 用于测量发射极特性的测量单元; 以及控制单元，适于接收来自测量单元的信号并用于控制脉冲电压供应构件。
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公开(公告)号：US07511279B2
公开(公告)日：2009-03-31
申请号：US11600250
申请日：2006-11-15
Applicant: Billy W. Ward , John A. Notte, IV , Louis S. Farkas, III , Randall G. Percival , Raymond Hill
Inventor： Billy W. Ward , John A. Notte, IV , Louis S. Farkas, III , Randall G. Percival , Raymond Hill
CPC classification number: H01J37/08 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/3174 , H01J2237/31755
Abstract: Ion sources, systems and methods are disclosed.
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公开(公告)号：US07504639B2
公开(公告)日：2009-03-17
申请号：US11600252
申请日：2006-11-15
Applicant: Billy W. Ward , John A. Notte, IV , Louis S. Farkas, III , Randall G. Percival , Raymond Hill
Inventor： Billy W. Ward , John A. Notte, IV , Louis S. Farkas, III , Randall G. Percival , Raymond Hill
CPC classification number: H01J37/08 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/3174 , H01J2237/31755
Abstract: Ion sources, systems and methods are disclosed.
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公开(公告)号：US20090001266A1
公开(公告)日：2009-01-01
申请号：US12209079
申请日：2008-09-11
Applicant: JUERGEN FROSIEN
Inventor： JUERGEN FROSIEN
IPC: G01N23/00
CPC classification number: H01J37/08 , H01J37/30 , H01J2237/0216 , H01J2237/061 , H01J2237/06316 , H01J2237/06341 , H01J2237/08 , H01J2237/0807 , H01J2237/26
Abstract: The present invention provides a charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip; and supporting member for supporting the emitter. Further, the apparatus includes an emitter location-measuring device for repeatedly measuring the location of the emitter; and a deflector system for compensating variations in the location of the emitter.
Abstract translation: 本发明提供带电粒子束装置，带电粒子束源包括具有发射极尖端的发射极; 以及用于支撑发射器的支撑构件。 此外，该装置包括用于反复测量发射器的位置的发射器位置测量装置; 以及用于补偿发射器位置变化的偏转器系统。
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公开(公告)号：US20070205375A1
公开(公告)日：2007-09-06
申请号：US11599935
申请日：2006-11-15
Applicant: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill , Shawn McVey , Johannes Bihr
Inventor： Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill , Shawn McVey , Johannes Bihr
CPC classification number: H01J37/08 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/3174 , H01J2237/31755
Abstract: Ion sources, systems and methods are disclosed.
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